JPS6126526A - Burner for synthesizing porous quartz glass base material - Google Patents

Burner for synthesizing porous quartz glass base material

Info

Publication number
JPS6126526A
JPS6126526A JP14416784A JP14416784A JPS6126526A JP S6126526 A JPS6126526 A JP S6126526A JP 14416784 A JP14416784 A JP 14416784A JP 14416784 A JP14416784 A JP 14416784A JP S6126526 A JPS6126526 A JP S6126526A
Authority
JP
Japan
Prior art keywords
outlet
burner
base material
quartz glass
flowing out
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14416784A
Other languages
Japanese (ja)
Other versions
JPH0624987B2 (en
Inventor
Shigeyoshi Kobayashi
小林　重義
Masaaki Ikemura
政昭 池村
Susumu Yama
八馬　進
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP14416784A priority Critical patent/JPH0624987B2/en
Publication of JPS6126526A publication Critical patent/JPS6126526A/en
Publication of JPH0624987B2 publication Critical patent/JPH0624987B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/22—Inert gas details
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C03B2207/26—Multiple ports for glass precursor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

PURPOSE:To obtain a porous quartz glass base material having a large caliber, by using a large flame having a uniform temperature distribution in the radial direction formed by flowing out and burning a specific gas from the respective outlets of the burner formed by a concentric 11-fold multiple tubes. CONSTITUTION:A burner 5 is constituted of central outlets 21, 22 and 27 for dispersing and flowing out a silicon compound and a carrier gas, outlets 24, 25 and 31 for dispersing and flowing out O2, outlet 30 for dispersing and flowing out H2 respectively, and outlets 23, 26, 28 and 29 for flowing out N2 to form an air curtain. H2 an O2 are fed from gas cylinders 1 and 2 through flow controllers 3 and 4 into the above-mentioned burner 5 provided at a Pyrex reactor 9 to generate an oxyhydrogen flame. A silicon compound gas, e.g. SiCl4 or SiHCl3, is fed from a tank 6 through a pump 7 and a heat exchanger 8 thereinto and hydrolyzed by the oxyhydrogen flame to form fine SiO2 particles having 0.1-0.2mu average particle diameter. An inert gas, e.g. N2, as a carrier gas is then fed to stick the above-mentioned fine particles to a starting member 10 and grow the titled base material 11.

Description

【発明の詳細な説明】 「技術分野」 本発明は、気相反応合成法による多孔質石英ガラス母材
の合成用バーナに関し、特に大口径の多孔質石英ガラス
母材を合成するために適したノクーナに関する。[Detailed Description of the Invention] [Technical Field] The present invention relates to a burner for synthesizing porous quartz glass base material by a gas phase reaction synthesis method, and is particularly suitable for synthesizing a porous quartz glass base material with a large diameter. Regarding Nocuna.

「従来技術およびその問題点」 従来、石英ガラスを気相反応合成法によって製造する際
には、四塩化珪素等の珪素化合物を酸水素炎中で加水分
解し、出発部材上にシリカ微粒子を堆積させて多孔質石
英ガラス母材を生成させ、これを焼成することによって
行なわれていた。このようにして製造された合成石英ガ
ラスは低膨張性であり、光学特性に優れているため、デ
ィスプレー、各種レンズ、プリズム、半導体製造用炉心
管、ポート、ルツボ、あるいはフォトマスク用等の材料
として注目されている。"Prior art and its problems" Conventionally, when producing quartz glass by a gas phase reaction synthesis method, silicon compounds such as silicon tetrachloride are hydrolyzed in an oxyhydrogen flame, and silica fine particles are deposited on the starting material. This was done by creating a porous quartz glass matrix and firing it. Synthetic quartz glass manufactured in this way has low expansion and excellent optical properties, so it can be used as a material for displays, various lenses, prisms, semiconductor manufacturing furnace tubes, ports, crucibles, and photomasks. Attention has been paid.

ところで、上記のような気相反応合成法によって多孔質
石英ガラス母材を製造するには、多重管バーナが使用さ
れている。その−例を挙げると、中心部に四塩化珪素等
の珪素化合物およびキャリヤガスの流出口、その外周に
不活性ガスの流出口、さらにその外周に水素および酸素
のそれぞれの流出口が形成された４〜５重管のバーナが
用いられている。そして、外周部から流出する水素およ
び酸素によって酸水素炎を形成し、これに中心部から流
出する珪素化合物のガスを供給し、珪素化合物を酸水素
炎中で加水分解することによってシリカ微粒子を生成さ
せるようになっている。なお、不活性ガスはエアカーテ
ンを形成して火炎を整える役割をなす。By the way, a multi-tube burner is used to produce a porous quartz glass base material by the gas phase reaction synthesis method as described above. For example, an outlet for a silicon compound such as silicon tetrachloride and a carrier gas is formed at the center, an outlet for an inert gas is formed at the outer periphery, and an outlet for hydrogen and oxygen is formed at the outer periphery. Four to five tube burners are used. Hydrogen and oxygen flowing out from the outer periphery form an oxyhydrogen flame, and silicon compound gas flowing out from the center is supplied to this flame, and the silicon compound is hydrolyzed in the oxyhydrogen flame to generate silica fine particles. It is designed to let you do so. Note that the inert gas plays the role of forming an air curtain and regulating the flame.

しかしながら、上記のような従来の多重管／炙−すては
、径方向の温度分布が整った大きな火炎を形成すること
が難しいため、例えばフォトマスク基板に適した大口径
の多孔質石英カラス母材を形成することが困難であった
。However, it is difficult to form a large flame with a uniform temperature distribution in the radial direction using the conventional multi-tube/broiler method as described above. It was difficult to form the material.

「発明の目的」 本発明の目的は、径方向における温度分布が整った大き
な火炎が得られ、それによって大口径の多孔質石英カラ
ス母材を合成できるようにした多孔質石英ガラス母材合
成用バーナを提供することにある。``Object of the Invention'' The purpose of the present invention is to obtain a large flame with a uniform temperature distribution in the radial direction, and thereby to synthesize a porous quartz glass base material with a large diameter. The goal is to provide a burner.

「発明の構成」 本発明による多孔質石英ガラス母材合成用バーナは、中
心部に珪素化合物およびキャリヤガスの流出口、その外
周に不活性ガスの流出口、その外周に酸素の流出口、そ
の外周に不−活性ガスの流出口、その外周に珪素化合物
およびキャリヤガスの流出口、その外周に不活性ガスの
流出口、その外周に水素および酸素のそれぞれの流出口
が形成されている。これによって、珪素化合物、水素、
酸素をバーナ内に均一に導入することができ、径方向の
温度分布が整った火炎が得られ、大型の多孔質石英ガラ
ス母材を合成することができる。"Structure of the Invention" The burner for synthesizing a porous quartz glass base material according to the present invention has an outlet for a silicon compound and a carrier gas at the center, an outlet for an inert gas at the outer periphery, an outlet for oxygen at the outer periphery, and an outlet for an inert gas at the outer periphery. An inert gas outlet is formed on the outer periphery, an inert gas outlet is formed on the outer periphery, an inert gas outlet is formed on the outer periphery, and an outlet for hydrogen and oxygen is formed on the outer periphery. This allows silicon compounds, hydrogen,
Oxygen can be uniformly introduced into the burner, a flame with uniform radial temperature distribution can be obtained, and a large porous quartz glass base material can be synthesized.

「発明の実施例」 第２図には本発明が適用される多孔質石英ガラス母材の
製造装置が示されている。ポンベｌおよびポンベ２から
水素および酸素がフローコントローラ３．４を通して多
重管構造のバーナ５に供給され、酸水素炎を発生させる
。そして、四塩化珪素、トリクロロシラン、四臭化珪素
等の珪素化合物のカスが、タンク６からポンプ７により
熱交換器８を通してバーナ５に供給され、酸水素炎中に
導入されて加水分解され、平均粒径約０．１〜０．２用
程度の５ｉ０２の微粒子が生成される。なお、図示して
ないが、窒素、アルゴンなどの不活性ガスもバーナ５に
供給され、これらは珪素化合物のキャリヤガスとして、
あるいは酸水素炎中のエアーカーテンとして利用される
。この加水分解反応を珪素化合物が四塩化珪素である場
合について化学式で示すと次のようになる。Embodiments of the Invention FIG. 2 shows an apparatus for manufacturing a porous quartz glass base material to which the present invention is applied. Hydrogen and oxygen are supplied from the bombe I and the bombe 2 through the flow controller 3.4 to the multi-tube structure burner 5 to generate an oxyhydrogen flame. Then, the residue of silicon compounds such as silicon tetrachloride, trichlorosilane, and silicon tetrabromide is supplied from the tank 6 by the pump 7 to the burner 5 through the heat exchanger 8, and introduced into the oxyhydrogen flame to be hydrolyzed. Fine particles of 5i02 with an average particle size of about 0.1 to 0.2 are produced. Although not shown, inert gases such as nitrogen and argon are also supplied to the burner 5, and these serve as carrier gases for silicon compounds.
Alternatively, it can be used as an air curtain in an oxyhydrogen flame. The chemical formula for this hydrolysis reaction when the silicon compound is silicon tetrachloride is as follows.

５ｉＣ１４＋２Ｈ２０→５ｉ０２　＋　４）１ｃＩそし
て、この５ｉＱ２微粒子はパイレックス製の反応器９中
の石英からなる回転する出発部材１０に付着し、順次成
長して多孔質石英ガラス母材！１が形成される。この際
に発生するＩ（ＣＩはＮａｆｌＨ液の貯槽１２から循環
されるＮａＯＨ液と洗浄塔１３で同波接触して吸収除去
される。5iC14+2H20→5i02 + 4) 1cI Then, these 5iQ2 fine particles adhere to a rotating starting member 10 made of quartz in a Pyrex reactor 9, and sequentially grow to form a porous quartz glass matrix! 1 is formed. The I (CI) generated at this time comes into contact with the NaOH solution circulated from the NaflH solution storage tank 12 in the cleaning tower 13 and is absorbed and removed.

第１図には本発明の一実施例である多孔質石英カラス母
材合成用／ヘーナ５が示されている。この゛　バーナ５
は同心円的に形成された１１重の多重管となっており、
今その中心部から第１管、第２管、第３管、第４管、・
・・第１１管とする。中心の第１管は珪素化合物とキャ
リヤガスとの流出口２１を形成する。この実施例におい
ては、珪素化合物として四塩化珪素、キャリヤガスとし
て水素が用いられている。第２管は同じく珪素化合物と
キャリヤガスとの流出口２２を形成する。なお、この流
出口２２は場合によっては設けなくてもよい。第３管は
窒素、アルゴン等の不活性ガスの流出口２３を形成する
。この実施例では不活性カスとして窒素が用いられてい
る。第４管は酸素の流出口２４を形成する。第５管は同
しく酸素の流出口２５を形成する。なお、この流出口２
５は場合によっては設けなくてもよい。第６管は不活性
ガスの流出口２６を形成する。第７管は珪素化合物とキ
ャリヤガスとの流出口２７を形成する。第８管は不活性
ガスの流出口２８を形成する。第８管は同じく不活性ガ
スの流出口２９を形成する。なお、この流出口２９は設
けなくてもよい。第１θ管は水素の流出口３０を形成す
る。最後に第１１管は酸素の流出口３１を形成する。な
お、流出口３０が酸素の流出口をなし、流出口３１が水
素の流出口をなすようにしてもよい。FIG. 1 shows a porous quartz glass base material synthesis/Hena 5 which is an embodiment of the present invention. This゛ Burner 5
has 11 multi-tubes formed concentrically,
Now from the center, the first pipe, second pipe, third pipe, fourth pipe, etc.
...It will be the 11th tube. The central first tube forms an outlet 21 for the silicon compound and the carrier gas. In this embodiment, silicon tetrachloride is used as the silicon compound and hydrogen is used as the carrier gas. The second tube likewise forms an outlet 22 for the silicon compound and the carrier gas. Note that this outlet 22 may not be provided depending on the case. The third tube forms an outlet 23 for an inert gas such as nitrogen or argon. In this embodiment, nitrogen is used as the inert gas. The fourth tube forms an oxygen outlet 24 . The fifth tube likewise forms an oxygen outlet 25 . In addition, this outlet 2
5 may not be provided depending on the case. The sixth tube forms an inert gas outlet 26. The seventh tube forms an outlet 27 for the silicon compound and the carrier gas. The eighth tube forms an inert gas outlet 28. The eighth pipe also forms an inert gas outlet 29. Note that this outlet 29 may not be provided. The first θ tube forms a hydrogen outlet 30 . Finally, the eleventh tube forms an oxygen outlet 31. Note that the outlet 30 may serve as an oxygen outlet, and the outlet 31 may serve as a hydrogen outlet.

このように本発明では、バーナ５が１１重の多重管で構
成されている。そして、珪素化合物およびキャリヤガス
は流出口２１（第１管）、流出口２２（第２管）および
流出口２７（第７管）から分散して流出する。また、酸
素は流出口２４（第４管）、流出口２５（第５管）およ
び流出口３１（第１１管）から分散して流出する。さら
に、水素は流出口３０（第１θ管）から流出する。そし
て、不活性ガスは流出口２３（第３管）、流出口２６（
第６管）、流出口２８（第８管）および流出口２９（第
９管）から流出してエアカーテンを形成する。その結果
、径方向の温度分布が均一で整った火炎が得られ、ノズ
ルの閉塞をおこすことなく、フォトマスク基板等に適し
た大型の多孔質石英ガラス母材を製造することができる
。また、珪素化合物のキャリヤガスとして水素を用いれ
ば、より高温の火炎が得られ、５ｉＱ２微粒子の合成速
度が速まり、出発部材１０への５ｉＱ２微粒子の付着効
率も高まるので、多孔質石英カラス母材の収率をさらに
向上させることができる。As described above, in the present invention, the burner 5 is composed of 11 multi-tubes. The silicon compound and the carrier gas then flow out in a dispersed manner through the outlet 21 (first pipe), the outlet 22 (second pipe), and the outlet 27 (seventh pipe). Further, oxygen flows out in a dispersed manner from the outlet 24 (fourth pipe), the outlet 25 (fifth pipe), and the outlet 31 (eleventh pipe). Furthermore, hydrogen flows out from the outlet 30 (first θ pipe). Then, the inert gas flows through the outlet 23 (third pipe) and the outlet 26 (
(6th pipe), outflow port 28 (8th pipe), and outflow port 29 (9th pipe) to form an air curtain. As a result, a flame with a uniform radial temperature distribution is obtained, and a large porous quartz glass base material suitable for photomask substrates and the like can be manufactured without clogging the nozzle. Furthermore, if hydrogen is used as a carrier gas for the silicon compound, a higher temperature flame can be obtained, the synthesis rate of 5iQ2 fine particles will be accelerated, and the adhesion efficiency of 5iQ2 fine particles to the starting member 10 will also be increased, so the porous quartz glass base material The yield can be further improved.

「発明の効果」 以上説明したように１本発明によれば、珪素化合物、酸
素および水素をバーナに均一に導入して径方向の温度分
布が整った火炎が得られ、ノズルの閉塞をおこすことな
く、大型の多孔質石英ガラス母材を製造することができ
る。"Effects of the Invention" As explained above, according to the present invention, a silicon compound, oxygen, and hydrogen are uniformly introduced into the burner to obtain a flame with a uniform temperature distribution in the radial direction, which prevents nozzle clogging. It is possible to produce a large-sized porous quartz glass base material.

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本発明による多孔質石英ガラス母材合成用バー
ナの実施例を示す斜視図、第２図は同バーナが適用され
た多孔質石英ガラス母材の製造装置を示す概略説明図で
ある。 図中、５は多重管バーナ、１０は出発部材、１１は多孔
質石英ガラス母材、２１および２２は珪素化合物のガス
およびキャリヤガスの流出口、２３は不活性ガスの流出
口、２４および２５は酸素の流出口、２Ｂは不活性ガス
の流出口、２７は珪素化合物およびギヤリヤガスの流出
口、２８および２９は不活性′ガスの流出口、３０は水
素の流出口、３１は酸素の流出口である。FIG. 1 is a perspective view showing an embodiment of a burner for synthesizing a porous quartz glass base material according to the present invention, and FIG. 2 is a schematic explanatory diagram showing an apparatus for manufacturing a porous quartz glass base material to which the burner is applied. . In the figure, 5 is a multi-tube burner, 10 is a starting member, 11 is a porous quartz glass base material, 21 and 22 are silicon compound gas and carrier gas outlet ports, 23 is an inert gas outlet port, 24 and 25 is an oxygen outlet, 2B is an inert gas outlet, 27 is a silicon compound and gear gas outlet, 28 and 29 are inert gas outlets, 30 is a hydrogen outlet, and 31 is an oxygen outlet. It is.

Claims (2)

【特許請求の範囲】[Claims] （１）酸水素炎中にて珪素化合物を加水分解してシリカ
微粒子を生成し、これを出発部材に付着せしめて多孔質
石英ガラス母材を合成する多重管バーナにおいて、中心
部に珪素化合物およびキャリヤガスの流出口、その外周
に不活性ガスの流出口、その外周に酸素の流出口、その
外周に不活性ガスの流出口、その外周に珪素化合物およ
びキャリヤガスの流出口、その外周に不活性ガスの流出
口、その外周に水素および酸素のそれぞれの流出口が形
成されていることを特徴とする多孔質石英ガラス母材合
成用バーナ。(1) In a multi-tube burner that hydrolyzes a silicon compound in an oxyhydrogen flame to produce silica fine particles and adheres them to a starting member to synthesize a porous quartz glass base material, silicon compounds and A carrier gas outlet, an inert gas outlet on its outer periphery, an oxygen outlet on its outer periphery, an inert gas outlet on its outer periphery, a silicon compound and carrier gas outlet on its outer periphery, and an inert gas outlet on its outer periphery. A burner for synthesizing a porous quartz glass base material, characterized in that an active gas outlet and hydrogen and oxygen outlet outlets are formed on the outer periphery of the outlet. （２）特許請求の範囲第１項において、前記キャリヤガ
スは水素である多孔質石英ガラス母材合成用バーナ。(2) A burner for synthesizing a porous quartz glass base material according to claim 1, wherein the carrier gas is hydrogen.
JP14416784A 1984-07-13 1984-07-13 Burner for synthesizing porous quartz glass base material Expired - Fee Related JPH0624987B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14416784A JPH0624987B2 (en) 1984-07-13 1984-07-13 Burner for synthesizing porous quartz glass base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14416784A JPH0624987B2 (en) 1984-07-13 1984-07-13 Burner for synthesizing porous quartz glass base material

Publications (2)

Publication Number Publication Date
JPS6126526A true JPS6126526A (en) 1986-02-05
JPH0624987B2 JPH0624987B2 (en) 1994-04-06

Family

ID=15355755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14416784A Expired - Fee Related JPH0624987B2 (en) 1984-07-13 1984-07-13 Burner for synthesizing porous quartz glass base material

Country Status (1)

Country Link
JP (1) JPH0624987B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04270130A (en) * 1990-08-16 1992-09-25 Corning Inc Method for manufacture of non-porous body of highly pure fused silica glass
EP0978487A2 (en) * 1998-08-07 2000-02-09 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
EP2098489A1 (en) * 2008-02-27 2009-09-09 Shin-Etsu Chemical Co., Ltd. Method of fabricating an optical fiber preform and a burner therefor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04270130A (en) * 1990-08-16 1992-09-25 Corning Inc Method for manufacture of non-porous body of highly pure fused silica glass
USRE39535E1 (en) 1990-08-16 2007-04-03 Corning Incorporated Method of making fused silica by decomposing siloxanes
EP0978487A2 (en) * 1998-08-07 2000-02-09 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
EP0978487A3 (en) * 1998-08-07 2001-02-21 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
EP2098489A1 (en) * 2008-02-27 2009-09-09 Shin-Etsu Chemical Co., Ltd. Method of fabricating an optical fiber preform and a burner therefor
CN103922578A (en) * 2008-02-27 2014-07-16 信越化学工业株式会社 Method of fabricating an optical fiber preform and a burner therefor
US9260339B2 (en) 2008-02-27 2016-02-16 Shin-Etsu Chemical Co., Ltd. Method of fabricating an optical fiber preform and a burner therefor

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