JPS6134809Y2 - - Google Patents

Info

Publication number
JPS6134809Y2
JPS6134809Y2 JP1979100442U JP10044279U JPS6134809Y2 JP S6134809 Y2 JPS6134809 Y2 JP S6134809Y2 JP 1979100442 U JP1979100442 U JP 1979100442U JP 10044279 U JP10044279 U JP 10044279U JP S6134809 Y2 JPS6134809 Y2 JP S6134809Y2
Authority
JP
Japan
Prior art keywords
cylindrical container
insulating plate
impurity trapping
trapping electrode
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979100442U
Other languages
Japanese (ja)
Other versions
JPS5617821U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1979100442U priority Critical patent/JPS6134809Y2/ja
Publication of JPS5617821U publication Critical patent/JPS5617821U/ja
Application granted granted Critical
Publication of JPS6134809Y2 publication Critical patent/JPS6134809Y2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02GINSTALLATION OF ELECTRIC CABLES OR LINES, OR OF COMBINED OPTICAL AND ELECTRIC CABLES OR LINES
    • H02G5/00Installations of bus-bars
    • H02G5/06Totally-enclosed installations, e.g. in metal casings
    • H02G5/063Totally-enclosed installations, e.g. in metal casings filled with oil or gas
    • H02G5/065Particle traps

Landscapes

  • Gas-Insulated Switchgears (AREA)
  • Installation Of Bus-Bars (AREA)

Description

【考案の詳細な説明】 本考案は、大電力回路に用いるガス絶縁母線装
置、特に不純物捕捉電極を有するガス絶縁母線装
置の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a gas insulated busbar device used in a high power circuit, particularly a gas insulated busbar device having an impurity trapping electrode.

従来、この種のガス絶縁母線装置として、第1
図及び第2図に示すものが多用されている。即
ち、円筒形容器1の中に、絶縁スペーサ2により
円筒形容器1の直径方向のほぼ中心に保持された
高電圧導体3が六弗化硫黄ガスSF6等の絶縁ガス
で絶縁状態に挿入配置されており、図面において
下方の絶縁スペーサ2の脚部には、多数の孔又は
スリツト4を有する板材でリング状又は弧状(図
示の従来例では弧状)に形成された不純物捕捉電
極5が、絶縁スペーサ側の端部埋金6とこれに螺
着されたネジ7とによつて、円筒形容器1の底部
近傍に挾持されている。
Conventionally, as this type of gas insulated busbar device, the first
The ones shown in Fig. 2 and Fig. 2 are often used. That is, a high voltage conductor 3 held approximately in the diametrical center of the cylindrical container 1 by an insulating spacer 2 is inserted into a cylindrical container 1 in an insulated state with an insulating gas such as sulfur hexafluoride gas SF 6 . In the lower legs of the insulating spacer 2 in the drawing, there is an impurity trapping electrode 5 formed in a ring shape or an arc shape (arc shape in the conventional example shown) from a plate material having a large number of holes or slits 4. It is held in the vicinity of the bottom of the cylindrical container 1 by an end filler 6 on the spacer side and a screw 7 screwed thereto.

上記構成によるガス絶縁母線装置において、そ
の内部に混入している不純物8を不純物捕捉電極
5で捕捉する場合、高電圧導体3に予備電圧を印
加して行うが、電圧が低いと、不純物捕捉電極5
の端部近傍の※印部分(第2図)の電界が弱いた
め、電圧によつて不規則な運動をしている不純物
8は※印部分に溜まり易い。
In the gas insulated bus device having the above configuration, when the impurities 8 mixed inside the bus are captured by the impurity trapping electrode 5, a preliminary voltage is applied to the high voltage conductor 3. However, if the voltage is low, the impurity trapping electrode 5
Since the electric field in the area marked * (Fig. 2) near the end of is weak, the impurity 8, which is moving irregularly due to the voltage, tends to accumulate in the area marked *.

上記の欠点を補うため、第3図に示すように、
不純物捕捉電極5より少なくとも軸方向もしくは
長手方向の寸法が十分に長く、且つ同電極の孔4
の面積より十分に大きい孔9を有する絶縁板10
を、円筒形容器1の内面に近い不純物捕捉電極5
の外面側で同電極5に重ね合わせて用いることが
行なわれている。この構造によれば、不純物8
は、第2図の※印部分に入り込む前に絶縁板10
上に乗るので、第3図から諒解されるように、不
純物捕捉電極5に捕捉され易くなる。
In order to compensate for the above drawbacks, as shown in Figure 3,
At least the dimension in the axial or longitudinal direction is sufficiently longer than that of the impurity trapping electrode 5, and the hole 4 of the same electrode
An insulating plate 10 having a hole 9 sufficiently larger than the area of
, an impurity trapping electrode 5 close to the inner surface of the cylindrical container 1
The electrode 5 is used by being superimposed on the outer surface of the electrode 5. According to this structure, impurity 8
Insulating plate 10 before entering the part marked with * in Figure 2.
Since the impurity is placed on top of the impurity trapping electrode 5, it is easily captured by the impurity trapping electrode 5, as can be understood from FIG.

しかし、上記のような絶縁板10を用いた構成
にあつては、絶縁板10が帯電することが避けら
れないので、その静電作用で絶縁板自体に不純物
が付着してしまうことがあり、この不純物が運転
中に何かの拍子で一時に絶縁板から離れ、不純物
捕捉電極5の孔4に捕捉される前に、絶縁スペー
サ2の側面に至ると、耐電圧上極めて有害とな
り、また、絶縁板10に不純物が付着している
と、コロナ発生の原因となり、極めて有害であ
る。
However, in a configuration using the insulating plate 10 as described above, it is unavoidable that the insulating plate 10 becomes electrically charged, so that impurities may adhere to the insulating plate itself due to the electrostatic action. If these impurities suddenly leave the insulating plate for some reason during operation and reach the side of the insulating spacer 2 before being captured by the holes 4 of the impurity trapping electrode 5, it will be extremely harmful in terms of withstand voltage. If impurities adhere to the insulating plate 10, it will cause corona generation, which is extremely harmful.

本考案は、上述した欠点を除去するためになさ
れたものであつて、不純物の捕捉が確実に行なわ
れ、不純物による有害な現象の発生を未然に防止
できる不純物捕捉電極付きガス絶縁母線装置を提
供することを目的とするものである。
The present invention has been made in order to eliminate the above-mentioned drawbacks, and provides a gas insulated busbar device with an impurity trapping electrode that can reliably trap impurities and prevent the occurrence of harmful phenomena caused by impurities. The purpose is to

この目的から本考案は、円筒形容器と、該円筒
形容器内を長手方向の軸心に沿つて延びる高電圧
導体と、該高電圧導体を前記円筒形容器内に支持
する絶縁スペーサと、該絶縁スペーサの脚部に取
り付けられると共に複数個の孔を有する不純物捕
捉電極と、を具備したガス絶縁母線装置におい
て、前記円筒形容器の内面側にある前記不純物捕
捉電極の外面には、前記円筒形容器の少なくとも
軸心方向に関する寸法が前記不純物捕捉電極より
も長い絶縁板が取り付けられており、複数個の孔
を有する該絶縁板の表面には、半導体膜が形成さ
れていることを特徴とするものである。好適な実
施例においては、半導体膜は半導体塗料の塗布に
よつて形成されている。
To this end, the present invention comprises: a cylindrical container; a high voltage conductor extending along a longitudinal axis within the cylindrical container; an insulating spacer supporting the high voltage conductor within the cylindrical container; In a gas insulated busbar device comprising an impurity trapping electrode attached to a leg portion of an insulating spacer and having a plurality of holes, the outer surface of the impurity trapping electrode on the inner surface side of the cylindrical container has the cylindrical shape. An insulating plate having a dimension longer than the impurity trapping electrode at least in the axial direction of the device is attached, and a semiconductor film is formed on the surface of the insulating plate having a plurality of holes. It is something. In a preferred embodiment, the semiconductor film is formed by applying a semiconductor paint.

次に、本考案の好適な実施例について第4図及
び第5図を参照して詳細に説明するが、図中、同
一符号は同一又は対応部分を示すものとする。
Next, a preferred embodiment of the present invention will be described in detail with reference to FIGS. 4 and 5, in which the same reference numerals indicate the same or corresponding parts.

第4図及び第5図において、1は円筒形容器、
2は絶縁スペーサ、3は高電圧導体、5は不純物
捕捉電極、4は不純物捕捉電極5に設けられた孔
又はスリツト、6は端部埋金、7は取付け用ネジ
であつて、これ等の諸構成要素は、第1図〜第3
図に関連して説明した従来技術のものと同様に構
成されている。また、10は絶縁板、9は該絶縁
板10に設けられた孔であり、従来技術と同様
に、不純物捕捉電極5の下方で同電極5に重ね合
わせて用いられる絶縁板10は、不純物捕捉電極
5より少なくとも軸方向もしくは長手方向の寸法
が十分に長く形成されると共に、同電極の孔4の
面積より十分に大きい孔9を有する。本考案によ
れば、この絶縁板10には、その表面に、例えば
半導体塗料を塗布することにより半導体膜11が
形成されている。
In FIGS. 4 and 5, 1 is a cylindrical container;
2 is an insulating spacer, 3 is a high voltage conductor, 5 is an impurity trapping electrode, 4 is a hole or slit provided in the impurity trapping electrode 5, 6 is an end filler, and 7 is a mounting screw. The various components are shown in Figures 1 to 3.
The structure is similar to that of the prior art described in connection with the figures. Further, 10 is an insulating plate, and 9 is a hole provided in the insulating plate 10. Similarly to the prior art, the insulating plate 10, which is used below the impurity trapping electrode 5 and superimposed on the same electrode 5, is used to trap impurities. The hole 9 is formed to be sufficiently longer in at least the axial or longitudinal direction than the electrode 5, and has a hole 9 that is sufficiently larger in area than the hole 4 of the electrode. According to the present invention, the semiconductor film 11 is formed on the surface of the insulating plate 10 by applying, for example, a semiconductor paint.

而して上記の構成によれば、半導体膜11の形
成により絶縁板10の表面の抵抗が低く保持され
るので、使用時の帯電が防止され、この帯電防止
により、前述した不純物の捕捉が円滑に且つ的確
に行なわれるため、不純物による有害な現象の発
生を未然に防止することができ、絶縁機能面での
大巾な改善と安全性の確保とが図れる。
According to the above configuration, the resistance of the surface of the insulating plate 10 is kept low by the formation of the semiconductor film 11, so that charging during use is prevented, and this charging prevention facilitates the capture of the impurities described above. Since this is carried out accurately and accurately, it is possible to prevent the occurrence of harmful phenomena due to impurities, and it is possible to greatly improve the insulation function and ensure safety.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のガス絶縁母線装置の一部の断面
図、第2図は要部の拡大断面図、第3図は改良さ
れた従来のガス絶縁母線装置の一部の断面図、第
4図は本考案の一実施例を示すガス絶縁母線装置
の一部の断面図、第5図は絶縁板の拡大断面図で
ある。 1……円筒形容器、2……絶縁スペーサ、3…
…高電圧導体、4……不純物捕捉電極の孔、5…
…不純物捕捉電極、8……不純物、9……絶縁板
の孔、10……絶縁板、11……半導体膜。
Fig. 1 is a sectional view of a part of a conventional gas insulated busbar device, Fig. 2 is an enlarged sectional view of the main part, Fig. 3 is a sectional view of a part of an improved conventional gas insulated busbar device, and Fig. 4 is a sectional view of a part of a conventional gas insulated busbar device. The figure is a sectional view of a part of a gas insulated busbar device showing an embodiment of the present invention, and FIG. 5 is an enlarged sectional view of an insulating plate. 1... Cylindrical container, 2... Insulating spacer, 3...
...High voltage conductor, 4... Impurity trapping electrode hole, 5...
... Impurity trapping electrode, 8... Impurity, 9... Hole of insulating plate, 10... Insulating plate, 11... Semiconductor film.

Claims (1)

【実用新案登録請求の範囲】 1 円筒形容器と、該円筒形容器内を長手方向の
軸心に沿つて延びる高電圧導体と、該高電圧導
体を前記円筒形容器内に支持する絶縁スペーサ
と、該絶縁スペーサの脚部に取り付けられると
共に複数個の孔を有する不純物捕捉電極と、を
具備したガス絶縁母線装置において、前記円筒
形容器の内面側にある前記不純物捕捉電極の外
面には、前記円筒形容器の少なくとも軸心方向
に関する寸法が前記不純物捕捉電極よりも長い
絶縁板が取り付けられており、複数個の孔を有
する該絶縁板の表面には、半導体膜が形成され
ていることを特徴とするガス絶縁母線装置。 2 前記半導体膜は半導体塗料の塗布によつて形
成されていることを特徴とする実用新案登録請
求の範囲第1項記載のガス絶縁母線装置。
[Claims for Utility Model Registration] 1. A cylindrical container, a high voltage conductor extending along the longitudinal axis within the cylindrical container, and an insulating spacer supporting the high voltage conductor within the cylindrical container. , an impurity trapping electrode attached to the leg of the insulating spacer and having a plurality of holes, the outer surface of the impurity trapping electrode on the inner surface side of the cylindrical container having An insulating plate having a dimension longer than the impurity trapping electrode at least in the axial direction of the cylindrical container is attached, and a semiconductor film is formed on the surface of the insulating plate having a plurality of holes. gas insulated busbar equipment. 2. The gas insulated busbar device according to claim 1, wherein the semiconductor film is formed by applying a semiconductor paint.
JP1979100442U 1979-07-19 1979-07-19 Expired JPS6134809Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979100442U JPS6134809Y2 (en) 1979-07-19 1979-07-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979100442U JPS6134809Y2 (en) 1979-07-19 1979-07-19

Publications (2)

Publication Number Publication Date
JPS5617821U JPS5617821U (en) 1981-02-17
JPS6134809Y2 true JPS6134809Y2 (en) 1986-10-09

Family

ID=29333171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979100442U Expired JPS6134809Y2 (en) 1979-07-19 1979-07-19

Country Status (1)

Country Link
JP (1) JPS6134809Y2 (en)

Also Published As

Publication number Publication date
JPS5617821U (en) 1981-02-17

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