JPS61198270U - - Google Patents
Info
- Publication number
- JPS61198270U JPS61198270U JP7739385U JP7739385U JPS61198270U JP S61198270 U JPS61198270 U JP S61198270U JP 7739385 U JP7739385 U JP 7739385U JP 7739385 U JP7739385 U JP 7739385U JP S61198270 U JPS61198270 U JP S61198270U
- Authority
- JP
- Japan
- Prior art keywords
- plasma etching
- chamber
- plasma
- circular
- electromagnets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 1
- 238000005530 etching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7739385U JPS61198270U (id) | 1985-05-23 | 1985-05-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7739385U JPS61198270U (id) | 1985-05-23 | 1985-05-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61198270U true JPS61198270U (id) | 1986-12-11 |
Family
ID=30620423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7739385U Pending JPS61198270U (id) | 1985-05-23 | 1985-05-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61198270U (id) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63277778A (ja) * | 1987-05-08 | 1988-11-15 | Anelva Corp | 放電化学反応装置の回転磁界発生装置 |
-
1985
- 1985-05-23 JP JP7739385U patent/JPS61198270U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63277778A (ja) * | 1987-05-08 | 1988-11-15 | Anelva Corp | 放電化学反応装置の回転磁界発生装置 |