JPS6197886A - Metallic vapor laser apparatus - Google Patents

Metallic vapor laser apparatus

Info

Publication number
JPS6197886A
JPS6197886A JP21927884A JP21927884A JPS6197886A JP S6197886 A JPS6197886 A JP S6197886A JP 21927884 A JP21927884 A JP 21927884A JP 21927884 A JP21927884 A JP 21927884A JP S6197886 A JPS6197886 A JP S6197886A
Authority
JP
Japan
Prior art keywords
metal vapor
discharge
ceramic tube
output
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21927884A
Other languages
Japanese (ja)
Inventor
Norimasa Yoshida
憲正 吉田
Yoshio Araki
義雄 荒木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP21927884A priority Critical patent/JPS6197886A/en
Publication of JPS6197886A publication Critical patent/JPS6197886A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/031Metal vapour lasers, e.g. metal vapour generation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To prevent the decrease in output and to contrive the prolongation in lifetime by a method wherein metal vapor adsorption films equipped with a feeding mechanism at the laser beam outlet are arranged in parallel with Brewster windows and inside the windows. CONSTITUTION:When a ceramic tube 4 is heated by impressing pulse high voltage from a pulse high voltage source 12 to both electrodes the cathode 2 and the anode 3 and to the buffer gas, a metal 16 evaporizes and excited by electrons, then emitting excited beams. At this time, the metal vapor diffuses through the buffer gas atmosphere and is adsorbed to the metal vapor adsorption films 17 arranged at both ends of the discharge tube body 5, taken out of the Brewster windows 10 through the adsorption films 17, and outputted from the output mirror 14 side under amplification by a total reflection mirror 13 and the output mirror 14. When the output of laser beam decreases with the increase in amount of deposition with the passage of operation, the adsorption films are fed out and replaced with parts of no deposition of metallic vapor.

Description

【発明の詳細な説明】 [発明の技術分野] 本発明は可視域(波長5106人、5780人)の発振
波長を持ち、高効率で高いレーザ出力が得られ、例えば
金属ウランのレーザによる同位体分離技術に応用される
銅蒸気レーザ等の金属蒸気レーザ装置に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention has an oscillation wavelength in the visible range (wavelengths of 5106 and 5780 wavelengths), and can obtain high efficiency and high laser output. This invention relates to metal vapor laser devices such as copper vapor lasers applied to separation technology.

[発明の技術的背景とその問題点] 従来の金属蒸気レーザ装置は、第3図に示すように、放
電管本体15に取着されたガス導入口1からHe5Ne
等のバッフ1ガスを供給してセラミック管4の両端に設
けられた陰極2および陽極3間にパルス高電圧電源12
がパルス高電圧を印加する。この高電圧により生じる放
電によりセラミック管4内に設置された銅粒16を加熱
し蒸発させる。なお耐熱性セラミック管4は放電部5を
Oリングシール部6およびベローズ7により断熱室8か
ら真空隔絶されている。また、セラミック管4の外周面
には熱遮蔽板9が設けられている。
[Technical background of the invention and its problems] As shown in FIG.
A pulse high voltage power supply 12 is connected between the cathode 2 and the anode 3 provided at both ends of the ceramic tube 4 by supplying a buff 1 gas such as
applies a pulsed high voltage. The copper grains 16 placed inside the ceramic tube 4 are heated and evaporated by the discharge generated by this high voltage. Note that the discharge section 5 of the heat-resistant ceramic tube 4 is vacuum isolated from the heat insulating chamber 8 by an O-ring seal section 6 and a bellows 7. Further, a heat shielding plate 9 is provided on the outer peripheral surface of the ceramic tube 4.

さらに放電管本体15の両端にはレーザ光取り出し用の
ブリュースター窓10が配置されている。
Furthermore, Brewster windows 10 for extracting laser light are arranged at both ends of the discharge tube body 15.

金属蒸気レーザ装置としては、放電部5をロータリーポ
ンプ11により排気できる真空排気系と、この放電部5
にのみバッファガスを導入するガス供給系1と、高圧直
流電源と高速スイッチング回路からなるパルス高電圧電
源12と、ブルユスタ窓1oの両側に配置された全反射
ミラー13と出力ミラー14がつくる光共振器とを具備
している。
The metal vapor laser device includes a vacuum evacuation system that can evacuate the discharge section 5 using a rotary pump 11, and a
A gas supply system 1 that introduces buffer gas only to Equipped with utensils.

放電はセラミック管4内にガス導入口1から供給された
バッファガスと両極2.3に印加される電圧数kV〜1
0数kVと繰り返し周波数数KHz〜10数K11zの
パルス二極放電である。
The discharge is caused by a buffer gas supplied from the gas inlet 1 into the ceramic tube 4 and a voltage of several kV to 1 applied to both poles 2.3.
This is a pulsed bipolar discharge with several kV and a repetition frequency of several KHz to several K11 z.

レーザー媒質となる金属蒸気は、放電プラズマの接触に
よってセラミック管4が金属沸点程度に加熱し、内部に
設置された金属粒16が蒸発することによって得られる
。この金属蒸気はセラミック管4内一様に10” 〜1
0”  n/cdの密度で分布し、放電プラズマ中のエ
レクトロン(電子)により励起されることにより励起光
を放射(エミッション)し、両端に置かれた全反射ミラ
ー13と出力ミラー14(50%透過率)からなる光共
振器で増幅され、出力ミラー14側からレーザ光となっ
て取り出される。なお、図中19はガス排出口、20は
冷却管、21は導線、22は接続管、23は絶縁管をそ
れぞれ示している。
The metal vapor serving as the laser medium is obtained by heating the ceramic tube 4 to about the boiling point of the metal by contact with the discharge plasma, and evaporating the metal grains 16 placed inside. This metal vapor is uniformly distributed in the ceramic tube 4 at a depth of 10" to 1
It is distributed at a density of 0" n/cd and emits excitation light by being excited by electrons in the discharge plasma. Total reflection mirrors 13 and output mirrors 14 (50% It is amplified by an optical resonator consisting of a transmittance) and is extracted as a laser beam from the output mirror 14 side.In the figure, 19 is a gas exhaust port, 20 is a cooling pipe, 21 is a conducting wire, 22 is a connecting pipe, 23 indicate insulating tubes.

このような構成の従来例では、金属蒸気が高温に保たれ
ているセラミック管4内からバッファガス雰囲気中を拡
散し、両端のブリュースター窓10のような低温部に付
着し、レーザ光が外部に取り出し難くなり、運転時間の
経過とともにレーザ出力が低下し、レーザ管の寿命が短
くなるという問題点を有していた。
In a conventional example with such a configuration, metal vapor diffuses into the buffer gas atmosphere from inside the ceramic tube 4 kept at a high temperature, and adheres to low-temperature parts such as the Brewster windows 10 at both ends, and the laser beam is transmitted to the outside. The laser tube becomes difficult to remove, the laser output decreases over time, and the life of the laser tube is shortened.

[発明の目的] 本発明は以上の事情によってなされたもので、ブリュー
スタ窓に金属蒸気が付着しても、レーザ光が外部に取り
出し難くならないような金属蒸気レーザ装置を提供する
ことを目的にする。
[Object of the Invention] The present invention was made in view of the above circumstances, and an object of the present invention is to provide a metal vapor laser device that does not make it difficult to extract laser light to the outside even if metal vapor adheres to the Brewster window. do.

[発明の概要] 上記目的を達成するために本発明は、熱遮蔽板で覆われ
た内部に金属粒が置かれた耐熱性セラミック管と、この
セラミック管をOリングとへベローズで真空隔絶する真
空断熱室と、バラフッガス導入口と高圧直流電源と、高
速スイッチング回路からなるパルス高電圧電源とを具備
した金属蒸気レーザ装置において、レーザ光の取り出し
口に送り出しR構を備えた金属蒸気吸着フィルムをブリ
ュースタ窓と平行にブリュースタ窓より放電管内部に配
置して、また全反射ミラーと出力ミラーがつくる光共振
器からなるように設けるか、またはブリュースタ窓と全
反射ミラーまたは出力ミラーを気密に保持されたボック
スで包囲してなる金属蒸気レーザ装置である。
[Summary of the Invention] In order to achieve the above object, the present invention includes a heat-resistant ceramic tube covered with a heat shielding plate and having metal grains placed therein, and vacuum-isolating the ceramic tube with an O-ring and a bellows. In a metal vapor laser device equipped with a vacuum insulation chamber, a rose gas inlet, a high voltage DC power source, and a pulsed high voltage power source consisting of a high-speed switching circuit, a metal vapor adsorption film equipped with a sending R structure at the laser beam extraction port is used. It can be placed parallel to the Brewster window and further inside the discharge tube than the Brewster window, and the total reflection mirror and the output mirror can form an optical resonator, or the Brewster window and the total reflection mirror or the output mirror can be airtight. This is a metal vapor laser device surrounded by a box held in a metal vapor laser.

[発明の実施例] 以下第1図を参照して本発明に係わる金属蒸気レーザ装
置の一実施例を説明する。なお、第1図中第3図と同一
部分には同一符号を付して重複する部分の説明を省略す
る。
[Embodiment of the Invention] An embodiment of a metal vapor laser device according to the present invention will be described below with reference to FIG. Note that parts in FIG. 1 that are the same as those in FIG. 3 are given the same reference numerals, and explanations of overlapping parts are omitted.

すなわち、第1図においてバッファガス(He 。That is, in FIG. 1, the buffer gas (He).

Ne等)をセラミック管4内の放電部5に導入する導入
口1と、高圧直流電源と高速スイッチング回路からなる
パルス高電圧電源12と、この電源12によりパルス高
電圧を生じ放電する陰極2と陽極3を両端を持った内部
に金属粒6を設置した耐熱性セラミック管4と、このセ
ラミック管4内の放電部5をOリングシール部6および
ベローズ7により真空隔絶された断熱室8と、前記セラ
ミック管4を覆う熱遮蔽板9と、上記セラミック管4お
よびその付帯部品を包囲する放電管本体と、この放電管
本体5の両端それぞれに金属蒸気を吸着するレーザ光が
透過する金属蒸気吸着フィルム17と、この吸着フィル
ム17と平行してさらに端にレーザ光を取り出すブリュ
ースタ窓10と、放電管本体5から取り出されるレーザ
を全反射する全反射ミラー13と、レーザ光を出力する
出力ミラー14がつくる光共振器とから金属蒸気レーザ
装置は構成されている。また、金属蒸気吸着フィルム1
7は放電管本体5に対して入れ換えが自在にできる送り
出し機構を有している。
An inlet 1 for introducing Ne, etc.) into a discharge section 5 in a ceramic tube 4, a pulsed high voltage power supply 12 consisting of a high voltage DC power supply and a high speed switching circuit, and a cathode 2 for generating a pulsed high voltage and discharging by this power supply 12. A heat-resistant ceramic tube 4 having an anode 3 at both ends and having metal grains 6 installed therein; a heat-insulating chamber 8 in which a discharge section 5 within the ceramic tube 4 is vacuum-isolated by an O-ring seal section 6 and a bellows 7; A heat shielding plate 9 that covers the ceramic tube 4, a discharge tube body that surrounds the ceramic tube 4 and its accessory parts, and a metal vapor adsorption device through which a laser beam that adsorbs metal vapor passes through each end of the discharge tube body 5. A film 17, a Brewster window 10 that is parallel to the adsorption film 17 and takes out the laser beam at the end, a total reflection mirror 13 that totally reflects the laser beam taken out from the discharge tube body 5, and an output mirror that outputs the laser beam. The metal vapor laser device is composed of the optical resonator formed by 14. In addition, metal vapor adsorption film 1
7 has a feeding mechanism that can be freely replaced with respect to the discharge tube main body 5.

次に本発明に係る金属蒸気レーザ装置の作用について説
明する。
Next, the operation of the metal vapor laser device according to the present invention will be explained.

パルス高電圧電源12から陰極2と陽極3の両極間とバ
ッフ7ガスに数kV〜1o数kVで印加し、繰り返し数
KHz〜10数K)(2のパルス二極放電して、耐熱性
セラミック管4を金属沸点程度に加熱する。この加熱に
よってセラミック管4内部の金属、例えば銅粒16が蒸
発してセラミック管4内部に一様に1014〜10”n
/liの密度で銅の蒸気が分布する。そして放電プラズ
マ中の電子(エレクトロン)により励起されることによ
り、励起光を放射する。このとき銅の蒸気は高温に保た
れているセラミック管4内からバッファガス雰囲気中を
拡散して放電管本体5の両端に配置された金属蒸気吸着
フィルム17に吸着される。
A pulsed high voltage power supply 12 is applied between the cathode 2 and anode 3 and the buffer 7 gas at several kV to several kV, and the repetition rate is KHz to several tens of K. The tube 4 is heated to about the boiling point of the metal. Through this heating, the metal inside the ceramic tube 4, for example, the copper grains 16, is evaporated and uniformly 1014 to 10"n inside the ceramic tube 4.
Copper vapor is distributed at a density of /li. Then, when excited by electrons in the discharge plasma, excitation light is emitted. At this time, the copper vapor diffuses into the buffer gas atmosphere from within the ceramic tube 4 maintained at a high temperature and is adsorbed by the metal vapor adsorption films 17 disposed at both ends of the discharge tube body 5.

従って、励起光はレーザ光を透過する吸着フィルム17
を透過してブリュースタ窓10から取り出され、放電管
本体5の両端に配置された全反射ミラー13と出力ミラ
ー14(50%透過率)からなる光共振器で増幅され、
出力ミラー14側よリレーザ光となって取り出される。
Therefore, the excitation light is transmitted through the adsorption film 17 that transmits the laser light.
is transmitted through the Brewster window 10, and is amplified by an optical resonator consisting of a total reflection mirror 13 and an output mirror 14 (50% transmittance) arranged at both ends of the discharge tube body 5.
The laser beam is extracted from the output mirror 14 side as a relay laser beam.

一方、銅の蒸気を吸着する吸着フィルム17は、運転経
過とともに付着量が増大・してくるので、レーザ光の出
力が低下してきたならば、吸着フィルムをカメラのフィ
ルム送り出しと同じように、銅の蒸気がまったく付着し
ていない部分に入れ換えるように送り出すことによって
、銅の蒸気や付着するためのレーザ光出力低下の原因を
取除くことができ、レーザ光の出力も元に戻ることにな
る。
On the other hand, the amount of adhesion of the adsorption film 17 that adsorbs copper vapor increases as the operation progresses, so if the output of the laser beam decreases, the adsorption film 17 is used to remove the copper vapor in the same way as the film feed of a camera. By sending the copper vapor to replace the area where it is not attached at all, the cause of the decrease in laser light output due to copper vapor and adhesion can be removed, and the laser light output will be restored to its original level.

以上説明したように上記実施例によれば、金属蒸気がフ
ィルムに付着することによってレーザ光出力低下するこ
とはなくなり、ひいては装置全体の寿命を長くすること
ができる。
As explained above, according to the above embodiment, the laser light output does not decrease due to metal vapor adhering to the film, and as a result, the life of the entire device can be extended.

なお、本発明は第1図に示す実施の態様に限定されるも
のではなく、例えば第2図に示すように、従来例の第3
図の金属蒸気レーザで、放電管本体5の両端部それぞれ
のブリュースタ窓10と企及′1 射ミラー13あるいは出力ミラー14を気密に保持した
容器内18に入れて、さらにブリュースタ窓10自体を
大きくして回転磯構を持たせて回転により金属蒸気の付
着がつく部分をついてない部分に入れ換えることにより
、金属蒸気が付着することによるレーザ光の出力低下を
除去することができ、装置全体の寿命を長くすることが
できる。
Note that the present invention is not limited to the embodiment shown in FIG. 1; for example, as shown in FIG.
Using the metal vapor laser shown in the figure, the Brewster window 10 and the output mirror 13 or output mirror 14 at each end of the discharge tube body 5 are placed in a container 18 that is kept airtight, and then the Brewster window 10 itself is sealed. By increasing the size and having a rotating rock structure, and replacing the part where metal vapor is attached due to rotation with the part that is not attached, it is possible to eliminate the decrease in the output of the laser light due to the attachment of metal vapor, and it is possible to reduce the overall efficiency of the device. It can extend the lifespan.

[発明の効果] 以上詳細したように本発明によれば、金属蒸気が金属蒸
気吸着フィルムに付着して新しいフィルムに入れ換える
ことができるので、レーザ装置の出力低下を招くことな
く、しかも金属蒸気レーザ装置自体の寿命を長くするこ
とができる。
[Effects of the Invention] As detailed above, according to the present invention, since metal vapor adheres to the metal vapor adsorption film and can be replaced with a new film, the output of the laser device does not decrease, and the metal vapor laser The life of the device itself can be extended.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る金属蒸気レーザの一実施例を示す
配置図、第2図は本発明の他の実施例を示す配置図、第
3図は従来の金属蒸気レーザを示す配置図である。
FIG. 1 is a layout diagram showing one embodiment of a metal vapor laser according to the present invention, FIG. 2 is a layout diagram showing another embodiment of the invention, and FIG. 3 is a layout diagram showing a conventional metal vapor laser. be.

Claims (2)

【特許請求の範囲】[Claims] (1)バッファガスを放電部に導入口、高圧DC電源お
よび高速スイッチング回路からなるパルス高電圧電源と
、この高圧電源によりパルス高電圧を生じ放電する陰極
および陽極を両端に持つた内部に金属粒を設置した耐熱
性セラミック管と、このセラミック管の放電部をOリン
グと熱遮蔽板により真空隔絶された断熱室と、前記セラ
ミック管を覆う熱遮蔽板からなっている放電管本体と、
の放電管本体の両端にそれぞれ配置されたレーザ光を透
過する金属蒸気吸着フィルムと、この吸着フィルムと平
行してレーザ光取り出し側に配置されたブリュースタ窓
と、前記放電管本体の両側にレーザ光軸に垂直に配置し
た全反射ミラーおよび出力ミラーとを具備したことを特
徴とする金属蒸気レーザ装置。
(1) A pulsed high-voltage power supply consisting of an inlet for introducing buffer gas into the discharge section, a high-voltage DC power supply, and a high-speed switching circuit, and a cathode and anode at both ends that generate a pulsed high voltage and discharge metal particles inside the high-voltage power supply. a heat-resistant ceramic tube in which a discharge portion of the ceramic tube is installed, an insulating chamber in which the discharge part of the ceramic tube is vacuum-isolated by an O-ring and a heat shield plate, and a discharge tube body comprising a heat shield plate that covers the ceramic tube;
A metal vapor adsorption film that transmits laser light is placed at each end of the discharge tube body, a Brewster window is placed parallel to the adsorption film on the laser light extraction side, and a laser beam is placed on both sides of the discharge tube body. A metal vapor laser device comprising a total reflection mirror and an output mirror arranged perpendicular to an optical axis.
(2)金属蒸気吸着フィルムブリュースタ窓幅より大き
い長さを持ち、連続的に送り出して入れ換え自在に形成
されたいることを特徴とする特許請求の範囲第1項記載
の金属蒸気レーザ装置。
(2) The metal vapor laser device according to claim 1, characterized in that the metal vapor adsorption film has a length larger than the Brewster window width and is formed so as to be continuously fed out and replaced.
JP21927884A 1984-10-18 1984-10-18 Metallic vapor laser apparatus Pending JPS6197886A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21927884A JPS6197886A (en) 1984-10-18 1984-10-18 Metallic vapor laser apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21927884A JPS6197886A (en) 1984-10-18 1984-10-18 Metallic vapor laser apparatus

Publications (1)

Publication Number Publication Date
JPS6197886A true JPS6197886A (en) 1986-05-16

Family

ID=16733011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21927884A Pending JPS6197886A (en) 1984-10-18 1984-10-18 Metallic vapor laser apparatus

Country Status (1)

Country Link
JP (1) JPS6197886A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102553A (en) * 1991-10-09 1993-04-23 Toshiba Corp Metal steam laser device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05102553A (en) * 1991-10-09 1993-04-23 Toshiba Corp Metal steam laser device

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