JPS6197510A - 走査型電子顕微鏡による立体形状測定装置 - Google Patents

走査型電子顕微鏡による立体形状測定装置

Info

Publication number
JPS6197510A
JPS6197510A JP59218355A JP21835584A JPS6197510A JP S6197510 A JPS6197510 A JP S6197510A JP 59218355 A JP59218355 A JP 59218355A JP 21835584 A JP21835584 A JP 21835584A JP S6197510 A JPS6197510 A JP S6197510A
Authority
JP
Japan
Prior art keywords
image
sample
edge
data
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59218355A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0445047B2 (enrdf_load_stackoverflow
Inventor
Toshiaki Ichinose
敏彰 一ノ瀬
Takanori Ninomiya
隆典 二宮
Yasuo Nakagawa
中川　泰夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59218355A priority Critical patent/JPS6197510A/ja
Publication of JPS6197510A publication Critical patent/JPS6197510A/ja
Publication of JPH0445047B2 publication Critical patent/JPH0445047B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP59218355A 1984-10-19 1984-10-19 走査型電子顕微鏡による立体形状測定装置 Granted JPS6197510A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59218355A JPS6197510A (ja) 1984-10-19 1984-10-19 走査型電子顕微鏡による立体形状測定装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59218355A JPS6197510A (ja) 1984-10-19 1984-10-19 走査型電子顕微鏡による立体形状測定装置

Publications (2)

Publication Number Publication Date
JPS6197510A true JPS6197510A (ja) 1986-05-16
JPH0445047B2 JPH0445047B2 (enrdf_load_stackoverflow) 1992-07-23

Family

ID=16718580

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59218355A Granted JPS6197510A (ja) 1984-10-19 1984-10-19 走査型電子顕微鏡による立体形状測定装置

Country Status (1)

Country Link
JP (1) JPS6197510A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157433A (ja) * 1986-12-22 1988-06-30 Mitsubishi Electric Corp 半導体パタ−ン形状評価装置
JPH01211849A (ja) * 1987-10-23 1989-08-25 Kobe Steel Ltd 走査型電子顕微鏡画像からの３次元形状の再構成法および装置
JP2005064023A (ja) * 2003-08-12 2005-03-10 Hitachi Ltd 露光プロセスモニタ方法
US7539340B2 (en) 2003-04-25 2009-05-26 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
JP2013242216A (ja) * 2012-05-21 2013-12-05 Hitachi High-Technologies Corp パターン計測装置、パターン計測方法及びパターン計測プログラム
WO2014007017A1 (ja) * 2012-07-06 2014-01-09 株式会社 日立ハイテクノロジーズ オーバーレイ誤差測定装置、及びパターン測定をコンピューターに実行させるコンピュータープログラム
US20140088440A1 (en) * 2011-05-26 2014-03-27 Elliot Krishna Swart Stereoscopic Plug-And-Play Dermatoscope And Web Interface
JPWO2023144909A1 (enrdf_load_stackoverflow) * 2022-01-26 2023-08-03

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63157433A (ja) * 1986-12-22 1988-06-30 Mitsubishi Electric Corp 半導体パタ−ン形状評価装置
JPH01211849A (ja) * 1987-10-23 1989-08-25 Kobe Steel Ltd 走査型電子顕微鏡画像からの３次元形状の再構成法および装置
US7539340B2 (en) 2003-04-25 2009-05-26 Topcon Corporation Apparatus and method for three-dimensional coordinate measurement
JP2005064023A (ja) * 2003-08-12 2005-03-10 Hitachi Ltd 露光プロセスモニタ方法
US20140088440A1 (en) * 2011-05-26 2014-03-27 Elliot Krishna Swart Stereoscopic Plug-And-Play Dermatoscope And Web Interface
JP2013242216A (ja) * 2012-05-21 2013-12-05 Hitachi High-Technologies Corp パターン計測装置、パターン計測方法及びパターン計測プログラム
WO2014007017A1 (ja) * 2012-07-06 2014-01-09 株式会社 日立ハイテクノロジーズ オーバーレイ誤差測定装置、及びパターン測定をコンピューターに実行させるコンピュータープログラム
JP2014016174A (ja) * 2012-07-06 2014-01-30 Hitachi High-Technologies Corp オーバーレイ誤差測定装置、及びパターン測定をコンピューターに実行させるコンピュータープログラム
TWI493154B (zh) * 2012-07-06 2015-07-21 Hitachi High Tech Corp 重疊誤差測定裝置及使圖案測定實行於電腦的電腦程式
US10545017B2 (en) 2012-07-06 2020-01-28 Hitachi High-Technologies Corporation Overlay error measuring device and computer program for causing computer to measure pattern
JPWO2023144909A1 (enrdf_load_stackoverflow) * 2022-01-26 2023-08-03

Also Published As

Publication number Publication date
JPH0445047B2 (enrdf_load_stackoverflow) 1992-07-23

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