JPS61264624A - Impregnated type cathode - Google Patents
Impregnated type cathodeInfo
- Publication number
- JPS61264624A JPS61264624A JP60105839A JP10583985A JPS61264624A JP S61264624 A JPS61264624 A JP S61264624A JP 60105839 A JP60105839 A JP 60105839A JP 10583985 A JP10583985 A JP 10583985A JP S61264624 A JPS61264624 A JP S61264624A
- Authority
- JP
- Japan
- Prior art keywords
- electron emission
- mainly composed
- cathode
- impregnated
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
- H01J1/28—Dispenser-type cathodes, e.g. L-cathode
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は高電流密度カソードとして電子管等に用いられ
る含浸形カソードに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to an impregnated cathode used as a high current density cathode in an electron tube or the like.
従来この種の含浸形カソードは、タ/ゲステン局、モリ
ブデンG M o )等の高融点金属からなる多孔質性
の基体に、Ba−Caアルミネート等の電子放射物質を
含浸させて構成されるが、さらに電子放出特性を向上さ
せるために、カソード表面に主として貴金属からなる薄
膜を付着させる場合があシ、このような電子放出特性の
向上に有効な材料としてオスミウム(Oa)、イリジウ
ム(Ir)、ルテニウム(Ru)、レニウム(R・)な
どが知られている(バキューム第3巻第718頁(Va
cuum。Conventionally, this type of impregnated cathode is constructed by impregnating a porous substrate made of a high-melting point metal such as Ta/Gesten, Molybdenum GMo) with an electron-emitting substance such as Ba-Ca aluminate. However, in order to further improve the electron emission characteristics, a thin film mainly made of noble metals is sometimes attached to the cathode surface, and osmium (Oa) and iridium (Ir) are effective materials for improving such electron emission characteristics. , ruthenium (Ru), rhenium (R.), etc. (Vacuum Vol. 3, p. 718 (Va)
Cuum.
Vol、3(1983)、p718))。Vol. 3 (1983), p718)).
これらの薄膜は、カソードの動作中に下地金属基体材料
と徐々に合金化して失われ、それに伴って電子放出特性
も劣化する。These thin films are gradually alloyed and lost with the underlying metal substrate material during operation of the cathode, with concomitant deterioration of electron emission properties.
したがって、良好な電子放出特性を長時間維持させるた
めには薄膜を十分厚く形成しておく必要がある。ところ
が、このように薄膜の膜厚を大きくすると、一般にその
電子放出特性を向上させる効果は低下し、著しい場合に
はむしろ薄膜を形成しないものより低下することもある
。Therefore, in order to maintain good electron emission characteristics for a long time, it is necessary to form a thin film sufficiently thick. However, when the thickness of the thin film is increased in this manner, the effect of improving the electron emission characteristics generally decreases, and in some cases, the effect of improving the electron emission characteristics may be even worse than that of a case where no thin film is formed.
したがって本発明の目的は、長時間にわたって良好な電
子放出特性が得られる含浸形カソードを提供することに
ある。Therefore, an object of the present invention is to provide an impregnated cathode that provides good electron emission characteristics over a long period of time.
このために本発明は、カソード材料表面に付着させる被
膜を、Oas I r−、Rus Re の少なくと
も一種またはそれらを主体とする合金と、アルミナ(A
t20g )、イツトリア(YxOs)、スカンジウム
・オキサイド(Sagos)の少なくとも一種またはそ
れらを主体とする化合物との混合物を主成分として構成
したものである。For this purpose, the present invention provides a coating film to be attached to the surface of the cathode material, which is composed of at least one of Oas Ir-, Rus Re, or an alloy mainly composed of them, and alumina (A
t20g), yttria (YxOs), and scandium oxide (Sagos), or a mixture thereof with a compound mainly composed of them.
図は本発明の一実施例を示す断面図である。同図におい
て、1はカソード材料としてのベレットである。このベ
レット1は、空孔率20−25%の多孔質W基体11か
ら構成され、空孔12中にはBa−Ca アルミネート
が含浸されている。そしてこのベレット1はタンタル(
T1)カップ2に装着され、さらにとのTaスリーブ3
にレーザ溶接によシ固定配置されている。The figure is a sectional view showing one embodiment of the present invention. In the figure, 1 is a pellet serving as a cathode material. This pellet 1 is composed of a porous W substrate 11 with a porosity of 20-25%, and the pores 12 are impregnated with Ba--Ca aluminate. And this Beret 1 is tantalum (
T1) Attached to cup 2 and further attached to Ta sleeve 3
It is fixed by laser welding.
ここで、ベレット1の上には約4wt%の弯o3を含む
Os −Atx Os膜4が、スパッタリングによシ約
800OAの厚さに形成されている。そしてこのベレッ
ト1は、W芯線51をアルミナ被膜52で被覆してなる
ヒータ5によって加熱される。Here, on the pellet 1, an Os-Atx Os film 4 containing about 4 wt% of curvature O3 is formed to a thickness of about 800 OA by sputtering. The pellet 1 is heated by a heater 5 made of a W core wire 51 coated with an alumina film 52.
このような構成を有するカソードを用い、カソード・ア
ノード2極管方式でアノードに幅約5μ蓼、周波数1o
oazの高圧パルスを印加して飽和電流密度を測定し之
。Using a cathode with such a configuration, the anode has a width of approximately 5μ and a frequency of 1o using a cathode-anode diode system.
A high voltage pulse of oaz was applied and the saturation current density was measured.
その結果、本実施例のカソードの電子放出特性はAt雪
03を含まないOs膜を400OAの厚さに付着させた
カソードと同等ないしは1.2倍程度であシ、同様にh
txo*を含まないOs膜を600OAの厚さに付着さ
せたカソードの約1.5倍ないしはそれ以上であった。As a result, the electron emission characteristics of the cathode of this example were the same as or about 1.2 times that of the cathode in which the Os film without At snow 03 was deposited to a thickness of 400 OA.
The thickness was about 1.5 times or more than that of a cathode on which a txo*-free Os film was deposited to a thickness of 600 OA.
以上ALsOs ’に含むOs膜を付着した例について
説明したが、0畠の代夛に従来同様の目的で使用されて
いるIr、Ru、Reを用いてもよいし、あるいはこれ
らを主体とする合金、例えばOs −Ru、Os −I
r、0s−W等を用いてもよい。また、酸化防止のため
に表面t−Irで覆ったOsも用いられる。一方、A4
0sの代シに、Y!03.5c20s、hるいはこれら
を主体とする化合物を用いても同様の結果が得られる。Although the example in which the Os film contained in ALsOs' is attached has been described above, Ir, Ru, and Re, which are conventionally used for the same purpose, may be used as substitutes for Obata, or alloys mainly composed of these may be used. , e.g. Os-Ru, Os-I
r, 0s-W, etc. may also be used. Further, Os whose surface is covered with t-Ir is also used to prevent oxidation. On the other hand, A4
Y for 0s! Similar results can be obtained by using 03.5c20s, h, or a compound mainly composed of these.
なお、金属、すなわちAt% Y% Sc の状態で膜
を形成し、その後酸化物としたものでもよい。また、こ
れらは電子放出特性を十分に向上させるために0.1w
t*以上入れることが望ましく、また抵抗値の上昇を抑
えるために20vrt%程度以下とすることが望ましい
。Note that a film may be formed in a metal state, that is, At% Y% Sc, and then converted into an oxide. In addition, in order to sufficiently improve the electron emission characteristics, these
It is desirable to set it at t* or more, and it is also desirable to set it at about 20 vrt% or less to suppress the increase in resistance value.
さらに、このような被膜の厚さは、必要な寿命によって
異なるが、厚すぎるとコストが上昇するとともに活性化
に時間がかかることもあシ、2pIn程度以下が望まし
い。Further, the thickness of such a coating varies depending on the required life span, but if it is too thick, the cost will increase and activation will take time, so it is preferably about 2 pIn or less.
以上説明したように、本発明によれば、カソード材料表
面に付着させる電子放出特性向上用の被膜にアルミナ、
イツトリア、スカンジウム・オキサイドの少なくとも一
種またはそれらを主体とする化合物を加えたことによシ
、油該被膜を、その電子放出特性向上の効果を落とすこ
となく厚くすることができる。このため、良好な電子放
出特性を長時間にわたり安定して維持できる。As explained above, according to the present invention, alumina is added to the coating for improving electron emission characteristics that is attached to the surface of the cathode material.
By adding at least one of yttoria and scandium oxide, or a compound based on them, the oil coating can be made thicker without reducing its effect of improving electron emission properties. Therefore, good electron emission characteristics can be stably maintained over a long period of time.
図は本発明の一実施例を示す断面図である。
1・・−・六ソードペレット、411・il @ OB
−A 40s膜、11・・・・多孔質W基体、12・
・Φ・空孔。
、・・′−・、The figure is a sectional view showing one embodiment of the present invention. 1...Six Sword Pellet, 411・il @ OB
-A 40s membrane, 11... Porous W substrate, 12...
・Φ・Vacancy. ,・・′−・,
Claims (1)
浸させた含浸形カソードにおいて、表面に、オスミウム
、イリジウム、ルテニウム、レニウムの少なくとも1種
またはそれらを主体とする合金と、アルミナ、イツトリ
ア、スカンジウム・オキサイドの少なくとも1種または
それらを主体とする化合物との混合物を主成分とする被
膜を付着させたことを特徴とする含浸形カソード。In an impregnated cathode in which a porous base made of a high-melting point metal is impregnated with an electron-emitting substance, the surface is coated with at least one of osmium, iridium, ruthenium, and rhenium, or an alloy mainly composed of them, and alumina, yttria, 1. An impregnated cathode characterized by being coated with a coating mainly composed of at least one type of scandium oxide or a mixture with a compound mainly composed of scandium oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60105839A JPS61264624A (en) | 1985-05-20 | 1985-05-20 | Impregnated type cathode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60105839A JPS61264624A (en) | 1985-05-20 | 1985-05-20 | Impregnated type cathode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61264624A true JPS61264624A (en) | 1986-11-22 |
Family
ID=14418192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60105839A Pending JPS61264624A (en) | 1985-05-20 | 1985-05-20 | Impregnated type cathode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61264624A (en) |
-
1985
- 1985-05-20 JP JP60105839A patent/JPS61264624A/en active Pending
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