JPS6148044U - High frequency plasma powder processing equipment - Google Patents

High frequency plasma powder processing equipment

Info

Publication number
JPS6148044U
JPS6148044U JP13348984U JP13348984U JPS6148044U JP S6148044 U JPS6148044 U JP S6148044U JP 13348984 U JP13348984 U JP 13348984U JP 13348984 U JP13348984 U JP 13348984U JP S6148044 U JPS6148044 U JP S6148044U
Authority
JP
Japan
Prior art keywords
processing equipment
high frequency
powder processing
frequency plasma
plasma powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13348984U
Other languages
Japanese (ja)
Inventor
博之 中山
忠孝 片岡
Original Assignee
関西ペイント株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西ペイント株式会社 filed Critical 関西ペイント株式会社
Priority to JP13348984U priority Critical patent/JPS6148044U/en
Publication of JPS6148044U publication Critical patent/JPS6148044U/en
Pending legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の実施例を示し、第１図は本装置の説明的
側面図、第２図は粉体容器の側断面図、第３図は第２図
Ａ−Ａ線における断面図である。 １・・・・・・真空容器、２・・・・・・容器本体、３
・・・・・・蓋、４，５・・・・・・電極、６・・・・
・・高周波電源、７・・・・・・吸気一口、８・・・・
・・真空吸気ポンプ、９・・・・・・ガス導入口、１０
・・・・・・ガス源、１１・・・・・・回転軸、１２・
・・・・・弾性爪片、１３・・・・・・モーター、２０
・・・・・・粉体容器、２１・・・・・・円筒状周壁、
２２．２３・・・・・・側壁、２４・・・・・・突出管
状開口、２５・・・・・・突入竺状開口、２６・・・・
・・リブ。The drawings show an embodiment of the present invention, and FIG. 1 is an explanatory side view of the device, FIG. 2 is a side sectional view of the powder container, and FIG. 3 is a sectional view taken along line A-A in FIG. 2. . 1... Vacuum container, 2... Container body, 3
...Lid, 4,5...Electrode, 6...
...High frequency power supply, 7...Intake mouth, 8...
...Vacuum suction pump, 9...Gas inlet, 10
... Gas source, 11 ... Rotating shaft, 12.
...Elastic claw piece, 13 ...Motor, 20
...Powder container, 21 ... Cylindrical peripheral wall,
22.23...Side wall, 24...Protruding tubular opening, 25...Protruding vertical opening, 26...
··rib.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空容器と真空容器の周壁に配置された高周波放電電極
とを備えたプラズマ発生装置、及び真空容器内で水平軸
回りに回転するように設けられた両側開放型の粉体容器
を昂備することを特徴とする高周波プラズマ粉体処理装
置。A plasma generating device equipped with a vacuum container and a high-frequency discharge electrode arranged on the peripheral wall of the vacuum container, and a powder container with both sides open and provided so as to rotate around a horizontal axis within the vacuum container. High-frequency plasma powder processing equipment featuring:
JP13348984U 1984-09-04 1984-09-04 High frequency plasma powder processing equipment Pending JPS6148044U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13348984U JPS6148044U (en) 1984-09-04 1984-09-04 High frequency plasma powder processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13348984U JPS6148044U (en) 1984-09-04 1984-09-04 High frequency plasma powder processing equipment

Publications (1)

Publication Number Publication Date
JPS6148044U true JPS6148044U (en) 1986-03-31

Family

ID=30692031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13348984U Pending JPS6148044U (en) 1984-09-04 1984-09-04 High frequency plasma powder processing equipment

Country Status (1)

Country Link
JP (1) JPS6148044U (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0360732A (en) * 1989-07-29 1991-03-15 Nippon Steel Corp Method and device for producing fine powder and is utilization
JP2010029830A (en) * 2008-07-31 2010-02-12 Nakamura Sangyo Gakuen Plasma treatment device
JP2017012970A (en) * 2015-06-29 2017-01-19 株式会社電子技研 Plasma powder processing apparatus and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884107A (en) * 1982-09-24 1983-05-20 Shunpei Yamazaki Plasma nitriding method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5884107A (en) * 1982-09-24 1983-05-20 Shunpei Yamazaki Plasma nitriding method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0360732A (en) * 1989-07-29 1991-03-15 Nippon Steel Corp Method and device for producing fine powder and is utilization
JP2010029830A (en) * 2008-07-31 2010-02-12 Nakamura Sangyo Gakuen Plasma treatment device
JP2017012970A (en) * 2015-06-29 2017-01-19 株式会社電子技研 Plasma powder processing apparatus and method

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