JPS61232214A - Production of silane - Google Patents
Production of silaneInfo
- Publication number
- JPS61232214A JPS61232214A JP60069966A JP6996685A JPS61232214A JP S61232214 A JPS61232214 A JP S61232214A JP 60069966 A JP60069966 A JP 60069966A JP 6996685 A JP6996685 A JP 6996685A JP S61232214 A JPS61232214 A JP S61232214A
- Authority
- JP
- Japan
- Prior art keywords
- group
- atom
- formula
- disproportionation
- chlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 10
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 4
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 14
- 238000007323 disproportionation reaction Methods 0.000 claims abstract description 12
- 125000005843 halogen group Chemical group 0.000 claims abstract description 12
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 10
- 150000001450 anions Chemical group 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 3
- 125000002843 carboxylic acid group Chemical group 0.000 claims abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 9
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- -1 BF_4 Chemical class 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 claims 1
- 125000001302 tertiary amino group Chemical group 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract description 16
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 229910003480 inorganic solid Inorganic materials 0.000 abstract description 12
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 7
- 125000004429 atom Chemical group 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 abstract description 2
- 238000007385 chemical modification Methods 0.000 abstract 1
- 229910001914 chlorine tetroxide Inorganic materials 0.000 abstract 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- 150000003377 silicon compounds Chemical class 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 36
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 11
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-dimethylformamide Substances CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000007983 Tris buffer Substances 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000007605 air drying Methods 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- 229910052727 yttrium Inorganic materials 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000002015 acyclic group Chemical group 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 235000019270 ammonium chloride Nutrition 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000005373 porous glass Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000004965 Silica aerogel Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910026551 ZrC Inorganic materials 0.000 description 1
- OTCHGXYCWNXDOA-UHFFFAOYSA-N [C].[Zr] Chemical compound [C].[Zr] OTCHGXYCWNXDOA-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- XKXHCNPAFAXVRZ-UHFFFAOYSA-N benzylazanium;chloride Chemical compound [Cl-].[NH3+]CC1=CC=CC=C1 XKXHCNPAFAXVRZ-UHFFFAOYSA-N 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001723 carbon free-radicals Chemical class 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Substances ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- HDNRFVFMQJSRPE-UHFFFAOYSA-N dichloro-bis(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)CCCCl HDNRFVFMQJSRPE-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- YQGOWXYZDLJBFL-UHFFFAOYSA-N dimethoxysilane Chemical compound CO[SiH2]OC YQGOWXYZDLJBFL-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 239000002815 homogeneous catalyst Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- NQMRYBIKMRVZLB-UHFFFAOYSA-N methylamine hydrochloride Chemical compound [Cl-].[NH3+]C NQMRYBIKMRVZLB-UHFFFAOYSA-N 0.000 description 1
- YWFWDNVOPHGWMX-UHFFFAOYSA-N n,n-dimethyldodecan-1-amine Chemical compound CCCCCCCCCCCCN(C)C YWFWDNVOPHGWMX-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- FFJMLWSZNCJCSZ-UHFFFAOYSA-N n-methylmethanamine;hydrobromide Chemical compound Br.CNC FFJMLWSZNCJCSZ-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical class O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000006884 silylation reaction Methods 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
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- Silicon Compounds (AREA)
- Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
発明の技術的分野
本発明はクロロ水素化シランの不均化お工び/又に再分
配反応によるシラン類、特にモノシランおよび/又はク
ロロシランの製造方法に関する。TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for producing silanes, particularly monosilanes and/or chlorosilanes, by disproportionation/or redistribution reactions of chlorohydrogenated silanes.
従来の技術
シラン、特にモノシランは半導体、アそルファス太陽電
池、工0デバイスや感光体等に有用な素原料である。ク
ロロシランあるいはモノシランは、次式の如く、クロロ
シランを原料に不均化もしくは再分配反応にニジ得られ
ることが知られている。そしてこれらの反応に有用な触
媒の開発が行われている。BACKGROUND OF THE INVENTION Silane, particularly monosilane, is a raw material useful for semiconductors, amorphous solar cells, industrial devices, photoreceptors, and the like. It is known that chlorosilane or monosilane can be obtained by disproportionation or redistribution reaction using chlorosilane as a raw material as shown in the following formula. Catalysts useful for these reactions are being developed.
281HC4: 81404 + 8101m2Si
H204ヰ 81HOts +81H3Ct2B1HI
Ct : 81H4+5iHIC4上記の触媒として
はアミノ基等を含む不溶性の固体陰イオン変換樹脂(特
開昭50−119798号公報)、トリメチルアミン又
はジメチルエチルアミン(特開昭59−121110号
公報)、パラジウム(特開昭54−59250号会報)
、無機固体塩基(%開明59−174515号公報)α
−オキソアミン基を含む化合物(特開昭59−5161
7号公報)、テトラアルキル尿素(特公昭55−140
46号公報)炭化水素基でN−置換したα−ピロリドン
(%公明55−14045号公報)、スルホン酸基を有
する陽イオン交換体(特開昭59−164614号公報
)、アミノアルコールとシリカの反応生成物(特開昭5
9−156907号公報)、などがある。また特に反応
生成物と触媒の分離が容易な不均一系触媒が注目されて
いる。281HC4: 81404 + 8101m2Si
H204ヰ 81HOts +81H3Ct2B1HI
Ct: 81H4+5iHIC4 The above catalysts include insoluble solid anion conversion resins containing amino groups etc. (Japanese Unexamined Patent Publication No. 50-119798), trimethylamine or dimethylethylamine (Japanese Unexamined Patent Publication No. 59-121110), palladium (Unexamined Japanese Patent Publication No. 59-121110), (Bulletin No. 54-59250)
, inorganic solid base (% Kaimei No. 59-174515) α
-Compounds containing oxoamine groups (JP-A-59-5161
7), tetraalkylurea (Special Publication No. 140, 1983)
No. 46) N-substituted α-pyrrolidone with a hydrocarbon group (% Komei No. 55-14045), a cation exchanger having a sulfonic acid group (Japanese Unexamined Patent Publication No. 59-164614), amino alcohol and silica Reaction product (Unexamined Japanese Patent Publication No. 5
9-156907), etc. In particular, heterogeneous catalysts that allow easy separation of reaction products and catalysts are attracting attention.
発明が解決しようとする問題点
クロロ水素化シランの不均化お工び又は再分配反応に有
用な触媒はいくつか提案されているが、特に従来の固体
陰イオン交換樹脂系の触媒は耐熱性、機械的強度に劣り
、イオン交換樹脂特有の膨潤などの問題があシ、触媒寿
命も満足するものではなかった。一方ルイス酸やアミン
類等の均一系触媒は生成物と触媒の分離に多大のエネル
ギーを要する。Problems to be Solved by the Invention Several catalysts useful for the disproportionation or redistribution reaction of chlorohydrogenated silanes have been proposed, but in particular, conventional solid anion exchange resin-based catalysts have poor heat resistance. However, the mechanical strength was poor, there were problems such as swelling peculiar to ion exchange resins, and the catalyst life was also unsatisfactory. On the other hand, homogeneous catalysts such as Lewis acids and amines require a large amount of energy to separate the product from the catalyst.
問題を解決する為の手段
発明の要旨
固体異面への化学修飾の技術自体はシランカップリング
剤による処理方法などで既に公知である。即ちシランカ
ップリング剤で無機質光面を化学修飾することにより、
各種複合材料の有機質と無機質の接着性を向上させたシ
、強度、電気的特性を著しく改良することができること
は当業界においてすでに公知であるが、本発明者らはク
ロロシランの不均化又は再分配反応に関する有用な触媒
を研究、開発する中で特に多孔性無機固体をアミン系の
有機珪素化合物で化学修飾したものが上記反応に対し、
高活性でかつ耐熱性の良好な触媒となることを見出し、
本発明を完成させ友ものである。Means for Solving the Problems Summary of the Invention The technique of chemically modifying a solid surface is already known as a treatment method using a silane coupling agent. That is, by chemically modifying the inorganic optical surface with a silane coupling agent,
Although it is already known in the art that the organic-inorganic adhesion, strength, and electrical properties of various composite materials can be significantly improved, the present inventors have discovered that chlorosilane can be disproportionated or recycled. While researching and developing useful catalysts for partition reactions, it has been found that porous inorganic solids are chemically modified with amine-based organosilicon compounds for the above reactions.
Discovered that it is a catalyst with high activity and good heat resistance.
This is a perfect companion to the present invention.
即ち、本発明は多孔性の無機固体の異面を炭素に結合し
た窒素原子を含有する有機珪素基で化学修飾した触媒の
存在下81Hn04−n(ただし1≦n≦3)で表わさ
れるクロロシランヲ不均化および/又は再分配させるこ
とを特徴とするシラン、特にモノシランおよび/又はク
ロロシランの展進方法に関するものである。That is, the present invention provides a method for treating a chlorosilane represented by 81Hn04-n (where 1≦n≦3) in the presence of a catalyst in which a different surface of a porous inorganic solid is chemically modified with an organosilicon group containing a nitrogen atom bonded to carbon. It relates to a process for the development of silanes, in particular monosilanes and/or chlorosilanes, characterized by disproportionation and/or redistribution.
表面修飾用試剤による表面修飾
多孔性無機固体の表面を炭素に結合する窒素原子を含有
する有機珪素基で修飾するのに用いることのできる有機
珪素試剤は以下の如く、一般式で懺わされる。Surface Modification with a Surface Modification Reagent The organosilicon reagent that can be used to modify the surface of a porous inorganic solid with an organosilicon group containing a nitrogen atom bonded to carbon is represented by the general formula as follows. .
(Y −R−)t S i Z4−Z (Z
=2又は3)又はムmN(−R−8iZs)s−m
(m” ’又は1)又はムnNe(−R−sizs)
4−nxe(n=o* 1又は2)Yは、−NH,、
−N皿1 、−NRIR” で嚢ゎされるアーミ/i
、sるいh、−y’Bm、 、xC’ 、 −Ne)H
!R1−xe 。(Y -R-)t S i Z4-Z (Z
=2 or 3) or mN(-R-8iZs)s-m
(m''' or 1) or mNe (-R-sizs)
4-nxe (n=o* 1 or 2) Y is -NH,,
-N plate 1, -NRIR” armie/i
,sruih,-y'Bm, ,xC',-Ne)H
! R1-xe.
−NeHx!xz−xe 、 −x%*RzRs−x’
テN b サレル7 ン部
υ
様が窒素原子含有基でおるか、置換反応あるいは付加反
応に工〕窒素原子含有基に変換可能な官能基でもよい。-NeHx! xz-xe, -x%*RzRs-x'
The element υ may be a nitrogen atom-containing group, or it may be a functional group that can be converted into a nitrogen atom-containing group through a substitution reaction or an addition reaction.
該官能基としては塩素、臭素。The functional groups include chlorine and bromine.
ヨウ素の様なハロゲン原子、あるいは酢酸基す
応に有用な不飽和結合を有する炭化水素基がある。この
場合、ジビニルジェトキシシランの様K Y−R−がビ
ニル基であっても良い。There are hydrocarbon groups with useful unsaturated bonds, such as halogen atoms such as iodine, or acetic acid groups. In this case, KY-R- may be a vinyl group as in divinyljethoxysilane.
R1、R” 、 R1は水素原子あるいは炭素数1〜2
゜の炭化水素基でア)、酸素原子、あるいはハロゲン原
子等の炭素、水素以外の原子を含んでいてもよく、飽和
でも、不飽和でもよく、直鎖でも側鎖を有していても良
く、環式でも非環式でも良い。又、Yがアミノ基の場合
はR1、R1は互いにつながっていてもよく、Yがアン
モニウム基の場合R1、R2、Rmのうちの2又は全て
が互いにつながっていてもよ(、Yがα−オキソアミノ
基の場合には、R1、1%N 、 R3のうちの2又は
全てが互いにつながるか、あるいは、只の一部であって
も良い。R1, R”, R1 is a hydrogen atom or has 1 to 2 carbon atoms
The hydrocarbon group of ゜a) may contain atoms other than carbon or hydrogen, such as oxygen atoms or halogen atoms, and may be saturated or unsaturated, and may be linear or have a side chain. , may be cyclic or acyclic. Furthermore, when Y is an amino group, R1 and R1 may be connected to each other, and when Y is an ammonium group, two or all of R1, R2, and Rm may be connected to each other (, Y is α- In the case of an oxo-amino group, two or all of R1, 1%N, and R3 may be connected to each other, or may be only a part of them.
Rは、炭素数1〜20の炭化水素基でめシ、酸素原子あ
るいはハロゲン原子等の炭素、水素以外の原子を含んで
いても工く、飽和でも不飽和でも良く、直鎖でも側鎖を
有していてもよく、環式でも非環式でも良い。R is a hydrocarbon group having 1 to 20 carbon atoms, which may contain atoms other than carbon or hydrogen such as oxygen atoms or halogen atoms, and may be saturated or unsaturated, and may be linear or have a side chain. It may be cyclic or acyclic.
2は、1つの珪素原子に結合しているもののうち、少く
とも1つが加水分解基であり、多孔性無機固体表面と反
応して、脱離し該素面と結合する機能を有し、代懺的な
加水分解基はハロゲン、アルコキシ基、アミノ基、アセ
トキシ基などである。固体との結合機構については例え
ば「工業材料」第27巻第9号34頁〜58頁に述べら
れている。又2のうち加水分解基以外のものは炭素数1
〜20の炭化水素基で、酸素原子あるいはハロゲン原子
を含んでいて良く、互いに同じか、あるいは異っていて
も良い。In 2, at least one of the groups bonded to one silicon atom is a hydrolyzable group, which has the function of reacting with the surface of a porous inorganic solid, desorbing it, and bonding with the bare surface. Examples of hydrolyzable groups include halogen, alkoxy groups, amino groups, and acetoxy groups. The bonding mechanism with solids is described, for example, in "Kogyo Zaizai", Vol. 27, No. 9, pp. 34-58. Also, of 2, those other than the hydrolyzable group have 1 carbon number.
~20 hydrocarbon groups, which may contain an oxygen atom or a halogen atom, and may be the same or different from each other.
ムは、水素原子又は炭素数1〜20の炭化水素基でハロ
ゲン原子、酸素原子等の炭素、水素以外の原子を含有し
ていてもよい。The group is a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, and may contain atoms other than carbon and hydrogen, such as a halogen atom and an oxygen atom.
xe はフッ素、塩素、臭素、ヨウ素# BP4e
OtO,、ON 、カルボン駿基等のアニオンである。xe is fluorine, chlorine, bromine, iodine #BP4e
These are anions such as OtO, ON, and carbon radicals.
上記一般式を更に具体的に示すと次の様になる。The above general formula is shown in more detail as follows.
式中、Y、Y、Y は、前記Yと、R,R,R。In the formula, Y, Y, and Y are the above Y and R, R, and R.
R−’F1前記FLト、A’、A’t!前記Aト、Z1
〜zllは前記2と同じ定義で衆わされる。R-'F1 Said FL t, A', A't! Said A, Z1
~zll has the same definition as 2 above.
Yが炭素に結合した窒素原子を有しない場合は、該試剤
は多孔性無機固体表面を修飾する前あるいはした後にア
ミン、アミド、尿素などの窒素化合物を用いて付加多る
いは置換反応にょル、窒素原子含有基を有した本発明に
係る触媒とすることができる。When Y does not have a nitrogen atom bonded to carbon, the reagent may be subjected to an addition or substitution reaction using a nitrogen compound such as an amine, amide, or urea before or after modifying the surface of the porous inorganic solid; The catalyst according to the present invention may have a nitrogen atom-containing group.
上記異面修飾試剤としては、ビス(3−(N。The above-mentioned different surface modification reagent includes bis(3-(N).
N−ジメチルアミノ)プロピルフジメトキシシラン、ト
リス(5−(N、N−ジエチルアミノ)プロピル〕メト
キシシラン、ビス(3−()IJエトキシシリル)プロ
ピル〕アミン、ビス〔3−(トリエトキシシリル)プロ
ピルコメチルアミy、とx(p−(トリメトキシシリル
)フェニルメチル〕エチルアミン、トリス(5−()リ
エトキシシリル)プロピル〕アミン、トリス(p−()
Vメトキシシリル)フェニルメチル〕アミン、ビスC3
−Cトリエトキシシリル)プロピルフジメチルアンモニ
ウムクロリド、ビス(p−()リメトキシシリル)フェ
ニルメチル〕ジメチルアンモニウムブロマイド、トリス
〔3−(トリエトキシシリル)プロピル〕ベンジルアン
モニウムクロリド、トリス(p−()リメトキシシリル
)フェニルメチル〕メチルアンモニウムク算リド、テト
ラキス(5−()リエトキシシリル)プロピル〕アンモ
ニウムクロリド、メチルトリス(r−トリメトキシシリ
ルグロビル)アンそニウムクロリ)”%)’Jス[5−
()リメトキシシリル)プロピル〕アンモニクムクロリ
ド、などの窒素原子含有修飾試剤の他、窒素原子非含有
修飾試剤として、ビス(3−クロロプロピル)ジクロロ
シラン、トリス(5mクロロプロピル)クロロシラン、
ジビニルジェトキシシラ/、トリビニルモノエトキシシ
ラン、等を用いることができる。N-dimethylamino)propyl fudimethoxysilane, tris(5-(N,N-diethylamino)propyl]methoxysilane, bis(3-()IJethoxysilyl)propyl)amine, bis[3-(triethoxysilyl)propyl comethylamine y, and
Vmethoxysilyl)phenylmethyl]amine, bisC3
-Ctriethoxysilyl)propyl fudimethylammonium chloride, bis(p-()rimethoxysilyl)phenylmethyl]dimethylammonium bromide, tris[3-(triethoxysilyl)propyl]benzylammonium chloride, tris(p-() methyltris(r-trimethoxysilyl)phenylmethyl]methylammonium chloride, tetrakis(5-()ethoxysilyl)propyl)ammonium chloride, methyltris(r-trimethoxysilylglobil)anthoniumchloride)'%)'JS[5 −
In addition to nitrogen-containing modification reagents such as (()rimethoxysilyl)propyl]ammonicum chloride, nitrogen-free modification reagents include bis(3-chloropropyl)dichlorosilane, tris(5mchloropropyl)chlorosilane,
Divinyljethoxysilane/trivinylmonoethoxysilane, etc. can be used.
多孔性無機固体の光面への化学修飾方法(シリル化)は
、その両者を室温又は室温以上の温度、好ましくは、3
0〜300℃で接触させるだけでよく、加水分解基の加
水分解を促進するために水を共存させても良いし、水に
対する溶解性の悪いものは水−アルコール系等の溶媒を
使用することもできる。In the method of chemically modifying the optical surface of a porous inorganic solid (silylation), both of them are heated at room temperature or above room temperature, preferably at
It is sufficient to contact the material at 0 to 300°C, and water may be allowed to coexist to promote hydrolysis of the hydrolyzable group. For substances with poor solubility in water, a solvent such as water-alcohol type may be used. You can also do it.
多孔性無機固体
本発明に使用できる多孔性無機固体としては石英、ノバ
キ≧ライト、湿式法シリカ、コロイダルシリカ、シリカ
エアロゲル、珪砂、珪石。Porous inorganic solids Porous inorganic solids that can be used in the present invention include quartz, Novaki≧lite, wet process silica, colloidal silica, silica aerogel, silica sand, and silica stone.
珪そう土、トリジマイト、クリストバライト等のシリカ
、カオリン、タルク、ウオラストナイト、石綿、珪酸カ
ルシウム、!酸アルミニウム。Silica such as diatomaceous earth, tridymite, cristobalite, kaolin, talc, wollastonite, asbestos, calcium silicate,! acid aluminum.
ゼオライト、ベントナイト、活性白土、多孔質ガラス、
珪酸マグネシウム、珪酸ジルコニウム等の珪識塩、炭酸
カルシウム、炭酸マグネシウム等の炭酸塩、水液化マグ
ネシウム、水酸化アルミニウム、水酸化カルシウム、水
酸化チタニウム等の水酸化物、酸化亜鉛、酸化鉄、酸化
マグネシウム、チタニア、シリカ・アルミナ、ジルコニ
ア、&化りロム、酸化カルシウム、酸化バナジウム、酸
化スズ、Wi化ビスマス等の金属激化物、炭化珪素、炭
化チタニウム、炭化ジルコニウム、炭化はう素1等の炭
化物、窒化珪素。Zeolite, bentonite, activated clay, porous glass,
Silicic salts such as magnesium silicate and zirconium silicate, carbonates such as calcium carbonate and magnesium carbonate, hydroxides such as liquefied magnesium, aluminum hydroxide, calcium hydroxide, and titanium hydroxide, zinc oxide, iron oxide, and magnesium oxide. , metal intensifiers such as titania, silica/alumina, zirconia, & chloride, calcium oxide, vanadium oxide, tin oxide, bismuth oxide, carbides such as silicon carbide, titanium carbide, zirconium carbide, boron 1 carbide, silicon nitride.
窒化はう素、窒化チタニウム、窒化ジルコニウム等の窒
化物、アルミニウム、銅、鉄、ニッケル、チタン、ジル
コニウム、タングステン等の金属が使用でき、特に好ま
しいのはシリカ、チタニアあるいは多孔質ガラスである
。ま九その表面積は1−/f以上、通常2〜I Q O
Om”/fのものが用いられる。Nitrides such as boron nitride, titanium nitride, and zirconium nitride, and metals such as aluminum, copper, iron, nickel, titanium, zirconium, and tungsten can be used, and particularly preferred are silica, titania, and porous glass. Its surface area is 1-/f or more, usually 2~IQO
Om''/f is used.
不均化および又探査分配反応
クロロシランの不均化およびまたは再分配反応は液相で
も気相でも良く、又、流通式でも回分式でもよいが気相
の方が低圧でおこなえ、かつ触媒と生成物の分離が容易
な気相の方が好ましく、流通式が好ましい。反応温度な
0〜300℃、好ましくは20〜200℃であシ、圧力
は常圧〜50ゆ/c!n” (、ゲージ圧)、接触時間
α1〜20秒の範囲で行うことができる。Disproportionation and/or Exploration Distribution Reaction The disproportionation and/or redistribution reaction of chlorosilanes may be carried out in liquid phase or gas phase, and may be carried out in flow or batchwise manner, but gas phase allows for lower pressure, and is easier to carry out with a catalyst. A gas phase is preferable because it allows separation of substances easily, and a flow type is preferable. The reaction temperature is 0 to 300°C, preferably 20 to 200°C, and the pressure is normal pressure to 50 Yu/c! n'' (gauge pressure) and contact time α in the range of 1 to 20 seconds.
また、原料のクロロシランは81Hn(t4−n (
ただし1≦n≦3)で弐わされるクロロ水素化シランで
ある。即ちモノクロロシラン、ジクロロシランまたはト
リクロロシランの中の111i類あるいは281類以上
の佐倉の組成の混合物を用いることができ、窒素ガス等
の不活性流体で希釈してもよい。In addition, the raw material chlorosilane is 81Hn (t4-n (
However, it is a chlorohydrogenated silane in which 1≦n≦3). That is, a mixture of monochlorosilane, dichlorosilane, or trichlorosilane having a Sakura composition of Class 111i or Class 281 or higher may be used, and may be diluted with an inert fluid such as nitrogen gas.
発明の効果
多孔性無機固体光面を炭素に結合し九窒累原子を有する
有機珪素塩で化学修飾し九触媒の存在下にクロロシラン
の不均化および又は再分配反応を行うに際し、従来の陰
イオン交換樹脂系の触媒エフ高温で行え、モノシランお
よびまたは原料と異なるクロロシランを収率良く得るこ
とができる。Effects of the Invention When a porous inorganic solid optical surface is chemically modified with an organosilicon salt having nine nitrogen atoms bonded to carbon and a chlorosilane disproportionation and/or redistribution reaction is carried out in the presence of a nine-nitrogen catalyst, conventional negative The ion-exchange resin-based catalyst F can be carried out at high temperatures, and monosilane and/or chlorosilane different from the raw material can be obtained in good yield.
実施例
以下、実施例によシ、更に詳細に説明するが、本発明を
限定するものではない。EXAMPLES Hereinafter, the present invention will be explained in more detail by way of examples, but the present invention is not limited thereto.
尚、実施例において反応生成物の分析は全て、2mの0
v−1充填カラム、カラム温度160℃のTOD (キ
ャリヤーガスはヘリウム)によるガスクロマトグラフで
行った。In addition, in the examples, all analyzes of reaction products were carried out using a 2 m
The analysis was performed using a TOD gas chromatograph using a v-1 packed column and a column temperature of 160°C (carrier gas is helium).
実施例−1
十分に窒素置換した100−フラスコにγ−アミノプロ
ピルトリエトキシシランj1.06f。Example-1 γ-Aminopropyltriethoxysilane j1.06f was placed in a 100-ml flask that was sufficiently purged with nitrogen.
r−クロロズロビルトリメトキシシラン19..861
、および溶媒として、25−のN、N−ジメチルホルム
アミドを入れ165℃のオイルバス中24時間還流加熱
し九。次いで減圧下(5mHf )で溶媒を留去し、2
5.2fのオイル状のトリス(5−()リアルコキシシ
リル)プロピル〕アンモ=f)ム1口’)Y、m(a4
ca、aH,51(OR)s)!eC1e(但し、R=
= OH3又はO,’Fis)を得た。このアンモニウ
ム塩&Ofとシリカ(7ジタビリン社製よりゲル、50
〜60メツシュ、空気中120℃ 10時間乾燥)7.
Of、及び50−のクロロベンゼンを100−フラスコ
中、窒素雰囲気下150℃ 5時間加熱し、次いで、1
00mのメタノールで3回洗浄し、風乾後、空気中10
0℃ 5時間乾燥し、トリス(5−()リアルコキシシ
リル)プロピル〕アミン
m(aH,aH!an鵞81(OR)s )s (但し
、R: OH3又はCt、H,)により、表面修飾され
たシリカa8ft−得た。r-chlorozlobiltrimethoxysilane19. .. 861
, and 25-N,N-dimethylformamide as a solvent, and heated under reflux for 24 hours in an oil bath at 165°C. Then, the solvent was distilled off under reduced pressure (5 mHf), and 2
5.2f oily tris(5-()alkoxysilyl)propyl]ammo=f)mu1 mouth')Y, m(a4
ca, aH, 51(OR)s)! eC1e (however, R=
= OH3 or O, 'Fis) was obtained. This ammonium salt & Of silica (7 gel from Ditabiline, 50
~60 mesh, dried in air at 120°C for 10 hours) 7.
Of, and 50-chlorobenzene were heated in a 100-flask at 150°C for 5 hours under a nitrogen atmosphere, and then 1
After washing with 00m methanol 3 times and air drying,
After drying at 0°C for 5 hours, the surface was Modified silica a8ft- was obtained.
該修飾シリカ2.0 cc (α72f)をガラス製気
相流通反応装置(内径10■)に充てんし、窒素気流中
110℃で1時間加熱した後、反応層を所定温度に保ち
ながら、常圧下原料ガス(5iHOts/ N、混合ガ
ス、モル比50/70)’iミツイード、反応を行わし
めた。条件整定後1時間の生成物を分析し、結果を弐−
1に示した。2.0 cc (α72f) of the modified silica was filled in a glass gas phase flow reactor (inner diameter 10 mm), heated at 110°C for 1 hour in a nitrogen stream, and then heated under normal pressure while keeping the reaction layer at a predetermined temperature. The reaction was carried out using raw material gas (5iHOts/N, mixed gas, molar ratio 50/70). Analyze the product 1 hour after setting the conditions and report the results.
Shown in 1.
貴 −1
実施例−2
実施例−1で得たN(CH意OH意(H意5i(OR)
s Es修飾シリカ1L1f、10−のメタノールと共
にフラスコに入れ、1.0−のヨウ化メチルを加え、窒
素雰囲気下、60Cで1時間加熱した。次いでこれをろ
過し、修飾シリカを回収し、5C1dのメタノールで2
回洗浄後、炭酸水素ナトリウム水溶液(2f/100m
)で2回洗浄後水洗した。Takashi-1 Example-2 N(CHiOHi(Hi5i(OR)) obtained in Example-1
sEs-modified silica 1L1f was placed in a flask with 10-methanol, 1.0-methyl iodide was added, and the mixture was heated at 60C for 1 hour under a nitrogen atmosphere. This was then filtered to recover the modified silica and diluted with 5C1d methanol.
After washing twice, sodium hydrogen carbonate aqueous solution (2f/100m
) and then washed with water.
このシリカに6Nの規塩酸100−を加え、炭酸水素イ
オンを塩素イオンに置換した。次いで水洗を2回行い、
50−メタノールで3回洗浄し、風乾後、空気中100
℃ 12時間乾燥を行い、メチルトリス(r−)リアル
コキシシリルグロビル)アンモニウムクロリド。6N dihydrochloric acid (100) was added to the silica to replace hydrogen carbonate ions with chlorine ions. Next, wash twice with water,
After washing 3 times with 50-methanol and air drying, 100
C. Dry for 12 hours to obtain methyltris(r-)alkoxysilylglobyl)ammonium chloride.
(H3−a6B(aH!aa、cc2−sl(oR)s
)sc!tes ”を修飾L タシリカ4.1fを得た
。(H3-a6B(aH!aa, cc2-sl(oR)s
)sc! tes'' was modified to obtain L Tasilica 4.1f.
この修飾シリカ2.0cc(IIL74 t )l触媒
とし、実施例−1と同じ要領でトリクロロシランの不均
化反応と行った。結果を表−2に示した。Using 2.0 cc (IIL74 t )l of this modified silica as a catalyst, a disproportionation reaction of trichlorosilane was carried out in the same manner as in Example-1. The results are shown in Table-2.
表 −2
□
実施例3
窒素置換した100ad7ラスコにビス(5−クロロプ
ロピル)ジメトキシシラン4.9 f (これはチッソ
(株)展ビス(3−りe+ロプロビル)ジクロロシラン
と過剰のメタノールニジ合成した。)と、ジメチル−n
−ドデシルアミン(東京化成(株)製)10を及び40
−のN、N−ジメチルホルムアミドを入れ、常圧下で1
2時間還流加熱を行った。減圧下(1wmHf ) 1
20 t:で溶媒及び未反応アミンを除去し、残った留
分を100℃のトルエン(150m)で洗浄し、ろ別し
、IAlFのアンモニウム塩
(Ct”(n−CuHu)(CHs)xNeCsHs)
zSl(OCHs)zt得た。Table 2 □ Example 3 4.9 f of bis(5-chloropropyl)dimethoxysilane (this was manufactured by Chisso Co., Ltd.) and excess methanol was added to a 100ad7 flask purged with nitrogen. ) and dimethyl-n
-Dodecylamine (manufactured by Tokyo Kasei Co., Ltd.) 10 and 40
- Add N,N-dimethylformamide and 1
Reflux heating was performed for 2 hours. Under reduced pressure (1wmHf) 1
The solvent and unreacted amine were removed at 20 t: and the remaining fraction was washed with toluene (150 m) at 100°C, filtered, and treated with ammonium salt of IAlF (Ct”(n-CuHu)(CHs) x NeCsHs).
zSl(OCHs)zt was obtained.
該アンモニウム塩2.Ofとシリカ(フジダビソン社裂
、よりゲル、50〜6oメツシュを空気中120℃10
時間乾燥)5at及び60d、のN、 N−ジメチルホ
ルムアミド1100−フラスコ中、窒素雰囲気化140
C,8時間加熱の後、シリカをろ別しこのシリカを10
0−のメタノールで5回洗浄し、風乾後、空気中100
’C。The ammonium salt2. Of and silica (Fuji Davison Co., Ltd., gel, 50~6o mesh in air at 120℃ 10
drying time) 5at and 60d, N,N-dimethylformamide 1100 - in a flask under nitrogen atmosphere 140
C. After heating for 8 hours, the silica was filtered out and this silica was
After washing 5 times with 0-methanol and air-drying, 100-
'C.
12時間乾燥し、表面を
(cte−(n−c、、H2s)(cH,)、NΦCx
Hs)z81(OCHs)雪 なるアンモニクム虐に
ょシ修飾されたシリカを得た。After drying for 12 hours, the surface was
Hs) z81 (OCHs) Obtained ammonium-modified silica.
該修飾シリカ2.0cc(I1752)を用いて、実施
例−1と同じ要領でトリクロロシランの不均化反応を行
った。結果を表−3に示した。Using 2.0 cc of the modified silica (I1752), a disproportionation reaction of trichlorosilane was carried out in the same manner as in Example-1. The results are shown in Table-3.
懺 −3懺 -3
Claims (1)
する下式で表わされる有機珪素試剤で化学修飾した触媒
の存在下、SiHnCl_4_−_n(ただし、1≦n
≦3)で表わされるクロロシランを不均化および/又は
再分配させることを特徴とするシランの製造方法、 (Y−R−)_lSiZ_4_−_l(l=2又は3)
又は AmN(−R−SiZ_3)_3_−_m(n=0又は
1)又は AnN^■(−R−SiZ_3)_4_−_nX^■(
n=0、1又は2) (Yは第1〜第3級のアミノ基か第1級〜第4級のアン
モニウム基、若しくは、α−オキソアミノ基から選ばれ
る窒素原子含有基、Rはハロゲン原子、酸素原子等を含
有していてもよいC_1〜C_2_0の炭化水素基、Z
は珪素原子に結合し、うち少なくとも1つは加水分解基
であり、他はハロゲン原子、酸素原子等を含有してもよ
いC_1〜C_2_0の炭化水素基、Aは水素原子であ
るか、あるいは、ハロゲン原子、酸素原子を含有しても
よいC_1〜C_2_0の炭化水素基、Xはハロゲン、
BF_4、OH、ClO_4、CN、カルボン酸基等の
アニオンである。)[Claims] SiHnCl_4_-_n (where 1≦n
≦3) A method for producing silane, characterized by disproportionation and/or redistribution of chlorosilane represented by (Y-R-)_lSiZ_4_-_l (l = 2 or 3)
or AmN(-R-SiZ_3)_3_-_m(n=0 or 1) or AnN^■(-R-SiZ_3)_4_-_nX^■(
n=0, 1 or 2) (Y is a nitrogen atom-containing group selected from a primary to tertiary amino group, a primary to quaternary ammonium group, or an α-oxo amino group, R is a halogen atom , a C_1 to C_2_0 hydrocarbon group which may contain an oxygen atom, etc., Z
is bonded to a silicon atom, at least one of which is a hydrolyzable group, the others are C_1 to C_2_0 hydrocarbon groups that may contain halogen atoms, oxygen atoms, etc., A is a hydrogen atom, or A halogen atom, a C_1 to C_2_0 hydrocarbon group that may contain an oxygen atom, X is a halogen,
These are anions such as BF_4, OH, ClO_4, CN, and carboxylic acid groups. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60069966A JPS61232214A (en) | 1985-04-04 | 1985-04-04 | Production of silane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60069966A JPS61232214A (en) | 1985-04-04 | 1985-04-04 | Production of silane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61232214A true JPS61232214A (en) | 1986-10-16 |
JPH0339964B2 JPH0339964B2 (en) | 1991-06-17 |
Family
ID=13417904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60069966A Granted JPS61232214A (en) | 1985-04-04 | 1985-04-04 | Production of silane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61232214A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0474265A2 (en) * | 1987-04-04 | 1992-03-11 | Hüls Aktiengesellschaft | Method for preparation of dichlorosilane |
JP2006297329A (en) * | 2005-04-22 | 2006-11-02 | Pentax Corp | Silica aerogel film and its manufacturing method |
-
1985
- 1985-04-04 JP JP60069966A patent/JPS61232214A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0474265A2 (en) * | 1987-04-04 | 1992-03-11 | Hüls Aktiengesellschaft | Method for preparation of dichlorosilane |
JP2006297329A (en) * | 2005-04-22 | 2006-11-02 | Pentax Corp | Silica aerogel film and its manufacturing method |
US8298622B2 (en) | 2005-04-22 | 2012-10-30 | Pentax Ricoh Imaging Company, Ltd. | Silica aerogel coating and its production method |
Also Published As
Publication number | Publication date |
---|---|
JPH0339964B2 (en) | 1991-06-17 |
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