JPS61218051A - Manufacture of shadow mask - Google Patents

Manufacture of shadow mask

Info

Publication number
JPS61218051A
JPS61218051A JP5819285A JP5819285A JPS61218051A JP S61218051 A JPS61218051 A JP S61218051A JP 5819285 A JP5819285 A JP 5819285A JP 5819285 A JP5819285 A JP 5819285A JP S61218051 A JPS61218051 A JP S61218051A
Authority
JP
Japan
Prior art keywords
oxide film
black oxide
shadow mask
metallic plate
metal plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5819285A
Other languages
Japanese (ja)
Other versions
JPH06105590B2 (en
Inventor
Michihiko Inaba
稲葉 道▲彦▼
Tatsuya Hatanaka
畠中 達也
Yasuhisa Otake
大竹 康久
Masaharu Kanto
関東 正治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP5819285A priority Critical patent/JPH06105590B2/en
Publication of JPS61218051A publication Critical patent/JPS61218051A/en
Publication of JPH06105590B2 publication Critical patent/JPH06105590B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • H01J9/146Surface treatment, e.g. blackening, coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/07Shadow masks
    • H01J2229/0727Aperture plate
    • H01J2229/0733Aperture plate characterised by the material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/07Shadow masks
    • H01J2229/0727Aperture plate
    • H01J2229/0777Coatings
    • H01J2229/0783Coatings improving thermal radiation properties

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)

Abstract

PURPOSE:To simplify the process of manufacturing a shadow mask by using an Fe-Ni alloy containing Cr and Mn for a metallic plate and subjecting the metallic plate to press formation after a black oxide film is formed on the plate. CONSTITUTION:After many openings are formed in a thin metallic plate which principally consists of Fe and Ni and contains at least one of Cr and Mn, this metallic plate is annealed to form a black oxide film on the plate. Next, the metallic plate coated with the black oxide film is formed into a shadow mask. For the above thin metallic plate principally consisting of Fe and Ni and containing at least one of Cr and Mn, a 30-45wt% Fe-Ni alloy containing 0.3-10wt% each of Cr and Mn and an Fe-Ni alloy containing at least 7wt% of Cr can be used. Since the concentration of Cr or Mn in the surface of the metallic plate apt to increase, it is necessary to form an oxide film closely bound to the plate. A shadow mask can be produced by pressing the metallic plate coated with the black oxide film into a given shape.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、カラー受像管用シャドウマスクの製造方法に
かかわり、特にその素材がCr又はMnの少なくとも一
種を含むPgとNiを主成分とする場合の焼鈍と黒色酸
化膜形成を連続で行ったのち所定形状に成形をする方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for manufacturing a shadow mask for a color picture tube, particularly when the material is mainly composed of Pg and Ni containing at least one of Cr or Mn. The present invention relates to a method of sequentially performing annealing and forming a black oxide film, and then forming the film into a predetermined shape.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

カラー受像管のシャドウマスク、フレーム、インナーシ
ールド、バイメタル等の所謂管内部品は、  4従来よ
りエツチング性、および成形性が良く、また電子ビーム
の反射軽減に寄与する酸化膜をその表面く形成し易い、
リムド鋼やAlキルド鋼等を素材として形成されている
。然し乍ら、近時各種のニューメディアに対応するべく
、カラー受像管の高品質化、つまり表示画像の所謂見易
さや極細かさが要求され、上述したリムド鋼やAlキル
ド鋼にて構成されるシャドウマスク、フレーム、インナ
ーシールド、バイメタル等を用いるには不具合が生じて
きた。
The so-called internal parts of a color picture tube, such as the shadow mask, frame, inner shield, and bimetal, have better etching and moldability than conventional ones, and it is easy to form an oxide film on their surface that contributes to reducing electron beam reflection. ,
It is made of rimmed steel, Al-killed steel, or the like. However, in order to respond to various new media these days, higher quality color picture tubes are required, that is, so-called easy-to-see and ultra-fine display images, and shadow masks made of the above-mentioned rimmed steel or Al-killed steel are required. , there have been problems with using frames, inner shields, bimetals, etc.

すなわち、カラー受像管の動作時には、上記各部材の温
度が30〜100℃に上昇し、例えばその熱膨張による
シャドウマスクの成形形状に歪みに起因した、所謂ドー
ミングが生じる。この結果、シャドウマスクと螢光面と
の間の相対的位置関係にずれが生じ、ビニリテイードリ
7 ) (FD)と称される色ずれが発生する。特に高
品位カラー受像管では、前記シャドウマスクの開孔径お
よびその開孔ピッチが非常に小さいので、その相対的ず
れ量の割合いが大きくなり、上述したリムド鋼やA7キ
ルド鋼を素材とする管内部品では実用に耐えなくなる。
That is, during operation of the color picture tube, the temperature of each of the above-mentioned members rises to 30 to 100[deg.] C., and so-called doming occurs due to distortion in the shape of the shadow mask due to thermal expansion, for example. As a result, a shift occurs in the relative positional relationship between the shadow mask and the phosphor surface, resulting in a color shift called vinylity shift (FD). In particular, in high-quality color picture tubes, the aperture diameter and the aperture pitch of the shadow mask are very small, so the relative misalignment ratio becomes large. The parts are no longer practical.

そこで従来、この種の管内部品を形成する素材として、
熱膨張係数の小さいNi−Fe合金、例えばアンバー(
35Ni−Fe)を用いることが、例えば特公昭42−
25446号、特開昭50−58977号、特開昭5O
−6864)0号等により提唱されている。ところが、
この種のN1−Fe合金は熱伝導性が悪く、蓄熱し易い
という欠点を有していた。
Therefore, conventionally, the materials used to form this type of pipe internal parts were
Ni-Fe alloys with a small coefficient of thermal expansion, such as amber (
35Ni-Fe) can be used, for example, in
No. 25446, JP-A-50-58977, JP-A-5O
-6864) No. 0, etc. However,
This type of N1-Fe alloy has the drawback of poor thermal conductivity and easy heat accumulation.

この解決策として熱伝導性に優れた黒色酸化皮膜を形成
する事も試られているが、通常の開孔の穿設、焼鈍、成
形、黒色酸化皮膜形成の贋でシャドウマスクを製造した
場合には、アンバー自体が耐食性に優れている事に起因
して黒色酸化皮膜を所定厚さとする事が極めて困難であ
った。
As a solution to this problem, attempts have been made to form a black oxide film with excellent thermal conductivity. It was extremely difficult to form a black oxide film to a predetermined thickness due to the fact that amber itself has excellent corrosion resistance.

〔発明の目的〕[Purpose of the invention]

本発明はアンバー系合金を用いたシャドウマスクの製造
方法で熱伝導性に優れた黒色酸化皮膜を容易に所定厚さ
とする事ができ、かつ焼鈍工程及び黒色酸化皮膜形成工
程の加熱処理工程を連続して行う事ができる為、製造工
程も極めて簡略化する事の出来るシャドウマスクの製造
方法を提供する事を目的とする。
The present invention is a method for manufacturing a shadow mask using an amber-based alloy, which allows a black oxide film with excellent thermal conductivity to be easily formed to a predetermined thickness, and in which the annealing process and the heat treatment process of the black oxide film forming process are performed continuously. It is an object of the present invention to provide a method for manufacturing a shadow mask, which can greatly simplify the manufacturing process.

〔発明の概要〕[Summary of the invention]

本発明はCr又はMnの少なくとも一稿を含むFe及び
Niを主成分とする薄板状金属板に多数の開孔を穿設す
る工程と、前記多数の開孔の穿設された金属板を焼鈍す
る工程と、前記焼鈍された金属板に黒色酸化皮膜を形成
する工程と、前記黒色酸化皮膜が形成された金属板を成
形する工程とを少なくとも備えたシャドウマスクの製造
方法である。
The present invention includes a step of drilling a large number of holes in a thin metal plate mainly composed of Fe and Ni containing at least one of Cr or Mn, and annealing the metal plate in which the large number of holes have been drilled. This method of manufacturing a shadow mask includes at least the steps of: forming a black oxide film on the annealed metal plate; and molding the metal plate on which the black oxide film is formed.

本発明において、まず多数の開孔を穿設する工程は、通
常の方法を用いる事ができ、例えば感光済塗布、露光、
現像、バーニング、エツチングを行なう事により、多数
のビーム開孔が設けられたフラットマスクが得られる。
In the present invention, the step of first drilling a large number of holes can be performed using a conventional method, such as pre-sensitized coating, exposure,
By performing development, burning, and etching, a flat mask with a large number of beam apertures is obtained.

そしてフラットマスクの洗浄、乾燥及び剪断後火の焼鈍
工程に進む。
After cleaning, drying and shearing the flat mask, proceed to the fire annealing process.

つまり本発明では金属板1cCr、Mnを含んだFe−
N1合金を使用し、焼鈍後続いて黒色酸化皮膜を形成し
その後プレス成形を行う事を最大の特徴とするものであ
る。とくにこの金属板は、表面にCr又はMnが濃縮し
やすく、酸化膜と金属界面において、Crx(又はMn
 ) Nl、Fe5−x−、O,の構造をもつ密着性の
よい酸化膜をつくるため、密着性がよく剥離しない。酸
化膜の付着させる温度は通常570〜900℃が適当で
あり、先に述べた様に水素又はちつ素焼鈍をした場合、
酸化温度を低く選ぶ事ができる。
In other words, in the present invention, the metal plate 1cFe-
The main feature is that N1 alloy is used, a black oxide film is formed after annealing, and then press molding is performed. In particular, Cr or Mn tends to concentrate on the surface of this metal plate, and Crx (or Mn
) A highly adhesive oxide film with a structure of Nl, Fe5-x-, O, is created, so it has good adhesiveness and does not peel off. The temperature at which the oxide film is deposited is usually 570 to 900°C, and as mentioned above, when hydrogen or nitrogen annealing is performed,
You can choose a low oxidation temperature.

次に黒色酸化皮膜を形成した金属板をシャドウマスクと
しての所定形状にプレス加工等により成形する。なお従
来のリムド鋼、Alギルド鋼を用いた場合には黒色酸化
皮膜を形成した後成、形工程を行うと黒色酸化皮膜の剥
離等を生じ実用的なものではないが、本発明方法の場合
は前述の如く密着性に優れた強固な黒色酸化膜が形成さ
れる為、成形加工を施しても剥離等を生じる事なく艮好
な黒色酸化皮膜が維持された。
Next, the metal plate on which the black oxide film has been formed is formed into a predetermined shape as a shadow mask by pressing or the like. In addition, when conventional rimmed steel or Al guild steel is used, if a post-forming and forming process is performed after forming a black oxide film, the black oxide film may peel off, which is not practical, but in the case of the method of the present invention, As mentioned above, since a strong black oxide film with excellent adhesion was formed, the black oxide film was maintained without peeling even after molding.

なお本発明におけるCr又はMnの少なくとも一種を含
むFe及びNiを主成分とする薄体状金属としては、C
r、Mnを0.3〜10重量%添加した30〜45重量
%Fe−Ni合金や、7重量’S以下OCOを添加した
前記Fe−Ni合金、等が挙げられる。
In the present invention, the thin metal mainly composed of Fe and Ni containing at least one of Cr or Mn includes C
Examples include a 30 to 45 wt% Fe-Ni alloy to which 0.3 to 10 wt% of r, Mn is added, and the aforementioned Fe-Ni alloy to which OCO of 7 wt.'S or less is added.

焼鈍工程は、真空、水素、ちつ素いずれのふん囲気で行
ってもよいが、成形時の0.2%耐力を下げ成形しやす
くするためには、金属板内部のCをできるだけ除去する
必要があるため、10−’ Torr以下の真空焼鈍が
最も好都合である。しかしCr又はMnを添加量が多く
なる。と0.2%耐力も低下するので水素又はちつ素ふ
ん囲気で行ってもよい。水素又はちつ素を使用する場合
、金属板の表面は水素又はちつ素の吸ぞ°うが行われ硬
化するが、同時に表面の欠陥密度が高くなり、黒色酸化
皮膜を生成させる場合に酸素がよく拡散し、成長速度が
速くなる利点がある。このため厚い黒色酸化膜を成長さ
せ、かつ成形性を向上させるならば、真空焼鈍をした後
水素又はちつ素焼鈍をするか、水素又はちつ素焼鈍をし
たのち真空焼鈍をする方がよい。
The annealing process may be performed in a vacuum, hydrogen, or nitrogen atmosphere, but in order to lower the 0.2% proof stress during forming and make it easier to form, it is necessary to remove as much C as possible inside the metal plate. Therefore, vacuum annealing at 10-' Torr or less is most convenient. However, the amount of Cr or Mn added increases. Since the 0.2% yield strength also decreases, the process may be carried out in a hydrogen or nitrogen atmosphere. When hydrogen or nitrogen is used, the surface of the metal plate is hardened by absorbing hydrogen or nitrogen, but at the same time, the density of defects on the surface increases, and when a black oxide film is formed, oxygen is absorbed into the surface of the metal plate. It has the advantage of being well diffused and growing faster. Therefore, if you want to grow a thick black oxide film and improve formability, it is better to perform vacuum annealing followed by hydrogen or nitrogen annealing, or hydrogen or nitrogen annealing followed by vacuum annealing. .

焼鈍温度は通常1000°C以上が望ましいが、成形時
の形状があまり問題とならない場合には700〜100
0℃で行ってもかまわない。
The annealing temperature is usually preferably 1000°C or higher, but if the shape during forming is not a big problem, the annealing temperature is 700°C to 100°C.
There is no problem even if the temperature is 0°C.

黒色酸化膜はいったん室温に金属板をもどしたのちあら
ためて酸化ふん囲気中で加熱し生成させるのもよいが、
簡便な方法として、焼鈍後間−炉内で酸化する事かかん
便なため望ましい。とくに、この金属板は耐食性がよく
、550℃以上の温度をかけなければ酸化する事はむつ
かしいため、本法が能率的である。酸化ふん囲気として
はCOl +01 *H,0等の酸化性ガスを利用し、
α−FetO,ができにくい様な酸素分圧に調整する。
It is also a good idea to generate a black oxide film by returning the metal plate to room temperature and then heating it again in an oxidizing atmosphere.
As a simple method, it is preferable to oxidize in a furnace after annealing because it is convenient. In particular, this method is efficient because this metal plate has good corrosion resistance and is difficult to oxidize unless it is heated to a temperature of 550° C. or higher. As the oxidizing atmosphere, use an oxidizing gas such as COl +01 *H,0,
Adjust the oxygen partial pressure so that α-FetO is difficult to form.

〔発明の実施例〕[Embodiments of the invention]

以下に、Cr又はMnを含んだFe及びNiを主成分と
する合金からなるシャドウマスク用素材として、2Cr
−36Ni −re (重量%) 、 2Mn−36N
l−Fe合金を用いた本発明の実施例について述べる。
Below, 2Cr is used as a shadow mask material made of an alloy mainly composed of Fe and Ni containing Cr or Mn.
-36Ni-re (weight%), 2Mn-36N
An example of the present invention using l-Fe alloy will be described.

尚本合金は、C二0.01.84 :0.15 、P 
:0.O05,8:0.OOl (いずれも重量1)の
不純物を含む。
This alloy is C20.01.84:0.15, P
:0. O05,8:0. Contains impurities of OOl (both weight 1).

(実施例1) 上記組成の合金を素材として通常のフォトエツチングに
て目的とする孔寸法を有す多数の細孔が穿設されたフラ
ットマスクを得る。次いでこのマスクをプレス成形し目
的とする曲面形状を得るが、マスク材の降伏点強度が高
ければスプリングバックの発生により球面形状が崩れ、
成形したマスクを実用に供することができない。この為
焼鈍を施  ・すことにより高品位のプレス成形品が得
られる値まで0.2%耐力を下げる必要がある。通常プ
レス成形可能な0.21耐力は20Kg/m”であり、
この値まで下げるためK 10−”Torr 1000
℃の真空フ/v囲fi−1’圓分間焼鈍した。その後7
50℃まで冷却し、この温度において空気を加分間流入
させた。この際初期10分間においては、空気流量をお
さえ、ち密で密着性のよいCrx(又はMn ) Ni
、Fe3−、、O,の酸化膜を成長させる必要性がある
ため、炉内の圧力を10’rorrに保ちながら流入を
行った。その後の20分間は大気圧と同等゛に炉内圧力
をおさえ流入を行った。
(Example 1) A flat mask having a large number of pores having a desired hole size is obtained by ordinary photoetching using an alloy having the above composition as a material. This mask is then press-molded to obtain the desired curved shape, but if the yield point strength of the mask material is high, the spherical shape will collapse due to springback.
The molded mask cannot be put to practical use. For this reason, it is necessary to lower the yield strength by 0.2% by annealing to a value that allows a high-quality press-formed product to be obtained. The 0.21 proof stress that can be normally press-formed is 20Kg/m'',
To lower it to this value, K 10-”Torr 1000
It was annealed for a period of 0.degree. C. under vacuum for 10 minutes. then 7
It was cooled to 50° C. and air was introduced at this temperature for addition. At this time, during the initial 10 minutes, the air flow rate is suppressed and the Crx (or Mn)Ni, which is dense and has good adhesion, is
Since it was necessary to grow an oxide film of , Fe3-, , O, the inflow was carried out while maintaining the pressure inside the furnace at 10'rorr. For the next 20 minutes, the pressure inside the furnace was kept at the same level as atmospheric pressure and the inflow was carried out.

この様にして、できあがった黒色酸化膜のついたフラッ
トマスクの皮膜とX線回折、イオンマイクロアナライザ
ーで分析したところ、構造はCr!(又はMn ) N
 t、Fas−x−y o、で、酸化膜と金属界面にC
rが濃縮していた。また皮膜の厚さは1.2μmで、充
分な黒色度と密着性をかねそなえていた。尚、密着性は
90’ tげテスト後このまげ部にセロテープを張り黒
化膜の剥離テストを行なうことにより評価した。また走
査型電子顕微鏡にて黒化膜状態を観察したが割れ及びピ
ンホールのないち密な黒化膜であることが確認された。
In this way, when the film of the flat mask with the black oxide film was analyzed using X-ray diffraction and an ion microanalyzer, the structure was found to be Cr! (or Mn) N
t, Fas-x-y o, and C is added to the oxide film and metal interface.
r was concentrated. The film had a thickness of 1.2 μm and had sufficient blackness and adhesion. The adhesion was evaluated by applying Sellotape to the curvature after the 90' curvature test and performing a peeling test of the blackened film. Further, the state of the blackened film was observed using a scanning electron microscope, and it was confirmed that the blackened film was dense and free of cracks and pinholes.

このフラットマスクを室温で通常の方法により成形し所
望の曲面を得たシャドウマスクとして完成させた。黒色
酸化膜は、おりまげ部においても剥離する事がなく、充
分な強度をそなえていた。
This flat mask was molded at room temperature using a conventional method to complete a shadow mask with a desired curved surface. The black oxide film did not peel off even at the bent portion and had sufficient strength.

(実施例2) 同様な合金を同様な方法にてエツチングした後1100
℃で水素焼鈍を行った。そのvk690℃まで冷却し、
その後この温度において水蒸気を30分間流入させ黒色
酸化膜を付着させた。水蒸気の場合も先程と同様初期1
0分間では流量をおさえ、後期20分間には流量を増大
させた。この様にしてつくったフラットマスクを同様に
プレス成形したところ、おりまげ部においても剥離のお
きないシャドウマスクができあがった。
(Example 2) After etching a similar alloy by a similar method, 1100
Hydrogen annealing was performed at ℃. Cool it to vk690℃,
Thereafter, water vapor was allowed to flow in for 30 minutes at this temperature to deposit a black oxide film. In the case of water vapor, the initial stage 1 is the same as before.
The flow rate was suppressed during 0 minutes, and increased during the latter 20 minutes. When the flat mask produced in this manner was press-molded in the same manner, a shadow mask was completed that did not peel off even at the folded portions.

以上の実施例ではシャドウマスク用素材として2Cr−
35Ni−Feと2Mn−36Ni−Fe合金を用イテ
説明したが本発明はこれに限るものでなく、35Ni−
Fe合金や32Ni−5Co等のスーパーアンバーを含
む鉄及びニッケルを主成分とする合金であれば同様に適
用し得ることは言うまでもない。更に本製造法はシャド
ウマスクに限らずカラー受像管に内装されるマスクフレ
ーム、インナーシルトが同様の鉄及びニッケルを主成分
とする合金であれば適用し得ることは言うまでもない。
In the above embodiments, 2Cr-
Although 35Ni-Fe and 2Mn-36Ni-Fe alloys were used, the present invention is not limited thereto;
It goes without saying that any alloy whose main components are iron and nickel, including super amber, such as Fe alloy or 32Ni-5Co, can be similarly applied. Furthermore, it goes without saying that this manufacturing method is applicable not only to shadow masks but also to color picture tubes as long as the mask frame and inner silt are made of an alloy containing iron and nickel as their main components.

〔発明の効果〕〔Effect of the invention〕

以上の様に本発明によれば、焼鈍から黒化を能率的に行
う事ができ、充分な厚みの黒色酸化膜を生成できる。ま
たフラットマスク保管時の赤さびの発生も防止できる等
の利点も併せ持ち、工業上極めて有効なものと言える。
As described above, according to the present invention, blackening can be efficiently performed from annealing, and a black oxide film of sufficient thickness can be produced. It also has the advantage of preventing the formation of red rust during storage of flat masks, making it extremely effective industrially.

Claims (1)

【特許請求の範囲】 1)Cr又はMnの少なくとも一種を含むFe及びNi
を主成分とする薄板状金属板に多数の開孔を穿設する工
程と、前記多数の開孔の穿設された金属板を焼鈍する工
程と、前記焼鈍された金属板に黒色酸化皮膜を形成する
工程と、前記黒色酸化皮膜が形成された金属板を成形す
る工程とを少なくとも備えたシヤドウマスクの製造方法
。 2)前記焼鈍の工程後室温にもどす事なく連続で黒色酸
化膜を形成する工程を施した事を特徴とする特許請求の
範囲第1項記載のシヤドウマスクの製造方法。 3)前記黒色酸化皮膜と薄板状金属板の界面にはCr又
はMnの濃化層を形成させる事を特徴とした特許請求の
範囲第1項記載のシヤドウマスクの製造方法。
[Claims] 1) Fe and Ni containing at least one of Cr or Mn
a step of drilling a large number of holes in a thin metal plate mainly composed of a metal plate, an annealing of the metal plate with the large number of holes, and a step of forming a black oxide film on the annealed metal plate. A method for manufacturing a shadow mask, comprising at least the steps of forming a black oxide film, and molding a metal plate on which the black oxide film is formed. 2) The method for manufacturing a shadow mask according to claim 1, wherein a step of continuously forming a black oxide film is performed without returning the material to room temperature after the annealing step. 3) The method for manufacturing a shadow mask according to claim 1, characterized in that a Cr or Mn concentrated layer is formed at the interface between the black oxide film and the thin metal plate.
JP5819285A 1985-03-25 1985-03-25 Method for manufacturing shed mask Expired - Lifetime JPH06105590B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5819285A JPH06105590B2 (en) 1985-03-25 1985-03-25 Method for manufacturing shed mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5819285A JPH06105590B2 (en) 1985-03-25 1985-03-25 Method for manufacturing shed mask

Publications (2)

Publication Number Publication Date
JPS61218051A true JPS61218051A (en) 1986-09-27
JPH06105590B2 JPH06105590B2 (en) 1994-12-21

Family

ID=13077154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5819285A Expired - Lifetime JPH06105590B2 (en) 1985-03-25 1985-03-25 Method for manufacturing shed mask

Country Status (1)

Country Link
JP (1) JPH06105590B2 (en)

Also Published As

Publication number Publication date
JPH06105590B2 (en) 1994-12-21

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