JPS6165742U - - Google Patents
Info
- Publication number
- JPS6165742U JPS6165742U JP14987284U JP14987284U JPS6165742U JP S6165742 U JPS6165742 U JP S6165742U JP 14987284 U JP14987284 U JP 14987284U JP 14987284 U JP14987284 U JP 14987284U JP S6165742 U JPS6165742 U JP S6165742U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- holder
- vapor deposition
- chemical vapor
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 9
- 239000004065 semiconductor Substances 0.000 claims 5
- 238000005229 chemical vapour deposition Methods 0.000 claims 4
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14987284U JPS6165742U (no) | 1984-10-03 | 1984-10-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14987284U JPS6165742U (no) | 1984-10-03 | 1984-10-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6165742U true JPS6165742U (no) | 1986-05-06 |
Family
ID=30708039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14987284U Pending JPS6165742U (no) | 1984-10-03 | 1984-10-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6165742U (no) |
-
1984
- 1984-10-03 JP JP14987284U patent/JPS6165742U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5690742A (en) | Susceptor for an epitaxial growth apparatus | |
| JPS6165742U (no) | ||
| JPS6318618A (ja) | サセプタ−用カバ− | |
| JPS6170935U (no) | ||
| JPS62182541U (no) | ||
| JPH0460552U (no) | ||
| JPS6265831U (no) | ||
| JPH0521866Y2 (no) | ||
| JPH0691017B2 (ja) | 連続式気相成長装置 | |
| JPH0246868U (no) | ||
| JPS63140619U (no) | ||
| JPH0982695A (ja) | 半導体製造装置および半導体装置の製造方法 | |
| JPS6344463Y2 (no) | ||
| JPH01133731U (no) | ||
| JPH0249710Y2 (no) | ||
| JP2872904B2 (ja) | ガスソース分子線エピタキシー装置 | |
| JPS62148574U (no) | ||
| JPH02146165U (no) | ||
| JPS6336048U (no) | ||
| JPS62190335U (no) | ||
| JPH0418428U (no) | ||
| JPS6262432U (no) | ||
| JPS63102236U (no) | ||
| JPS63186775U (no) | ||
| JPS5812941U (ja) | 気相成長装置用サセプタ |