JPS6148883A - Manufacture of rainbow hologram using photoresist - Google Patents
Manufacture of rainbow hologram using photoresistInfo
- Publication number
- JPS6148883A JPS6148883A JP17085884A JP17085884A JPS6148883A JP S6148883 A JPS6148883 A JP S6148883A JP 17085884 A JP17085884 A JP 17085884A JP 17085884 A JP17085884 A JP 17085884A JP S6148883 A JPS6148883 A JP S6148883A
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- hologram
- light
- developer
- rainbow hologram
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 9
- 230000002040 relaxant effect Effects 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 3
- 238000012545 processing Methods 0.000 claims description 2
- 238000011161 development Methods 0.000 abstract description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052786 argon Inorganic materials 0.000 abstract description 2
- 239000012895 dilution Substances 0.000 description 7
- 238000010790 dilution Methods 0.000 description 7
- 238000004049 embossing Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000003513 alkali Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/22—Processes or apparatus for obtaining an optical image from holograms
- G03H1/2249—Holobject properties
- G03H2001/2263—Multicoloured holobject
- G03H2001/2268—Rainbow hologram
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
Description
【発明の詳細な説明】
く本発明の産業上の位置すげ〉
本発明はフォトレジストを用いて高回折効率で低ノイズ
の表面レリーフ型のレインボウ伊ホログラムの製造方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION Industrial Position of the Present Invention The present invention relates to a method of manufacturing a surface relief type rainbow hologram with high diffraction efficiency and low noise using a photoresist.
〈従来技術〉
フォトレジストを用いたレインボウホログラムの作製光
学系を第1図に示す。レーザー光源(1)から出た光は
ハーフミラ−(2)で2つに分割され、一方はミラー(
3)、レンズ(4) (5)を通過後、スリット状のフ
レネルホログラム(6)に入射する。このフレネルホロ
グラム(6)はここには記してはいない別の光学系にお
いて得られたものであり、このフレネルホログラム(6
)から実家(力がホトレジストを塗布した乾板02上に
再生される。ハーフミラ−(2)で分割されたもう一方
の光は、アッテネータ−(8)を通過後、ミラー(9)
で反射し、レンズ0o)0υによって遠点03)に結ぶ
光となる。この2つの光がホトレジストを塗布した乾板
(12+上にて干渉を生じ、この干渉縞を記録すること
により、レインボウホログラムが得られる。<Prior Art> FIG. 1 shows an optical system for producing a rainbow hologram using photoresist. The light emitted from the laser light source (1) is split into two by a half mirror (2), one of which is split by a mirror (2).
3) After passing through lenses (4) and (5), the light enters a slit-shaped Fresnel hologram (6). This Fresnel hologram (6) was obtained using another optical system not shown here.
) from my parents' house (power is reproduced on the dry plate 02 coated with photoresist.The other light split by the half mirror (2) passes through the attenuator (8) and then the mirror (9)
The light is reflected by the lens 0o)0υ and connected to the far point 03). These two lights cause interference on a dry plate (12+) coated with photoresist, and by recording this interference fringe, a rainbow hologram is obtained.
フォトレジストは本来、濃淡−の明確なパターンを鋭い
エツジを持った凹凸のパターンに置きかえるように作ら
れていて、現像液もそれにあわせてアルカリの度合が決
められである。例えば、シュプレイ社のAZ−1350
のポジタイプのフォトレジストにはマイクロポジット現
像液というようになっている。Photoresists are originally made to replace a clear pattern of shading with an uneven pattern with sharp edges, and the degree of alkalinity of the developer is determined accordingly. For example, Spree's AZ-1350
Microposite developer is used for positive type photoresists.
〈従来技術の問題点〉
しかしながら、干渉縞をこのような処理によって記録す
ると、本来、なだらかな形の縞が鋭いエツジを持った縞
となる。これは非線形記録であ杢ため、ノイズが大変に
多いものとなる。<Problems with the Prior Art> However, when interference fringes are recorded by such processing, the originally gentle fringes become fringes with sharp edges. Since this is non-linear recording, there is a lot of noise.
そこで、現1象液のアルカリの度合を高めることにより
、このエツジを削り落すことにより線形記録にしてノイ
ズを低減する方法が提案され、検討された。例えば、シ
ュプレイ社のAZ1!+50のフォトレジストに対して
は、同社のAZ−305Aの高アルカリ現像液を1:4
に希釈して用いる方法である。1:4に希釈した時のア
ルカリ度はマイクロポジット現像液のアルカリ性よりも
高い。Therefore, a method has been proposed and studied in which the noise is reduced by increasing the alkali level of the phenolic liquid to scrape off these edges, thereby creating a linear recording. For example, Spree's AZ1! For +50 photoresist, use the same company's AZ-305A high alkaline developer at 1:4.
This method is used after diluting it. The alkalinity when diluted 1:4 is higher than that of Microposit developer.
この方法によって線形性が改善されることは分かったが
、これは単純な2光束干渉によって得られるグレーティ
ングの場合であり、また現像時間もアルカリ度が高いた
め、20 secと短かく、作業性の悪いものであり、
現在まで、拡散物体のフレネルホログラムからのレイン
ボウホログラム作製という条件のもとでの高回折効率で
、しかも低ノイズが得られる条件は得られていない。Although it was found that linearity was improved by this method, this was the case for gratings obtained by simple two-beam interference, and the development time was as short as 20 sec due to the high alkalinity, making it difficult to work. It is bad;
Up to now, conditions have not been obtained under the conditions of producing a rainbow hologram from a Fresnel hologram of a diffused object with high diffraction efficiency and low noise.
く本発明による改良点〉
本発明は、このような問題点に着目しなされたもので、
AZ−303A現像液の希釈度を1:5とし、現像時間
を40 secとし、参照光と信号光の強度比を1:6
から1:12とすることにより上記した不明の点、およ
び問題点を解明および解決することを目的としている。Improvements made by the present invention The present invention has been made by focusing on these problems,
The dilution of the AZ-303A developer was 1:5, the development time was 40 sec, and the intensity ratio of the reference light and signal light was 1:6.
The aim is to clarify and solve the above-mentioned unclear points and problems by setting the ratio from 1:12 to 1:12.
尚、この時希釈液のPHは、マイクロポジット現像液よ
りもわずかに高いものである。At this time, the pH of the diluted solution is slightly higher than that of the microposit developer.
く実験に基づく詳細な説明〉
以下、この発明を図面に基づいて詳細に説明する。第2
図(a)には、拡散物体のフレネルボログラムの作製方
法、およびfb)には、レインボウホログラムの作製方
法、(clには明るさ、ノイズの測定方法が示しである
。Detailed Description Based on Experiments> The present invention will be described in detail below based on the drawings. Second
Figure (a) shows a method for producing a Fresnel bologram of a diffuse object, fb) shows a method for producing a rainbow hologram, and (cl) shows a method for measuring brightness and noise.
フレネルホログラムは、写真乾板(20)、アグファゲ
バルト社の8E56HD上にアルゴンレーサーカらの波
長488 nmの光を用いて、拡散物体Cυからの物体
光(22と参照光1231の干渉縞を記録することによ
り作製される。The Fresnel hologram records the interference fringes of the object beam (22) from the diffused object Cυ and the reference beam 1231 on a photographic plate (20), 8E56HD manufactured by Agfagewald, using light with a wavelength of 488 nm from an argon laser beam. It is made by
レインボウホログラムは、このように作製されたフレネ
ルホログラム(2αにアパーチャー(24)をかけて共
役の光を入射させて再生される拡散物体の実像(251
と参照光(26)との干渉縞をホトレジストを塗布した
乾板C?力に記録することにより作製される。A rainbow hologram is a real image (251
The interference fringes between the reference beam (26) and the photoresist coated dry plate C? Produced by recording force.
このようにして作製されたレインボウホログラムに細い
ビームを入射させると、アパーチャーのあったところに
アパーチャーの像が再生される。When a narrow beam is made incident on the rainbow hologram created in this way, an image of the aperture is reproduced where the aperture was.
測定は、このアパーチャーの像に対して行なわれ、明る
さはアパーチャーの開いていたとこの光強度(S)、ノ
イズはアパーチャーの閉じたところの光強度■、コント
ラストは、拡散物体のなかったところ03)からの光強
度と拡散物体の像(8)からの光強度との比で測定する
。The measurement was performed on the image of this aperture.The brightness is the light intensity (S) when the aperture is open, the noise is the light intensity (S) when the aperture is closed, and the contrast is 03 when there is no diffuse object. ) and the light intensity from the diffused object image (8).
この結果を第3図に示す。(a)は、シブレイ社のA’
Z−303A現像液の希釈度が1:4、(bl、(cl
、(dlは、1:5の場合であって、現像時間を25.
40.60 secと変えた場合である。The results are shown in FIG. (a) is Sibley's A'
The dilution of Z-303A developer is 1:4, (bl, (cl)
, (dl is 1:5 and the development time is 25.
This is the case where the time is changed to 40.60 sec.
S/N(信号とノイズの強度比)は10以上あることが
望まれる。これらのグラフより、AZ−603への希釈
率1:5、現像時間40 secで信号光と参照光の強
度比が1=10の時が10分な明るさで、ノイズが少な
(、また十分な画質を得る露光域も広いことが分る。ま
た、ここには図示しないが、信号光と参照光の強度比は
1:6から1=12の範囲で良好な結果を得た。It is desired that the S/N (signal to noise intensity ratio) is 10 or more. From these graphs, it can be seen that when the dilution ratio to AZ-603 is 1:5, the development time is 40 seconds, and the intensity ratio of the signal light and reference light is 1 = 10, the brightness is 10 minutes, with little noise (and sufficient It can be seen that the exposure range for obtaining good image quality is wide.Furthermore, although not shown here, good results were obtained with the intensity ratio of the signal light and reference light in the range of 1:6 to 1=12.
く本発明の効果〉
以上、説明したように、本発明によれば、ボジタイプの
フォトレジスト(例えばホトレジストAZ 1350
)を用いて、明るく、ノイズの少ないレインボウホログ
ラムが作製できることが分かった。これから電鋳罠より
、Niのエンボスマスターカ作製さね1、このエンボス
マスターヲ用いて熱可塑性プラスチックにエンボスする
ことにより多量で安価にホログラムが作製されることを
考えると、本発明は、ディスプレーの分野において産業
上有効なものである。Effects of the Present Invention> As explained above, according to the present invention, a positive type photoresist (for example, Photoresist AZ 1350
), it was found that a bright and low-noise rainbow hologram could be created. Considering that holograms can be produced in large quantities and at low cost by embossing thermoplastic plastics using this embossing master, the present invention has been developed to produce a Ni embossing master using an electroforming trap. It is industrially effective in the field.
図面は本発明の実施例を示すもので、第1図はレインボ
ウホログラムを作製する光学系を示し、第2図は同様の
位置関係を示す説明図であって、(a)はフレネルホロ
グラムを撮影の、(b)はレインボウホログラムの、(
C)は明るさ、ノイズの測定の際の位置関係を示す説明
図であり、第3図は露光時間の変化に於ける明るさ、S
/N比、コントラストを示すグラフ図で、(alはAZ
−1c13A現像液の希釈率1:4、現像時間20 s
ec、(blは同希釈率1:5、現像時間25 sec
、(c)は同希釈率1:5、現像時間40 sec、(
d)は同希釈率1:5、現は時間60 secの場合を
それぞれ示す。The drawings show an embodiment of the present invention, and FIG. 1 shows an optical system for producing a rainbow hologram, and FIG. 2 is an explanatory diagram showing a similar positional relationship, in which (a) shows a photograph of a Fresnel hologram. , (b) is the rainbow hologram's (
C) is an explanatory diagram showing the positional relationship when measuring brightness and noise, and Figure 3 shows the brightness and S as the exposure time changes.
/N ratio and contrast, (al is AZ
-1c13A developer dilution ratio 1:4, development time 20 s
ec, (bl is the same dilution ratio 1:5, development time 25 sec
, (c) is the same dilution ratio 1:5, development time 40 sec, (
d) shows the case where the same dilution ratio is 1:5 and the current time is 60 sec.
Claims (1)
グラムに用いるレリーフ型レインボウホログラムを製造
する工程において、露光後の現像液に高アルカリ性現像
液を使用することにより、フォトレジストの持つ狭い入
出力特性を緩和し、高回折効率で低ノイズにすることが
できることを特徴とするフォトレジストを用いたレイン
ボウホログラムの製造方法。 2)特許請求の範囲第1)項に記した現像液での処理時
間を、35secから45secとすることにより同様
の効果を得ることを特徴とするフォトレジストを用いた
レインボウホログラムの製造方法。 3)特許請求の範囲第1)項に記した露光時に、参照光
と信号光の強度比を1:6から1:12の範囲とするこ
とにより同様の効果を得ることを特徴とするフォトレジ
ストを用いたレインボウホログララムの製造方法。[Claims] 1) In the process of manufacturing a relief-type rainbow hologram used in an embossed hologram using a positive type photoresist, by using a highly alkaline developer as a developer after exposure, the narrow A method for manufacturing a rainbow hologram using a photoresist, which is characterized by relaxing input/output characteristics and achieving high diffraction efficiency and low noise. 2) A method for manufacturing a rainbow hologram using a photoresist, characterized in that the same effect is obtained by changing the processing time with the developer described in claim 1) from 35 seconds to 45 seconds. 3) A photoresist characterized in that a similar effect is obtained by setting the intensity ratio of the reference light and signal light in the range of 1:6 to 1:12 during exposure as described in claim 1). A method for manufacturing a rainbow hologram using.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17085884A JPS6148883A (en) | 1984-08-16 | 1984-08-16 | Manufacture of rainbow hologram using photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17085884A JPS6148883A (en) | 1984-08-16 | 1984-08-16 | Manufacture of rainbow hologram using photoresist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6148883A true JPS6148883A (en) | 1986-03-10 |
Family
ID=15912619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17085884A Pending JPS6148883A (en) | 1984-08-16 | 1984-08-16 | Manufacture of rainbow hologram using photoresist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6148883A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002046820A1 (en) * | 2000-12-07 | 2002-06-13 | Sony Corporation | Image projector, projected image pattern, laser driver, imaging device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430858A (en) * | 1977-08-11 | 1979-03-07 | Mitsubishi Electric Corp | Hologram recorder-reproducer |
JPS5837680A (en) * | 1981-08-28 | 1983-03-04 | Ricoh Co Ltd | Redeveloping method for hologram |
JPS5844720A (en) * | 1981-07-15 | 1983-03-15 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | Method of forming open pattern |
-
1984
- 1984-08-16 JP JP17085884A patent/JPS6148883A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5430858A (en) * | 1977-08-11 | 1979-03-07 | Mitsubishi Electric Corp | Hologram recorder-reproducer |
JPS5844720A (en) * | 1981-07-15 | 1983-03-15 | インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン | Method of forming open pattern |
JPS5837680A (en) * | 1981-08-28 | 1983-03-04 | Ricoh Co Ltd | Redeveloping method for hologram |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002046820A1 (en) * | 2000-12-07 | 2002-06-13 | Sony Corporation | Image projector, projected image pattern, laser driver, imaging device |
US6892027B2 (en) | 2000-12-07 | 2005-05-10 | Sony Corporation | Image projector, projected image pattern, laser driver, imaging device |
US6970647B2 (en) | 2000-12-07 | 2005-11-29 | Sony Corporation | Image projection apparatus, projection image pattern, laser drive apparatus, camera apparatus |
US6973263B2 (en) | 2000-12-07 | 2005-12-06 | Sony Corporation | Image projection apparatus, projection image pattern, laser drive apparatus, camera apparatus |
US6990292B2 (en) | 2000-12-07 | 2006-01-24 | Sony Corporation | Image projection apparatus, projection image pattern, laser drive apparatus, camera apparatus |
US7228070B2 (en) | 2000-12-07 | 2007-06-05 | Sony Corporation | Image projection apparatus, projection image pattern, laser drive apparatus, camera apparatus |
US7248795B2 (en) | 2000-12-07 | 2007-07-24 | Sony Corporation | Image projection apparatus, projection image pattern, laser drive apparatus, camera apparatus |
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