JPS61203555A - Fluorescent light source tube - Google Patents

Fluorescent light source tube

Info

Publication number
JPS61203555A
JPS61203555A JP4192785A JP4192785A JPS61203555A JP S61203555 A JPS61203555 A JP S61203555A JP 4192785 A JP4192785 A JP 4192785A JP 4192785 A JP4192785 A JP 4192785A JP S61203555 A JPS61203555 A JP S61203555A
Authority
JP
Japan
Prior art keywords
insulating layer
anode
light source
source tube
insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4192785A
Other languages
Japanese (ja)
Other versions
JPH0574903B2 (en
Inventor
Tokuhide Shimojo
徳英 下条
Shigeki Kikuta
菊田 繁樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Noritake Itron Corp
Original Assignee
Ise Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ise Electronics Corp filed Critical Ise Electronics Corp
Priority to JP4192785A priority Critical patent/JPS61203555A/en
Publication of JPS61203555A publication Critical patent/JPS61203555A/en
Publication of JPH0574903B2 publication Critical patent/JPH0574903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J63/00Cathode-ray or electron-stream lamps
    • H01J63/06Lamps with luminescent screen excited by the ray or stream

Landscapes

  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)

Abstract

PURPOSE:To improve the reliability of a fluorescent light source tube by installing a few insulating layers, having slit-like openings for exposing the phosphors of a phosphor dot array located on an anode, on the anode and installing a grid electrode over the insulating layers. CONSTITUTION:Several phosphors 3 are placed on an anode 2a on a base plate 1 along its longitudinal direction to form a phosphor dot array. Next, insulating layers 7 and 8 having slit-like openings for exposing the phosphors 3 are installed on the anode 2a and then a grid electrode 5 is placed over the insulating layers 7 and 8, thereby constituting a fluorescent light source tube. The insulating layer 7 is formed by exposing noncrystalline glass to light and the insulating layer 8 is formed by subjecting noncrystalline glass to screen printing. The width of the slits 13 is adjusted to be larger than that of slits 12. Due to the above structure, the number of pin holes is reduced, the positional accuracy is increased and any contact between a grid 5 and the anode 2a is prevented. Consequently, it is possible to improve the yield and the reliability of the fluorescent light source tube.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はファクシミリ用光源や複写機用光源などに用い
られる螢光光源管に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a fluorescent light source tube used in facsimile light sources, copying machine light sources, and the like.

〔従来の技術〕[Conventional technology]

螢光光源管は、絶縁基板上に形成した陽極上に塗布筋れ
た螢光体により発光点を形成し、この発光点を一方向に
複数個並置せしめて発光点列を構成して、上記絶縁基板
上の真空容器外に引き出された陽極リードのうち任意の
1ii)ffllJ−ドを選択することにより、選択さ
れた陽極上の螢光体をカソードルミネセンスにより発光
きせるようにしたもので、ファクシミリ用光源や複写機
用光源として用いられている。
In a fluorescent light source tube, a light emitting point is formed by a phosphor coated on an anode formed on an insulating substrate, and a plurality of light emitting points are arranged side by side in one direction to form a light emitting point array. By selecting any one of the anode leads drawn out of the vacuum container on the insulating substrate, the phosphor on the selected anode is made to emit light by cathodoluminescence. It is used as a light source for facsimile machines and copying machines.

第3図は従来の螢光光源管の基板構造を示す平面図であ
る。同図において、1は絶縁基板、2はその詳細を第4
図に示すように、一端2aが陽極として一直線上に配置
され、他端2bが外部IJ−ドとして交互に真空容器外
に引き出されて、絶縁基板1上に配置された複数個の陽
極兼外部リードである。また、3はその詳細を第5図に
示すように、各陽極兼外部リード2の一端2a (以下
、陽極という)上に塗布されて発光点を形成する例えば
znO:znからなる螢光体であり、これら螢光体3が
絶縁基板1上の長手方向に沿って一列に並置されて発光
点列を形成している。4は前記絶縁基板1上の螢光体3
の配列方向に沿って該螢光体3を露出させるべく形成さ
れたスリット状の開口部10を有する絶縁層、5はこの
絶縁層4上に配置されたスリット状の開口部11を有す
るグリッド′電極、6はこのグリッド電極5上に張設さ
れたカソードでおる。なお、絶縁基板1は図示しないフ
ェースガラスと封着され、真空容器を形成している。ま
た、第5図中符号dはグリッドtff15の開口部11
の幅を示している。
FIG. 3 is a plan view showing the substrate structure of a conventional fluorescent light source tube. In the figure, 1 is an insulating substrate, 2 is the details of the 4th
As shown in the figure, one end 2a is arranged in a straight line as an anode, and the other end 2b is alternately pulled out of the vacuum container as an external IJ-do. It is the lead. Further, 3 is a phosphor made of, for example, znO:zn, which is coated on one end 2a (hereinafter referred to as anode) of each anode/external lead 2 to form a light emitting point, as the details are shown in FIG. These phosphors 3 are arranged in a row along the longitudinal direction of the insulating substrate 1 to form a row of light emitting points. 4 is a phosphor 3 on the insulating substrate 1;
5 is an insulating layer having slit-like openings 10 formed to expose the phosphors 3 along the arrangement direction of the insulating layer 4; The electrode 6 is a cathode stretched over the grid electrode 5. Note that the insulating substrate 1 is sealed with a face glass (not shown) to form a vacuum container. Further, the symbol d in FIG. 5 indicates the opening 11 of the grid tff15.
It shows the width.

ところで、このように構成された螢光光源管は、10.
000 fL 前後の高輝度が要求されるため、螢光体
層への入射電流は100 mAA−In近い高電流密度
が必要になる。このような高電流密度を得るために、カ
ソード6と螢光体3との間隔は0.5〜1mと非常に狭
く、グリッド電極5は絶縁層4上に直接置かれている。
By the way, the fluorescent light source tube configured as described above has 10.
Since a high brightness of around 100 mAA-In is required, the current incident on the phosphor layer needs to have a high current density of around 100 mAA-In. In order to obtain such a high current density, the distance between the cathode 6 and the phosphor 3 is very narrow, 0.5 to 1 m, and the grid electrode 5 is placed directly on the insulating layer 4.

従って、絶縁層4としては、絶縁基板1上の発光点列に
相当する30(−FF1程度に近い長さにわたって位置
精度や形状が良好なことはもちろんグリッド電極5と陽
極2a とが電気的にタッチしないようにピンホールの
ないことが必要になる。嘔らに、グリッド電極5と絶縁
基板1との間隙部9に螢光体や導電性のゴミなどがある
と、グリッド電極5と陽極2aにタッチが生じる□ので
、絶縁層4の厚みは厚い方が望ましい。
Therefore, the insulating layer 4 should not only have good positional accuracy and shape over a length close to 30 (-FF1), which corresponds to the array of light emitting points on the insulating substrate 1, but also be electrically connected to the grid electrode 5 and the anode 2a. It is necessary that there be no pinholes to prevent touching.Additionally, if there is fluorescent material or conductive dust in the gap 9 between the grid electrode 5 and the insulating substrate 1, the grid electrode 5 and the anode 2a Since a touch occurs on □, it is desirable that the thickness of the insulating layer 4 is thicker.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところが、上記した従来の螢光光源管においては、絶縁
層4はスクリーン印刷法によって形成しているため、次
のような問題点を有していた。すなわち、■スクリーン
製版の伸び縮み等により細長いスリット状の開口部10
を精度良く形成できない。■印刷機の機械的精度等によ
り発光点列とのくり返し位置合せ精度が悪い。■絶縁ペ
ーストの印刷後のダレを防ぐためと厚みを得るために、
ペースト中にフィラーを添加している。このため、ピン
ホールが発生しやすい(フィラー添加をしていない絶縁
ペーストの印刷はダレが生じ全く使用で、きない)。な
どの問題を有し、製造上、歩留や信頼性を低下させる要
因となっていた。
However, in the conventional fluorescent light source tube described above, the insulating layer 4 is formed by a screen printing method, and therefore has the following problems. In other words, ■ an elongated slit-shaped opening 10 due to expansion and contraction of screen plate making, etc.
cannot be formed accurately. - Repeated positioning accuracy with the light emitting point array is poor due to the mechanical precision of the printing machine. ■To prevent the insulating paste from sagging after printing and to increase the thickness,
Fillers are added to the paste. For this reason, pinholes are likely to occur (printing with insulating paste without filler addition causes sagging and is completely unusable). These problems have caused a decline in yield and reliability in manufacturing.

本発明は、このような事情に鑑みてなされたもので、絶
縁層を多層構造としこの絶縁層上にグリッド電極を配設
することにより、歩留および信頼性を向上せしめた螢光
光源管を提供するものである。           
   ′・、〔問題点を解決するだめの手段〕 本発明に係る螢光光源管は、絶縁基板上に形成した陽極
上に塗布でれた螢光体により発光点を形成し、この発光
点を一方向に複数個配列して発光点列を構成して、前記
絶縁基板上の真空容器外に引き出された任意の陽極リー
ドを選択することにより、この陽ffi IJ−ド上の
延長上の陽極上の螢光体がカソードルミネセンスにより
発光する螢光光源管において、前記絶縁基板上の発光点
列を構成する陽極上の螢光体の配列方向に沿って該螢光
体を露出させるべく形成されたスリット状の開口部を有
する複数層の絶縁層を設け、かつこの絶縁層上にその開
口部と対応して形成でれたスリット状の開口部を有する
グリッド電極を積み重ねて設けたものである。
The present invention has been made in view of these circumstances, and provides a fluorescent light source tube with improved yield and reliability by having an insulating layer in a multilayer structure and arranging a grid electrode on the insulating layer. This is what we provide.
[Means for solving the problem] The fluorescent light source tube according to the present invention forms a light-emitting point using a phosphor coated on an anode formed on an insulating substrate. By arranging a plurality of light emitting points in one direction to form a row of light emitting points and selecting an arbitrary anode lead drawn out to the outside of the vacuum vessel on the insulating substrate, an anode extending on this anode can be formed. In a fluorescent light source tube in which the upper phosphor emits light by cathodoluminescence, the phosphor is formed so as to be exposed along the arrangement direction of the phosphor on the anode constituting the light emitting point array on the insulating substrate. A plurality of insulating layers each having a slit-like opening are provided, and a grid electrode having a slit-like opening corresponding to the opening is stacked on the insulating layer. be.

〔作用〕[Effect]

本発明においては、顛縁基板上の発光点列を構成する陽
極上の螢光体の配列方向にスリット状の開口部を有する
複数層の絶縁層を形成し、この絶縁層上にグリッド電極
5を重ねて配設することにより、前記絶縁層のピンホー
ルが少なく、しかも該絶縁層へのグリッド電極の位置精
度が良好となり、グリッド電極と陽極との電気的タッチ
を低減することが可能になる。
In the present invention, a plurality of insulating layers having slit-like openings are formed in the direction in which the phosphors on the anode constituting the light emitting point array on the frame substrate are arranged, and grid electrodes 5 are formed on this insulating layer. By arranging them one on top of the other, there are fewer pinholes in the insulating layer, and the positional accuracy of the grid electrode on the insulating layer is improved, making it possible to reduce electrical contact between the grid electrode and the anode. .

〔実施例〕〔Example〕

以下、本発明を図面に示す実症例に基いて説明する。 The present invention will be explained below based on actual cases shown in the drawings.

第1図および第2図は本発明に係る螢光光源管の一実施
例を示す第5図相当の断面図およびその平面図であり、
第3図乃至第5図と同一符号は同一または相当部分を示
す。この実施例の螢光光源管が上記した従来のものと異
なる点は、絶縁基板1上の発光点列を構成する陽iZa
 上の螢光体3の配列方向に沿って該螢光体を露出すべ
くスリット状の開口部12を有する第1層の絶縁層7を
露光法により形成するとともに、この絶縁J@i 7上
にスリット状の開口部13を有する第2層の絶縁層8を
印刷法により形成して2層構造とし、この絶縁層8丘に
スリット状の開口部11を有するグリッド電画5を積み
重ねて配設するようにしたことである。この場合、前記
絶縁層1はスリット状の開口部(以下スリットと称する
)12がそのとに積み重ねられた絶縁層8のスリット1
3より螢光体3の発光点列側に接近して形成場れる。ま
た、グリッドを極5はそのスリット11が前記絶縁層8
のスリット13より発光点列側に接近して日差し状に飛
び出して形成きれている。なお、図中符号7、および8
、は前記各絶縁NJ7および8のスリット部分の端部を
示し、符号5□はグリッド″aLisのスリット部分の
端部を示している。
1 and 2 are a sectional view and a plan view thereof corresponding to FIG. 5 showing an embodiment of the fluorescent light source tube according to the present invention,
The same reference numerals as in FIGS. 3 to 5 indicate the same or corresponding parts. The difference between the fluorescent light source tube of this embodiment and the conventional one described above is that the fluorescent light source tube of this embodiment is different from the conventional one described above.
A first insulating layer 7 having a slit-shaped opening 12 is formed along the arrangement direction of the upper phosphors 3 to expose the phosphors 3 by an exposure method. A second insulating layer 8 having slit-shaped openings 13 is formed by a printing method to form a two-layer structure, and grid electric pictures 5 having slit-shaped openings 11 are stacked on top of this insulating layer 8. This is what we decided to do. In this case, the insulating layer 1 has a slit-shaped opening (hereinafter referred to as slit) 12 formed in the insulating layer 8, which has a slit 12 stacked thereon.
3, the formation field is closer to the light emitting point array side of the phosphor 3. In addition, the grid pole 5 has slits 11 in the insulating layer 8.
The slit 13 approaches the light emitting point row side and projects out like sunlight. In addition, the symbols 7 and 8 in the figure
, indicates the end of the slit portion of each of the insulators NJ7 and 8, and symbol 5□ indicates the end of the slit portion of the grid "aLis."

次に、上記各絶縁層7.8の形成方法について具体的に
説明する。まず、ピンホールの少ない絶縁材料としてフ
ィラーを含まない非晶質ガラスを使用し、陽極兼外部リ
ード2(第4図参照)を複数個並置して陽極パターンが
形成された絶縁基板1上に1層目の絶縁層7を露光法に
より形成する。
Next, a method for forming each of the above-mentioned insulating layers 7.8 will be specifically explained. First, amorphous glass that does not contain fillers is used as an insulating material with few pinholes, and a plurality of anode/external leads 2 (see Fig. 4) are arranged side by side on an insulating substrate 1 on which an anode pattern is formed. The second insulating layer 7 is formed by an exposure method.

すなわち、水溶性のフォトレジスト(例えばジアゾ系の
もの)を用いて陽極2a 上に螢光体3が形成場れる幅
より広い幅で螢光体と同じ方向に露光によりライン状に
7オトレジストのパターンを10〜20μmの厚みで形
成する。次に、油性のフィラーを11ない非晶質材のガ
ラスペーストをスクリーン印刷により形成し、乾燥後先
の水溶性フォトレジストを水洗により除去すると、この
パターン上にある絶縁層は一緒に除去される(いわゆる
リフトオフ法)。これでスリット12を有する絶縁層I
のパターンが形成てれる。この時、絶縁層7は乾燥、固
化されているので、フィラーを含まなくてもダレは生じ
ない。この後、焼成によりガラス化し、約10μm厚み
の絶縁層7が形成される。このようにしてフィラーを含
まない非晶質ガラスペーストを露光法により形成するこ
とにより、ピンホールの少ない位置精度の良いスリット
12を有する絶縁層7が形成できる。
That is, using a water-soluble photoresist (for example, a diazo type photoresist), a pattern of 7 photoresists is formed in a line on the anode 2a by exposure in the same direction as the phosphor in a width wider than the width where the phosphor 3 is formed. is formed with a thickness of 10 to 20 μm. Next, an amorphous glass paste containing no oil-based filler is formed by screen printing, and after drying, the water-soluble photoresist is removed by washing with water, and the insulating layer on this pattern is removed together. (The so-called lift-off method). Now the insulating layer I with the slit 12
A pattern is formed. At this time, since the insulating layer 7 has been dried and solidified, no sagging occurs even if it does not contain filler. Thereafter, it is vitrified by firing to form an insulating layer 7 with a thickness of about 10 μm. By forming the amorphous glass paste containing no filler by the exposure method in this manner, the insulating layer 7 having the slits 12 with few pinholes and high positional accuracy can be formed.

次いで、このように形成した第1層の絶縁層7上に絶縁
層8を印刷法により積層して形成する。
Next, an insulating layer 8 is laminated by a printing method on the first insulating layer 7 formed in this manner.

これは、従来のように1層の絶縁層上K1ff接グリン
ド電極5を積み重ねた場合、(1)絶縁層の厚みが〜1
0μm程度と薄く、その螢光体側の間隙部9の位置での
タッチが生じやすい。また、(11)非晶質ガラス層自
体はピンホールは非常に少ないが、基板上にゴミ等があ
れば結果的にピンホールとなる等の問題が生じており、
この問題点を解決するために、上記絶縁層7の上に絶縁
層8を債み重ねて2層構造としたものである。すなわち
、スリット12を有する第1層の絶縁層7の上に、非晶
質ガラス材に屁、03粒子などのフィラーを加えた通常
の絶縁ガラスペーストを通常のスクリーン印刷法にて形
成し、その後焼成してスリット13を有する絶縁層8を
約20μmの厚みで重ねて形成する。この場合、第2層
の絶縁層8のスリット13の幅は、すでにパターン精度
の良い第1層の絶縁層7が形成されているため、余裕を
もって第1層の絶縁層7のスリット幅よりも比較的広く
とれ、またパターン精度も比較的ラフでよい。さらに第
1層の絶縁層7はピンホールが少ないため、第2層の絶
縁層8に多少のピンホールがあっても、これら各層の絶
縁層7および8のピンホールが重なる場合は極めて希で
ある。
This means that when the K1ff contact grid electrode 5 is stacked on one insulating layer as in the past, (1) the thickness of the insulating layer is ~1
It is thin, about 0 μm, and is easily touched at the position of the gap 9 on the phosphor side. In addition, (11) the amorphous glass layer itself has very few pinholes, but if there is dust on the substrate, problems such as pinholes will occur as a result.
In order to solve this problem, an insulating layer 8 is stacked on the insulating layer 7 to form a two-layer structure. That is, on the first insulating layer 7 having the slits 12, a normal insulating glass paste made of an amorphous glass material and fillers such as fart and 03 particles is formed by a normal screen printing method, and then By firing, an insulating layer 8 having slits 13 is formed with a thickness of about 20 μm. In this case, the width of the slit 13 of the second insulating layer 8 is larger than the slit width of the first insulating layer 7 with a margin, since the first insulating layer 7 with good pattern accuracy has already been formed. It can be relatively wide, and the pattern accuracy can be relatively rough. Furthermore, since the first insulating layer 7 has few pinholes, even if there are some pinholes in the second insulating layer 8, it is extremely rare for the pinholes in the insulating layers 7 and 8 to overlap. be.

このようにして形成された絶縁層7および8においてそ
の長でが約300−のスリットの一例を示すと、第1層
7はスリット12の幅が150±10μmで螢光体3の
発光点列との平行度はきわめて良好(中心線上で10μ
m以内のズレ)であった。また第2層8はスリット13
の幅が350士100μm1中心線上のズレが100μ
m以内であった。
Taking an example of a slit having a length of about 300 mm in the insulating layers 7 and 8 formed in this way, in the first layer 7, the width of the slit 12 is 150±10 μm, and the light emitting point array of the phosphor 3 is shown. The parallelism with the center line is very good (10 μ on the center line)
The deviation was within m). In addition, the second layer 8 has slits 13
The width is 350 mm and the deviation on the center line is 100 μm.
It was within m.

次に、これら第1.第2層の絶縁層7および8上に積み
重ねたスリット11を有するグリッド電極5について述
べる。このグリッド電極5はカソード6からの電子を効
果的に螢光体3上に導くためのものである。そのため、
精度良い細いスリット(通常150μm程度)11を有
するグリッド電極5を位置精度良く積み重ねる必要があ
る。このため、絶縁層上で位置合せをするが、従来の第
5図に示すように絶縁層4が1層の場合は、螢光体3の
面と絶縁層面の基板よりの高さがほぼ同じになるので、
グリッド電極の位置合せ中に螢光面に当たりやすい。ま
た、絶縁層4がグリッド電極5のスリット11内に露出
すると、そこにカソード6からの電子がたまり(チャー
ジアップ)、発光強度が下がる。従って、絶縁層4が露
出しないように形成するためには、そのスリット100
幅に余裕をとると、グリッド電極5と基板1間の螢光体
残渣による部分9のタッチが多く発生する不具合があっ
た。例えば、グリッド電極5のスリット11に150μ
mを使用したとき、スクリーン印刷で形成する絶縁層4
はスリット幅300±25μm1中心線上でのプレ50
μmが必要となる。これは非常に難しい寸法精度である
。本発明による2層構造の絶縁層7および8上に積み重
ねられたグリッド電極5においては、 +11  グリッド電極5のスリット110幅を第1層
の絶縁層7のスリット12の幅とほぼ同じにすることに
より、グリッドの位置合せがやり易く、かつ精度良くで
きる。
Next, these first. A grid electrode 5 having slits 11 stacked on second insulating layers 7 and 8 will be described. This grid electrode 5 is for effectively guiding electrons from the cathode 6 onto the phosphor 3. Therefore,
It is necessary to stack grid electrodes 5 having precisely narrow slits (usually about 150 μm) 11 with high positional accuracy. For this reason, alignment is performed on the insulating layer, but if the insulating layer 4 is one layer as shown in FIG. So,
It is easy to hit the fluorescent surface during alignment of the grid electrode. Further, when the insulating layer 4 is exposed in the slit 11 of the grid electrode 5, electrons from the cathode 6 accumulate there (charge up), and the emission intensity decreases. Therefore, in order to form the insulating layer 4 so that it is not exposed, the slit 100 must be
If a margin is provided for the width, there is a problem in that many touches occur in the portion 9 due to phosphor residue between the grid electrode 5 and the substrate 1. For example, the slit 11 of the grid electrode 5 has a diameter of 150 μm.
Insulating layer 4 formed by screen printing when m is used.
is slit width 300±25μm1 pre-50 on center line
μm is required. This is a very difficult dimensional accuracy. In the grid electrode 5 stacked on the insulating layers 7 and 8 of the two-layer structure according to the present invention, +11 the width of the slit 110 of the grid electrode 5 is approximately the same as the width of the slit 12 of the first insulating layer 7. This makes grid alignment easier and more accurate.

(2)絶縁層8の面を螢光体面より高くすることができ
、グリッド電極5の位置合わせ作業中の螢光体3に触る
ことがない。
(2) The surface of the insulating layer 8 can be made higher than the surface of the phosphor, and the phosphor 3 is not touched during positioning of the grid electrode 5.

(3)第2層の絶縁層8はそのスリット13の幅を広く
とっても、グリッド電極5の日差し部と基板1上との間
に残った残渣部分91は一方が第1層の絶縁層7のため
電気的タッチにならない。
(3) Even if the width of the slit 13 of the second insulating layer 8 is wide, the residue portion 91 remaining between the sunlight part of the grid electrode 5 and the top of the substrate 1 is one side of the first insulating layer 7. Therefore, there will be no electrical touch.

などの利点を奏する。It has advantages such as:

なお、上記した実施例では第1層の絶縁層T上にさらに
1層を積層した場合について示したが、2層、3層と積
層しても勿論良い。
In addition, although the above-described embodiment shows the case where one layer is further laminated on the first insulating layer T, it goes without saying that two or three layers may be laminated.

また、第1層の絶縁層7は、ガラスペーストを用いたリ
フトオフ法により形成した厚膜絶縁層について述べたが
、ピンホールの少ない精度の良い絶縁層であれば良く、
例えばスパッタl cvo I蒸着法などにより成膜し
露光によりパターニングを行なった8%02 、 A/
、20B  などの非晶質薄膜絶縁層でも良い。
Further, although the first insulating layer 7 is a thick film insulating layer formed by a lift-off method using glass paste, it may be any insulating layer with high precision with few pinholes.
For example, 8%02, A/
, 20B or the like may also be used.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明に係る螢光光源管によれば、
絶縁基板上の発光点列を構成する陽極上の螢光体の配列
方向にスリットを有する複数層の絶縁層を設け、この絶
縁層上にグリッド電極を配置した構造とすることにより
、前記絶縁層のピンホールが少なく加工精度も向上して
、その絶縁層へのグリッド電極の位置精度が良好となる
。これによって、グリッド電極と陽極との電気的タッチ
が低減化され、歩留ならびに信頼性の向上がはかれる効
果がある。
As explained above, according to the fluorescent light source tube according to the present invention,
By providing a structure in which a plurality of insulating layers having slits are provided in the arrangement direction of the phosphors on the anode constituting the light emitting point array on the insulating substrate, and a grid electrode is arranged on this insulating layer, the insulating layer The number of pinholes is reduced, the processing accuracy is improved, and the positional accuracy of the grid electrode on the insulating layer is improved. This has the effect of reducing electrical contact between the grid electrode and the anode, improving yield and reliability.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は本発明に係る螢光光源管の一実施
例を示す要部新館図およびその平面図、第3図は従来の
螢光光源管の基板構造を示す平面図、第4図は第3図の
陽極兼外部リードの一部を示す拡大平面図、第5図は従
来の螢光光源管の断面図である。 1・・・・絶縁基板、乏・・・・陽極兼外部リード、2
a  ・・・・陽−”、3・・・・螢光体、5・・・・
グリッド電極、6・・・・カソード、7・・・・第1層
の絶縁層゛、8・・・・第2層の絶縁層、11・・・・
スリット状の開口部(スリット)、12.13・・・・
スリット状の開口部(スリット)。
1 and 2 are a new main part diagram and a plan view thereof showing an embodiment of the fluorescent light source tube according to the present invention, and FIG. 3 is a plan view showing the substrate structure of a conventional fluorescent light source tube, and FIG. 4 is an enlarged plan view showing a part of the anode and external lead of FIG. 3, and FIG. 5 is a sectional view of a conventional fluorescent light source tube. 1...Insulating substrate, poor...Anode/external lead, 2
a...positive-", 3...fluorescent material, 5...
Grid electrode, 6... cathode, 7... first layer insulating layer, 8... second layer insulating layer, 11...
Slit-shaped opening (slit), 12.13...
A slit-shaped opening (slit).

Claims (2)

【特許請求の範囲】[Claims] (1)絶縁基板上に形成した陽極上に塗布された螢光体
により発光点を形成し、この発光点を一方向に複数個配
列して発光点列を構成して、前記絶縁基板上の真空容器
外に引き出された任意の陽極リードを選択することによ
り、陽極リード上の延長上の陽極上の螢光体がカソード
ルミネセンスにより発光する螢光光源管において、前記
絶縁基板上の発光点列を構成する陽極上の螢光体の配列
方向に沿つて該螢光体を露出させるべく形成されたスリ
ット状の開口部を有する複数層の絶縁層を設け、前記絶
縁層の第1層の開口部はその上に積み重ねられた絶縁層
の開口部より前記発光点列に接近して形成されかつこの
絶縁層上にその開口部と対応して形成されたスリット状
の開口部を有するグリッド電極を積み重ねて設けたこと
を特徴とする螢光光源管。
(1) A light-emitting point is formed by a phosphor coated on an anode formed on an insulating substrate, and a plurality of light-emitting points are arranged in one direction to form a light-emitting point row, and a light-emitting point is formed on the insulating substrate. By selecting an arbitrary anode lead drawn out of the vacuum container, a light emitting point on the insulating substrate can be set in a fluorescent light source tube in which a phosphor on an anode extending from the anode lead emits light by cathodoluminescence. A plurality of insulating layers having slit-like openings formed to expose the phosphors on the anodes constituting the row are provided, and the first layer of the insulating layer is A grid electrode having an opening formed closer to the light emitting point array than an opening in an insulating layer stacked above the grid electrode, and having a slit-like opening formed on the insulating layer in correspondence with the opening. A fluorescent light source tube characterized by being provided in a stacked manner.
(2)複数層の絶縁層のうち第1層目の絶縁層は非晶質
ガラス材料を用いて露光法により形成し、第1層上の絶
縁層の少くとも1層は非晶質ガラス材にフィラーを含有
した材料で印刷法により形成したことを特徴とする特許
請求の範囲第1項記載の螢光光源管。
(2) The first insulating layer among the plurality of insulating layers is formed by an exposure method using an amorphous glass material, and at least one of the insulating layers on the first layer is made of an amorphous glass material. 2. The fluorescent light source tube according to claim 1, wherein the fluorescent light source tube is formed by a printing method using a material containing a filler.
JP4192785A 1985-03-05 1985-03-05 Fluorescent light source tube Granted JPS61203555A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4192785A JPS61203555A (en) 1985-03-05 1985-03-05 Fluorescent light source tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4192785A JPS61203555A (en) 1985-03-05 1985-03-05 Fluorescent light source tube

Publications (2)

Publication Number Publication Date
JPS61203555A true JPS61203555A (en) 1986-09-09
JPH0574903B2 JPH0574903B2 (en) 1993-10-19

Family

ID=12621869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4192785A Granted JPS61203555A (en) 1985-03-05 1985-03-05 Fluorescent light source tube

Country Status (1)

Country Link
JP (1) JPS61203555A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4949099A (en) * 1987-10-07 1990-08-14 Futaba Denshi Kogyo Kabushiki Kaisha Fluorescent printer head using a single filamentary cathode
JPH04123751A (en) * 1990-09-13 1992-04-23 Futaba Corp Fluorescent printer head and manufacture thereof
US5754216A (en) * 1993-09-22 1998-05-19 Kabushiki Kaisha Toshiba Optical recording head and image recording apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4949099A (en) * 1987-10-07 1990-08-14 Futaba Denshi Kogyo Kabushiki Kaisha Fluorescent printer head using a single filamentary cathode
JPH04123751A (en) * 1990-09-13 1992-04-23 Futaba Corp Fluorescent printer head and manufacture thereof
US5754216A (en) * 1993-09-22 1998-05-19 Kabushiki Kaisha Toshiba Optical recording head and image recording apparatus

Also Published As

Publication number Publication date
JPH0574903B2 (en) 1993-10-19

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