JPS61140355U - - Google Patents
Info
- Publication number
- JPS61140355U JPS61140355U JP2284485U JP2284485U JPS61140355U JP S61140355 U JPS61140355 U JP S61140355U JP 2284485 U JP2284485 U JP 2284485U JP 2284485 U JP2284485 U JP 2284485U JP S61140355 U JPS61140355 U JP S61140355U
- Authority
- JP
- Japan
- Prior art keywords
- chemical liquid
- horizontal direction
- sprayed
- opening
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007921 spray Substances 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985022844U JPH0532848Y2 (nl) | 1985-02-20 | 1985-02-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985022844U JPH0532848Y2 (nl) | 1985-02-20 | 1985-02-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61140355U true JPS61140355U (nl) | 1986-08-30 |
JPH0532848Y2 JPH0532848Y2 (nl) | 1993-08-23 |
Family
ID=30515522
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985022844U Expired - Lifetime JPH0532848Y2 (nl) | 1985-02-20 | 1985-02-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0532848Y2 (nl) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0312918A (ja) * | 1989-06-12 | 1991-01-21 | Fujitsu Ltd | スプレー現像方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5732446A (en) * | 1980-08-04 | 1982-02-22 | Mitsubishi Electric Corp | Resist developing device |
JPS59232417A (ja) * | 1983-06-16 | 1984-12-27 | Toshiba Corp | 半導体ウエ−ハのレジスト現像装置 |
JPS61160930A (ja) * | 1985-01-09 | 1986-07-21 | Dainippon Screen Mfg Co Ltd | 基板の表面処理液供給方法 |
-
1985
- 1985-02-20 JP JP1985022844U patent/JPH0532848Y2/ja not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5732446A (en) * | 1980-08-04 | 1982-02-22 | Mitsubishi Electric Corp | Resist developing device |
JPS59232417A (ja) * | 1983-06-16 | 1984-12-27 | Toshiba Corp | 半導体ウエ−ハのレジスト現像装置 |
JPS61160930A (ja) * | 1985-01-09 | 1986-07-21 | Dainippon Screen Mfg Co Ltd | 基板の表面処理液供給方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0312918A (ja) * | 1989-06-12 | 1991-01-21 | Fujitsu Ltd | スプレー現像方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0532848Y2 (nl) | 1993-08-23 |