JPS6150157B2 - - Google Patents
Info
- Publication number
- JPS6150157B2 JPS6150157B2 JP19608881A JP19608881A JPS6150157B2 JP S6150157 B2 JPS6150157 B2 JP S6150157B2 JP 19608881 A JP19608881 A JP 19608881A JP 19608881 A JP19608881 A JP 19608881A JP S6150157 B2 JPS6150157 B2 JP S6150157B2
- Authority
- JP
- Japan
- Prior art keywords
- cavity
- plating
- plating film
- mold
- electroforming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 47
- 239000002131 composite material Substances 0.000 claims description 14
- 239000011159 matrix material Substances 0.000 claims description 10
- 238000005323 electroforming Methods 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 2
- 229910052755 nonmetal Inorganic materials 0.000 claims 1
- 238000003672 processing method Methods 0.000 claims 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 26
- 229910052759 nickel Inorganic materials 0.000 description 13
- 239000004809 Teflon Substances 0.000 description 11
- 229920006362 Teflon® Polymers 0.000 description 11
- 239000002245 particle Substances 0.000 description 11
- 238000000071 blow moulding Methods 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910001295 No alloy Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Moulds For Moulding Plastics Or The Like (AREA)
Description
【発明の詳細な説明】
本発明はキヤビテイ内表面に複合メツキによる
メツキ皮膜を形成した電鋳加工による成形型の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a mold by electroforming in which a plating film is formed by composite plating on the inner surface of a cavity.
近時、物品の表面に電気メツキ或いは化学メツ
キによつて金属マトリツクス中に一つ、あるいは
多くの非金属相(あるいは他の金属相)を共析さ
せるようにした複合メツキ(分散メツキと呼ぶ事
もある)を施して、その物品の用途に応じた性質
を付与することが行われている。例えば、物品の
表面にニツケルとテフロンとの複合メツキを施す
ことにより、耐摩耗性、潤滑性及び離型性等を向
上させることができる。しかしながら、上記した
複合メツキをプラスチツク成形型のキヤビテイの
内表面に適用しようとする場合、メツキは凹んだ
部分に付着し難い性質を有するために形状が複雑
な成形型の場合に凹部の内表面に均等な皮膜厚さ
のメツキ層を形成することが非常に困難であつ
た。 Recently, composite plating (referred to as dispersion plating) in which one or more nonmetallic phases (or other metal phases) is eutectoided into a metal matrix on the surface of an article by electroplating or chemical plating has been developed. ) to impart properties appropriate to the intended use of the article. For example, by applying composite plating of nickel and Teflon to the surface of an article, wear resistance, lubricity, mold releasability, etc. can be improved. However, when trying to apply the above-mentioned composite plating to the inner surface of the cavity of a plastic mold, the plating has a property that it is difficult to adhere to the recessed part. It was very difficult to form a plating layer of uniform thickness.
また、成形型のキヤビテイの内表面に皮革模様
或いはしぼ模様のような細かな凹凸模様を有する
ものでは、キヤビテイの形成後に複合メツキを施
したのでは、細かな凹凸模様がメツキ皮膜によつ
て埋まつてしまい、成形品の表面に必要な模様を
付けることが困難である。 In addition, if the inner surface of the mold cavity has a fine uneven pattern such as a leather pattern or a grain pattern, if composite plating is applied after the cavity is formed, the fine uneven pattern will be buried by the plating film. This makes it difficult to add the necessary pattern to the surface of the molded product.
本発明は上記した事情に鑑みてなされたもので
あり、その目的は、キヤビテイの内表面に均等な
皮膜厚さの複合メツキによるメツキ層を極めて簡
単な操作で形成でき、しかも、メツキ皮膜の内表
面に細かな凹凸模様を正確に且つ容易に付設でき
るようにした電鋳加工による成形型の製造方法を
提供するにある。 The present invention has been made in view of the above-mentioned circumstances, and its purpose is to form a plating layer by composite plating with an even film thickness on the inner surface of the cavity with an extremely simple operation, and to also form a plating layer on the inner surface of the cavity using composite plating. To provide a method for manufacturing a mold by electroforming, which allows a fine uneven pattern to be accurately and easily added to the surface.
以下本発明を例えばプラスチツクのブロー成形
に使用する成形型に適用した一実施例について図
面を参照しながら説明する。即ち、ブロー成形の
ための成形型は通常パーテイングラインで上下二
分割された一対の上型及び下型から成るもので、
以下、一方の型について説明する。第1図は成形
品の外形形状と合致したた形状を有する原型1を
示すもので、第2図は原型1を適宜の枠内に入れ
て石膏或いは樹脂を流し込んで形成したレプリカ
2を示すもので、これは原型1と逆の凹凸形状の
凹部2aを有している。そして、第3図はレプリ
カ2の凹部2aにエポキシ樹脂を注入するか或い
はエポキシ樹脂を複数層に塗布することによつて
形成された電鋳用の母型3を示すもので、このよ
うにして製作された母型3の表面に、まず、例え
ば銀鏡メツキによる導電層4が形成される。この
場合、導電層4は樹脂メツキを行う場合に一般的
に行われている化学銅メツキ等により形成しても
よい。そして、導電層4を形成した母型3の表面
に例えば電気メツキ法によりニツケルとテフロン
との複合メツキによるメツキ皮膜5が所定の皮膜
厚さに形成される。複合メツキは公知の技術で、
メツキ浴中にテフロン粒子が正電荷をもつて分散
できるように分散助剤とともに収納して機械的な
撹拌により懸濁状態にしておき、金属マトリツク
スとしてニツケルを使用するもので、メツキ皮膜
5はテフロン粒子6をニツケル層7が包み込むよ
うにして形成される(第6図参照)。次に、母型
3表面のメツキ皮膜5上に電鋳加工法によつて所
定厚さの電鋳金属層例えばニツケルを析出させて
キヤビテイ8が形成される(第4図及び第6図参
照)。そして、電鋳加工を終了したキヤビテイ8
から母型3が離形される。この場合、キヤビテイ
8及びメツキ皮膜5並びに導電層4の相互間の結
合は合金的な結合で結合力が大であるのに対して
母型3と導電層4との間は母型3がエポキシ樹脂
であるために合金的な結合がなされず、従つて、
キヤビテイ8から母型3を離形させる時に母型3
から導電層4が容易に剥離し、キヤビテイ8の凹
凸8aの表面にはメツキ皮膜5と導電層4とが合
金的な結合力で結合されて残存する。この後に、
キヤビテイ3を例えば希硝酸液中に入れて導電層
4をまず溶解し、次にメツキ皮膜5のニツケル層
7の表面部の金属相たるニツケル層を所定厚さ溶
解し、希硝酸液中から取出してキヤビテイ8の製
作を終了する(第5図及び第8図参照)。而し
て、複合メツキによつて形成されたメツキ皮膜5
はテフロン粒子6をニツケル層7が包み込むよう
になつているが、導電層4の溶解後にメツキ皮膜
5のニツケル層7が所定厚さ溶解されるためにキ
ヤビテイ8の凹部8aの表面たるメツキ皮膜5の
表面には非金属相たるテフロン粒子6が直接多数
露出した状態を呈する(第7図参照)。 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to, for example, a mold used for blow molding plastic will be described with reference to the drawings. That is, a mold for blow molding usually consists of a pair of upper and lower molds that are divided into upper and lower halves at the parting line.
One type will be explained below. Figure 1 shows a prototype 1 having a shape that matches the external shape of the molded product, and Figure 2 shows a replica 2 formed by placing the prototype 1 in an appropriate frame and pouring plaster or resin into it. This has a concave portion 2a having a concave and convex shape opposite to that of the original mold 1. FIG. 3 shows a master mold 3 for electroforming formed by injecting epoxy resin into the recess 2a of the replica 2 or by applying multiple layers of epoxy resin. First, a conductive layer 4 is formed on the surface of the manufactured mother mold 3 by, for example, silver mirror plating. In this case, the conductive layer 4 may be formed by chemical copper plating, which is commonly used when resin plating is performed. Then, on the surface of the matrix 3 on which the conductive layer 4 has been formed, a plating film 5 made of a composite plating of nickel and Teflon is formed to a predetermined film thickness by, for example, an electroplating method. Composite plating is a well-known technology.
In order for Teflon particles to be positively charged and dispersed in the plating bath, they are stored together with a dispersion aid and made into a suspended state by mechanical stirring, and nickel is used as the metal matrix, and the plating film 5 is made of Teflon. The nickel layer 7 is formed so as to surround the particles 6 (see FIG. 6). Next, a cavity 8 is formed by depositing an electroformed metal layer of a predetermined thickness, such as nickel, on the plating film 5 on the surface of the mother mold 3 by an electroforming process (see FIGS. 4 and 6). . Cavity 8, which has been electroformed
The matrix 3 is released from the mold. In this case, the bond between the cavity 8, the plating film 5, and the conductive layer 4 is an alloy bond with a strong bonding force, whereas the bond between the matrix 3 and the conductive layer 4 is that the matrix 3 is made of epoxy. Since it is a resin, there is no alloy bonding, and therefore,
When releasing the mother mold 3 from the cavity 8, the mother mold 3
The conductive layer 4 is easily peeled off, and the plating film 5 and the conductive layer 4 remain on the surface of the unevenness 8a of the cavity 8, bonded by an alloy bonding force. After this,
For example, the cavity 3 is placed in a dilute nitric acid solution and the conductive layer 4 is dissolved first, then the nickel layer which is the metal phase on the surface of the nickel layer 7 of the plating film 5 is dissolved to a predetermined thickness, and then taken out from the dilute nitric acid solution. The manufacturing of the cavity 8 is then completed (see FIGS. 5 and 8). Thus, the plating film 5 formed by composite plating
In this case, the Teflon particles 6 are surrounded by the nickel layer 7, but since the nickel layer 7 of the plating film 5 is melted to a predetermined thickness after the conductive layer 4 is melted, the plating film 5 on the surface of the recess 8a of the cavity 8 is A large number of Teflon particles 6, which are non-metallic phases, are directly exposed on the surface (see FIG. 7).
以上のようにして製作されたキヤビテイ8は次
のような効果を奏する。即ち、キヤビテイ8の形
状が複雑である場合でも、母型3は凹部8aと逆
の形状で表面が外方に露出した形状でメツキが付
着し易く、従つて特別な処理を行わなくてもメツ
キ皮膜5を均等な皮膜厚さに形成することができ
る。また、キヤビテイ8側に合金的な結合力で残
存したメツキ皮膜5の内表面は、母型3が表面に
細かな凹凸形状を有するものでも、正確に逆の凹
凸形状を形成でき、従来の如くキヤビテイ8の形
成後その表面にメツキ皮膜を付設する場合のよう
に表面の細かな凹凸形状が埋まつてしまうような
不具合も生じない。そして、メツキ皮膜5の表面
のニツケル層7を一部溶解してテフロン粒子6を
キヤビテイ8の凹部8aの表面に直接露出させる
ようにしたから、凹部8aの表面部の耐摩耗性、
潤滑性及び離型性等がテフロン粒子6の性質によ
り著しく高められる。このために、ブロー成形型
に適用した場合にパリソンが成形途中に凹部8a
の表面に密着することが極力防止されるようにな
り、肉厚の均等なブロー成形品を得ることができ
る。また、ブロー成形以外にバキユーム成形の場
合にも同様の効果が得られ、インジエクシヨンそ
の他の成形法の成形型に適用した場合でも成形品
の離型を極めて容易になし得るという優れた効果
を奏する。 The cavity 8 manufactured as described above has the following effects. That is, even if the shape of the cavity 8 is complicated, the matrix 3 has a shape that is opposite to the recess 8a and the surface is exposed to the outside, so that plating can easily adhere to it, and therefore, plating can be easily applied without any special treatment. The film 5 can be formed to have a uniform film thickness. Furthermore, the inner surface of the plating film 5 remaining on the cavity 8 side due to the bonding force of the alloy can form an accurately opposite uneven shape even if the mother die 3 has a fine uneven shape on the surface, and it can be Unlike the case where a plating film is attached to the surface of the cavity 8 after it is formed, there is no problem that the fine irregularities on the surface are buried. Since the nickel layer 7 on the surface of the plating film 5 is partially dissolved to expose the Teflon particles 6 directly on the surface of the recess 8a of the cavity 8, the wear resistance of the surface of the recess 8a is improved.
The properties of the Teflon particles 6 significantly improve lubricity, mold releasability, etc. For this reason, when applied to a blow molding mold, the parison has a concave portion 8a during molding.
It is possible to prevent the material from adhering to the surface as much as possible, and it is possible to obtain a blow-molded product with uniform wall thickness. In addition to blow molding, the same effect can be obtained in the case of vacuum molding, and even when applied to molds for injection molding and other molding methods, it has the excellent effect of making it possible to release the molded product extremely easily.
尚、上記実施例においては複合メツキによるメ
ツキ皮膜5をニツケルとテフロン粒子によるもの
を例として説明したが、ニツケル以外に銅、亜鉛
等も用いられており、また、テフロン粒子の代り
にフエロカーボン、酸化インジユーム、セラミツ
ク、その他種々の酸化物及び樹脂等の粒子を用い
ることができ、各粒子特有の性質を電鋳加工によ
る成形型に付与することが極めて容易にできる。 In the above embodiment, the composite plating film 5 was explained using nickel and Teflon particles as an example, but copper, zinc, etc. may also be used in addition to nickel, and ferrocarbon may be used instead of Teflon particles. Particles of , indium oxide, ceramic, and various other oxides and resins can be used, and properties unique to each particle can be extremely easily imparted to a mold by electroforming.
本発明は以上説明した実施例から明らかなよう
に、キヤビテイの内表面に均等な皮膜厚さの複合
メツキによるメツキ皮膜を極めて簡単な操作で形
成できるようにした電鋳加工による成形型の製造
方法を提供できる。 As is clear from the embodiments described above, the present invention is a method for manufacturing a mold by electroforming, which allows a composite plating film with an even thickness to be formed on the inner surface of a cavity with an extremely simple operation. can be provided.
図面は本発明の一実施例を示すものであり、第
1図は原型の側面図、第2図はレプリカの側面
図、第3図は母型の側面図、第4図及び第5図は
製作過程を示す断面図、第6図は第4図の部分
の拡大断面図、第7図は第5図の部分の拡大断
面図である。
図面中、1は原型、2はレプリカ、3は母型、
4は導電層、5はメツキ皮膜、6はテフロン粒
子、7はニツケル層、8はキヤビテイである。
The drawings show one embodiment of the present invention, and FIG. 1 is a side view of the original model, FIG. 2 is a side view of the replica, FIG. 3 is a side view of the matrix, and FIGS. 6 is an enlarged sectional view of the portion shown in FIG. 4, and FIG. 7 is an enlarged sectional view of the portion shown in FIG. 5. In the drawings, 1 is the original model, 2 is the replica, 3 is the matrix,
4 is a conductive layer, 5 is a plating film, 6 is a Teflon particle, 7 is a nickel layer, and 8 is a cavity.
Claims (1)
共折させる複合メツキによるメツキ皮膜を形成す
る工程と、この複合メツキによるメツキ皮膜の外
表面に電鋳加工法によつて所定厚さの電鋳金属層
を折出させてキヤビテイを製作する工程と、前記
メツキ皮膜をキヤビテイの内表面側に付着した状
態で該キヤビテイから前記母型を離形させ、前記
メツキ皮膜の内表面を外部に露出させる工程と前
記メツキ皮膜の内表面の前記金属相を所定厚さ溶
解させ前記非金属相を外部に露出させる工程とか
らなる電鋳加工による成形型の製造方法。1. A step of forming a plating film on the outer surface of the electroforming matrix by composite plating in which a metallic phase and a non-metallic phase are co-deposited, and a process of forming a plating film on the outer surface of the plating film by this composite plating by an electroforming processing method. A step of producing a cavity by depositing a thick electroformed metal layer, and releasing the mother mold from the cavity with the plating film attached to the inner surface of the cavity, and removing the plating film from the inner surface of the cavity. A method for producing a mold by electroforming, comprising the steps of exposing the metal phase on the inner surface of the plating film to the outside to a predetermined thickness and exposing the non-metal phase to the outside.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19608881A JPS5896889A (en) | 1981-12-04 | 1981-12-04 | Production of molding tool by electroforming |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19608881A JPS5896889A (en) | 1981-12-04 | 1981-12-04 | Production of molding tool by electroforming |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5896889A JPS5896889A (en) | 1983-06-09 |
JPS6150157B2 true JPS6150157B2 (en) | 1986-11-01 |
Family
ID=16352003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19608881A Granted JPS5896889A (en) | 1981-12-04 | 1981-12-04 | Production of molding tool by electroforming |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5896889A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02175893A (en) * | 1988-12-27 | 1990-07-09 | Konan Tokushu Sangyo Kk | Production of electroformed mold provided with fine rugged pattern |
US8303866B2 (en) * | 2007-04-23 | 2012-11-06 | Digitaloptics Corporation East | Mass production of micro-optical devices, corresponding tools, and resultant structures |
TW201219187A (en) * | 2010-11-09 | 2012-05-16 | jun-jie Zheng | uses a pretreatment work on a first mold to form a forming layer and obtains a metal plated film containing a conductive material through an electroforming process |
-
1981
- 1981-12-04 JP JP19608881A patent/JPS5896889A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5896889A (en) | 1983-06-09 |
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