JPS6127507A - Color filter - Google Patents

Abstract

PURPOSE:To improve adaptability to vapor deposition by using a red dye consisting of a perylene tetracarboxylic acid deriv. of the specific constitutional formula, a green dye consisting of phthalocyanine, etc. and a blue dye consisting of phthalocyanine and quinacridone dye. CONSTITUTION:Light having resist sensitivity is irradiated to a substrate 1 on which a resist mask 2 is provided and thereafter the red dye layer 3 consisting of the perylene tetracarboxylic acid deriv. expressed by formula I or formula II(R1 denotes hydrogen, alkyl group, aryl group) is provided thereon. Only the resist mask is then dissolved to form the 1st patterned dye 4. The position of the resist mask is further deviated and the 2nd patterned green dye layer 5 consisting of the phthalocyanine dye and anthraquinone dye and the 3rd patterned blue dye layer 6 consisting of the phthalocyanine dye and quinacridone dye are similarly provided, by which a color filter is formed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a color filter, and particularly to a color filter for fine color separation in color imaging devices, color sensors, color displays, and the like.

[Conventional technology]

As a typical color filter, gelatin and
A dyed color filter is known in which a mordant layer made of a hydrophilic polymer material such as Kangin, Greeny, or polyvinyl alcohol is provided, and the mordant layer is dyed with a dye to form a colored layer. There are many dyes that can be used in the dyeing method, and it is relatively easy to meet the spectral characteristics required for filters. Moreover, since it involves a complicated process of providing an interlayer for resist dyeing for each color, it has the drawback of poor yield. Furthermore, it has a relatively low heat resistance of about 150 to 160°C, making it difficult to use in processes that require thermal treatment.

On the other hand, a vapor deposition method is known in which a thin film of dye or pigment is formed by a vapor deposition method such as vapor deposition (Japanese Unexamined Patent Publication No. 55-14
6406 etc.). According to this method, a colored layer can be formed using the dye itself, so it can be made thinner than the dyeing method.
Furthermore, the process is easy to control as it is a non-aqueous process. It also has the feature of good heat resistance. However, it has not been widely used until now because it is not easy to select a usable dye suitable for vapor deposition.

When looking at color filters from the perspective of dyes, dyes for color filters are required to have the following properties.

First of all, it must have appropriate spectral characteristics as a filter. In general, color filters are composed of two or three colors, depending on the application and method, and the color characteristics of the filter must be well-balanced not only for each individual color characteristic but also for the overall color.For example, one color However, if the spectral properties are poor, no matter how good the other properties are, the color properties will be poor and the filter will be unsuitable.

On the other hand, from a manufacturing method point of view, even if the spectral characteristics are good, dyes lack manufacturing stability or require special treatments and processes, leading to a decrease in yield and ultimately making them unsuitable for color filters. Put it away. Therefore, as a dye for color filters, it is necessary to select an optimal dye that is well-balanced in terms of both spectral characteristics and manufacturing.

In particular, the dyeing method has various advantages over the dyeing method, as it has strong manufacturing constraints such as being heat resistant, easily evaporated, and resistant to solvent treatment in the photolithography process. Despite this, vapor-deposited color filters were not widespread.

On the other hand, the characteristics required of the dye used to form the dye layer are that it can be vapor deposited, can withstand solvents and heat treatment in the photolithography process using resist after vapor deposition, and has well-balanced spectral characteristics as a filter. That's true. . Phthalocyanine dyes are examples of dyes that relatively satisfy these characteristics. Since the basic phthalocyanine ring of phthalocyanine dyes is extremely stable both chemically and thermally, many phthalocyanine dyes have excellent vapor deposition properties and solvent resistance, and exhibit spectral characteristics ranging from blue to green. Therefore, it can be said that phthalocyanine dyes can be used as blue to green or green dyes in the vapor deposition method.

The problem then is the red pigment to be combined with it. This is because unless a red dye has performance comparable to that of a phthalocyanine dye, it is impossible to produce a vapor-deposited filter of a practical level as a color filter as a whole.

[Purpose of the invention]

Therefore, in the present invention, an excellent vapor-deposited dye layer is obtained by selecting and using the most suitable three-color dyes, taking into account their adaptability to vapor deposition, spectral transmission characteristics, solvent resistance, and durability. The main purpose is to provide color filters.

Another object of the present invention is to create a color filter that has comprehensively excellent characteristics by using a red dye that can be vapor deposited, has excellent solvent resistance, and has excellent spectral characteristics in combination with a phthalocyanine dye. It is also about providing.

[Structure of the invention]

The color filter according to the present invention is characterized in that the dye forming the dye layer is selected from dyes having the following structure.

Red dye: Perylenetetracarboxylic acid derivative selected from structural formulas (I) and (II) Green dye: A combination of a phthalocyanine dye and an anthraquinone dye Blue dye: A combination of a phthalocyanine dye and a quinacridone dye, where R1 is Hydrogen, an alkyl group or an aryl group.

The perylenetetracarboxylic acid derivative of the red pigment used in the present invention has a structure represented by the above formula (1) or (II), is extremely thermally stable due to its perylene skeleton, and decomposes even when heated. It has the property of being easily vapor-deposited when the temperature reaches a predetermined temperature or higher, without having to evaporate, and is extremely suitable for forming a dye layer by vapor deposition.

In addition, the dye layer of perylenetetracarboxylic acid derivatives formed by vapor deposition is not a loose film often seen in organic films, but is extremely dense and adheres strongly to the surface of inorganic materials such as white glass. , it has excellent physical properties as a deposited film.

The spectral characteristics also have excellent red characteristics, as shown by 14 in FIG.

On the other hand, this dye layer has excellent resistance to organic solvents. That is, it is hardly soluble in not only poor solvents such as alcohols but also good solvents such as ketones, esters, ether alcohols, and halogen solvents, and does not cause any change in spectral characteristics. Therefore, there is no problem at all when applying a resist to the dye layer and developing it, so that fine processing of the dye layer can be easily carried out, making it extremely suitable for manufacturing fine color filters and the like.

Preferred examples of perylenetetracarboxylic acid derivatives include the following.

(Hereinafter, it will be indicated by the symbol) (Su(3,4,9,10-perylenetetracarboxylic acid = anhydride) ・?) In the above formula, R1 is -H・9 In the above formula, R1 is The present invention also has the object of making it possible to produce a vapor-deposited filter having a green dye layer and a blue dye layer with excellent spectral properties.

As mentioned above, there are only a few green or blue dyes that can be used in the vapor deposition method, and phthalocyanine dyes are one that satisfies the characteristics relatively well.

Phthalocyanine dyes generally exhibit blue spectral characteristics, but their transmission characteristics extend slightly into the green region.

Furthermore, depending on the type of central metal and the introduction of substituents, it may exhibit a tendency to become even closer to green.

In any case, the spectral properties range from blue to green, and depending on the intended use where strict properties are required, green or blue may not be sufficient.

Accordingly, the present invention makes it possible to form excellent green and blue colored layers by making use of the characteristics of phthalocyanine dyes suitable for vapor deposition methods and compensating for their drawbacks in spectral characteristics.

The color filter according to the present invention has a green dye layer formed by vapor-depositing a phthalocyanine-based dye and an anthraquinone-based dye, and a blue dye layer formed by vapor-depositing a phthalocyanine-based dye and a quinacridone-based dye.

That is, in the present invention, by using an anthraquinone-based yellow dye in addition to a phthalocyanine-based dye as a green dye layer, the blue spectral component of the phthalocyanine dye is cut, and a colored layer having excellent green spectral properties is formed. It is something.

The anthraquinone dye used in the present invention refers to anthraquinone derivatives and similar polycyclic quinones. Anthraquinone dyes are thermally stable, do not decompose at high temperatures, and easily evaporate when the temperature exceeds a certain level.
゛Very suitable.

The thin film of anthraquinone dye formed by vapor deposition is not a sparse film as is often seen in organic films, but is extremely dense and adheres strongly to the surface of inorganic materials such as glass, and has excellent physical properties as a vapor deposited film. are doing.

On the other hand, this deposited film has excellent resistance to organic solvents. In other words, it is hardly soluble in poor solvents such as alcohols, as well as good solvents such as ketones, esters, ether alcohols, halo and gen solvents, and does not cause any change in spectral characteristics. Therefore, there is no problem at all when resist is applied and developed to the dye layer, and the dye layer can be easily microfabricated, making it extremely suitable for manufacturing fine color filters, etc. be.

The dyes having the structural formula shown above in the structure of typical anthraquinone yellow dyes are examples of suitable dyes that can form the dye layer of the color filter of the present invention. It is not necessarily limited to these as long as the purpose of the invention is achieved.

Anthraquinone represented by the structural formula shown above (an example of a commercially available non-anthraquine dye is listed below using its trade name).

Chromophthal Yellow A2R (manufactured by Ciba Geigy) C, 1, No., 70600 Heliofirst Yellow E3R (manufactured by Bayer) Palyogen Yellow Li2O2 (manufactured by BASF) C, 1, No., 68420 Kayaset Yellow E-R (manufactured by Nippon Kayaku) C, I, No, 65049 Chromophthal Yellow AGR (manufactured by Ciba Geigy) Piblast Yellow E2G (manufactured by Bayer) Ihonthren Yellow GCN (manufactured by Sumitomo Chemical) C, 1, No, 67300 Michelthrene Yellow GK (manufactured by Mitsui Toatsu) C, 1, No , 61725 Indanthrene Printing Yellow ff0K (manufactured by Hoechst)"f:, 1. No, 59100r Intrazole Yellow V (manufactured by Hoechst) C, 1, No, 60531 Mikethrene Soluble Yellow 12G (≦Manufactured by Itosho)
C, 1, No, 60605 Mikethrene Yellow GF (manufactured by Mitsui Toatsu) C, 1, No. 66510 Nihon Thren Yellow GCF (manufactured by Sumitomo Chemical) C, 1, No. 65430 Endanthrene Yellow 3G (manufactured by Bayer) C, 1 , No., 65405-Honthrene Yellow 4GL (manufactured by Sumitomo Chemical) f Dathrene Yellow 5GK (manufactured by Bayer) C, 1, No., 65410° Parathrene Yellow PGA (manufactured by BASF) C, I, No., 68400 Cibanon Yellow 2G (manufactured by Ciba Geigy) Ingenthrene Yellow F2GC (manufactured by Hoechst) Ann Lasol Yellow IGG (manufactured by Hoechst) Indanthrene Yellow 5GF (manufactured by BASF) Mikethrene Yellow 3GL (manufactured by Mitsui Toatsu) Indanthrene Yellow LGF (manufactured by CBASF) Monolite Yellow FR (manufactured by ICI) ) Kayaset Yellow E-AR (manufactured by Nippon Kayaku).

Furthermore, in the present invention, by using a quinacridone magenta dye in addition to the phthalocyanine dye as the blue dye layer, the green spectral component of the phthalocyanine dye is cut, and a dye layer having excellent blue spectral properties is formed. It is something.

The dyes used for color correction of phthalocyanine dyes include:
It must be a magenta dye with sharp rise characteristics. Furthermore, since it is formed by a vapor deposition method, it must have vapor deposition properties and solvent properties comparable to those of phthalocyanine dyes, but the quinacridone magenta dye used in the present invention satisfies all of these properties. In combination with other dyes, it is possible to form an excellent vapor-deposited blue dye layer.

The quinacridone dye used in the present invention refers to those having the basic skeleton represented by the formula (I), including derivatives derived therefrom.

(I) Examples of derivatives include. It is also possible to use mixtures of these. In terms of spectral characteristics, both have a rise in transmittance on the back side, making them suitable for cutting the green component of phthalocyanine dyes.

In addition, quinacridone dyes are extremely stable thermally, do not decompose even when heated, and easily evaporate when the temperature exceeds a certain level, making it difficult to form a thin dye film by vapor deposition. Very suitable. The thin film of quinacridone dye formed by vapor deposition is not a loose film that is often seen in organic films, but is extremely dense and adheres strongly to the surface of inorganic materials such as glass, and has excellent physical properties as a vapor deposited film. have.

On the other hand, this deposited film has excellent resistance to organic solvents. That is, it is almost insoluble not only in poor solvents such as alcohols but also in good solvents such as ketones, esters, ether alcohols, and halogen solvents, and does not cause any change in spectral characteristics. Therefore, there is no problem at all when applying a resist to the dye layer and developing it, so that fine processing of the dye layer can be easily carried out, making it extremely suitable for manufacturing fine color filters and the like.

Commercially available quinacridone pigments (trade names) include Lionogen Magenta R (Toyo Ink), Firstken Super Magenta R, RS (Dainippon Ink), Syncasia Red BRT, YRT (DuPont), Syncasia Violet BRT (DuPont). ), etc.

On the other hand, as mentioned above, phthalocyanine dyes also have similar excellent properties.

Examples of typical phthalocyanines are metal-free phthalocyanine and copper phthalocyanine.

Beryllium phthalocyanine, magnesium phthalocyanine, zinc phthalocyanine, titanium phthalocyanine,
Tin phthalocyanine, lead phthalocyanine, palladium phthalocyanine, chromium phthalocyanine, molybdenum phthalocyanine.

Manganese phthalocyanine, iron phthalocyanine.

Examples include cobalt phthalocyanine, nickel phthalocyanine, palladium phthalocyanine, and platinum phthalocyanine.

In order to form a green layer in combination with an anthraquinone dye, a phthalocyanine having high transmittance on the green side is desirable.

The green dye layer or blue dye layer is generally formed by sequentially depositing a phthalocyanine dye and an anthraquinone dye or a quinacridone dye, but simultaneous vapor deposition is also possible, and the thickness of each layer can be adjusted depending on the desired spectral characteristics. Or control the amount of vapor deposition. Preferably the film thickness is 500 to
ooo person is appropriate. FIGS. 7 and 8 show an example in which the spectral characteristics are significantly improved by stacking anthraquinone dyes or quinacridone dyes compared to the case of a phthalocyanine dye alone.

Indicated by 9.

Furthermore, in FIG. 8, a method for forming a patterned dye layer in a spectroscopic method supplemented by copper phthalocyanine alone and a layered layer of Lionogen Magenta R will be described. Patterning techniques for vapor-deposited dye layers include dry etching and lift-off.

In the dry etching method, a resist pattern is created on a dye layer, and using this as a mask, a dye pattern is formed by dry etching such as plasma or ion etching (Japanese Patent Laid-Open No. 58-34961, etc.). This method does not require the formation of an intermediate layer as in the dyeing method, but instead a resist mask remains on the dye pattern. Furthermore, since it is extremely difficult to remove this mask without causing any damage to the dye layer, the result is a two-layer structure in which a substantially optically unnecessary resist mask is laminated on the dye layer.

In addition, patterned dye layers formed by the lift-off method use a substance that can be dissolved later, mainly resist, to form a resist mask below the dye layer to be removed, and then provide a vapor-deposited dye layer on top of the resist mask. By dissolving or peeling off the dye layer, the dye layer above it can be physically removed and formed without any direct effect on the dye layer.

As a resist used in the lift-off method of organic dye layer,
It does not matter whether it is a negative type or a positive type, as long as it can be dissolved later. However, in the case of a negative type, crosslinking generally progresses when exposed to radiation, and a solvent with strong dissolving power is required to dissolve it. Therefore, it is not preferable because it tends to damage or dissolve the dye film.

In this respect, positive resists become soluble when the entire surface is irradiated with radiation, especially after forming turns in the resist, so it is suitable for lift-off because it is possible to select a solvent that dissolves the dye less easily than in negative resists. In addition, positive resists have a wide variety of resin components, and the solvents used for coating and development also vary. - As an example, a positive resist mainly composed of a fluorine-containing methacrylate having the structure shown below as a polymerized unit may be cited as a preferable example. This resist dissolves well not only in good solvents with high dissolving ability such as esters, aromatics, and halogenated hydrocarbons, but also in poor solvents with low dissolving ability such as alcohols, so it does not affect the dye film. This is because less solvent can be used.

As such a resist, FPM210. FBI
Examples include IO and FBM120 (both trade names manufactured by Daikin Industries).

R2-C-R1 Here, R1 and R2 are hydrogen or an alkyl group, and R3 is an alkyl group in which at least one fluorine is bonded to each carbon.

Typical Examples Table 1 Other resists that are commercially available under the following trade names can be used as appropriate.

AZ series: 111, 119A, 120, 34
0,1350B.

1350J, 1370, 1375, 1450, 1450
J, 1470°1475.2400, 2415.243
0 (Manufactured by Shibu9fu Co., Ltd.) Waycoat:) (P
R-204, HPR-205, HPR-206°HPR
-207, HPR1182 Waycoat: MPR (manufactured by Hunt) Kodak
Micor Po5itive Re5ist (manufactured by Kodak) Isofine Po5itive Re5ist
(manufactured by Micro Image Technology) PCI29,1
293F (manufactured by Polychrome) OF
PRll 77.78,800 0EBR1000,1010,10300DUR100
0,1001,1010,1013,1014 (manufactured by Tokyo Ohkasha) EBRI, 9 (manufactured by Toshi) FM
REloo, EIOI (manufactured by Fuji Pharmaceutical Co., Ltd.)
JSRPo5itive Photoresist
PFR3003 (manufactured by Japan Synthetic Rubber Co., Ltd.) Selectilux P'
(Manufactured by Merck & Co., Ltd.) After a pigment layer in a pattern of predetermined multiple colors is formed by the above-described buttering process,
It is desirable to provide a protective film on the dye layer to prevent defects such as dust and scratches, and to protect the dye layer from various environmental conditions.

Various commonly known methods can be used to form the protective film.

For example, polyurethane, polycarbonate.

Organic materials such as silicon, acrylic, polyparaxylylene, Si3N4, 5IO2, SiO, AM203, Ta
The protective film can be formed using an inorganic material such as No. 283 by coating methods such as spin cord, dipping, roll coater, or vapor deposition.

It is also possible to use various photosensitive resins, such as various resistors.

Organic vapor-deposited dye filters have better heat resistance and light resistance than organic dyed filters, but they are often sensitive to humidity, as is the case with general vapor-deposited films, so the protective film should be hydrophobic in consideration of this point. Considering the matching with desirable 0 dye, neoprene rubber, Anne. Plain rubber, cyclized com.

Rubber resins such as natural rubber and resists thereof are particularly suitable. In addition, in the case of resin film coating, it is necessary that the organic solvent used does not attack the dye layer.Since the dye used in the present invention has excellent solvent resistance, it can be used with various solvents such as aromatic, cellosolve, ester ketone, etc. or a mixed solvent thereof can be used, but aliphatic hydrocarbons, alcohols and the like are more preferred. The above-mentioned rubber-based resins containing these solvents are preferred, but rubber-based resin resists are particularly preferred from the viewpoint of processability. Examples of rubber-based resin resists include those commercially available under the following trade names.

Waycoat IC, Type 3IC.

SC, HR and HNR999 (manufactured by Hunt) Kodak Microesist 747 and 752 (manufactured by Kodak) OMR81,8
3, 85, 87, 83 SS.

83SR, 83UR and O, DURlloWR (manufactured by Tokyo Ohka Co., Ltd.) Isopo 3F MR and HD (manufactured by Micro Image Technology Co., Ltd.) SeJle
ct i look ux N20. N35°N45. N60 and N100 (manufactured by E and M Chemicals) JSRCIR701 and JSR CBR-N901 (manufactured by Japan Synthetic Rubber) The substrate used in the present invention is not particularly limited as long as dye vapor deposition is possible. For example, the following can be used. Glass plates, optical resin plates, resin films such as gelatin, polyvinyl alcohol, hydroxyethyl cellulose, methyl methacrylate, polyester, butyral polyamide, etc.

It is also possible to form the patterned dye layer integrally with one that is applied as a color filter. An example of a substrate in this case is a wafer on which a display surface of a cathode ray tube, a light receiving surface of an image pickup tube, and a solid-state imaging device such as a CCD, BBD, or CID are formed.

Examples include a contact type image sensor using a thin film semiconductor, a liquid crystal display surface, and a photoreceptor for color electrophotography.

If it is necessary to increase the adhesion between the vapor-deposited dye layer and the underlying substrate, such as glass, apply a thin layer of polyurethane resin, polycarbonate resin, silane coupling agent, etc. to the glass substrate in advance before applying the vapor-deposited film. It is effective when formed.

A typical pattern creation process of the present invention will be explained below with reference to the drawings.

A positive resist is spin-coated onto a desired substrate using a spinner. After drying, prebaking is performed under appropriate temperature conditions. Then, it is exposed to light or electron beam having resist sensitivity in a predetermined pattern shape and developed. If necessary, pretreatment for the purpose of alleviating strain on the resist film is performed before development, and rinsing treatment is performed for the purpose of suppressing swelling of the resist film after development.

If the remaining resist film and residue, so-called scum, cannot be removed even after development, they can be removed by plasma ashing.

Through the above steps, the resist mask 2 shown in FIG.
is formed on the substrate 1. Next, as shown in the figure, the entire surface is irradiated with light or an electron beam having resist sensitivity.

This is to facilitate the subsequent dissolution and removal of the resist mask by cutting and decomposing the main chain of the resist, but it can be omitted. If it is omitted, it is necessary to use a solvent with stronger solubility.

Then, as shown in FIG. 3, a dye layer 3 is formed on the resist mask by vacuum evaporation. In the case of lamination, the thickness of the zero dye layer, which is repeatedly vapor-deposited, is determined depending on the desired spectral characteristics, but is preferably about 500 to toooλ.

Next, in order to remove the resist mask under the dye layer, the resist mask is immersed in a solvent that dissolves or peels only the resist mask from the substrate without dissolving the dye and without damaging the spectral characteristics.

Removal of the resist mask simultaneously removes the dye layer thereon, and to assist in this removal, it is also effective to apply ultrasonic energy during immersion.

In this way, the first patterned dye layer 4 is formed as shown in FIG. Second. The third dye pattern formation is
The above steps may be repeated while shifting the position of the resist mask according to the pattern.

By repeating these steps as many times as there are different colors, a patterned dye layer 4, 5 and 6 of three colors as shown in FIG. 5, for example, can be produced.

A desired protective layer 7 is then applied to the patterned dye layer I to complete the color filter (FIG. 6).

Example 1 A positive resist 0DUR1013 (Tokyo Ohka Department) was applied to a thickness of 1.0 μm on a glass substrate by a spinner coating method. After pre-baking for 120'020 minutes, mask exposure was carried out with far ultraviolet light, and a special developer,
A resist mask was formed by processing with a special rinsing liquid.

Next, the entire surface of this resist mask was irradiated with deep ultraviolet light to make it soluble in a developer.

Subsequently, the glass substrate on which the resist mask was formed and the Cu phthalocyanine filled in the molybdenum vapor deposition port were placed in a vacuum vapor deposition machine and evacuated. Vacuum degree 10-5 to 1O-6
The vapor deposition port was heated to 450 to 550 0 torr to deposit Cu phthalocyanine to a thickness of about 2000 nm.

Subsequently, Lionogen Magenta R (Toyo Ink) as a quinacridone dye was deposited to a thickness of 2000 mm.

A patterned blue dye layer was formed by immersing and stirring the vapor-deposited glass substrate in the above-mentioned special developer and removing unnecessary portions of the vapor-deposited film while dissolving the resist mask. Subsequently, 0DUR1013 was coated in the same process on the glass substrate on which the patterned blue dye layer was formed, exposed and developed, and then a resist mask corresponding to the patterned green dye layer was formed.

After the entire surface was exposed, it was installed in a vacuum evaporation machine, and PB phthalocyanine was evaporated at 450 to 550"O to obtain a film of 2,000 people.Furthermore, a. (manufactured by)
It was deposited to a thickness of 4,000 people. Thereafter, it was immersed in a developer and stirred to form a patterned green dye layer. Furthermore, in exactly the same process, Irgazine Red BPT (trade name: Ciba Geigy Cl No. 71127) was added as a perylenetet, lacarboxylic acid derivative red pigment at a concentration of 400 to 500.
It was deposited to a thickness of about 2000° C. and treated with a developer to obtain a patterned red dye layer. At this time, not only the blue and green dye layers but also Irgazine Red BPT were not dissolved at all by the developer treatment, and the spectral characteristics were not impaired.

Finally, commercially available negative resist 0 is used as a protective film for rubber resin.
DUR110WR (product name: Nitokyo Ohka) was applied, prebaked, and cured with fog light over the entire surface to complete a three-color filter.

The dye used in the series of steps described above was not damaged by solvents, heat, etc., and a color filter with excellent spectral characteristics was formed. show off.

Incidentally, for comparison with the conventional method, astrafloxin G (Bayer's acid), which is a well-known red pigment, was used in the same process. Although a vapor-deposited film was obtained, it was attacked by the solvent during the developer treatment process, making it impossible to obtain a desired patterned red dye layer.

Example 2 A three-color color filter was formed in the same process as in Example 1 using a counter electrode substrate for a liquid crystal display in which a transparent electrode was formed on a glass substrate.

Using this color filter, we were able to create a liquid crystal cell capable of displaying good color using an electrode substrate.

Example 3 By performing the same steps as in Example 1 using a wafer on which a solid-state image sensor was formed as a substrate, a color solid-state image sensor with good characteristics could be directly formed.

Examples 4 to 10 Example 1 with the following typical dye combinations of the present invention
A three-color filter was formed using the same process as above.

In either case, a filter with excellent spectral properties was formed without any effect on the dye layer. Example 11 The positive resist used in Example 1 was used with FPM210, FB
MIIo, 120 (manufactured by Daikin Industries) AZ1350 (
I made a color filter using the exact same process except for using the same color filter (manufactured by Shipley).

The dye layer was not damaged in any way by these resists, and of course the spectral characteristics were not impaired.

〔Effect of the invention〕

As is clear from the above detailed description, the color filter of the present invention has excellent color characteristics and spectral characteristics, high manufacturing stability and good yield, and excellent solvent resistance and heat resistance. It is.

[Brief explanation of the drawing]

Figures 1 to 6 are process explanatory diagrams of the color filter manufacturing method according to the present invention, in which Figure 1 is a resist mask formation process diagram, Figure 2 is an exposure process diagram, and Figure 3 is a dye layer formation process diagram. 4 is a process diagram for forming a patterned dye layer, and FIG. 5 is an embodiment of the patterned dye layer of three colors to be manufactured, and
The figures are diagrams each showing the protective layer forming process. 7, 8, and 9 are graphs of spectral characteristics, respectively. 1 ・・・・・・・・・・・・・・・・・・・・・・・・
・・・Board 2 ・・・・・・・・・・・・・・・・・・
・・・・・・・・・Resist mask 3 ・・・・・・
・・・・・・・・・・・・・・・・・・Dye layer 4
．． 5 and 6 ...... Patterned dye layer 7
・・・・・・・・・・・・・・・・・・・・・・・・
...Protective layers 8 and 9 ......
・Graphs 10 and 11 of spectral characteristics before and after correction for green ・Graphs 12, 13 and 14 of spectral characteristics before and after correction for blue Chart of blue, green and red spectral properties Table of aging liquids

Claims (4)

[Claims] (1) In a color filter having a dye layer formed of a red dye, a green dye, and a blue dye, the red dye is a perylenetetracarboxylic acid derivative selected from the following structural formulas (I) and (II), and the green dye A color filter characterized in that the color filter is made of a combination of a phthalocyanine dye and an anthraquinone dye, and the blue dye is made of a combination of a phthalocyanine dye and a quinacridone dye. (I) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ Here, R_1 is hydrogen, an alkyl group, or an aryl group. (2) The color filter according to claim 1, wherein the dye layer is a patterned dye layer formed by depositing a dye on a substrate having a resist mask and then removing the resist mask. (3) The color filter according to claim 2, wherein the resist mask is formed of a positive resist. (4) Claim 1 in which a protective layer is provided on the dye layer
Color filters as described in section.