JPS6114480B2 - - Google Patents
Info
- Publication number
- JPS6114480B2 JPS6114480B2 JP3088381A JP3088381A JPS6114480B2 JP S6114480 B2 JPS6114480 B2 JP S6114480B2 JP 3088381 A JP3088381 A JP 3088381A JP 3088381 A JP3088381 A JP 3088381A JP S6114480 B2 JPS6114480 B2 JP S6114480B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- water
- irradiation
- saucer
- irradiation position
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000002184 metal Substances 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
Landscapes
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
本発明はポリエチレン、ポリ塩化ビニル等のプ
ラスチツクやゴム類の長尺体への電子線照射装置
に関する。ポリエチレン、ポリ塩化ビニル等でで
きた製品あるいは、ゴムでできた製品、たとえば
電線やチユーブは架橋処理のため電子線照射が行
なわれるが、長尺の製品の場合は電子線放出部の
照射窓の下を何回も往復させ電子線を照射する。
この場合照射窓から出た電子線は全部被照射体に
当るのではなくかなりの量が被照射体間を通して
下方等へ漏れてくる。このような漏れた電子線は
照射装置の下の床面であるコンクリートに当つた
り、照射装置あるいは、その付属装置を支える脚
部等の金属製物体に当つたりするが、この時電子
線が物体に当ることによつて制動X線が発生す
る。この制動X線のエネルギーはほぼその物体の
原子番号に比例するが、物体が金属体等の重い原
子番号の材料でできている場合は発生する制動X
線のエネルギーが大きく防護用の遮蔽壁はかなり
厚いものにする必要がある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam irradiation device for elongated objects such as plastics such as polyethylene and polyvinyl chloride, and rubber. Products made of polyethylene, polyvinyl chloride, etc., or products made of rubber, such as electric wires and tubes, are irradiated with electron beams for crosslinking. It is irradiated with an electron beam by moving back and forth over and over again.
In this case, the electron beam emitted from the irradiation window does not entirely hit the irradiated object, but rather a considerable amount leaks downward through between the irradiated objects. Such leaked electron beams may hit the concrete floor below the irradiation device, or hit metal objects such as the legs that support the irradiation device or its auxiliary equipment; Braking X-rays are generated when the beam hits an object. The energy of this braking X-ray is approximately proportional to the atomic number of the object, but if the object is made of a material with a heavy atomic number such as a metal body, the braking
The energy of the rays is large, so the protective shielding wall needs to be quite thick.
本発明はこのような問題点に鑑みなされた装置
に関するもので照射窓下の照射位置にて長尺の被
照射体に電子線を照射し、その下側へ漏れる電子
線を照射位置の下に置いた受皿の水にてうけ止め
るようにしたことを特徴とする。 The present invention relates to a device that was created in view of the above problems, and it irradiates an elongated object with an electron beam at an irradiation position below the irradiation window, and directs the electron beam leaking downward to the irradiation position. It is characterized in that it receives water from a saucer placed on it.
第1図は本発明の実施例を示すものであるが、
図において1は電子線放出部であり、2はその照
射窓、3は照射位置、4は被照射体で被照射体4
はロール5,5′間で何回も往復して電子線照射
を何回もうける構成になつている。6は照射位置
の下側に置いた受皿で水が張つてある。水は照射
位置の下側に漏れてくる電子線を完全に受けとめ
るだけの深さにするのが望ましいがそれよりも浅
くとも効果はある。 FIG. 1 shows an embodiment of the present invention.
In the figure, 1 is an electron beam emitting part, 2 is an irradiation window, 3 is an irradiation position, and 4 is an irradiated object.
The structure is such that the electron beam is irradiated with the electron beam many times by reciprocating between the rolls 5 and 5' many times. 6 is a saucer placed below the irradiation position and filled with water. It is desirable that the water be deep enough to completely catch the electron beam leaking below the irradiation position, but it is also effective if it is shallower than that.
又受皿には水の流入部流出部を設けて電子線が
当ることによる発熱あるいは分解物を除去するよ
うにすれば温度が上がりすぎたり、分解物がたま
りすぎたりすることがなくなる。 Furthermore, if the receiving tray is provided with a water inlet and an outlet to remove heat generated by exposure to the electron beam and decomposed products, the temperature will not rise too much and the decomposed products will not accumulate too much.
以上述べた本発明の装置では受皿の水で照射位
置の下側へ漏れる電子線を受けとめるようにする
ので水を構成する原子は一般にコンクリートや金
属でできた壁を構成する原子よりも原子番号が小
さいため電子線が当ることによる制動X線の発生
も少なく、防護用の遮蔽壁も水を張つた受皿を使
わない場合に比べ大がかりなものにする必要はな
くなり経済的である。 In the device of the present invention described above, the water in the saucer is used to receive the electron beam leaking to the lower side of the irradiation position, so the atoms that make up the water generally have a higher atomic number than the atoms that make up the walls made of concrete or metal. Because it is small, there is less generation of brake X-rays due to exposure to electron beams, and there is no need for a large-scale protective shielding wall compared to the case where a water-filled saucer is not used, making it more economical.
又水は電気良導体であるため流出部を通じ地下
に散乱電子線を散逸させる効果をもつている。 Also, since water is a good electrical conductor, it has the effect of dissipating scattered electron beams underground through the outflow section.
第1図は本発明電子線照射装置の実施例説明図
で図中1は電子線放出部、2は照射窓、3は照射
位置、4は被照射体、5,5′はロール、6は水
を張つた受皿を示す。
FIG. 1 is an explanatory diagram of an embodiment of the electron beam irradiation apparatus of the present invention. In the figure, 1 is an electron beam emitting part, 2 is an irradiation window, 3 is an irradiation position, 4 is an object to be irradiated, 5 and 5' are rolls, and 6 is a Shows a saucer filled with water.
Claims (1)
連続して電子線を照射する電子線照射装置におい
て、電子線放出部の照射窓の下の被照射体走行部
の下方に水を入れた受皿を設け、照射位置より下
方に漏れる電子線を水にて受けとめるようにした
ことを特徴とする電子線照射装置。 2 受皿は水の流入部、流出部をもち、水はたえ
ず流入、流出していることを特徴とする特許請求
の範囲第1項記載の電子線照射装置。[Scope of Claims] 1. In an electron beam irradiation device that continuously irradiates an electron beam from above a long irradiated object that travels in the horizontal direction, an irradiated object running section below an irradiation window of an electron beam emitting section. An electron beam irradiation device characterized in that a saucer filled with water is provided below the irradiation position, and the water catches electron beams leaking downward from the irradiation position. 2. The electron beam irradiation device according to claim 1, wherein the saucer has an inlet and an outlet for water, and water constantly flows in and out.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3088381A JPS56138300A (en) | 1981-03-03 | 1981-03-03 | Method of irradiating electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3088381A JPS56138300A (en) | 1981-03-03 | 1981-03-03 | Method of irradiating electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56138300A JPS56138300A (en) | 1981-10-28 |
JPS6114480B2 true JPS6114480B2 (en) | 1986-04-18 |
Family
ID=12316126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3088381A Granted JPS56138300A (en) | 1981-03-03 | 1981-03-03 | Method of irradiating electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56138300A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59102399U (en) * | 1982-12-27 | 1984-07-10 | 株式会社マキシム | infant souvenirs |
-
1981
- 1981-03-03 JP JP3088381A patent/JPS56138300A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59102399U (en) * | 1982-12-27 | 1984-07-10 | 株式会社マキシム | infant souvenirs |
Also Published As
Publication number | Publication date |
---|---|
JPS56138300A (en) | 1981-10-28 |
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