JPS61171147U - - Google Patents
Info
- Publication number
- JPS61171147U JPS61171147U JP5499085U JP5499085U JPS61171147U JP S61171147 U JPS61171147 U JP S61171147U JP 5499085 U JP5499085 U JP 5499085U JP 5499085 U JP5499085 U JP 5499085U JP S61171147 U JPS61171147 U JP S61171147U
- Authority
- JP
- Japan
- Prior art keywords
- relay
- relays
- mounting block
- prevention frame
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002265 prevention Effects 0.000 claims description 6
Landscapes
- Patch Boards (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5499085U JPH0136270Y2 (ru) | 1985-04-13 | 1985-04-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5499085U JPH0136270Y2 (ru) | 1985-04-13 | 1985-04-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61171147U true JPS61171147U (ru) | 1986-10-23 |
| JPH0136270Y2 JPH0136270Y2 (ru) | 1989-11-06 |
Family
ID=30577245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5499085U Expired JPH0136270Y2 (ru) | 1985-04-13 | 1985-04-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0136270Y2 (ru) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8694145B2 (en) | 2001-06-19 | 2014-04-08 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
-
1985
- 1985-04-13 JP JP5499085U patent/JPH0136270Y2/ja not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8694145B2 (en) | 2001-06-19 | 2014-04-08 | Applied Materials, Inc. | Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0136270Y2 (ru) | 1989-11-06 |