JPS61292932A - Quartz fork - Google Patents
Quartz forkInfo
- Publication number
- JPS61292932A JPS61292932A JP13417885A JP13417885A JPS61292932A JP S61292932 A JPS61292932 A JP S61292932A JP 13417885 A JP13417885 A JP 13417885A JP 13417885 A JP13417885 A JP 13417885A JP S61292932 A JPS61292932 A JP S61292932A
- Authority
- JP
- Japan
- Prior art keywords
- quartz
- fork
- quartz fork
- flat
- end sections
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Feeding Of Articles By Means Other Than Belts Or Rollers (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、被処理体の表面処理技術さらにはウニへ表面
上に薄膜を形成する技術に関するもので、特に石英治具
を用いてウェハの搬送を行なう場合に適用して有効な技
術に関するものである。[Detailed Description of the Invention] [Technical Field] The present invention relates to a technology for surface treatment of objects to be processed, as well as a technology for forming a thin film on the surface of a sea urchin, and particularly relates to a technology for transporting a wafer using a quartz jig. It relates to techniques that are effective when applied to certain cases.
半導体の製造工程において、集積度が向上するにつれ、
微小な塵埃や異物がクエへに付着することＫより起こる
歩留低下が、極めて大きな問題となってきている。In the semiconductor manufacturing process, as the degree of integration increases,
A decrease in yield caused by the adhesion of minute dust and foreign matter to the squares has become an extremely serious problem.
そのため、ウェハのロード−アンロードＩＩＫおける塵
埃の発生を極力低減するため、発塵のおきにくいソフト
ランディングが用いられている。Therefore, in order to reduce the generation of dust as much as possible during loading and unloading of wafers, soft landing is used, which is less likely to generate dust.
（電子材料別冊超ＬＳＩ製造も試験装置ガ、イドブック
１９８５年版ｐ、５９〜ｐ、６０参照）。(Refer to the Electronic Materials Special Edition for VLSI Manufacturing and Testing Equipment Guide, Idbook 1985 edition, p. 59-p. 60).
ところが、本発明者が不良解析したところでは、まだま
だクエへ表面に異物が付着しており、それに起因して不
良が発生していることを見い出した。However, when the present inventor analyzed the defects, it was discovered that foreign matter still adhered to the surface of the squares, which caused the defects.
そこで、本発明者は異物の発生源について追求したとこ
ろ、石英フォークに問題があることを突き止めた。第３
図は特開昭５８−６２４８９号公報で開示されているよ
うな従来の石英フォークの概略側面図で、１の管状部と
２の偏平部から構成されている。第４図は第３図ＩＶ−
ＩＶ線断面図であり、図から分かるように、偏平部２の
端部３が先細りとなっている。本発明者はこの端部３が
少しの衝撃でも簡単に破損してしまい、その破片の一部
がウニへ表面に飛散し付着していることを見い出し、こ
の問題を解決すべく検討な行なった。Therefore, the inventor of the present invention investigated the source of the foreign matter and found that there was a problem with the quartz fork. Third
The figure is a schematic side view of a conventional quartz fork as disclosed in Japanese Unexamined Patent Publication No. 58-62489, which is composed of one tubular part and two flat parts. Figure 4 is Figure 3 IV-
It is a sectional view taken along the line IV, and as can be seen from the figure, the end 3 of the flat part 2 is tapered. The inventor of the present invention discovered that this end portion 3 was easily damaged even by the slightest impact, and some of the fragments were scattered and attached to the surface of sea urchins, and conducted studies to solve this problem. .
本発明の目的は、異物の発生が低減でき・うる処理技術
を提供することである。An object of the present invention is to provide a processing technique that can reduce the generation of foreign matter.
本発明の他の目的は、石英フォークの強度を向上できう
る技術を提供することである。Another object of the present invention is to provide a technique that can improve the strength of a quartz fork.
本発明の前記ならびＫそのほかの目的と新規な特徴は、
本明細書の記述および添付図面からあきらかくなるであ
ろう。The above and other objects and novel features of the present invention are:
It will become clear from the description of this specification and the accompanying drawings.
本願において開示される発明のうち代表的なものの概要
を簡単に説明すれば、下記のとおりである。A brief overview of typical inventions disclosed in this application is as follows.
すなわち、石英フォークの偏平部の端部を丸状に形成す
ることＫより、前記端部が破損しＫ＜くなるので、石英
フォークの強度が向上し、さらに異物不良を低減した処
理を行なうことができるものである。That is, by forming the end of the flat part of the quartz fork into a round shape, the end is damaged and K<, so the strength of the quartz fork is improved, and processing is performed to reduce foreign material defects. It is something that can be done.
第１図は、本発明の一実施例である石英フォークの概略
側面図、第２図は、第１図の■−■線断面図である。以
下、図を用いてその構成について説明する。石英フォー
ク４は、管状部５と偏平部６かうなっており、前記偏平
部６上に被処理体である例えばウェハＷを整列載置した
ウェハ治具７を載せられるようになっている。８は石英
フォーク４の管状部５を保持する保持具で、移動アーム
９と連結している。前記移動アーム９は図示しない駆動
部と接続しており、石英フォーク４０前後動作及び上下
動作がおこなえるようになっている。FIG. 1 is a schematic side view of a quartz fork that is an embodiment of the present invention, and FIG. 2 is a sectional view taken along the line ■--■ in FIG. The configuration will be explained below with reference to the drawings. The quartz fork 4 has a tubular portion 5 and a flat portion 6, and a wafer jig 7 on which objects to be processed, such as wafers W, are aligned and placed can be placed on the flat portion 6. A holder 8 holds the tubular portion 5 of the quartz fork 4 and is connected to a moving arm 9. The movable arm 9 is connected to a drive section (not shown), and is capable of moving the quartz fork 40 back and forth and up and down.
石英フォーク４の偏平部６の端部１０は、丸状に形成さ
れて先細りがないようにしている。なお、本実施例にお
いては、さらに端部１０の強度が向上するように５例え
ばシリコン棒１１を端部に溢って埋設している。The end portion 10 of the flat portion 6 of the quartz fork 4 is formed into a round shape so as not to taper. In this embodiment, in order to further improve the strength of the end portion 10, silicon rods 11, for example, are buried in the end portion.
次に動作について説明する。ウェハ治具７にウェハＷを
載置したのち、石英フォーク４を移動させ偏平部６を前
記ウェハ治具７の下部に挿入する。Next, the operation will be explained. After placing the wafer W on the wafer jig 7, the quartz fork 4 is moved to insert the flat part 6 into the lower part of the wafer jig 7.
そして、偏平部６の端部１０にてウェハ治具７を支持し
て持ち上げ、図示しない処理槽内に搬送する。ウェハ治
具７を処理槽内の所定位置まで移動させたら、石英フォ
ーク４を下降させ、ウェハ治具をおろしたのち後退する
。その後、処理槽内を所定の処理雰囲気にして、例えば
ウニへ表面上に薄膜を形成したり、あるいはウニへ表面
部に不純物を拡散する等の処理を行なう。Then, the wafer jig 7 is supported and lifted by the end 10 of the flat part 6 and transported into a processing tank (not shown). When the wafer jig 7 is moved to a predetermined position in the processing tank, the quartz fork 4 is lowered, and the wafer jig is lowered and then retreated. Thereafter, the inside of the treatment tank is set to a predetermined treatment atmosphere, and treatments such as forming a thin film on the surface of the sea urchin or diffusing impurities into the surface of the sea urchin are performed, for example.
（１）石英フォークの偏平部の端部な丸状に形成するこ
とにより、端部が衝撃により破損しにくくなるので、石
英フォーク＼を交換する頻度が減り、コストが低減でき
つるという効果が得られる。(1) By forming the flat end of the quartz fork into a round shape, the end is less likely to be damaged by impact, reducing the frequency of replacing the quartz fork, resulting in lower costs and improved durability. It will be done.
（２１石英フォークの偏平部の端部を丸状に形成し、か
つ前記端部にシリコン棒等の補強材を埋設あるいは取り
付けることにより、端部が衝撃により破損することがな
くなるとともに、熱や重さにより変形することがないな
ど、その強度が飛躍的に向上することとなり、長期間の
使用に耐えうる石英フォークが得られる効果がある。(21 By forming the end of the flat part of the quartz fork into a round shape and burying or attaching a reinforcing material such as a silicon rod to the end, the end will not be damaged by impact and will not be damaged by heat or weight.) This results in a dramatic improvement in its strength, with no deformation caused by the quartz fork, which has the effect of providing a quartz fork that can withstand long-term use.
＋３１ （１１あるいは（２）のような構成とするこ
とにより、石英フォークの偏平部の端部強度が向上する
ため、前記端部が破損して石英フォークの破片が発生す
ることがなくなるので、破片が被処理体表面に付着して
不良が発生するという問題を解決できるという効果が得
られる。+31 (By having a configuration like 11 or (2), the strength of the end of the flat part of the quartz fork is improved, so the end part is not damaged and fragments of the quartz fork are not generated. This has the effect of solving the problem of defects caused by adhesion to the surface of the object to be processed.
以上本発明者によってなされた発明を実施例にもとづき
具体的に説明したが、本発明は上記実施例に限定される
ものではなく、その要旨を逸脱しない範囲で種々変更可
能であることはいうまでもない。たとえば、偏平部の端
部以外の場所、例えば偏平部の底部に補強材を配設して
もフォークの強度を飛躍的に向上できる。また、本実施
例においては石英を材料とするフォークで説明したが、
他の材料例えばシリコンカーバイト等を材料とするもの
であっても良い。Although the invention made by the present inventor has been specifically explained above based on examples, it goes without saying that the present invention is not limited to the above examples and can be modified in various ways without departing from the gist thereof. Nor. For example, the strength of the fork can be dramatically improved even if a reinforcing material is provided at a location other than the end of the flat portion, for example, at the bottom of the flat portion. Also, in this example, a fork made of quartz was used, but
It may also be made of other materials such as silicon carbide.
〔利用分野〕
以上の説明では主として本発明者によってなされた発明
を、その背景となった利用分野である石英フォークに適
用した場合について説明したが、それに限定されるもの
ではなく、たとえば、ウェハ載置用治具等各種石英製品
に適用することができる。[Field of Application] In the above explanation, the invention made by the present inventor was mainly applied to a quartz fork, which is the field of application that formed the background of the invention, but the invention is not limited to this, for example, It can be applied to various quartz products such as mounting jigs.
第１因は、本発明の一実施例である石英フォークの概略
側面図、
第２図は、第１図の■−■線断面図、
第３図は、従来の石英フォークの概略側面図、第４図は
、第３図のＩＶ−ＩＶ線断面図である。
１．５・・・管状部、２．６・・・偏平部、３．１０・
・・端部、４・・・石英フォーク、７・・・クエハ治具
、８・・・保持部、９・・・移動アーム、１１・・・シ
リコン棒。
第 １ 図
第 ２５Ａ
第 ３ 図The first factor is a schematic side view of a quartz fork that is an embodiment of the present invention, FIG. 2 is a sectional view taken along the line ■-■ in FIG. 1, and FIG. 3 is a schematic side view of a conventional quartz fork. FIG. 4 is a sectional view taken along the line IV-IV in FIG. 3. 1.5... Tubular part, 2.6... Flat part, 3.10.
... End part, 4... Quartz fork, 7... Quartz jig, 8... Holding part, 9... Moving arm, 11... Silicon rod. Figure 1 Figure 25A Figure 3
Claims (1)
送するための石英フォークにおいて、前記フォークの偏
平部の端部を丸状に形成したことを特徴とする石英フォ
ーク。1. A quartz fork for transporting objects to be processed into a processing tank in which a predetermined processing atmosphere can be created, characterized in that the ends of the flat parts of the fork are formed into a round shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13417885A JPS61292932A (en) | 1985-06-21 | 1985-06-21 | Quartz fork |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13417885A JPS61292932A (en) | 1985-06-21 | 1985-06-21 | Quartz fork |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61292932A true JPS61292932A (en) | 1986-12-23 |
Family
ID=15122265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13417885A Pending JPS61292932A (en) | 1985-06-21 | 1985-06-21 | Quartz fork |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61292932A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5178534A (en) * | 1989-05-18 | 1993-01-12 | Bayne Christopher J | Controlled diffusion environment capsule and system |
-
1985
- 1985-06-21 JP JP13417885A patent/JPS61292932A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5178534A (en) * | 1989-05-18 | 1993-01-12 | Bayne Christopher J | Controlled diffusion environment capsule and system |
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