JPS61164279U - - Google Patents

Info

Publication number

JPS61164279U

JPS61164279U JP4817285U JP4817285U JPS61164279U JP S61164279 U JPS61164279 U JP S61164279U JP 4817285 U JP4817285 U JP 4817285U JP 4817285 U JP4817285 U JP 4817285U JP S61164279 U JPS61164279 U JP S61164279U

Authority

JP

Japan

Prior art keywords

susceptor

reaction chamber

fixed part

wafer

bottom plate

Prior art date

1985-04-02

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000007664 blowing Methods 0.000 claims description 3
• 239000010453 quartz Substances 0.000 claims description 2
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
• 238000010438 heat treatment Methods 0.000 claims 2
• 229910052710 silicon Inorganic materials 0.000 claims 2
• 239000010703 silicon Substances 0.000 claims 2
• 230000006698 induction Effects 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 3
• 239000007789 gas Substances 0.000 description 3
• 238000004140 cleaning Methods 0.000 description 1
• 238000000034 method Methods 0.000 description 1
• 239000012495 reaction gas Substances 0.000 description 1