JPS61172219A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS61172219A
JPS61172219A JP1395685A JP1395685A JPS61172219A JP S61172219 A JPS61172219 A JP S61172219A JP 1395685 A JP1395685 A JP 1395685A JP 1395685 A JP1395685 A JP 1395685A JP S61172219 A JPS61172219 A JP S61172219A
Authority
JP
Japan
Prior art keywords
oxide
chromium oxide
protective film
magnetic
recording medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1395685A
Other languages
Japanese (ja)
Inventor
Shigeo Fujii
重男 藤井
Shiro Murakami
志郎 村上
Shigeru Oguma
小熊 繁
Masato Dobashi
土橋 正人
Shigeo Endo
遠藤 重郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP1395685A priority Critical patent/JPS61172219A/en
Publication of JPS61172219A publication Critical patent/JPS61172219A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a magnetic disk, etc. having excellent resistance to corrosion and weather and which is also highly lubricative by forming a protective layer contg. chromium oxide and silicon oxide or germanium oxide on a magnetic thin film formed on a substrate. CONSTITUTION:A magnetic layer of a ferromagnetic metallic thin film, ferromagnetic oxide, etc. is formed on an Al (alloy) substrate, a ceramic substrate, etc., and then a protective film consisting of chromium oxide and silicon oxide (one between SiO2 and SiO or their mixture) or chromium oxide and germanium oxide (one between SiO2 and SiO or their mixture) or chromium oxide, silicon oxide and germanium oxide is formed on the magnetic layer. Chromium oxide enhances the hardness, and silicon oxide and germanium oxide have excellent resistance to corrosion and weather and considerably high lubricity. As the chromium oxide content increases, the lubricity decreases. Consequently, the chromium oxide content is regulated to 15%, the thickness of the protective film is controlled to 50-1,000Angstrom to control the spacing loss to a low value, and a magnetic recording medium having excellent CSS resistant characteristic, etc. and good durability is obtained.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は磁性薄膜及びこの表面側に形成された保護膜を
有する磁気記録媒体に係り、特にこの保護膜の耐食性を
高めたディスク形の磁気記録媒体に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic recording medium having a magnetic thin film and a protective film formed on the surface side of the magnetic recording medium, and particularly relates to a disk-shaped magnetic recording medium in which the protective film has improved corrosion resistance. Regarding recording media.

[従来の技術1 記録密度の高い合金磁性薄膜を有する磁気記録媒体の研
究開発が近年大いに推進されているが、その一つとして
、基板の板面上に磁性薄膜層を形成し、さらにその上に
保護膜を設けたものがある。
[Prior art 1] Research and development of magnetic recording media having alloy magnetic thin films with high recording density has been greatly promoted in recent years. Some have a protective film on them.

この保護膜としては、オスミウム、ルテニウム、イリジ
ウム、マンガン、タングステン等の金属、酸化珪素、酸
化チタン、酸化タンタル、酸化ハフニウム等の酸化物、
各種の窒化物、炭化物、ホウ素、炭素、炭素とホウ素の
合金、ポリ珪酸、ダイヤモンド構造炭素からなる膜を用
いることが公知である(特開昭59−61106)。
As this protective film, metals such as osmium, ruthenium, iridium, manganese, and tungsten, oxides such as silicon oxide, titanium oxide, tantalum oxide, and hafnium oxide,
It is known to use films made of various nitrides, carbides, boron, carbon, alloys of carbon and boron, polysilicic acid, and diamond structure carbon (Japanese Patent Laid-Open No. 59-61106).

[発明が解決しようとする問題点] これらの保護膜のうち、潤滑性に優れるところから、炭
素がしばしば用いられているが、この炭素保護膜は、H
2Oや02等を透過させる性質が比較的高く、これがた
めに磁性膜層の耐食、耐候性を高めるという本来の保護
作用にやや欠けるという問題があった。
[Problems to be Solved by the Invention] Among these protective films, carbon is often used because of its excellent lubricity.
It has a relatively high property of transmitting 2O, 02, etc., and therefore has a problem in that it lacks the original protective effect of increasing the corrosion resistance and weather resistance of the magnetic film layer.

また、」二記の炭素以外の材質からなる保護膜において
は、多少耐食性、耐候性に優れてはいるものの潤滑性が
炭素よりもかなり劣るという問題があった。
In addition, a protective film made of a material other than carbon as described in item 2 has a problem in that although it has somewhat excellent corrosion resistance and weather resistance, its lubricity is considerably inferior to that of carbon.

[問題点を解決するための手段1 本発明者らは、磁気記録媒体の磁性薄膜上に形成される
保護膜について、鋭意研究を重ねた結果、保護膜として
酸化クロムと酸化シリコン及び/又は酸化ゲルマニウム
とを含んでなるものは耐食性、耐候性に著しく優れ、か
つ潤滑性についても相当に優れた性質を有することを見
出した。
[Means for Solving the Problems 1] As a result of extensive research into the protective film formed on the magnetic thin film of a magnetic recording medium, the inventors found that chromium oxide, silicon oxide, and/or oxidized It has been found that materials containing germanium have extremely excellent corrosion resistance and weather resistance, and also have considerably excellent lubricity.

本発明はかかる知見に基いて成されたものであり、 基板の板面−Lに磁性薄膜が形成されており、かつこの
磁性薄膜の表面に保護膜層が形成された磁気記録媒体に
おいて、該保護膜層は、酸化クロム、例えばCr2O3
と、酸化シリコン(SiO。
The present invention has been made based on this knowledge, and provides a magnetic recording medium in which a magnetic thin film is formed on the plate surface -L of a substrate, and a protective film layer is formed on the surface of this magnetic thin film. The protective film layer is made of chromium oxide, e.g. Cr2O3
and silicon oxide (SiO.

lとSiOのいずれかあるいは混合物)及び/又は酪化
ゲルマニウム(G e O2とGeOのいずれかあるい
は混合物)とを含んでなることを特徴とする磁気記録媒
体、 を要旨とするものである。
1 and SiO (or a mixture thereof) and/or germanium butyride (G e O 2 and GeO or a mixture thereof).

以下本発明について更に詳細に説明する。The present invention will be explained in more detail below.

本発明においては、基板としては、アルミニウム、マグ
ネシウムを数%含むアルミニウム合金、チタン合金など
が用いられるが、軽量かつ安価であり加工も容易な点か
らしてアルミニウム合金が好適である。なお、近年、セ
ラミック基板が注目されているが、本発明はこのセラミ
ック基板やガラス基板をも用い得る。
In the present invention, aluminum, an aluminum alloy containing several percent of magnesium, a titanium alloy, and the like are used as the substrate, and an aluminum alloy is preferable because it is lightweight, inexpensive, and easy to process. Note that although ceramic substrates have attracted attention in recent years, the present invention can also use such ceramic substrates and glass substrates.

基板は、その表面が平坦になる様仕上げ処理されたもの
が用いられる。この基板の上には表面精度向」−及びヘ
ッドクラッシュによるディスク表面の変形を防ぐために
、アルマイトやNi −P等の硬質の下地層が設けられ
る。(なお、セラミック基板の場合は必ずしも必要では
ない。)基板がアルミニウム又はアルミニウム合金であ
る場合には、下地層としてこの基板の表面を陽極酸化法
によってアルマイト層を形成することができる。アルマ
イト層の厚さは、特に限定されるものではないが、通常
は数pm−数10gm、例えば10#Lm前後程度とさ
れる。
The substrate used is one that has been finished so that its surface is flat. A hard underlayer of alumite, Ni--P, or the like is provided on this substrate to improve surface accuracy and to prevent deformation of the disk surface due to head crashes. (Note that this is not necessarily necessary in the case of a ceramic substrate.) When the substrate is made of aluminum or an aluminum alloy, an alumite layer can be formed as a base layer on the surface of the substrate by anodizing. The thickness of the alumite layer is not particularly limited, but is usually about several pm to several tens of gm, for example about 10 #Lm.

N1−Pの下地層は、通常、無電解めっき法により形成
され、その厚ごとしては、約lO〜1100p程度とさ
れる。また、これらのアルマイト下地層やN1−P下地
層は、その上に磁性薄膜を形成するに先立って表面研磨
するのが好ましい。
The N1-P underlayer is usually formed by electroless plating, and its thickness is approximately 10 to 1100 p. Further, it is preferable that the surface of these alumite underlayers and N1-P underlayers be polished before forming a magnetic thin film thereon.

下地層の上には磁性薄膜が形成される。A magnetic thin film is formed on the underlayer.

この磁性薄膜としては、合金磁性薄膜や酸化物系磁性薄
膜を用いることができるが、合金磁性薄膜としては、C
o、Co−Ni、Co−Ni −Pt、Co−N1−P
、Co−Pt系等各種のものを用いることができる。ま
た、CoやNiの一部をFeでおきかえたものであって
も良い。酸化物系磁性薄膜としては、γ−Fe、03等
が挙げられる。
As this magnetic thin film, an alloy magnetic thin film or an oxide-based magnetic thin film can be used, but as an alloy magnetic thin film, C
o, Co-Ni, Co-Ni-Pt, Co-N1-P
, Co--Pt type, etc. can be used. Alternatively, a part of Co or Ni may be replaced with Fe. Examples of the oxide-based magnetic thin film include γ-Fe, 03, and the like.

これらの磁性薄膜は、通常のスパッタリング等の気相め
っき法や特開昭56−41524号に記載のように、液
相めっき法によって形成できる。
These magnetic thin films can be formed by ordinary vapor phase plating methods such as sputtering or liquid phase plating methods as described in Japanese Patent Laid-Open No. 56-41524.

なお、上記の組成系及び製造法は、本発明においては、
−例であって、特にこれらに限定されるものではない。
In addition, in the present invention, the above composition system and manufacturing method are as follows:
- This is an example and is not particularly limited to these.

磁性薄膜の上には酸化クロムと酸化シリコン及び/又は
酸化ゲルマニウムからなる保護膜を形成する。
A protective film made of chromium oxide, silicon oxide, and/or germanium oxide is formed on the magnetic thin film.

具体的には、酸化クロムと酸化シリコン、酸化クロムと
酸化ゲルマニウム、酸化クロムと酸化シリコンと酸化ゲ
ルマニウムの3通りが挙げられる。この酸化シリコンと
酸化ゲルマニウムは前記の炭素よりも優れた耐食性及び
耐候性を有し、かつ潤滑性についても相当に優れた特性
を有する。
Specifically, there are three types: chromium oxide and silicon oxide, chromium oxide and germanium oxide, and chromium oxide, silicon oxide, and germanium oxide. The silicon oxide and germanium oxide have better corrosion resistance and weather resistance than the carbon, and also have considerably better lubricity.

酸化クロムは硬質であり、保護膜の耐摩耗性等を高める
。なお、酸化クロム自体は潤滑性を有しないので、含有
率は、保護膜全体のうち15モル%以下とし、保護膜の
潤滑性を低下させないようにするのが好ましい。
Chromium oxide is hard and increases the wear resistance of the protective film. Note that since chromium oxide itself does not have lubricity, the content is preferably 15 mol% or less of the entire protective film so as not to reduce the lubricity of the protective film.

この保護膜はその膜厚が1000Åを越えると、形成時
間が長くなると共に、磁気ヘッドと磁性薄膜との距離を
大きくしディスクの電磁変換特性を低下させる。また、
当然ながら、薄すぎる場合には、保護膜としての機能を
果さなくなる。好ましい膜厚は50〜1000Å、特に
好ましい膜厚は100〜800A、とりわけ200〜6
00Aである。更にこの保護膜の上に各種の有機物質か
ら成る潤滑剤を塗布することもできる。
If the thickness of this protective film exceeds 1000 Å, the formation time becomes longer and the distance between the magnetic head and the magnetic thin film becomes larger, which deteriorates the electromagnetic conversion characteristics of the disk. Also,
Naturally, if it is too thin, it will not function as a protective film. The preferred film thickness is 50 to 1000 Å, particularly preferred film thickness is 100 to 800 Å, especially 200 to 6
It is 00A. Furthermore, a lubricant made of various organic substances can also be applied onto this protective film.

し作用1 磁性薄膜上に形成された酸化クロムと酸化シリコン及び
/又は酸化ゲルマニウムとを含んでなる保護膜は、酸化
シリコン、酸化ケ°゛1しくニウムが耐食性、耐候性に
優れると共に、酸化クロムにより保護膜全体の硬度が高
められる。従って、本発明の磁気記録媒体は、耐食性、
耐候性に優れ、かつ耐C3S特性等に優れ、実用性が高
い。
Effect 1 A protective film formed on a magnetic thin film containing chromium oxide and silicon oxide and/or germanium oxide has excellent corrosion resistance and weather resistance, while silicon oxide, silicon oxide, and/or germanium oxide have excellent corrosion resistance and weather resistance. This increases the hardness of the entire protective film. Therefore, the magnetic recording medium of the present invention has corrosion resistance,
It has excellent weather resistance, excellent C3S resistance, etc., and is highly practical.

[実施例] 以下、本発明を具体的実施例によって詳細に説明する。[Example] Hereinafter, the present invention will be explained in detail using specific examples.

なお以下に述べる実施例はr、f、マグネトロンスパッ
タ装置によったが、イオン工学的に同様のことが言える
イオンビームスパッタリング等によって本発明の効果を
得ることが可能であることは無論である。
Although the embodiments described below are based on r, f, and magnetron sputtering devices, it goes without saying that the effects of the present invention can also be obtained by ion beam sputtering, etc., which can be said to be similar in terms of ion technology.

実施例1 マグネシウムを4%含むアルミニウム合金基板(大きさ
:直径130mm、内径40 m m、厚さ1.9mm
)について表面を旋盤加工し平坦にした。次いで、無電
解めっき法によってこの加工基板の七にN1−P層を厚
さ25gmになるよう形成し、片面約51Lmポリシン
グしたのち0.05ないし0.171m深さのスクラッ
チをアトランダムに付加(テクスチャー処理)した状態
で鏡面研磨仕上げした。
Example 1 Aluminum alloy substrate containing 4% magnesium (size: diameter 130 mm, inner diameter 40 mm, thickness 1.9 mm)
), the surface was lathed to make it flat. Next, an N1-P layer was formed on the processed substrate to a thickness of 25 gm by electroless plating, and after polishing one side by approximately 51 Lm, scratches with a depth of 0.05 to 0.171 m were randomly added ( Textured) and finished with mirror polish.

次にr、f、平板マグネ]・ロンスパッタ装置を用い、
Cr膜を4000A形成し、その後、空気中に晒すこと
なく、直ちに下記条件にてCo−Ni薄膜を形成した。
Next, using a r, f, flat plate magnet]・ron sputtering device,
A 4000A Cr film was formed, and then a Co--Ni thin film was immediately formed under the following conditions without exposing it to the air.

初期排気         2 X I O”−6To
rrスパッタリング時雰囲気  Ar スパッタリング時雰囲気圧 12 mTorr投入電力
         ILcw ターゲット組成      Ni  20原子%残部C
O 極間隔          108mm磁性薄膜の膜厚
      500A 薄膜形成速度       200A/min基板温度
         200°Cその後、ターゲットをC
r20310モル%、残部Siのものとしたこと及び雰
囲気のアルゴン中に2〜3%の酸素(分圧で)を含有さ
せたこと以外は上記と同様にし、酸化クロム−酸化シリ
コン系保護膜を40OA厚さとなるようにしてスパッタ
リングして形成し、磁気記録媒体とした。この磁気記録
媒体の#CSS性テストを行った。このテストは、保護
膜を付けた5埼゛′φデイスクにつき5屋″φデイスク
ドライブに装着して行った。
Initial exhaust 2 X I O”-6To
rr Atmosphere during sputtering Ar Atmospheric pressure during sputtering 12 mTorr Input power ILcw Target composition Ni 20 at% balance C
O Pole spacing 108mm Film thickness of magnetic thin film 500A Thin film formation rate 200A/min Substrate temperature 200°C Then, the target was heated to C
A chromium oxide-silicon oxide based protective film was formed at 40 OA by using the same method as above except that the argon atmosphere contained 2 to 3% oxygen (in partial pressure). A magnetic recording medium was formed by sputtering to a certain thickness. A #CSS property test of this magnetic recording medium was conducted. This test was conducted using a 5" diameter disk with a protective film attached to a 5" diameter disk drive.

用いたヘッドはM n−Z nウィンチェスタ−型であ
り、内周部R==50mmでのヘッド浮上量を0.45
舊m(3600rpm時)に設定して、この点でテスト
を行った。C3Sサイクルは第1図によった。
The head used was an Mn-Zn Winchester type, and the head flying height at the inner circumference R = = 50 mm was set to 0.45.
A test was conducted at this point with the engine speed set at 3,600 rpm. The C3S cycle was as shown in FIG.

耐C8S性の寿命はスタート時対比再生出力が10%低
下する時点あるいはエラーが1ケでも増大する時点とし
た。
The life of the C8S resistance was defined as the point at which the reproduction output decreased by 10% compared to the starting point or the point at which the number of errors increased by even one.

第1表にテスト結果を示す。Table 1 shows the test results.

実施例2 ターゲットの組成及びスパッタ時間を種々変更して、保
護膜材質及び保護膜厚さを第1表のように変えた他は、
実施例1と同様にして磁気記録媒体を作成した。
Example 2 The target composition and sputtering time were variously changed, and the protective film material and protective film thickness were changed as shown in Table 1.
A magnetic recording medium was produced in the same manner as in Example 1.

これらのfI#C5S性テスト結果を第1表に示す。The results of these fI#C5S tests are shown in Table 1.

比較例1 保護膜として、5i02.オスミウム、窒化珪素、炭化
珪素、ダイヤモンド構造炭素からなるものをそれぞれ用
いたこと以外は、実施例1と同様にして磁気記録媒体を
作成し、同様にして耐CSS性テストを行った。
Comparative Example 1 As a protective film, 5i02. Magnetic recording media were prepared in the same manner as in Example 1, except that osmium, silicon nitride, silicon carbide, and diamond structure carbon were used, and CSS resistance tests were conducted in the same manner.

その結果を第1表に示す。The results are shown in Table 1.

第1表より、本発明に係る磁気記録媒体においては、保
護膜の潤滑性が高いことが明らかである。
From Table 1, it is clear that in the magnetic recording medium according to the present invention, the protective film has high lubricity.

なお、オスミウム、窒化珪素、炭化珪素、ダイヤモンド
構造炭素保護膜については膜厚を40OAにして同様に
耐C3S性テストを試みたが、いずれも寿命はIOK回
以下であった。また、フロロカーボン系潤滑剤付加を1
00A程度しても20に回置下であった。通常、耐C3
S性はlOK回ないし20に回置上必要とされているの
で、安全性をみた場合これらの保護膜は耐C5S性的に
充分でない。
Note that C3S resistance tests were similarly attempted for osmium, silicon nitride, silicon carbide, and diamond-structured carbon protective films with a film thickness of 40 OA, but all of them had lifetimes of IOK times or less. In addition, 1 fluorocarbon lubricant was added.
Even if it was about 00A, it was under rotation to 20A. Normally resistant to C3
Since the S property is required to be between 10K times and 20 times, these protective films are not sufficient in terms of C5S resistance when looking at safety.

なお、上記実施例及び比較例に係る磁気記録媒について
その耐食性及び耐候性を試験した。
The magnetic recording media according to the above Examples and Comparative Examples were tested for their corrosion resistance and weather resistance.

この試験は、試料(磁気記録媒体)を、比抵抗3MΩ・
cm(25℃)の純水中に1週間浸漬し、残留磁束密度
(B r)の減少量(ΔBr)を求めることにより行っ
た。結果を第2表に示す。
In this test, the sample (magnetic recording medium) was
The measurement was performed by immersing the sample in pure water at 25° C. for one week and determining the amount of decrease (ΔBr) in the residual magnetic flux density (Br). The results are shown in Table 2.

第  2  表 第2表より、本発明に係る磁気記録媒体は優れた耐食性
及び耐候性を有することが明らかである。
Table 2 It is clear from Table 2 that the magnetic recording medium according to the present invention has excellent corrosion resistance and weather resistance.

[効果] 以上詳述した通り、本発明の磁気記録媒体の保護膜は、
耐食性及び耐候性に優れているので、磁性層の十分な保
護が図れ、磁気記録媒体の耐久性に優れる。
[Effects] As detailed above, the protective film of the magnetic recording medium of the present invention has the following effects:
Since it has excellent corrosion resistance and weather resistance, the magnetic layer can be sufficiently protected, and the magnetic recording medium has excellent durability.

また、この保護膜は潤滑性、耐C5S性も高く、実用性
に優れる。
Moreover, this protective film has high lubricity and C5S resistance, and is excellent in practicality.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は耐C8S性テスト用ドライブの回転特性を示す
FIG. 1 shows the rotational characteristics of a drive for testing C8S resistance.

Claims (3)

【特許請求の範囲】[Claims] (1)基板の板面上に磁性薄膜が形成されており、かつ
この磁性薄膜の表面に保護膜層が形成された磁気記録媒
体において、該保護膜層は、酸化クロムと、酸化シリコ
ン及び/又は酸化ゲルマニウムとを含んでなることを特
徴とする磁気記録媒体。
(1) In a magnetic recording medium in which a magnetic thin film is formed on the plate surface of a substrate and a protective film layer is formed on the surface of this magnetic thin film, the protective film layer is made of chromium oxide, silicon oxide and/or or germanium oxide.
(2)保護膜層中の酸化クロムの含有率は15モル%以
下であることを特徴とする特許請求の範囲第1項に記載
の磁気記録媒体。
(2) The magnetic recording medium according to claim 1, wherein the content of chromium oxide in the protective film layer is 15 mol% or less.
(3)保護膜層の厚さが50〜1000Åであることを
特徴とする特許請求の範囲第1項又は第2項に記載の磁
気記録媒体。
(3) The magnetic recording medium according to claim 1 or 2, wherein the protective film layer has a thickness of 50 to 1000 Å.
JP1395685A 1985-01-28 1985-01-28 Magnetic recording medium Pending JPS61172219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1395685A JPS61172219A (en) 1985-01-28 1985-01-28 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1395685A JPS61172219A (en) 1985-01-28 1985-01-28 Magnetic recording medium

Publications (1)

Publication Number Publication Date
JPS61172219A true JPS61172219A (en) 1986-08-02

Family

ID=11847660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1395685A Pending JPS61172219A (en) 1985-01-28 1985-01-28 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS61172219A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780135A (en) * 1995-09-13 1998-07-14 Kabushiki Kaisha Toshiba Magnetic disc apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780135A (en) * 1995-09-13 1998-07-14 Kabushiki Kaisha Toshiba Magnetic disc apparatus

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