JPS6148596A - Continuous electroplating apparatus - Google Patents
Continuous electroplating apparatusInfo
- Publication number
- JPS6148596A JPS6148596A JP16979984A JP16979984A JPS6148596A JP S6148596 A JPS6148596 A JP S6148596A JP 16979984 A JP16979984 A JP 16979984A JP 16979984 A JP16979984 A JP 16979984A JP S6148596 A JPS6148596 A JP S6148596A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- anodes
- guides
- steel strip
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、連続して移動する銅帯へ電気メッキを行う連
続式電気メッキ装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a continuous electroplating apparatus for electroplating a continuously moving copper strip.
[従来の技術]
銅帯を高速で連続的に電気メッキする装置として、従来
より第5図及び第6図に示す如き方式のものが知られて
いる。即ち、鋼帯1の板幅よりも幅広の上下の不溶性陽
極2.2と絶縁物質性の側板3,3どからメッキ槽4を
描成し、入口5より鋼帯1を送給すると共に、出口6に
設けたメッキ液吹出ノズル7.7よりメッキ液を鋼帯1
に対し向流にして送り、循環させるようにしたものであ
る。[Prior Art] As an apparatus for continuously electroplating a copper strip at high speed, a system as shown in FIGS. 5 and 6 has been known. That is, a plating bath 4 is formed from the upper and lower insoluble anodes 2.2, which are wider than the width of the steel strip 1, and the side plates 3, 3 made of an insulating material, and the steel strip 1 is fed through the inlet 5. The plating solution is applied to the steel strip 1 from the plating solution blowout nozzle 7.7 provided at the outlet 6.
It is designed to be sent in a countercurrent to the flow and circulated.
斯かる従来の連続式電気メッキ装置においては、鋼帯1
の入口5及び出口6を除くと完全に密閉された構造で、
メッキ液の流路が断面矩形状の管状になっているので、
高速流でメッキ液を吹出しても、幅方向に均一な流れが
得られるし、流れ方向も一定であるのが特徴である。し
かしながら斯かる従来装置では、不溶性陽極2を使用し
ているため、陽極反応が酸素発生反応であり、多量の酸
素ガスが発生する。酸素ガスはメッキ液を循環させるこ
とによりメッキ槽4内に滞留するので、銅帯1面や陽極
2面が酸素ガス層におおわれ、通電不能になったり、部
分的に不メッキ或いは不良メッキになったりする問題が
あった。発生した酸素ガスを除去するためには、メッキ
液の流速を大きくするか、鋼帯1と陽極2どの間の距離
を大きくする必要があるが、前者の場合には、メッキ液
流量増大に伴い設備が増大し、一方後者の場合には、電
力費増加の原因となってしまう。In such conventional continuous electroplating equipment, the steel strip 1
It has a completely sealed structure except for the inlet 5 and outlet 6,
Since the plating solution flow path is tubular with a rectangular cross section,
Even when the plating solution is blown out at high speed, a uniform flow can be obtained in the width direction, and the flow direction is also constant. However, in such a conventional device, since the insoluble anode 2 is used, the anode reaction is an oxygen generation reaction, and a large amount of oxygen gas is generated. Oxygen gas stays in the plating tank 4 by circulating the plating solution, so one side of the copper strip and two sides of the anode are covered with an oxygen gas layer, which may make it impossible to conduct electricity or result in partially unplated or defective plating. There were some problems. In order to remove the generated oxygen gas, it is necessary to increase the flow rate of the plating solution or to increase the distance between the steel strip 1 and the anode 2. In the former case, as the flow rate of the plating solution increases, The number of facilities increases, and in the latter case, this causes an increase in electricity costs.
[発明が解決しようとする問題点]
本発明は、不溶性電極により発生する酸素ガスを速かに
除去して不メッキや不良メッキを防止し、高電流密度の
メッキを可能にしようとするものである。[Problems to be Solved by the Invention] The present invention aims to rapidly remove oxygen gas generated by an insoluble electrode to prevent non-plating or defective plating, and to enable high current density plating. be.
[問題点を解決するための手段]
本発明の連続式電気メッキ装髄は、平行配置した陽極間
の側壁部を開放型としたメッキ槽内に、鋼帯の板幅に対
応して移動し1qるにしたフローガイドを配設すると共
に、該フローガイ1〜の上下面と陽極全長との間に、槽
内外を貫通ずる隙間を形成した構成を有する。[Means for Solving the Problems] The continuous electroplating method of the present invention moves steel strips corresponding to the width of the steel strip into a plating bath with open side walls between anodes arranged in parallel. It has a configuration in which a flow guide with a length of 1q is provided, and a gap is formed between the upper and lower surfaces of the flow guy 1 to the entire length of the anode, passing through the inside and outside of the tank.
[作 用コ
従って、フローガイドの上下面と陽極との間1
よりメッキ液を溢流させることができ、このメ
ッキ液の溢流によって酸素ガスを排出することができる
。[Effect: Therefore, between the upper and lower surfaces of the flow guide and the anode 1
The plating solution can be allowed to overflow, and oxygen gas can be discharged by the overflow of the plating solution.
[実 施 例] 以下、図面を参照して本発明の詳細な説明する。[Example] Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図乃至第3図に示す如く、本発明では、前記第5図
及び第6図で示したメッキ槽4の側板3,3を取除いた
開放型のメッキ槽4′を使用する。メッキ槽4′内には
、槽外部側方からロッド8を介して鋼帯1の板幅に応じ
移動せしめられ、口つ空気供給管9からの圧縮空気の供
給、排出にJ:って両端部が膨縮可能なフローガイド1
0゜10を配設すると共に、該フローガイド10.10
には、陽極2.2の全長との間に所要の隙間11が形成
されるようその上下面を一連に段差凹設し、更に該各フ
ローガイド10の吹出ノズル7側端部にシール部10a
を設けて該シール部10aを、吹出ノズル7の開口部に
対し摺接させて吹出ノズル7の開口幅を調整し得るよう
構成し、一方各フローガイド10の入口5側端部にサポ
ート部材
入口5から適宜離間した位置に設置したサポート部材1
2.12に摺動可能に支持せしめる。As shown in FIGS. 1 to 3, the present invention uses an open type plating tank 4' from which the side plates 3, 3 of the plating tank 4 shown in FIGS. 5 and 6 have been removed. Inside the plating tank 4', compressed air is supplied and discharged from an air supply pipe 9, which is moved from the outside side of the tank via a rod 8 according to the width of the steel strip 1. Flow guide 1 that can expand and contract
0°10 and the flow guide 10.10
The upper and lower surfaces of the anodes 2.2 are provided with a series of step recesses so as to form a required gap 11 between them and the entire length of the anodes 2.2, and a seal portion 10a is provided at the end of each flow guide 10 on the side of the blow-off nozzle 7.
The seal portion 10a is configured to be able to adjust the opening width of the blow-off nozzle 7 by slidingly contacting the opening of the blow-off nozzle 7, while a support member inlet is provided at the end of the inlet 5 side of each flow guide 10. Support member 1 installed at a position appropriately spaced from 5
2.12 to be slidably supported.
前記フローガイド10の両端部、即ちシール部10a及
びサポート部10bは、ゴム或いは芯金へりのゴム、又
は芯金へすのビニール等の絶縁物質によって形成され、
空気供給管9がら空気を供給された際に膨張して、シー
ル部10aがノズル7.7に、サボー1一部iobがサ
ポート部材12゜12に圧接するような大きさとしであ
る。又、フローガイド10の中間部、即ち陽極2.2と
対応した部分は適当な絶縁物質によって形成されている
。Both ends of the flow guide 10, that is, the seal portion 10a and the support portion 10b, are formed of an insulating material such as rubber, rubber on the edge of the core metal, or vinyl on the edge of the core metal,
The size is such that when air is supplied from the air supply pipe 9, it expands and the seal portion 10a comes into pressure contact with the nozzle 7.7, and part of the sabot 1 iob comes into pressure contact with the support member 12°12. Further, the middle portion of the flow guide 10, ie, the portion corresponding to the anode 2.2, is formed of a suitable insulating material.
前記構成において、ロッド8の操作により、フローガイ
ドio、ioを第2図に示すように、鋼帯1の板幅位置
に対応させた状態で作業を行う。In the above configuration, by operating the rod 8, the work is performed with the flow guides io, io corresponding to the width position of the steel strip 1, as shown in FIG.
この際の位置調整は、シール部10a及びサポート部1
0bを収縮させて行い、位置決め後に膨張させて、シー
ル部10aをノズル7.7間に、又サボー1〜部10b
をサポート部材12.12に夫々圧接しておく。At this time, the position adjustment is performed for the seal part 10a and the support part 1.
0b is contracted, and after positioning, it is expanded to seal the seal portion 10a between the nozzles 7 and 7, and between the sabots 1 to 10b.
are pressed against the support members 12 and 12, respectively.
鋼帯1を第1図の入口5より出口6へ向り走行させてメ
ッキ槽4′内を通し、且つ出口6部の吹出ノズル7.7
より入口5へ向はメッキ液を供給すると、陽極反応によ
りメッキ槽4′内には酸素ガスが発生ずる。発生した酸
素ガスの一部は入口5よりメッキ液と共に排出され、一
方メッキM4′内に滞溜しようとしていた酸素ガスはフ
ローガイド10.10の上F面と陽極2,2との間に形
成された隙間11よりメッキ液と共に槽外へ排出される
。この際、前記隙間11を小さく選定しておくことによ
り、メッキ液の流速は入口5から排出されるものより大
きくなり、メッキ液を拡散させる作用を有効に発揮する
。The steel strip 1 is run from the inlet 5 to the outlet 6 in FIG.
When a plating solution is supplied toward the inlet 5, oxygen gas is generated in the plating tank 4' due to an anode reaction. A part of the generated oxygen gas is discharged from the inlet 5 along with the plating solution, while the oxygen gas that was about to stay in the plating M4' is formed between the upper F surface of the flow guide 10.10 and the anodes 2, 2. It is discharged from the tank together with the plating solution through the gap 11. At this time, by selecting the gap 11 to be small, the flow velocity of the plating solution becomes higher than that discharged from the inlet 5, and the effect of diffusing the plating solution is effectively exhibited.
前記メッキ作業において、鋼帯1の幅が広幅の時には、
吹出ノズル7の開口幅を全幅としてメッキ液を供給する
。一方、第4図に示すように、鋼帯1の幅が狭幅の時に
は、吹出ノズル7の開口幅をフローガイド10.10の
夫々のシール部10aにより狭めて不必要な部分を塞ぎ
、適正な開口幅にてメッキ液を供給するようにする。In the plating work, when the width of the steel strip 1 is wide,
The plating solution is supplied with the opening width of the blow-off nozzle 7 being the full width. On the other hand, when the width of the steel strip 1 is narrow, as shown in FIG. The plating solution should be supplied with a suitable opening width.
この際、フローカイト10.10のシール部10aを吹
出ノズル7の開口部に確実に接触させておくことにより
、メッキ液の飛散もない。At this time, by ensuring that the seal portion 10a of the flow kite 10.10 is in contact with the opening of the blow-off nozzle 7, there is no scattering of the plating solution.
前記シール部10aによる吹出ノス′ルアの開口幅調整
は、ロッド8の操作によりフローガイド10の全体的な
位置決めを行う際に、サポート部10b移動と共に同時
に行われるものである。The adjustment of the opening width of the blowout nozzle luer by the seal portion 10a is performed simultaneously with the movement of the support portion 10b when the entire flow guide 10 is positioned by operating the rod 8.
尚、ロッドの操作は、スクリュ一方式、シリンタ方式等
あらゆる駆動方式を採用し得る。The rod may be operated using any drive method such as a one-way screw method or a cylinder method.
[発明の効果]
以上説明したように、本発明の連続式電気メッキ装置に
よれば、平行配置した陽極間の側壁部を開放型としたメ
ッキ槽内に、鋼帯の板幅位置に応じて移動し得るように
したフローガイドを配設して、該フローガイドの上下面
と陽極全長との間に隙間を設けた構成であるので、該隙
間より酸素ガスを速かに除去し得て、不メッキ!
や不良メッキの発生を防止することができる・と
言う優れた効果を秦し得る。[Effects of the Invention] As explained above, according to the continuous electroplating apparatus of the present invention, in a plating tank with an open side wall between the anodes arranged in parallel, a steel strip is placed in a plating bath according to the width position of the steel strip. Since a movable flow guide is provided and a gap is provided between the upper and lower surfaces of the flow guide and the entire length of the anode, oxygen gas can be quickly removed from the gap. Not plated!
It has excellent effects such as being able to prevent the occurrence of plating and defective plating.
第1図は本発明の連続式電気メッキg四の概略切断側面
図、第2図は第1図の■−■矢視図、第3図は第1図の
■−■矢視図、第4図は第1図の■−■矢視図にして第
3図とは異なる状態を示す図、第5図は従来装置の概略
切断側面図、第6図は第5図のVl−Vl矢視図である
。
1は鋼帯、2は陽極、4′はメッキ槽、9は空気供給管
、10はフローガイド、11は隙間を示す。
特 許 出 願 人
石川島播磨重工業株式会社Fig. 1 is a schematic cutaway side view of continuous electroplating g4 of the present invention, Fig. 2 is a view taken along the ■-■ arrow in Fig. 1, and Fig. 3 is a view taken along the -■ arrow in Fig. 1. 4 is a view taken along the ■-■ arrow in FIG. 1 and shows a state different from that in FIG. 3, FIG. 5 is a schematic cutaway side view of the conventional device, and FIG. This is a perspective view. 1 is a steel strip, 2 is an anode, 4' is a plating tank, 9 is an air supply pipe, 10 is a flow guide, and 11 is a gap. Patent application Hitoshi Kawajima Harima Heavy Industries Co., Ltd.
Claims (1)
槽内に、鋼帯の板幅に対応して移動し得るようにしたフ
ローガイドを配設すると共に、該フローガイドの上下面
と陽極全長との間に、槽内外を貫通する隙間を形成した
ことを特徴とする連続式電気メッキ装置。1) A flow guide that can move according to the width of the steel strip is installed in a plating tank with open side walls between the anodes arranged in parallel, and the upper and lower surfaces of the flow guide A continuous electroplating device characterized by forming a gap between the entire length of the anode and penetrating the inside and outside of the tank.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16979984A JPS6148596A (en) | 1984-08-14 | 1984-08-14 | Continuous electroplating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16979984A JPS6148596A (en) | 1984-08-14 | 1984-08-14 | Continuous electroplating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6148596A true JPS6148596A (en) | 1986-03-10 |
Family
ID=15893104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16979984A Pending JPS6148596A (en) | 1984-08-14 | 1984-08-14 | Continuous electroplating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6148596A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0215199A (en) * | 1988-07-04 | 1990-01-18 | Fuji Photo Film Co Ltd | Electrolytic method |
JPH03126900A (en) * | 1989-10-13 | 1991-05-30 | Fuji Photo Film Co Ltd | Production of support for printing plate |
-
1984
- 1984-08-14 JP JP16979984A patent/JPS6148596A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0215199A (en) * | 1988-07-04 | 1990-01-18 | Fuji Photo Film Co Ltd | Electrolytic method |
JPH03126900A (en) * | 1989-10-13 | 1991-05-30 | Fuji Photo Film Co Ltd | Production of support for printing plate |
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