JPS6136997B2 - - Google Patents

Info

Publication number
JPS6136997B2
JPS6136997B2 JP3160376A JP3160376A JPS6136997B2 JP S6136997 B2 JPS6136997 B2 JP S6136997B2 JP 3160376 A JP3160376 A JP 3160376A JP 3160376 A JP3160376 A JP 3160376A JP S6136997 B2 JPS6136997 B2 JP S6136997B2
Authority
JP
Japan
Prior art keywords
liquid
filter medium
gas dispersion
treated
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3160376A
Other languages
Japanese (ja)
Other versions
JPS52115565A (en
Inventor
Koichi Horiuchi
Yoshiro Iwata
Hiroshi Tajima
Mitsuhiro Morikawa
Jujiro Hashimoto
Hiromasa Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP3160376A priority Critical patent/JPS52115565A/en
Publication of JPS52115565A publication Critical patent/JPS52115565A/en
Publication of JPS6136997B2 publication Critical patent/JPS6136997B2/ja
Granted legal-status Critical Current

Links

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  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Water Treatment By Sorption (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

この発明は例えば廃水をオゾンと吸着剤によつ
て処理する液体処理方法に関する。 第1図は従来の液体処理装置を示す断面図であ
り、図において1は吸着ろ過槽、2はこの吸着ろ
過槽に収納されたろ過材、3は前記吸着ろ過槽1
の内部に設けた吸着ろ過槽上部空間、4は前記吸
着ろ過槽1の前段に設けられた気体分散式気液接
触装置、5はこの装置に被処理水を導入する導入
口、6は被処理水、7はこの被処理水の中に反応
性の気体を放出分散させる気体分散装置、8はこ
の気体分散装置に気体を送入する送気管、9は前
記気液接触装置4によつて処理された被処理水を
次段の前記吸着ろ過槽1に導くための接続管、1
0は前記吸着ろ過槽1によつて処理された被処理
水を排出する排出口、11は前記気液接触装置4
の上部に設けられた排気口、12はこの排気口か
ら排出される気体を処理するための廃ガス処理装
置、13は被処理水の中を上昇する気泡である。 従来の液体処理装置は上記のように構成され、
たとえば被処理液として廃水が導入口5から注入
され、気体分散式気液接触装置4内部において、
気体分散装置7から細かい泡状に放出分散される
例えばオゾンガスを含む気泡13と接触し、前記
廃水に含まれる汚染物質が酸化、分解あるいは殺
菌される。次に接続管9を通つて吸着ろ過槽1に
導かれ、ろ過材2として例えば吸着機能をもつた
活性炭の層を通過することによつて上記酸化分解
された廃水中の汚染物質等が吸着ろ過される。こ
のように活性炭などのろ過材によつて廃水中の汚
染物質を吸着ろ過する前にオゾンによつて廃水を
処理すると前記吸着ろ過槽への負荷が軽減される
ので、この組合せによる廃水処理がよく行なわれ
る。 しかるに吸着ろ過槽1の内部には第1図に示す
ように上部空間3を設ける必要があつた。すなわ
ち、ろ過材2が目づまり等を起した時に排出口1
0から逆に水を送つて前記ろ過材2の逆洗滌を行
なうが、この時にろ過材の層が膨脹するのでこれ
を受け入れる為に設けるものであり、通常の運転
中は不必要な空間である。従つて吸着ろ過槽1は
大形となり、しかも気液接触装置4と吸着ろ過槽
1とを機能別に分けて別置している為に占有空間
が大きくしかも装置が高価になるという欠点があ
つた。 この発明は、装置の大きさを小型化した安価な
液体処理装置で液体を処理する方法を得ることを
目的とするものである。 第2図はこの発明の一実施例を示す断面図であ
り、図中に示した符号は上記従来装置と全く同一
又は相当部分を示すものである。第2図に示すよ
うに、この発明の基本は第1図に示す従来の吸着
ろ過槽上部空間3に従来の気体分散式気液接触装
置4を組込みこれらを一体化して構成したところ
にあり14は一体化された槽体である。 上記のように構成された液体処理装置において
は、例えば廃水などの被処理液が導入口5から槽
体14内部に導入され、この槽体14の上半部分
において気体分散装置7から放散される例えばオ
ゾンガスによつて廃水中の汚染物質の酸化分解あ
るいは殺菌処理が行なわれ、続いて前記槽体14
の下半部分に収納された例えば活性炭を用いたろ
過材2の層を通過することによつて、上記酸化・
分解された廃水中の汚染物質等が吸着ろ過されて
処理が行なわれ、前記処理水は排出口10から取
出される。なおオゾンガスを含む廃ガスは破線の
矢印で示す如く排気口11を通つて廃ガス処理装
置12に導かれる。また、前記気体分散装置7か
らの気体流出によつてろ過材2表面付近の被処理
液及びろ過材層の表面付近が常にかき乱されるの
で、前記ろ過材2の層が目づまりを起すのを著し
く改善することになる。また言うまでもなく装置
の大きさを従来のものよりも小さくすることがで
きるので装置を安価に製造することができる。 上記実施例において、ろ過材2が目づまり等を
起した時には排出管10から洗滌液を注入してい
わゆる逆洗滌を行なう。第3図は上記逆洗滌を行
つている様子を示す断面図であり、図に示した符
号はいずれも第2図に示したものと同一のもので
ある。図に示すように洗滌液を槽体14の下部に
設けた排出口10から注入することによつてろ過
材2がかき乱され乍ら上方に押し上げられるが、
この時に送気管8から例えば空気を送入し気体分
散装置7から吐出すことによつてろ過材2が激し
く撹拌されるので前記ろ過材2の洗滌が効率よく
行なわれることになる。従つてろ過材の粒子同志
が廃水中の汚染物質等によつて互に付着して生成
する塊(マツドボール)の発生も抑制することに
なる。 次に上記実施例に示した液体処理装置の特性を
従来のものと比較して下の表に示す。
The present invention relates to a liquid treatment method for treating wastewater, for example, with ozone and an adsorbent. FIG. 1 is a cross-sectional view showing a conventional liquid processing device. In the figure, 1 is an adsorption filtration tank, 2 is a filter material stored in this adsorption filtration tank, and 3 is the adsorption filtration tank 1.
4 is a gas dispersion type gas-liquid contacting device provided in the previous stage of the adsorption filtration tank 1, 5 is an inlet for introducing the water to be treated into this device, and 6 is an inlet to be treated. Water, 7 is a gas dispersion device for discharging and dispersing reactive gas into the water to be treated, 8 is an air pipe for supplying gas to this gas dispersion device, and 9 is treated by the gas-liquid contact device 4. a connecting pipe for guiding the treated water to the adsorption filtration tank 1 at the next stage;
0 is a discharge port for discharging the water treated by the adsorption filtration tank 1, and 11 is the gas-liquid contact device 4.
12 is a waste gas treatment device for treating the gas discharged from the exhaust port, and 13 is a bubble rising in the water to be treated. A conventional liquid processing device is configured as described above.
For example, wastewater is injected as the liquid to be treated from the inlet 5, and inside the gas dispersion type gas-liquid contact device 4,
The pollutants contained in the wastewater are oxidized, decomposed, or sterilized by contact with the bubbles 13 containing, for example, ozone gas, which are released and dispersed in the form of fine bubbles from the gas dispersion device 7 . Next, the wastewater is led to the adsorption filtration tank 1 through the connecting pipe 9, and passes through a layer of activated carbon, which has an adsorption function, as the filter material 2, so that the pollutants in the oxidized and decomposed wastewater are adsorbed and filtered. be done. In this way, if the wastewater is treated with ozone before adsorption and filtration of pollutants in the wastewater using a filter medium such as activated carbon, the load on the adsorption filtration tank is reduced, so wastewater treatment using this combination is recommended. It is done. However, it was necessary to provide an upper space 3 inside the adsorption filtration tank 1 as shown in FIG. In other words, when the filter material 2 becomes clogged, the discharge port 1
The filter medium 2 is backwashed by sending water backwards from zero, but the layer of the filter medium expands at this time, so it is provided to accommodate this expansion, and this space is unnecessary during normal operation. . Therefore, the adsorption filtration tank 1 has to be large in size, and since the gas-liquid contact device 4 and the adsorption filtration tank 1 are separated by function and placed separately, they have the drawbacks of occupying a large space and making the device expensive. . The object of the present invention is to provide a method for processing liquid with an inexpensive liquid processing device that is smaller in size. FIG. 2 is a cross-sectional view showing one embodiment of the present invention, and the reference numerals shown in the figure indicate the same or corresponding parts as those of the conventional device described above. As shown in FIG. 2, the basis of the present invention is that a conventional gas dispersion type gas-liquid contact device 4 is incorporated into the conventional adsorption filtration tank upper space 3 shown in FIG. 1, and these are integrated. is an integrated tank body. In the liquid treatment apparatus configured as described above, a liquid to be treated, such as waste water, is introduced into the tank body 14 from the inlet 5, and is diffused from the gas dispersion device 7 in the upper half of the tank body 14. For example, the pollutants in the wastewater are oxidized and decomposed or sterilized by ozone gas, and then the tank body 14
The above-mentioned oxidation and
Contaminants and the like in the decomposed wastewater are adsorbed and filtered for treatment, and the treated water is taken out from the discharge port 10. Note that the waste gas containing ozone gas is led to the waste gas treatment device 12 through the exhaust port 11 as shown by the broken line arrow. In addition, since the liquid to be treated near the surface of the filter medium 2 and the surface of the filter medium layer are always disturbed by the gas flowing out from the gas dispersion device 7, clogging of the layer of the filter medium 2 is significantly prevented. I will do it. Needless to say, since the size of the device can be made smaller than that of conventional devices, the device can be manufactured at low cost. In the embodiment described above, when the filter medium 2 becomes clogged, a cleaning liquid is injected from the discharge pipe 10 to perform so-called backwashing. FIG. 3 is a sectional view showing the above-mentioned backwashing process, and all the reference numerals shown in the figure are the same as those shown in FIG. 2. As shown in the figure, by injecting the cleaning liquid from the outlet 10 provided at the bottom of the tank body 14, the filter medium 2 is disturbed and pushed upward.
At this time, for example, air is introduced from the air pipe 8 and discharged from the gas dispersion device 7, so that the filter medium 2 is vigorously agitated, so that the filter medium 2 can be efficiently washed. Therefore, the generation of lumps (mud balls), which are formed when particles of the filter medium adhere to each other due to pollutants in wastewater, is also suppressed. Next, the characteristics of the liquid treatment device shown in the above embodiment are compared with those of the conventional device and are shown in the table below.

【表】 上記の表において 試料(1)Acのみ……活性炭を用いた吸着ろ過
槽のみを通したもの。 試料(2)O3+Ac……第1図に示した従来の液
体処理装置を通したもの。 試料(3)O3×Ac……第2図に示したこの発明
の液体処理装置を通したも
の。 であり、またTK/Kp=0.5とはろ過材層の液体
透過係数Kが初期値Kpの半分になるまでに要す
る時間を、またTOCは全有機炭素を表わしてい
る。なお、他の条件を一定とするために、用いた
廃液、活性炭、活性炭の使用量及びろ過槽の断面
積などはいずれも同一のものとした。 上記の表からも明らかな如くろ過層の目づまり
が特に改善されていることがわかる。 ところで上記説明ではこの発明を廃液の処理に
利用する場合について述べたが、その他の処理に
も利用できることはいうまでもない。 この発明は以上説明した通り、とくに槽体内部
へ気体分散装置から空気を送入している状態にお
いて、被処理液の排出口から槽体内に洗浄液を注
入することにより液体浄化用のろ過装置をその洗
浄液と空気とによつて同時に逆洗するように構成
したので、ろ過材表面付近の被処理液及びろ過層
の表面付近が常にかく乱され、ろ過材の層が目づ
まりを起こすことが著しく抑制されるとともに、
ろ過材の逆洗時には気体分散装置からの空気によ
りろ過材が洗浄液とともに激しく撹拌されて効率
良くそのろ過材の洗浄が行なえるという効果があ
る。
[Table] In the above table, Sample (1) A c only...Through only an adsorption filtration tank using activated carbon. Sample (2) O 3 +A c ...Through the conventional liquid processing device shown in Figure 1. Sample (3) O 3 ×A c ...Through the liquid treatment device of the present invention shown in FIG. 2. TK/K p =0.5 means the time required for the liquid permeability coefficient K of the filter layer to become half of the initial value K p , and TOC represents the total organic carbon. In order to keep other conditions constant, the waste liquid, activated carbon, amount of activated carbon used, cross-sectional area of the filter tank, etc. were all the same. As is clear from the table above, it can be seen that the clogging of the filtration layer is particularly improved. Incidentally, in the above description, the present invention is applied to the treatment of waste liquid, but it goes without saying that it can also be applied to other treatments. As explained above, this invention operates a filtration device for liquid purification by injecting cleaning liquid into the tank body from the outlet of the liquid to be treated, especially when air is being fed into the tank body from the gas dispersion device. Since the cleaning solution and air are used for backwashing at the same time, the liquid to be treated near the surface of the filter medium and the surface of the filter layer are constantly disturbed, and clogging of the filter layer is significantly suppressed. Along with
During backwashing of the filter media, the filter media is vigorously stirred together with the cleaning liquid by the air from the gas dispersion device, resulting in the effect that the filter media can be efficiently cleaned.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の液体処理装置を示す断面図、第
2図はこの発明の一実施例を示す断面図、第3図
は前記実施例において、ろ過材を逆洗滌している
様子を示す断面図である。 図において、2はろ過材、5は導入口、7は気
体分散装置、10は排出口、14は槽体である。
なお各図中同一符号は同一または相当部分を示す
ものとする。
Fig. 1 is a sectional view showing a conventional liquid processing device, Fig. 2 is a sectional view showing an embodiment of the present invention, and Fig. 3 is a sectional view showing a state in which the filter medium is backwashed in the above embodiment. It is a diagram. In the figure, 2 is a filter medium, 5 is an inlet, 7 is a gas dispersion device, 10 is an outlet, and 14 is a tank body.
Note that the same reference numerals in each figure indicate the same or corresponding parts.

Claims (1)

【特許請求の範囲】 1 ろ過材を収納して上部に空間を残した槽体、
この槽体の上部に設けた被処理液の導入口、前記
槽体の下部に設けた被処理液の排出口、および前
記空間の底部に設けた気体分散装置を備えた液体
処理装置で被処理液を処理するに際し、被処理液
処理時には、前記気体分散装置が前記ろ過材の上
部に位置するようにすると共に、前記気体分散装
置から前記槽体内部へオゾンを送入し、前記ろ過
材洗浄時には、前記気体分散装置が前記ろ過材内
に位置するようにすると共に、前記排出口から洗
浄液を送入し、かつ、前記気体分散装置から空気
を送入するようにしたことを特徴とする液体処理
方法。 2 ろ過材として吸着材を用いた特許請求の範囲
第1項記載の液体処理方法。 3 吸着材として活性炭を用いた特許請求の範囲
第2項記載の液体処理方法。
[Claims] 1. A tank body that houses a filter medium and leaves a space at the top;
The liquid to be treated is processed by a liquid processing device equipped with an inlet for the liquid to be treated provided at the top of the tank, an outlet for the liquid to be treated provided at the bottom of the tank, and a gas dispersion device provided at the bottom of the space. When processing a liquid, the gas dispersion device is positioned above the filter medium, and ozone is introduced into the tank body from the gas dispersion device to clean the filter medium. In some cases, the gas dispersion device is located within the filter medium, a cleaning liquid is introduced from the outlet, and air is introduced from the gas dispersion device. Processing method. 2. A liquid treatment method according to claim 1, which uses an adsorbent as a filtering material. 3. A liquid treatment method according to claim 2, using activated carbon as an adsorbent.
JP3160376A 1976-03-23 1976-03-23 Apparatus for treating liquid Granted JPS52115565A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3160376A JPS52115565A (en) 1976-03-23 1976-03-23 Apparatus for treating liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3160376A JPS52115565A (en) 1976-03-23 1976-03-23 Apparatus for treating liquid

Publications (2)

Publication Number Publication Date
JPS52115565A JPS52115565A (en) 1977-09-28
JPS6136997B2 true JPS6136997B2 (en) 1986-08-21

Family

ID=12335766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3160376A Granted JPS52115565A (en) 1976-03-23 1976-03-23 Apparatus for treating liquid

Country Status (1)

Country Link
JP (1) JPS52115565A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228195A (en) * 1983-06-10 1984-12-21 日揮株式会社 Device for treating radioactive waste water

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5035955A (en) * 1973-08-02 1975-04-04

Also Published As

Publication number Publication date
JPS52115565A (en) 1977-09-28

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