JPS6125125A - Liquid crystal display element - Google Patents

Liquid crystal display element

Info

Publication number
JPS6125125A
JPS6125125A JP14658584A JP14658584A JPS6125125A JP S6125125 A JPS6125125 A JP S6125125A JP 14658584 A JP14658584 A JP 14658584A JP 14658584 A JP14658584 A JP 14658584A JP S6125125 A JPS6125125 A JP S6125125A
Authority
JP
Japan
Prior art keywords
electrode
transparent
electrodes
metal
metal electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14658584A
Other languages
Japanese (ja)
Inventor
Shoichiro Takahara
高原 晶一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP14658584A priority Critical patent/JPS6125125A/en
Publication of JPS6125125A publication Critical patent/JPS6125125A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/13439Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making

Abstract

PURPOSE:To easily align edges of electrodes and to improve a display image by laminating a metallic electrode and a transparent electrode on a substrate in three-layer structure, and forming those transparent electrode and metallic electrode of this three-layer structure with a pattern at a time. CONSTITUTION:Transparent electrodes 2 forming picture elements are arrayed on the transparent substrate 1 and connected by metallic electrodes 3 in three- layer structure at a time by employing pattern formation. Thus, the metallic electrodes 3 and transparent electrodes 2 are formed in sandwich structure with the pattern at a time to easily align their edges, thereby improving the display image. The restrictions of the material of the metallic electrodes depending upon the reaction between the liquid crystal and the metallic electrodes 3 and the adhesive strength of the metallic electrodes 3 to the substrate are eliminated and almost all kinds of metal having good conductivity are usable. Further, metallic wiring resistance is small, which is preferable.

Description

【発明の詳細な説明】 く技術分野〉 本発明は液晶テレビジョン等に用いられる液晶表示素子
に関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a liquid crystal display element used in liquid crystal televisions and the like.

〈従来技術〉 第5図と第6図は、液晶表示素子において低抵抗膜を達
成するためのメタル配線による電極パターンを示す。
<Prior Art> FIGS. 5 and 6 show electrode patterns using metal wiring for achieving a low resistance film in a liquid crystal display element.

ガラス基板1上に、画素を形成する透明電極2が配列さ
れるとともに、それぞれの透明電極2を接続するメタル
電極3が形成される。メタル電極3は、透明電極2の端
部2aに20〜50μの幅で形成される。メタル電極3
の幅は、液晶表示素子の表示イメージを損なわないよう
に、且つ、メタル配線の電気抵抗を小さくするように選
定される。
Transparent electrodes 2 forming pixels are arranged on a glass substrate 1, and metal electrodes 3 connecting the respective transparent electrodes 2 are formed. The metal electrode 3 is formed on the end portion 2a of the transparent electrode 2 with a width of 20 to 50 μm. Metal electrode 3
The width is selected so as not to impair the display image of the liquid crystal display element and to reduce the electrical resistance of the metal wiring.

上述の電極パターンの形成方法について説明する。A method for forming the above-mentioned electrode pattern will be explained.

先ず、ガラス基板1の上にメタルを全面に形成し、フォ
トエツチングによりメタル電極3のパターンを形成する
か、あるいは、リフトオフ法により、先にフォトレジス
ト膜をパターン化し、その上からメタルを形成してフォ
トレジスト膜を取り除くことにより、メタル電極3のパ
ターンを形成する。その後、透明電極2をスパッタ法ま
たは電子線加熱型電子衝撃法により全面に形成し、フォ
トエツチングにより透明電極2のパターンを形成する。
First, metal is formed on the entire surface of the glass substrate 1, and a pattern of the metal electrode 3 is formed by photoetching, or a photoresist film is first patterned by a lift-off method, and then metal is formed on it. By removing the photoresist film, a pattern of the metal electrode 3 is formed. Thereafter, a transparent electrode 2 is formed on the entire surface by a sputtering method or an electron beam heating type electron impact method, and a pattern of the transparent electrode 2 is formed by photoetching.

しかるに、上述の方法では、メタル電極3のバターンと
透明電極2のパターンを個別に形成するため、メタル電
極3と透明電極2の端縁を一致させることが難しく、第
7図と第8図に示すようなパターンずれが生じる。第7
図(イ)と第8図(イ)では、メタル電極3が透明電極
2の端部より内側に入っているので、画素領域が分割さ
れた形となり、画素のサイズが小さくなるという欠点が
ある。
However, in the above method, since the pattern of the metal electrode 3 and the pattern of the transparent electrode 2 are formed separately, it is difficult to match the edges of the metal electrode 3 and the transparent electrode 2. A pattern shift as shown occurs. 7th
In Figures (a) and 8(a), the metal electrode 3 is located inside the edge of the transparent electrode 2, so the pixel area is divided, which has the disadvantage of reducing the size of the pixel. .

第7図(ロ)と第8図(ロ)は適正な場合である。Figures 7 (b) and 8 (b) are appropriate cases.

第7図(ハ)と第8図(ハ)は、メタル電極3が透明電
極2の端部より外側へ出ており、画素今イズの変形はあ
るが、分割されていないので表示には余り影響がないが
、メタルの材質によっては液晶との反応が生じるという
問題点がある。したがって、メタル電極と透明電極との
端縁を一致させる必要があるが、従来ではこのための煩
雑な工程を要していた。
In Figures 7 (c) and 8 (c), the metal electrode 3 protrudes outward from the edge of the transparent electrode 2, and there is a deformation of the pixel size, but since it is not divided, it is not visible in the display. Although there is no effect, there is a problem that depending on the material of the metal, a reaction may occur with the liquid crystal. Therefore, it is necessary to match the edges of the metal electrode and the transparent electrode, but this conventionally required a complicated process.

また、上述の方法では、メタル電極3がガラス基板1へ
直接に形成されるため、メタル電極3の材質がガラスと
密着性の悪い金属であれば、長時間の使用中にメタル電
極が徐々に剥離し、引出し抵抗値が変化してくる。した
がって、メタル電極3のガラろ基板1と接する側へガラ
スとの密着性の良い金属を形成するか、あるいは、メタ
ル電極3の全体をガラスとの密着性の良い金属で形成す
る必要があった。一般には、メタル電極3の下層にはガ
ラスと密着性の良いCr2上層にはALIを形成するか
、あるいは、メタル電極3の全体をNi−Cr合金で形
成する。しかるに、CrとAuを重ねる場合には、密着
性と電気伝導性は問題がないが、コストが高くなり、ま
た、全体をNi−Cr合金とする場合には、電気伝導性
が悪く、引出し抵抗値が大きいという問題点があった。
In addition, in the method described above, since the metal electrode 3 is formed directly on the glass substrate 1, if the material of the metal electrode 3 is a metal that has poor adhesion to glass, the metal electrode will gradually be formed during long-term use. It peels off and the pull-out resistance value changes. Therefore, it was necessary to form a metal with good adhesion to glass on the side of the metal electrode 3 in contact with the galley substrate 1, or to form the entire metal electrode 3 from a metal with good adhesion to glass. . Generally, the lower layer of the metal electrode 3 is Cr2, which has good adhesion to glass, and the upper layer is ALI, or the entire metal electrode 3 is formed of a Ni--Cr alloy. However, when stacking Cr and Au, there is no problem with adhesion and electrical conductivity, but the cost increases, and when the whole is made of Ni-Cr alloy, the electrical conductivity is poor and the drawing resistance is low. There was a problem that the value was large.

第1表は各種の金属のガラスに対する密着性を示す。Table 1 shows the adhesion of various metals to glass.

第  1  表 ◎:非常に強い、○:強い、△:劣る。×:弱い以上の
ように、従来においては、メタル電極と透明電極のパタ
ーン形成をそれぞれ個別に行なうことによるパターン端
縁部の不揃い、及びガラス基板への密着性と電気伝導性
からくるメタル電極の材質の制約という問題点があった
Table 1 ◎: Very strong, ○: Strong, △: Inferior. ×: Weak As mentioned above, in the past, the patterns of the metal electrode and transparent electrode were formed separately, resulting in irregularities in the pattern edges, and due to the adhesion and electrical conductivity of the metal electrode to the glass substrate. There was a problem with material limitations.

〈発明の目的〉 本発明は上記事情に鑑みてなされたものであり、その目
的は、メタル電極を透明電極ではさむ構造にして、この
3層の電極のパターン形成を一度で行なえるようにした
液晶表示素子を提供することである。
<Object of the invention> The present invention was made in view of the above circumstances, and its object is to create a structure in which a metal electrode is sandwiched between transparent electrodes, so that pattern formation of three layers of electrodes can be performed at one time. An object of the present invention is to provide a liquid crystal display element.

〈発明の構成〉 本発明においては、透明の基板上に画素を形成する複数
の透明電極を配列するとともに、各透明電極をメタル電
極により接続して形成した液晶表示素子において、上記
基板上で、透明電極がメタル電極を上下にはさんだ3層
構造を有し、この3層構造の透明電極とメタル電極とを
一度にパターン形成したことを特徴とする。
<Structure of the Invention> In the present invention, in a liquid crystal display element formed by arranging a plurality of transparent electrodes forming pixels on a transparent substrate and connecting each transparent electrode with a metal electrode, on the substrate, The transparent electrode has a three-layer structure in which metal electrodes are sandwiched between upper and lower sides, and the transparent electrode and metal electrode of this three-layer structure are characterized in that they are patterned at the same time.

〈実施例〉 以下、本発明の一実施例を説明する。<Example> An embodiment of the present invention will be described below.

第1図と第2図は液晶表示素子の構成を示す。1 and 2 show the structure of a liquid crystal display element.

ガラス等の透明な基板1上に、画素を形成する透明電極
2が複数配列されるとともに、それぞれの透明電極2を
接続するメタル電極3が形成される。メタル電極3は、
透明電極2の端部2aにおいて、透明電極2の上N2b
と下層2Cにより上下にはさまれて形成される。すなわ
ち、透明電極2b、メタル電極3.透明電極2Cの3層
構造に形成され、したがって、メタル電極3は基板1上
に透明電極2Cを介して形成される。
A plurality of transparent electrodes 2 forming pixels are arranged on a transparent substrate 1 made of glass or the like, and metal electrodes 3 connecting the respective transparent electrodes 2 are formed. The metal electrode 3 is
At the end 2a of the transparent electrode 2, the top N2b of the transparent electrode 2
and the lower layer 2C are sandwiched between the upper and lower layers. That is, transparent electrode 2b, metal electrode 3. The transparent electrode 2C is formed in a three-layer structure, and therefore the metal electrode 3 is formed on the substrate 1 via the transparent electrode 2C.

第3し1と第4図は液晶表示素子の製造過程の状態を示
す。
Figures 3 and 4 show the state of the manufacturing process of a liquid crystal display element.

第3図(イ)と第4図(イ)に示すように、先ず、基板
l上の全面に透明電極2 c /を形成し、次に、この
透明電極20′の上にメタル電極3′をパターン形成す
る。このメタル電極3′のパターン形成の方法としては
、フォトエツチングあるいはリフトオフ法による。この
場合、破線で示す完成時の透明電極2のパターンに対し
て、メタル電極3′が透明電極2の端部2aと重なると
ともに隣り合う透明電極2,2の間隙Aに部分的に重な
るように、メタル電極3′のパターンを形成する。一般
に、透明電極2,2間の間隙Aは40〜50μの幅があ
り、また、メタル電極3′の透明電極2と重なる部分の
幅は電気抵抗のみから考慮すればよいので、メタル電極
3′の位置決めは高精度に行なう必要はない。
As shown in FIG. 3(a) and FIG. 4(a), first, a transparent electrode 2c/ is formed on the entire surface of the substrate l, and then a metal electrode 3' is formed on this transparent electrode 20'. form a pattern. The metal electrode 3' is patterned by photo-etching or lift-off. In this case, with respect to the pattern of the completed transparent electrode 2 shown by the broken line, the metal electrode 3' overlaps the end 2a of the transparent electrode 2 and partially overlaps the gap A between the adjacent transparent electrodes 2, 2. , a pattern of metal electrode 3' is formed. Generally, the gap A between the transparent electrodes 2, 2 has a width of 40 to 50 μm, and the width of the portion of the metal electrode 3' that overlaps with the transparent electrode 2 can be considered only from the electrical resistance. It is not necessary to perform positioning with high precision.

次に、上述の透明電極20′とメタル電極3′の上に透
明電極2b’を全面形成する。その後、透明電極2b’
、2c’及びメタル電極3′を一度にパターン形成し、
第3図(ロ)、第4図(ロ)に示すように、画素を形成
する透明電極2及びメタル電極3を基板1上に形成する
。このパターン形成の方法としては、湿式のフォトエツ
チング法が好ましい。そして、メタル電極が透明電極で
はさまれているため、透明電極がケミカルエツチングさ
れるときにメタル電極の上方と下方からエツチングが進
行し、メタル電極の不要部分が除去されてパターンが形
成される。この場合、透明電極2b、2cとメタル電極
3が同時にエツチングによりパターン形成されるので、
画素の端縁部eにおいて、透明電極2b、2cとメタル
電極3とはそれぞれの端縁が一致する。
Next, a transparent electrode 2b' is formed on the entire surface of the transparent electrode 20' and metal electrode 3'. After that, the transparent electrode 2b'
, 2c' and metal electrode 3' are patterned at once,
As shown in FIGS. 3(b) and 4(b), transparent electrodes 2 and metal electrodes 3 forming pixels are formed on the substrate 1. As a method for forming this pattern, a wet photoetching method is preferable. Since the metal electrode is sandwiched between the transparent electrodes, when the transparent electrode is chemically etched, etching progresses from above and below the metal electrode, and unnecessary portions of the metal electrode are removed to form a pattern. In this case, since the transparent electrodes 2b, 2c and the metal electrode 3 are patterned by etching at the same time,
At the edge portion e of the pixel, the edges of the transparent electrodes 2b, 2c and the metal electrode 3 coincide with each other.

次に製造方法の実施例を示す。Next, an example of the manufacturing method will be shown.

■ ガラス基i : #7740  フュージョンバイレッ
クス1.1を 透明電極: In2Oa +SnO2(5wt%)30
0〜500人 メタル電極: 41300人 フォトレジスト: ^e−OFPn−77EIn 20
3−OFPR−77E エツチング液:A#at25°C (Fe2C1a : HCA! = 1 : 1 mo
l %In203aむ 30°C メタル電極の画素に対する位置決め精度:±20μガラ
ス基板: #7740  フュージョンパイレックス1
.1を 透明電極: In2O3+Sn02  、(5HL%)
300〜500人 メタル電極:Ni300人 フォトレジスト:  Ni−0FPR−77EIn 2
0 a−OFPR−77E エツチング液:Ni−リフトオフ法によるインバージョ
ンエッチ法を採用した In20 3 メタル電極の画素に対する位置決め精度:±20μ〈発
明の効果〉 以上説明したように、本発明においては、基板上で、透
明電極がメタル電極を上Yにはさんだ3層構造を有し、
この3層構造の透明電極とメタル電極とを一度にパター
ン形成するようにしたから、メタル電極と透明電極の端
縁を容易に一致させることができ、表示イメージを高め
ることができるとともに、液晶とメタル電極との反応及
びメタル電極の基板に対する密着性からくるメタル電極
の材質の制約が無くなり、良導電性金属であれば殆んど
の金属が利用できる。さらに、メタル配線抵抗が従来の
透明電極とメタル電極の2層構造の場合より小さくなる
■ Glass base i: #7740 Fusion Vilex 1.1 transparent electrode: In2Oa +SnO2 (5wt%) 30
0-500 people Metal electrode: 41300 people Photoresist: ^e-OFPn-77EIn 20
3-OFPR-77E Etching solution: A# at 25°C (Fe2C1a: HCA! = 1: 1 mo
l%In203am 30°C Positioning accuracy of metal electrode to pixel: ±20μ Glass substrate: #7740 Fusion Pyrex 1
.. 1 as transparent electrode: In2O3+Sn02, (5HL%)
300-500 people Metal electrode: Ni 300 people Photoresist: Ni-0FPR-77EIn 2
0 a-OFPR-77E Etching solution: In20 using the inversion etching method using the Ni-lift-off method Positioning accuracy of the metal electrode with respect to the pixel: ±20μ <Effects of the Invention> As explained above, in the present invention, the substrate The transparent electrode has a three-layer structure in which the metal electrode is sandwiched between the upper Y,
Since the transparent electrode and metal electrode of this three-layer structure are patterned at the same time, the edges of the metal electrode and the transparent electrode can be easily matched, which not only improves the display image but also improves the liquid crystal display. There are no restrictions on the material of the metal electrode due to the reaction with the metal electrode and the adhesion of the metal electrode to the substrate, and almost any metal can be used as long as it has good conductivity. Furthermore, the metal wiring resistance is smaller than that of the conventional two-layer structure of a transparent electrode and a metal electrode.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る液晶表示素子の構成を示す正面図
、第2図は第1図の平面図、第3図は本発明に係る液晶
表示素子の製造過程の状態を示す正面図、第4図は第3
図の平面図、第5図は液晶表示素子の従来例を示す正面
図、第6図は第5図の平面図、第7図は液晶表示素子の
他の従来例を示す正面図、第8図は第7図の平面図であ
る。 1一基板     2−透明電極 3−メタル電極
FIG. 1 is a front view showing the configuration of a liquid crystal display element according to the present invention, FIG. 2 is a plan view of FIG. 1, and FIG. 3 is a front view showing the state of the manufacturing process of the liquid crystal display element according to the present invention. Figure 4 is the third
5 is a front view showing a conventional example of a liquid crystal display element; FIG. 6 is a plan view of FIG. 5; FIG. 7 is a front view showing another conventional example of a liquid crystal display element; The figure is a plan view of FIG. 7. 1 - Substrate 2 - Transparent electrode 3 - Metal electrode

Claims (1)

【特許請求の範囲】[Claims] 透明な基板上に画素を形成する複数の透明電極を配列す
るとともに、各透明電極をメタル電極により接続して形
成した液晶表示素子において、上記基板上で、透明電極
がメタル電極を上下にはさんだ3層構造を有し、この3
層構造の透明電極とメタル電極とを一度にパターン形成
したことを特徴とする液晶表示素子。
In a liquid crystal display element formed by arranging a plurality of transparent electrodes forming pixels on a transparent substrate and connecting each transparent electrode with a metal electrode, the transparent electrodes sandwich the metal electrodes above and below on the substrate. It has a three-layer structure, and these three
A liquid crystal display element characterized by patterning a layered transparent electrode and a metal electrode at the same time.
JP14658584A 1984-07-13 1984-07-13 Liquid crystal display element Pending JPS6125125A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14658584A JPS6125125A (en) 1984-07-13 1984-07-13 Liquid crystal display element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14658584A JPS6125125A (en) 1984-07-13 1984-07-13 Liquid crystal display element

Publications (1)

Publication Number Publication Date
JPS6125125A true JPS6125125A (en) 1986-02-04

Family

ID=15411033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14658584A Pending JPS6125125A (en) 1984-07-13 1984-07-13 Liquid crystal display element

Country Status (1)

Country Link
JP (1) JPS6125125A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04241324A (en) * 1991-01-14 1992-08-28 Sharp Corp Liquid crystal display device
JP2006327005A (en) * 2005-05-26 2006-12-07 Fujifilm Holdings Corp Mold and manufacturing method of molded product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04241324A (en) * 1991-01-14 1992-08-28 Sharp Corp Liquid crystal display device
JP2006327005A (en) * 2005-05-26 2006-12-07 Fujifilm Holdings Corp Mold and manufacturing method of molded product

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