JPS61433B2 - - Google Patents
Info
- Publication number
- JPS61433B2 JPS61433B2 JP18561881A JP18561881A JPS61433B2 JP S61433 B2 JPS61433 B2 JP S61433B2 JP 18561881 A JP18561881 A JP 18561881A JP 18561881 A JP18561881 A JP 18561881A JP S61433 B2 JPS61433 B2 JP S61433B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP81101073A EP0058214B1 (en) | 1981-02-16 | 1981-02-16 | Method for increasing the resistance of a solid material surface against etching |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57137474A JPS57137474A (en) | 1982-08-25 |
| JPS61433B2 true JPS61433B2 (US20100268047A1-20101021-C00003.png) | 1986-01-08 |
Family
ID=8187576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18561881A Granted JPS57137474A (en) | 1981-02-16 | 1981-11-20 | Method of increasing resistance of solid material surface against etching |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0058214B1 (US20100268047A1-20101021-C00003.png) |
| JP (1) | JPS57137474A (US20100268047A1-20101021-C00003.png) |
| DE (1) | DE3170974D1 (US20100268047A1-20101021-C00003.png) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1248402A (en) * | 1983-09-16 | 1989-01-10 | Larry E. Stillwagon | Method of making articles using gas functionalized plasma developed layer |
| US5215867A (en) * | 1983-09-16 | 1993-06-01 | At&T Bell Laboratories | Method with gas functionalized plasma developed layer |
| AT388884B (de) * | 1988-02-05 | 1989-09-11 | Miba Gleitlager Ag | Verfahren zum reinigen eines metallischen werkstueckes mit oberflaechenteilen aus verschiedenem werkstoff durch ionenbeschuss aus einer gasentladung |
| DE4019380C1 (US20100268047A1-20101021-C00003.png) * | 1990-06-18 | 1991-12-05 | Du Pont De Nemours (Deutschland) Gmbh, 6380 Bad Homburg, De | |
| US5607733A (en) * | 1990-07-12 | 1997-03-04 | Canon Kabushiki Kaisha | Process for preparing an X-ray mask structure |
| DE69132444T2 (de) * | 1990-07-12 | 2001-03-08 | Canon Kk | Röntgenstrahlmaskenstruktur, Verfahren zur Herstellung und zur Röntgenstrahlbelichtung |
| JP4237430B2 (ja) * | 2001-09-13 | 2009-03-11 | Ａｚエレクトロニックマテリアルズ株式会社 | エッチング方法及びエッチング保護層形成用組成物 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0007108B1 (en) * | 1978-07-18 | 1983-04-13 | Nippon Telegraph and Telephone Public Corporation | A method of manufacturing a diffraction grating structure |
-
1981
- 1981-02-16 DE DE8181101073T patent/DE3170974D1/de not_active Expired
- 1981-02-16 EP EP81101073A patent/EP0058214B1/en not_active Expired
- 1981-11-20 JP JP18561881A patent/JPS57137474A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0058214A1 (en) | 1982-08-25 |
| DE3170974D1 (en) | 1985-07-25 |
| JPS57137474A (en) | 1982-08-25 |
| EP0058214B1 (en) | 1985-06-19 |
