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Priority to JP4750185UpriorityCriticalpatent/JPH0241384Y2/ja
Publication of JPS61162632UpublicationCriticalpatent/JPS61162632U/ja
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Publication of JPH0241384Y2publicationCriticalpatent/JPH0241384Y2/ja
Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus