JPS61270645A - Induction coupled plasma emission analyzing instrument - Google Patents

Abstract

PURPOSE:To make possible the efficient correction of background with high accuracy by providing plural display image planes and displaying and comparing simultaneously the spectra of simulation and the spectra of actually measured data. CONSTITUTION:This analyzing instrument is constituted of a sample introducing part 1, an induction coupled plasma light emitting part 2, a spectroscope part 3, a storage device 4, an information inputter 5, a simulator 6, a calculator 7, a display part A8, a display part B9 and a recorder 10. The concn. of a sample and the wavelength for analysis are preliminarily inputted by the information inputter 5 and are stored into the simulator 6. The sample is then introduced from the introducing part 1 into the light emitting part 2 and the wavelength is scanned by the spectroscope 3. The spectral relation of each wavelength is stored into the storage device 4. The spectra of the simulation and the spectra of the actually measured data are displayed and compared superposedly respectively or one side on the display parts 8, 9. The quick correction of the background with a small amt. of the sample is made possible with the good accuracy.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to inductively coupled plasma optical emission spectrometry, and particularly to a background correction method for efficiently obtaining highly accurate analysis values.

[Background of the invention]

Inductively coupled plasma optical emission spectroscopy involves applying high-frequency waves to an inert gas to generate high-temperature plasma, and measuring the spectral intensity emitted by a sample introduced into the plasma. This analysis method basically targets samples in a solution state, and the sample is atomized and introduced into the plasma. The sample mist introduced into the high-temperature plasma is decomposed and excited to produce light emission of the elements. By taking the emitted light into a spectrometer and measuring the intensity of each spectrum, qualitative and quantitative analysis of each element becomes possible.

However, here, there are complex mixed components, and the spectrum of the generated elements becomes more complex as the number of complex elements increases, making it difficult to find a line to select for analysis. Therefore, the method of determining the base position of the spectrum and determining the original peak height from that position to determine the concentration, etc. is used. However, when determining the base position W (hereinafter referred to as background correction position), In advance, it is necessary to inhale the sample, measure it, write the spectrum, input the background correction position, and perform calculations. For this purpose, a sample quantity that can be measured in multiple quantities is required, making it difficult to apply to small quantities of samples.

Furthermore, although it is possible to obtain the spectrum pattern by inputting the concentration wavelength of each element using a simulator, this method cannot be used to calculate background correction positions and the like.

The method for display devices is to display the measured spectrum or multiple spectra on a single screen, or to reduce or expand the specified wavelength position or intensity, but the original shape remains unchanged. The method used was to save the data by outputting it to an external printer each time, and making decisions by comparing the outputted papers. In other words, it is not possible to use different procedures at the same time, it is not possible to display the enlarged or reduced part and the original form at the same time, and it is not possible to have multiple display screens.

[Purpose of the invention]

The object of the present invention is to provide a means for performing background correction in inductively coupled plasma optical emission spectroscopy efficiently and with high accuracy by combining a simulator and actual measurement data.

[Summary of the invention] The present invention uses a simulator to determine elements and wavelengths.

It specifies density, etc., and specifies and corrects an accurate background position from the resulting spectrum.

[Embodiments of the invention]

An embodiment of the present invention is shown in FIG. When performing background correction, it is necessary to know what kind of subekal pattern there is. For example, let's take the analysis of phosphorus in steel as an example. In a copper solution of 1100 pp, 1. ppm
When the sample is adjusted so as to contain the above components and introduced into the induced plasma light emitting section 2 by the sample introduction section, each component in the sample is excited and emits a wavelength spectrum unique to that component. The wavelengths are scanned by the spectroscope 3, and the spectral relationship of each wavelength is stored in the storage device 4. In advance, the copper concentration, the phosphorus concentration, and the wavelength for analysis are input using the information input device 5, and the line information stored in the simulator device 6 is displayed on either display section A9 or display section B. ,
After displaying the spectrum, the required background position and wavelength are set using the information input device 5. In this method, there is a cursor 12 in the display section that allows you to specify a wavelength, and its position can be changed using an information input device. FIG. 2 shows the state in which the setting position has been determined. Cursor 12-1
．． ．． The tangent line between 12-2 and 12-2.12-3, and the third
The figure shows the case where the copper concentration is 500 ppm. Similarly, when the phosphorus emission intensities at each tangent line between 12-4.12-6 and 12-5.1.2-6 are determined, a difference appears. Normally, unless the emission intensity is the same at each background correction position, there will be a difference in the required density. Therefore, as shown in FIG. 4, the background position is determined based on the spectrum pattern obtained from simulation. Furthermore, as shown in Fig. 5,
The commonly performed bank ground correction is A.
The line connecting both B contacts is determined by the strength S□ of the phosphorus peak position. However, the actual phosphorus strength is S 1+ 8
2, resulting in an error of 82 minutes. Similarly, the intensity S, +S2+S3 between the horizontal line B and the phosphorus peak also causes an error. Here, each spectrum is displayed in advance using a simulator as shown in Figure 4, and a function calculator is used to determine how they overlap, and then search for and specify the curve that determines the background position. . In actual sample measurements, the concentration is determined from the measured intensity based on this information.

Here, the two screens of display sections A and B display the simulated spectrum and the actually measured spectrum individually or superimposed on one side for comparison and confirmation.

As described above, as a means for ordinary analysis, a large amount of a small sample or a valuable sample cannot be consumed for checking. By confirming and specifying through simulation, a small amount of sample is required and rapid analysis is possible.

[Brief explanation of drawings]

Figure 1 is a detailed explanatory diagram of the present invention, Figures 2 and 3 are diagrams showing examples of phosphorus in steel, Figure 4 is a diagram showing simulated spectral patterns of copper and phosphorus, and Figure 5. is a diagram showing a method of background correction using copper and phosphorus spectral patterns. DESCRIPTION OF SYMBOLS 1... Sample introduction part, 2... Inductively coupled plasma light emitting part, 3... Spectrometer part, 4... Storage device, 5... Information input device, 6... Simulator device, 7.・Arithmetic unit,
8... Display section A, 9... Display section B, 10... Recorder, 12-1 to 6. Cursor position (background correction position).

Claims (1)

[Claims] 1. Inductive coupling characterized by having multiple display screens, simultaneously displaying simulated spectra and actually measured spectra, allowing individual enlargement/reduction, superimposition of them, and displaying the location of each part. Plasma emission spectrometer.