JPS6138577B2 - - Google Patents
Info
- Publication number
- JPS6138577B2 JPS6138577B2 JP15666479A JP15666479A JPS6138577B2 JP S6138577 B2 JPS6138577 B2 JP S6138577B2 JP 15666479 A JP15666479 A JP 15666479A JP 15666479 A JP15666479 A JP 15666479A JP S6138577 B2 JPS6138577 B2 JP S6138577B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- holes
- pairs
- upper plate
- diameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 26
- 239000004020 conductor Substances 0.000 claims description 20
- 239000000696 magnetic material Substances 0.000 claims description 3
- 229920001342 Bakelite® Polymers 0.000 description 2
- 239000004637 bakelite Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
Description
【発明の詳細な説明】
本発明は電子線装置に係り、特に電子線偏向コ
イルの構造の改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam device, and particularly to an improvement in the structure of an electron beam deflection coil.
電子ビーム露光装置或いは走査型電子顕微鏡等
の電子線装置は装置自身で発生する熱により装置
の温度が上昇するのを防止するため、かねてより
種々の工夫がなされている。それらの多くは発生
した熱を効率よく外部に取り去ろうとするもので
ある。 2. Description of the Related Art In order to prevent the temperature of an electron beam apparatus such as an electron beam exposure apparatus or a scanning electron microscope from rising due to heat generated by the apparatus itself, various measures have been taken for some time. Most of them attempt to efficiently remove the generated heat to the outside.
上記電子線装置の熱の発生源としては電子線偏
向コイルや電磁レンズ等があるが、これらのうち
真空室内に配置される電子線偏向コイルにおいて
発生する熱を効率よく取り除くことは必ずしも容
易ではない。 The sources of heat in the electron beam equipment mentioned above include electron beam deflection coils and electromagnetic lenses, but among these, it is not necessarily easy to efficiently remove the heat generated in the electron beam deflection coils placed inside the vacuum chamber. .
本発明の目的は発熱量を大巾に減少し得る電子
線偏向コイルの改良された構造を提供することに
ある。 SUMMARY OF THE INVENTION An object of the present invention is to provide an improved structure of an electron beam deflection coil that can greatly reduce the amount of heat generated.
本発明の電子線装置の要点は、導線分布密度の
小さい区域の導線の径を太くして導線の抵抗値を
小さくした電子線偏向コイルを具備することにあ
る。 The key point of the electron beam device of the present invention is to include an electron beam deflection coil in which the diameter of the conductor wire is increased in the area where the conductor wire distribution density is low to reduce the resistance value of the conductor wire.
以下本発明の実施例を第１図〜第５図により説
明する。 Embodiments of the present invention will be described below with reference to FIGS. 1 to 5.
第１図は本発明に係る電子線偏向コイルの構成
体であるヨークの上面図ａ及び正面図ｂ、第２図
及び第３図は該ヨークの上下に取付けられる上板
及び下板の上面図ａ及び正面図ｂ、第４図は該上
板の上面及び下板の下面に設けられた接続パター
ンを示す要部拡大斜視図、第５図は上記電子線偏
向コイルの完成体を示す正面図ａ及び要部断面図
ｂである。 FIG. 1 is a top view a and a front view b of a yoke that is a component of an electron beam deflection coil according to the present invention, and FIGS. 2 and 3 are top views of an upper plate and a lower plate attached above and below the yoke. a, a front view b, and FIG. 4 are enlarged perspective views of main parts showing the connection patterns provided on the upper surface of the upper plate and the lower surface of the lower plate, and FIG. 5 is a front view showing the completed electron beam deflection coil. FIG.
第１図に示すベークライト等非磁性体よりなる
円筒状ヨーク１は、中心部に電子線（ビーム）通
過用窓２を有し、該窓２の中心線に相当するＺ軸
に平行で且つ放射状に配列された貫通孔３，４，
５，６，７，８，９，１０，１１，１２，１３，
１４等を穿孔する。 A cylindrical yoke 1 made of a non-magnetic material such as Bakelite shown in FIG. Through holes 3, 4, arranged in
5, 6, 7, 8, 9, 10, 11, 12, 13,
14 etc. is drilled.
これらの貫通孔には後述のごとく導線を両端を
突出させて挿入するが、その導線の配設密度の大
きい区域では導線の径d0を電子線の偏向に必要な
電流を流し得る太さとし、導線の配設密度の小さ
い区域では導線の径ｄを前記d0より太いものとす
る。 Conductive wires are inserted into these through holes with both ends protruding as described below, but in areas where the conductor wires are densely arranged, the diameter d 0 of the conductor wires is set to a thickness that allows the flow of the current necessary for deflecting the electron beam. In areas where the conductor wire density is low, the diameter d of the conductor wire is set to be larger than the above-mentioned d0 .
この目的のため導線の配設密度即ち貫通孔の配
設密度の大きい区域の貫通孔３，４，５，６，
９，１０，１１，１２等は前記径d0の導線がガタ
なく挿入される径d0′とし、配設密度の小さい区
域の貫通孔７，８，１３，１４等は径ｄの導線を
ガタなく挿入し得る径d′（d′＞d0′）と大きくす
る。 For this purpose, the through holes 3, 4, 5, 6 in areas where the density of conducting wires, that is, the density of through holes is high,
9, 10, 11, 12, etc. have a diameter d 0 ' into which the conductor wire with the diameter d 0 can be inserted without play, and the through holes 7, 8, 13, 14, etc. in the area with a small installation density have a diameter d 0 ' in which the conductor wire with the diameter d can be inserted. The diameter d′ (d′>d 0 ′) is made large enough to allow insertion without play.
また貫通孔３及び４，５及び６，７及び８は
夫々対をなし、同じく対をなす貫通孔９及び１
０，１１及び１２，１３及び１４とＺ軸に対し
夫々対称に設けられる。 Further, the through holes 3 and 4, 5 and 6, 7 and 8 form pairs, respectively, and the through holes 9 and 1 also form a pair.
0, 11, 12, 13, and 14 are provided symmetrically with respect to the Z axis.
第２図及び第３図はベークライト等の非磁性体
よりなるリング状の上板１５及び下板１６であ
る。 FIGS. 2 and 3 show a ring-shaped upper plate 15 and lower plate 16 made of a non-magnetic material such as Bakelite.
該上板１５及び下板１６は中心線に相当するＺ
軸を中心とし、前記電子線通過用窓２と同径の電
子線通過用窓２′，２″を夫々具備する。そして前
記貫通孔３，４，５，６，７，８，９，１０，１
１，１２，１３，１４等と同位置且つ同径の穴
３′，４′，５′，６′，７′，８′，９′，１０′，
１
１′，１２′，１３′，１４′及び３″，４″，５″，
６″，７″，８″，９″，１０″，１１″，１２″，１
３″，１４″等が穿孔されている。 The upper plate 15 and the lower plate 16 are arranged at Z, which corresponds to the center line.
Electron beam passing windows 2' and 2'' having the same diameter as the electron beam passing window 2 are respectively provided with the axis as the center. ,1
Holes 3', 4', 5', 6', 7', 8', 9', 10', in the same position and the same diameter as 1, 12, 13, 14, etc.
1
1', 12', 13', 14' and 3'', 4'', 5'',
6″, 7″, 8″, 9″, 10″, 11″, 12″, 1
3″, 14″ etc. are perforated.
上記上板１５の上面及び下板１６の下面には、
夫々対をなす穴例えば穴３′―４′間、５″―６″間
等を接続する接続パターンが形成されている。 On the upper surface of the upper plate 15 and the lower surface of the lower plate 16,
Connection patterns are formed to connect pairs of holes, such as between holes 3' and 4', between holes 5'' and 6'', etc.
第４図にその一部を拡大して示す。 Fig. 4 shows a part of it enlarged.
同図は上板１５の上面の一部を示す拡大斜視図
であつて、３′，４′，……，８′は前述の導線の
端部を突出して嵌合せしめる穴である。 This figure is an enlarged perspective view showing a part of the upper surface of the upper plate 15, and 3', 4', .
これらのうち、対をなす穴３′―４′間、５′―
６′間、７′―８′間を接続する導電性接続パター
ン１７，１８，１９を通常のプリント板形成法等
を用いて形成する。 Among these, between the pair of holes 3'-4', 5'-
Conductive connection patterns 17, 18, 19 connecting between 6' and between 7' and 8' are formed using an ordinary printed board forming method or the like.
次に上記ヨーク１、上板１５、下板１６、導線
を用いて電子線偏向コイルを組立てる方法につい
て第５図により説明する。 Next, a method of assembling an electron beam deflection coil using the yoke 1, upper plate 15, lower plate 16, and conductive wire will be explained with reference to FIG.
第５図ａは本実施例により得られた電子線偏向
コイルの完成体の正面図、同図ｂは内部構造を示
す要部断面図である。 FIG. 5a is a front view of the completed electron beam deflection coil obtained in this example, and FIG. 5b is a sectional view of a main part showing the internal structure.
同図ｂに示すように先ずヨーク１の貫通孔（図
には貫通孔３のみを示す）のすべてに導線２０を
両端部を突出させて挿入する。次に該ヨーク１の
上側には上板１５を、下側には下板１６を取付け
る。この時接続パターンは外側に向け、各穴
３′，４′，……及び３″，４″，……にはそれぞれ
対応する導線を両端部を突出させて嵌合させる。 As shown in FIG. 1B, first, the conductive wires 20 are inserted into all of the through holes of the yoke 1 (only the through holes 3 are shown in the figure) with both ends protruding. Next, an upper plate 15 is attached to the upper side of the yoke 1, and a lower plate 16 is attached to the lower side. At this time, the connection pattern is directed outward, and corresponding conductor wires are fitted into the holes 3', 4', . . . and 3'', 4'', . . . with both ends protruding.
次いで上板１５上面及び下板１６下面の接続パ
ターン１７及び１７′と導線２０の両端部とを半
田付けする。なお２１，２１′は半田を示す。 Next, the connection patterns 17 and 17' on the upper surface of the upper plate 15 and the lower surface of the lower plate 16 and both ends of the conductive wire 20 are soldered. Note that 21 and 21' indicate solder.
このようにすべての導線２０を接続パターンに
半田付けすることにより導線２０と接続パターン
１７，１８，１９，……によりループ状の導電路
即ちコイルが形成される。 By soldering all the conductive wires 20 to the connection patterns in this manner, a loop-shaped conductive path, ie, a coil, is formed by the conductive wires 20 and the connection patterns 17, 18, 19, .
このようにして第５図ａに示す電子線偏向コイ
ルが得られる。 In this way, the electron beam deflection coil shown in FIG. 5a is obtained.
なお前記導線の配設密度の大きい所では径の細
いものを、配設密度の小さい所では太いものを用
いる。これは配設密度の小さい所では場所の余裕
があるので出来るだけ太い線を用いることにより
コイル全体の電気抵抗を小さくすることを目的と
する。 Note that in areas where the wiring density is high, wires with a small diameter are used, and in areas where the wiring density is low, wires with a large diameter are used. The purpose of this is to reduce the electrical resistance of the entire coil by using wires as thick as possible since there is plenty of space in places where the arrangement density is low.
以上説明したごとく本発明によれば、導線を配
設可能な限り太くすることができるのでコイルの
電気抵抗を著しく小さくすることができ、従つて
コイルによる発熱量が大巾に減少し、電子線装置
の熱の問題を軽減することが可能となつた。 As explained above, according to the present invention, since the conductor wire can be made as thick as possible, the electrical resistance of the coil can be significantly reduced, and therefore the amount of heat generated by the coil is greatly reduced, and the electron beam It has become possible to reduce the problem of heat in the equipment.
しかも中心軸に平行な各導線は上板及び下板の
各穴とガタなく嵌合しており、各穴は機械加工に
より高精度で加工できるため電子線偏向コイルの
各種精度が向上し電子線の高精度偏向を実現する
ことが可能である。 Moreover, each conductor wire parallel to the central axis fits into each hole in the upper and lower plates without play, and each hole can be machined with high precision, improving the various precisions of the electron beam deflection coil. It is possible to achieve highly accurate deflection.
なお上記実施例において導線の太さを２種類に
した場合について説明したが、これは配設密度を
考慮して３種類或いはそれ以上を用いてもよい。 In the above embodiment, a case has been described in which two types of conductor thicknesses are used, but three or more types may be used in consideration of the arrangement density.
また上板及び下板は積層板として各層間に接続
パターンを形成したものであつてもよい。 Further, the upper plate and the lower plate may be laminated plates with a connection pattern formed between each layer.
第１図〜第５図は本発明に係る電子線偏向コイ
ルの実施例を示すもので、第１図はヨークの上面
図及び正面図、第２図及び第３図はそれぞれ上板
及び下板の上面図及び正面図、第４図は接続パタ
ーンの一部を示す拡大斜視図、第５図は電子線偏
向コイルの完成体の正面図及び要部断面図であ
る。
１……ヨーク、２，２′，２″……電子線通過用
窓、３，４，５，６，７，８，９，１０，１１，
１２，１３，１４……貫通孔、３′，４′，５′，
６′，７′，８′，９′，１０′，１１′，１２′，１
３′，１４′及び３″，４″，５″，６″，７″，８″
，
９″，１０″，１１″，１２″，１３″，１４″……
穴、１５……上板、１６……下板、１７，１８，
１９……接続パターン、２０……導線、２１……
半田。
1 to 5 show examples of the electron beam deflection coil according to the present invention, in which FIG. 1 is a top view and a front view of a yoke, and FIGS. 2 and 3 are an upper plate and a lower plate, respectively. 4 is an enlarged perspective view showing a part of the connection pattern, and FIG. 5 is a front view and a sectional view of the main part of the completed electron beam deflection coil. 1... Yoke, 2, 2', 2''... Window for electron beam passage, 3, 4, 5, 6, 7, 8, 9, 10, 11,
12, 13, 14...through hole, 3', 4', 5',
6', 7', 8', 9', 10', 11', 12', 1
3', 14' and 3'', 4'', 5'', 6'', 7'', 8''
，
9″, 10″, 11″, 12″, 13″, 14″...
Hole, 15... Upper plate, 16... Lower plate, 17, 18,
19... Connection pattern, 20... Conductor, 21...
solder.
Claims (1)
心軸に対し対称に設けられた複数対の貫通孔を有
する円筒状ヨークと、該ヨークの各貫通孔に両端
部を突出して挿入された複数対の導線と、該複数
対の導線の突出部が嵌合する複数対の穴を有する
リング状上板とリング状下板とからなり、該上板
の上面及び下板の下面にそれぞれ前記各対の穴に
嵌合する前記導線の各対に対応する複数の接続パ
ターンを有し、前記上板及び下板の複数対の穴に
嵌合せる前記複数対の導線の突出部がこれに対応
する前記接続パターンと接続されてなる電子線偏
向コイルの、前記導線の配設密度の小さい区域に
位置せる前記導線の径と、該導線に対応する前記
ヨークの貫通孔と前記上板及び下板の穴の径とを
他の区域の導線の径、貫通孔の径及び上板、下板
の径より大きくしてなる電子線偏向コイルを具備
することを特徴とする電子線装置。1. A cylindrical yoke made of a non-magnetic material and having multiple pairs of through holes provided parallel to and symmetrically with respect to the central axis, and a cylindrical yoke inserted into each through hole of the yoke with both ends protruding. It consists of a ring-shaped upper plate and a ring-shaped lower plate each having a plurality of pairs of conductive wires and a plurality of pairs of holes into which the protrusions of the plurality of pairs of conductor wires fit, and the upper surface of the upper plate and the lower surface of the lower plate are respectively provided with the above-mentioned rings. It has a plurality of connection patterns corresponding to each pair of the conductor wires that fit into each pair of holes, and the protruding portions of the plurality of pairs of conductor wires that fit into the plurality of pairs of holes of the upper plate and the lower plate correspond to this. of the electron beam deflection coil connected to the connection pattern, the diameter of the conductor wire located in the area where the conductor wire arrangement density is low, the through hole of the yoke corresponding to the conductor wire, and the upper plate and the lower plate. 1. An electron beam device comprising an electron beam deflection coil in which the diameter of the hole is larger than the diameter of the conducting wire in other areas, the diameter of the through hole, and the diameters of the upper plate and the lower plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15666479A JPS5679846A (en) | 1979-12-03 | 1979-12-03 | Electron beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15666479A JPS5679846A (en) | 1979-12-03 | 1979-12-03 | Electron beam device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5679846A JPS5679846A (en) | 1981-06-30 |
| JPS6138577B2 true JPS6138577B2 (en) | 1986-08-29 |
Family
ID=15632596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15666479A Granted JPS5679846A (en) | 1979-12-03 | 1979-12-03 | Electron beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5679846A (en) |
-
1979
- 1979-12-03 JP JP15666479A patent/JPS5679846A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5679846A (en) | 1981-06-30 |
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