JPS6130285Y2 - - Google Patents

Description

[Detailed description of the invention] (a) Technical field of the invention This invention concerns a wafer positioning device used when manufacturing ICs and the like.

(b) Purpose of the invention As shown in Figure 1, the wafer has a circular outer shape, and a part of the outer shape is provided with an orientation flat 2 that serves as a reference for positioning.

Various types of such wafer positioning devices have been announced, and the device shown in FIG. 2 is one of them. In FIG. 2, 3 is a drive roller, 4 is a guide, 5 is an end face of the guide 4, 6 and 7 are freely rotating driven rollers, 8 is a table on which the wafer 1 is placed, 9 is a guide, and 10 is an end face of the guide 9. be.

Figure 2 shows a state in which the wafer 1 is placed on the table 8, and the driven roller 6 and the driven roller 7 press the wafer 1 against the drive roller 3 side, and the drive roller 3 rotates the wafer 1. It is something.

When placing the wafer 1 on the table 8 for the first time, the driven roller 6 and the driven roller 7 are moved away from the table 8. When the wafer 1 is placed on the stand 8, the driven rollers 6 and 7 are pressed against the drive roller 3 by a spring or the like (not shown), and the wafer 1 is brought into contact with the drive roller 3. The driven roller 6 and the driven roller 7 rotate freely as the wafer 1 rotates.

In FIG. 2, the end faces 5 and 10 are arranged on the same line. Then, the drive roller 3 is positioned slightly outside this line relative to the wafer 1. Since the wafer 1 is circular, it contacts the drive roller 3 but rotates without contacting the guides 4 and 9.

Next, FIG. 3 shows an enlarged view of the main parts when the wafer 1 shown in FIG. 2 is further rotated. FIG. 3 shows a state where the orientation flat 2 is in contact with the end surface 5 of the guide 4 and the end surface 10 of the guide 9. In this state, the drive roller 3 and the orientation flat 2 are separated from each other. , end face 5.1
0 and the position of the drive roller 3. Therefore, in the state shown in FIG. 3, the driving roller 3 idles, and the wafer 1 is fixed between the driven rollers 6 and 7 and the end surfaces 5 and 10.

In this case, if the rotation and stop of the wafer 1 can be detected, it is convenient to stop the drive roller 3 or to proceed to the next process.

This invention allows the rotation and stop of the wafer 1 to be detected by a roller rotation detector provided on the driven roller 6.

(c) Example of the invention First, a configuration diagram of an example of this invention is shown in Fig. 4.

1 to 10 in Figure 4 are the same as in Figure 1, and 11
is a roller rotation detector attached to the driven roller 6. The roller rotation detector 11 has a disc 11A with a groove attached to the slave roller 6,
The slotted portion of the light emitting element is configured to pass through a photodetector 11B in which a light emitting element and a light receiving element are opposed to each other.

Next, the operation of FIG. 4 will be explained.

As the driven roller 6 rotates, the disc 11A also rotates, and the slotted portion of the disc 11A is the photodetector 1.
When the light passes through 1B, the photodetector 11B transmits and receives light at the slit portion, and an output is output from the roller rotation detector 11 each time.

When the rotation of the wafer 1 stops, the rotation of the driven roller 6 also stops. As a result, the roller rotation detector 11
The output of will also no longer change. Therefore, by setting the drive roller 3 to stop rotating when the output from the roller rotation detector 11 stops changing, the drive roller 3 can be stopped without idling.

Although the roller rotation detector 11 is attached to the driven roller 6 in FIG. 4, a roller rotation detector may also be attached to the driven roller 7 in order to reliably detect when the rotation of the wafer 1 has stopped.

(d) Effect of the invention According to this invention, the rotation and stop of the wafer 1 can be detected by the output of the roller rotation detector 11 attached to the driven roller, so it is possible to stop the driving roller or proceed to the next process. can do.

[Brief explanation of the drawing]

Fig. 1 is an external view of a wafer, Fig. 2 is a configuration diagram of a conventional device, Fig. 3 is an enlarged view of the main parts when the wafer 1 in Fig. 2 is further rotated, and Fig. 4 is an embodiment of the invention. Diagram. 1... Wafer, 2... Orientation flat, 3... Drive roller, 4... Guide, 5...
End face, 6... Driven roller, 7... Driven roller, 8
...stand, 9...guide, 10...end face, 11...
Roller rotation detector, 11A... disc with slot, 11B... photodetector.

Claims (1)

[Claims for Utility Model Registration] A driving roller, a first guide having a first end surface, a second guide having a second end surface, a first driven roller, and a second driven roller. Then, a first driven roller and a second driven roller press the wafer against the drive roller, and the drive roller rotates the wafer so that the orientation flat of the wafer is aligned between the first end surface and the second end surface. In a wafer positioning device configured such that the wafer and the driving roller separate when they come into contact with an end surface, a roller rotation detector is attached to the first driven roller, and the rotation of the wafer is stopped based on the output of the roller rotation detector. A wafer positioning device characterized by detecting.