JPS6183062A - サ−マルヘッドの製造装置 - Google Patents
サ−マルヘッドの製造装置Info
- Publication number
- JPS6183062A JPS6183062A JP60017790A JP1779085A JPS6183062A JP S6183062 A JPS6183062 A JP S6183062A JP 60017790 A JP60017790 A JP 60017790A JP 1779085 A JP1779085 A JP 1779085A JP S6183062 A JPS6183062 A JP S6183062A
- Authority
- JP
- Japan
- Prior art keywords
- resistance value
- value
- resistance
- pulse
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004364 calculation method Methods 0.000 claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims description 43
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000000034 method Methods 0.000 abstract description 21
- 239000010408 film Substances 0.000 description 32
- 238000010586 diagram Methods 0.000 description 15
- 239000000463 material Substances 0.000 description 14
- 239000010409 thin film Substances 0.000 description 14
- 238000005259 measurement Methods 0.000 description 8
- 239000000523 sample Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 238000009966 trimming Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 244000145845 chattering Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/35—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads providing current or voltage to the thermal head
Landscapes
- Electronic Switches (AREA)
- Measurement Of Resistance Or Impedance (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60017790A JPS6183062A (ja) | 1985-01-30 | 1985-01-30 | サ−マルヘッドの製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60017790A JPS6183062A (ja) | 1985-01-30 | 1985-01-30 | サ−マルヘッドの製造装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59205015A Division JPS6183053A (ja) | 1984-09-28 | 1984-09-28 | サ−マルヘツドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6183062A true JPS6183062A (ja) | 1986-04-26 |
| JPH0229508B2 JPH0229508B2 (enrdf_load_stackoverflow) | 1990-06-29 |
Family
ID=11953507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60017790A Granted JPS6183062A (ja) | 1985-01-30 | 1985-01-30 | サ−マルヘッドの製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6183062A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH048556A (ja) * | 1990-04-26 | 1992-01-13 | Matsushita Electric Ind Co Ltd | サーマルヘッドおよびその抵抗値トリミング法 |
| CN110389267A (zh) * | 2019-07-17 | 2019-10-29 | 国网陕西省电力公司电力科学研究院 | 一种基于智能电能表采集数据的低压台区台户关系识别方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS539543A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Thick film material for thermal head and thermal head |
| JPS539544A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Thick film materialfor thermal head and thermal head |
| JPS5434046A (en) * | 1977-08-22 | 1979-03-13 | Fujitsu Ltd | Resistance value adjustment of resistance element group |
-
1985
- 1985-01-30 JP JP60017790A patent/JPS6183062A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS539543A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Thick film material for thermal head and thermal head |
| JPS539544A (en) * | 1976-07-15 | 1978-01-28 | Toshiba Corp | Thick film materialfor thermal head and thermal head |
| JPS5434046A (en) * | 1977-08-22 | 1979-03-13 | Fujitsu Ltd | Resistance value adjustment of resistance element group |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH048556A (ja) * | 1990-04-26 | 1992-01-13 | Matsushita Electric Ind Co Ltd | サーマルヘッドおよびその抵抗値トリミング法 |
| CN110389267A (zh) * | 2019-07-17 | 2019-10-29 | 国网陕西省电力公司电力科学研究院 | 一种基于智能电能表采集数据的低压台区台户关系识别方法 |
| CN110389267B (zh) * | 2019-07-17 | 2021-05-04 | 国网陕西省电力公司电力科学研究院 | 一种低压台区台户关系识别方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0229508B2 (enrdf_load_stackoverflow) | 1990-06-29 |
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| Publication | Publication Date | Title |
|---|---|---|
| US4782202A (en) | Method and apparatus for resistance adjustment of thick film thermal print heads | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |