JPS61144092A - Circuit formation for printed wiring board by heat transfer - Google Patents

Circuit formation for printed wiring board by heat transfer

Info

Publication number
JPS61144092A
JPS61144092A JP26678884A JP26678884A JPS61144092A JP S61144092 A JPS61144092 A JP S61144092A JP 26678884 A JP26678884 A JP 26678884A JP 26678884 A JP26678884 A JP 26678884A JP S61144092 A JPS61144092 A JP S61144092A
Authority
JP
Japan
Prior art keywords
heat
printed wiring
film
wiring board
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26678884A
Other languages
Japanese (ja)
Inventor
正則 伊藤
竹中 史夫
文彦 林
遠矢 功治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP26678884A priority Critical patent/JPS61144092A/en
Publication of JPS61144092A publication Critical patent/JPS61144092A/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、エツチングによるプリント配線板の製作に関
し、感熱弦写型積層フィルムの感熱転写層をエツチング
レジストとして使用するプリント配線板の回路形成法に
関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to the production of printed wiring boards by etching, and relates to a method for forming circuits on printed wiring boards using a heat-sensitive transfer layer of a heat-sensitive string-type laminated film as an etching resist. Regarding.

(従来技術) プリント配線板は、通常銅張り積層板上の銅層をエツチ
ング液によって選択的に除去して、所望のパターンに銅
配線部分を残留形成し、製作される。
(Prior Art) Printed wiring boards are usually manufactured by selectively removing the copper layer on a copper-clad laminate using an etching solution to leave copper wiring portions in a desired pattern.

選択的に除去する方法としては、エツチングレジストと
呼ば庇る本質的にエツチング液に不溶な有機又は無機質
で所望の銅配線部分を被覆し、エツチング液の接触を押
えることが一般に行なわれている。
As a selective removal method, it is generally practiced to cover the desired copper wiring portions with an organic or inorganic material called an etching resist, which is essentially insoluble in the etching solution, and thereby prevent contact with the etching solution.

所望の銅配線部を被覆する方法としては、スクリーン印
刷洗液体レジスト法、ドライフィルム法などが良く知ら
れている。しかし、スクリーン印刷法では印刷精度に限
界があると共に、少量多品種生産においてはスクリーン
版をその都度作らねばならないなどの問題がある。一方
、液体レジスト法、ドライフィルム法では精度的には充
分であるが、現像処理によってエツチングレジストの回
路パターンを洗い出さねばならないという工程が必要と
なる。
As a method of covering a desired copper wiring portion, a screen printing wash-liquid resist method, a dry film method, etc. are well known. However, the screen printing method has limitations in printing accuracy, and also has problems such as the need to make screen plates each time in low-volume, high-mix production. On the other hand, although the liquid resist method and the dry film method have sufficient accuracy, they require a step in which the circuit pattern of the etching resist must be washed out by a development process.

(発明の目的) 本発明は、感熱転写型積層フィルムの感熱転写層をエツ
チングレジストとして使用することにより、現像不用で
、高精度の配線パターンを有するプリント配線板を製作
することを目的とする。
(Objective of the Invention) An object of the present invention is to manufacture a printed wiring board having a highly accurate wiring pattern without the need for development by using a heat-sensitive transfer layer of a heat-sensitive transfer type laminated film as an etching resist.

(発明の構成) 本発明は、支持体上に感熱転写層を有する積層フィルム
の感熱転写層面を回路作成用積層板の金属面に密着させ
た後、透明支持体側から高密度エネルギー光を、パター
ン状に露光することにより、該金属面上に転写されたエ
ツチングレジスト層を設けることを特徴とする熱転写法
によるプリント配線板の回路形式法である。
(Structure of the Invention) In the present invention, after the heat-sensitive transfer layer surface of a laminated film having a heat-sensitive transfer layer on a support is brought into close contact with the metal surface of a circuit-forming laminate, high-density energy light is emitted from the transparent support side in a pattern. This is a method for forming circuits on printed wiring boards using a thermal transfer method, which is characterized by providing an etching resist layer transferred onto the metal surface by exposing the metal surface to light.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明の感熱転写層は、感熱(光)性を有する無機物質
又は有機物質又はその両者と皮膜形成能と耐エツチング
性を有する有慨バインダー樹脂とからなる組成物を支持
体上に積層することにより得られる。
The heat-sensitive transfer layer of the present invention is obtained by laminating on a support a composition comprising an inorganic substance or an organic substance having heat-sensitive (photo) properties, or both, and a binder resin having film-forming ability and etching resistance. It is obtained by

感熱(光)性を有する無機物質又は有機物質としては、
照射(露光)する高密度エネルギー光の放射域に有効な
吸収域をもつことが望まれる。
Inorganic or organic substances that have heat-sensitive (light) properties include:
It is desirable to have an effective absorption range in the radiation range of the high-density energy light to be irradiated (exposed).

更に光エネルギーから熱エネルギーへ効率的に転換する
ことのできるものでなければならない。
Furthermore, it must be able to efficiently convert light energy into thermal energy.

このようなものとして無機物質としては、微粉末カーボ
ン、微粉末グラファイト等、有機物質としては、いわゆ
る°“熱線吸収剤1°°°顔料“°゛染料°゛等が挙げ
られ、使用する高密度エネルギー光の波長との関係で適
宜選択される。
Examples of such inorganic substances include fine powder carbon, fine powder graphite, etc., and organic substances include so-called heat ray absorbers, pigments, dyes, etc. It is appropriately selected in relation to the wavelength of energy light.

有機バインダー樹脂としては、アクリル系樹脂塩ビ系樹
脂、スチレン系樹脂、変性ポリエステル樹脂等の合成高
分子系の他、セルロース系樹脂などの天然高分子系のも
の゛も使用されうる。
As the organic binder resin, in addition to synthetic polymers such as acrylic resins, vinyl chloride resins, styrene resins, and modified polyester resins, natural polymers such as cellulose resins can also be used.

以上述べた組成物よりなる感熱転写層の厚味は使用する
高密度エネルギー光の出力、上記組成物の種類等により
選択されるが、通常5ミクロン以下であり、最低の厚味
はエツチング液、エツチング条件等によって左右される
が、通常0.1ミクロン程度である。なお、この感熱転
写層の上に、有機樹脂等よりなる保護層を設けることも
できる。
The thickness of the heat-sensitive transfer layer made of the composition described above is selected depending on the output of the high-density energy light used, the type of the composition, etc., but it is usually 5 microns or less, and the minimum thickness is the etching solution, Although it depends on etching conditions etc., it is usually about 0.1 micron. Note that a protective layer made of an organic resin or the like can also be provided on this heat-sensitive transfer layer.

支持体としては、使用する高密度エネルギー光に対して
必ずしも透明である必要はないが、透明なものが好まし
く、また、分解・劣化などが起らない°゛不活性°°な
ものでなければならない。このようなものとしてポリエ
チレンテレフタレートフィルム、ポリスチレンフィルム
等が挙げられる。
The support does not necessarily need to be transparent to the high-density energy light used, but it is preferably transparent, and it must be inert so that it does not decompose or deteriorate. No. Examples of such materials include polyethylene terephthalate film and polystyrene film.

本発明の高密度エネルギー光としては、その収束性がき
わめて良好なレーザー光を使用することが好ましい。
As the high-density energy light of the present invention, it is preferable to use a laser light with extremely good convergence.

レーザー光としては、YAGレーザ−、アルゴンレーザ
ー等が挙げられる。
Examples of laser light include YAG laser and argon laser.

本発明の回路形成法として、銅張積層板を例にとり説明
する。まず、本発明の積層フィルムの感熱転写層面を銅
張積層板の銅面と対向させるように置く。
The circuit forming method of the present invention will be explained by taking a copper-clad laminate as an example. First, the heat-sensitive transfer layer surface of the laminated film of the present invention is placed so as to face the copper surface of the copper-clad laminate.

次に、該積層フィルムの支持体側に回路パターン用マス
クフィルムヲ重ネ、マスクフィルム、積層フィルム、銅
張積層板をそれぞれ密着させる。
Next, a circuit pattern mask film, a mask film, a laminate film, and a copper-clad laminate are respectively brought into close contact with the support side of the laminate film.

密着は機械的密着、真空密着、吸引密着等の手段で達成
される。
Adhesion is achieved by mechanical adhesion, vacuum adhesion, suction adhesion, or other means.

次に、良く収束された高密度エネルギー光をマスク上か
ら走査し、マスクのパターンを銅張積層板上に転写させ
る。
Next, well-focused high-density energy light is scanned over the mask to transfer the mask pattern onto the copper-clad laminate.

又、別の方法としては、マスクフィルムを使用せず、高
密度エネルギー光を機械的あるいは光学的に移動させて
、配線パターンを描かせることにより、直接転写させる
こともできる。
Alternatively, the wiring pattern can be directly transferred without using a mask film by mechanically or optically moving high-density energy light.

このようにして銅面上に形成された熱転写層をエツチン
グレジストとしてエツチングを行なう。
Etching is performed using the thermal transfer layer thus formed on the copper surface as an etching resist.

エツチング液としては、塩化第二鉄系エツチング液、過
硫酸アンモニウム系エツチング液、塩化銅系エツチング
液、アルカリ性エツチング液等が使用されるが、これら
に限定されるものではない。
As the etching solution, a ferric chloride-based etching solution, an ammonium persulfate-based etching solution, a copper chloride-based etching solution, an alkaline etching solution, etc. can be used, but the etching solution is not limited to these.

エツチング後のレジストの剥離については、有機バイン
ダー樹脂成分により異なるが、剥離液としては、安全面
から不燃性溶剤を使用するのが好ましい。
Stripping of the resist after etching varies depending on the organic binder resin component, but from the viewpoint of safety, it is preferable to use a nonflammable solvent as the stripping liquid.

(発明の効果) 以上説明したように、本発明によるプリント配線板の回
路形成法によれば、高精度で、かつ゛現像工程を全く必
要とせず、場合によってはマスクフィルムをも必要とし
ないプリント配線板の製造が可能となる。又、高密度エ
ネルギー光と、それに対する感熱(光)物質を選ぶこと
により通常の感光性レジストでは困難な完全開窒化が可
能となり、作業環境が著しく改善される。
(Effects of the Invention) As explained above, according to the method for forming a circuit on a printed wiring board according to the present invention, the printed wiring board can be formed with high precision and does not require any development process and in some cases does not require a mask film. It becomes possible to manufacture plates. In addition, by selecting high-density energy light and a heat-sensitive (photo) substance for it, complete open nitridation, which is difficult with ordinary photosensitive resists, becomes possible, and the working environment is significantly improved.

実施例1゜ グラファイト100部、エチルセルロース30部及びイ
ソプロピルアルコール1170部からなるグラファイト
分散液をディップコーターによってポリエチレンテレフ
タレートフィルム(厚味70μ)上に乾燥皮膜厚味0.
35μに塗工し、この上に更に変性ポリエステル100
部、酢酸エチル900部からなる溶液をディップコータ
ーによって乾燥皮膜厚味0.15μに血工し、感熱転写
フィルムを作成した。銅面に研磨を施した銅張積層板(
銅箔厚味35μ)に上記のフィルムを塗工面を研磨した
銅面に密着させるようにして張り合せ、ポリエチレンテ
レフタレートフィルム側から12ff!VのYAGレー
ザー光を用いて配線パターンを描き、感熱転写層を銅面
上に転写させた。銅面への転写の状態+−2良好であっ
た。
Example 1 A graphite dispersion consisting of 100 parts of graphite, 30 parts of ethyl cellulose, and 1170 parts of isopropyl alcohol was coated on a polyethylene terephthalate film (thickness: 70μ) using a dip coater to form a dry film with a thickness of 0.
Coat 35μ and further coat with modified polyester 100μ.
A solution consisting of 900 parts of ethyl acetate was coated with a dip coater to a dry film thickness of 0.15 μm to prepare a heat-sensitive transfer film. Copper-clad laminate with polished copper surface (
The above film was pasted onto copper foil (thickness: 35μ) so that the coated side was in close contact with the polished copper surface, and 12ff! from the polyethylene terephthalate film side. A wiring pattern was drawn using a V YAG laser beam, and the heat-sensitive transfer layer was transferred onto the copper surface. The state of transfer to the copper surface was +-2 good.

これをアルカリ性エツチング液(シャツくンメタルフィ
ニシング社製;ニープロセス、i温s。
This was applied with an alkaline etching solution (manufactured by Shitsukun Metal Finishing Co., Ltd.; Knee Process, I-temperature S.

℃)でスプレーによってエツチングを行なうと配線回路
が形成された。
Etching was carried out by spraying at 10°C to form a wiring circuit.

実施例2゜ 実施例1と同様に作製した感熱転写フィルムを研磨を施
したポリインドフィルム製フレキシブル銅張基板(銅箔
゛厚味35μ、基板フィルム厚味50μ)と張り合せ、
配線ノ(ターンを転写させた。配写は良好であった。同
様にアルカ1)性エツチング液でエツチングを行なうと
高精度の配線回路が形成された。
Example 2 A heat-sensitive transfer film prepared in the same manner as in Example 1 was laminated with a flexible copper-clad substrate made of polished polyind film (copper foil thickness: 35 μm, substrate film thickness: 50 μm),
The wiring patterns (turns) were transferred. The distribution was good. Similarly, when etching was performed using an alkaline etching solution, a highly accurate wiring circuit was formed.

Claims (2)

【特許請求の範囲】[Claims] (1)支持体上に感熱転写層を有する積層フィルムの感
熱転写層面を回路作成用積層板の金属面に密着させた後
、透明支持体側から高密度エネルギー光を、パターン状
に照射することにより、該金属面上に転写されたエッチ
ングレジスト層を設けることを特徴とする熱転写法によ
るプリント配線板の回路形成法。
(1) After the heat-sensitive transfer layer surface of a laminated film having a heat-sensitive transfer layer on a support is brought into close contact with the metal surface of a circuit-forming laminate, high-density energy light is irradiated in a pattern from the transparent support side. A method for forming a circuit on a printed wiring board by a thermal transfer method, which comprises providing a transferred etching resist layer on the metal surface.
(2)高密度エネルギー光がレーザー光である特許請求
範囲第一項記載の回路形成法。
(2) The circuit forming method according to claim 1, wherein the high-density energy light is a laser light.
JP26678884A 1984-12-18 1984-12-18 Circuit formation for printed wiring board by heat transfer Pending JPS61144092A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26678884A JPS61144092A (en) 1984-12-18 1984-12-18 Circuit formation for printed wiring board by heat transfer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26678884A JPS61144092A (en) 1984-12-18 1984-12-18 Circuit formation for printed wiring board by heat transfer

Publications (1)

Publication Number Publication Date
JPS61144092A true JPS61144092A (en) 1986-07-01

Family

ID=17435696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26678884A Pending JPS61144092A (en) 1984-12-18 1984-12-18 Circuit formation for printed wiring board by heat transfer

Country Status (1)

Country Link
JP (1) JPS61144092A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303786A (en) * 1988-06-01 1989-12-07 Shikoku Chem Corp Manufacture of printed wiring board and thermal transfer ink therefor
JPH0354567A (en) * 1989-07-21 1991-03-08 Toyo Ink Mfg Co Ltd Film type resist and formation of resist
WO1997015173A1 (en) * 1995-10-17 1997-04-24 Minnesota Mining And Manufacturing Company Method for radiation-induced thermal transfer of resist for flexible printed circuitry

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964866A (en) * 1972-10-30 1974-06-24
JPS52116172A (en) * 1976-03-26 1977-09-29 Nec Corp Exposure method by light beam

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964866A (en) * 1972-10-30 1974-06-24
JPS52116172A (en) * 1976-03-26 1977-09-29 Nec Corp Exposure method by light beam

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01303786A (en) * 1988-06-01 1989-12-07 Shikoku Chem Corp Manufacture of printed wiring board and thermal transfer ink therefor
JPH0354567A (en) * 1989-07-21 1991-03-08 Toyo Ink Mfg Co Ltd Film type resist and formation of resist
WO1997015173A1 (en) * 1995-10-17 1997-04-24 Minnesota Mining And Manufacturing Company Method for radiation-induced thermal transfer of resist for flexible printed circuitry

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