JPS61137124A - Image formation optical system with variable image formation characteristic - Google Patents

Image formation optical system with variable image formation characteristic

Info

Publication number
JPS61137124A
JPS61137124A JP25856984A JP25856984A JPS61137124A JP S61137124 A JPS61137124 A JP S61137124A JP 25856984 A JP25856984 A JP 25856984A JP 25856984 A JP25856984 A JP 25856984A JP S61137124 A JPS61137124 A JP S61137124A
Authority
JP
Japan
Prior art keywords
image formation
resistance body
state
voltage
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25856984A
Other languages
Japanese (ja)
Inventor
Masayuki Suzuki
雅之 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP25856984A priority Critical patent/JPS61137124A/en
Publication of JPS61137124A publication Critical patent/JPS61137124A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To control an image formation state by using an optical element which varies the state of the wave front of incident luminous flux by moving a grain body in liquid. CONSTITUTION:When a specific voltage is impressed to the heating resistance body 6b of an optical element, etc., the vapor bubble 7 of the grain body is formed nearby the resistor 6b of a liquid layer 2 of ethyl glycol, etc., between a reflecting layer 3 and a transparent protection plate 1 and never disappears even when the voltage impressed to the resistance body 6b, etc., is lowered. In this state, the hold voltage to the resistance body 6b is cut off and a necessary voltage corresponding to the distance from the resistance body 6b, etc., is impressed to an adjacent resistance body 6c, etc., so that the air bubble 7 moves to the position of the resistance body 6c and is held similarly. Only a light beam which has high incidence height to a pupil as to an incidence light beam is shifted in phase owing to absorption and scattering by variation in the wave front state of the incident luminous flux by the grain body, so when the optical element is inserted into the optical system as a soft-focus filter, only a part with high incidence height of spherical aberration is affected to cause flare aberration, thereby controlling the image formation state such as drawing ability.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は、結像特性を可変とする結像光学系に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an imaging optical system with variable imaging characteristics.

〔従来技術〕[Prior art]

一般に、写真レンズ等において、入射瞳を特殊な形状に
形成することによりソフトフォーカス機能を有するもの
がある。しかしながら、このような方法においては、開
口絞り径を変化すると、ソフトフォーカスは、該絞り径
の変化に対応して機能するため、ソフトフォーカス機能
に自由度を要求する撮影者に不都合である。
Generally, some photographic lenses have a soft focus function by forming an entrance pupil in a special shape. However, in such a method, when the diameter of the aperture diaphragm is changed, the soft focus functions in response to the change in the diameter of the aperture, which is inconvenient for photographers who require flexibility in the soft focus function.

〔発明の概要〕[Summary of the invention]

本発明の目的は、結像状態を制御する事が可能な結像光
学系を提供することにある。
An object of the present invention is to provide an imaging optical system that can control the imaging state.

本発明に於いては、液体内に存在する粒体を移動させる
ことにより入射光束の波面の状態を変化せしめる光学素
子を用いることにより上記目的を達成するものである。
The present invention achieves the above object by using an optical element that changes the state of the wavefront of an incident light beam by moving particles present in a liquid.

同、本発明においては、前記粒体とは、気体、固体及び
液体の三つの状if含むものである。気体としては液体
を沸騰させて形成した蒸気泡、液体とは異なり液体には
溶解しにくい成分より成る、気泡、例えば水済液中に混
入したアルゴン、空気、酸素、窒素、水素、ヘリウム、
ネオン、−酸化炭素、−酸化窒素、メタンなどの気泡で
ある。固体としては比較的密度の小さいもの、例えば高
分子材料、液体としてはもとの液体と混り合わない様な
液体であり、例えば水と油の組み合わせである。
Similarly, in the present invention, the particles include three states, i.e., gas, solid, and liquid. Examples of gases include vapor bubbles formed by boiling a liquid, and bubbles made of components that are difficult to dissolve in liquids, such as argon, air, oxygen, nitrogen, hydrogen, helium, and
These are bubbles of neon, -carbon oxide, -nitrogen oxide, methane, etc. The solid is a material with relatively low density, such as a polymeric material, and the liquid is a liquid that does not mix with the original liquid, such as a combination of water and oil.

以F1本発明ζこ関しで詳述する。The F1 invention ζ will be explained in detail below.

〔−)!:施例〕[-)! :Example]

第1図及び第2図は本発明の結縁光学系(こ光学素子と
して使用する粒体の移動機構を説明するだめの図である
。図中、1は透明保−板、2はエチルアルコールより成
る液体薄層、3は熱伝導性のある反射j−で、例えばT
a膜より成る。4は発熱抵抗体(6a、6b、・・・、
6e)を含み、且つ各抵抗体間を絶縁性の物質S (O
zで隔離した発熱抵抗体1−15は絶縁性の支持体であ
る。7は蒸気泡で形成さ不り入射光束の波面を変換する
粒体、8は導′14を線であり、発熱抵抗体(6a H
6b 、・−5e)を各々独〜fに駆動できる様個々の
駆動電圧(vI〜v5)lコ、l!!絖さ4%s一方発
熱抵抗体(6a。
Figures 1 and 2 are diagrams for explaining the moving mechanism of the grains used as the optical element of the present invention. 3 is a thermally conductive reflective layer, e.g. T
It consists of a membrane. 4 is a heating resistor (6a, 6b, . . .
6e) and an insulating substance S (O
The heating resistors 1-15 separated by z are insulating supports. 7 is a grain that is not formed by vapor bubbles and converts the wavefront of the incident light beam; 8 is a wire that connects the guide 14;
6b, .-5e) can be driven individually to f, respectively, using individual drive voltages (vI to v5) l, l! ! Thickness 4%s On the other hand, the heating resistor (6a.

61〕、・・、6e)の他端9は接地あるいは共通の電
圧に設定さイしている。従って各々の発熱抵抗体に印加
4−る電圧を制御することにより、発熱抵抗体の近傍の
液体層の温度を制御できる。S目)2より成る層4に、
ll設された発熱抵抗体の巾lIは例えば20μm1発
熱抵抗体の間隔12は50μmである。
61], . . . , 6e), the other end 9 is set to ground or a common voltage. Therefore, by controlling the voltage applied to each heating resistor, the temperature of the liquid layer near the heating resistor can be controlled. In the layer 4 consisting of Sth) 2,
The width lI of the heat generating resistors is, for example, 20 μm, and the interval 12 between the heat generating resistors is 50 μm.

第1図に示す様に発熱抵抗体6bに電圧が印加されてい
る場合ζこは気泡の粒体7は前記発熱抵抗体の近傍の位
置に存するが、発熱抵抗体6bに印加する電圧を切り、
発熱抵抗体6Cに電圧を印加すると粒体7は発熱抵抗体
6Cの近傍に移動する。
When a voltage is applied to the heating resistor 6b as shown in FIG. ,
When a voltage is applied to the heating resistor 6C, the particles 7 move to the vicinity of the heating resistor 6C.

この様に、液体内で温贋差を形成することにより粒体7
は移動し、第1図で示す様な素子であれば、発熱してい
る抵抗体の近傍に粒体が移動してゆく。
In this way, by forming a temperature difference in the liquid, the particles 7
If the element is as shown in FIG. 1, the particles will move near the resistor that is generating heat.

従って゛電圧を印加する発熱抵抗体を選ぶことにより、
粒体の位置を制御することが出来るのである。
Therefore, by selecting the heating resistor to which voltage is applied,
The position of the particles can be controlled.

この様lこ粒体を移動させることにより、該素子に入射
する光釆の波面を変化させるものである。
By moving the particles in this way, the wavefront of the light incident on the element is changed.

第1図1こ示す素子で液体内lこ気泡を粒体として設け
る場合には、発熱抵抗体lこ熱をかけて液体に蒸気泡を
形成することで、容易ζこ液体内に気泡を形成すること
が出来る。例えば第1図に示す構成の素子では、液体が
エチルアルコールである場合には、発熱抵抗体の両端に
約4.2vの直流電圧を印加すると、直径150μm程
度の泡が形成され、一度形成された蒸気泡は印加電圧を
下げても消滅しなかった。そして気泡より成る粒体は、
発熱抵抗体に印加する電圧を1.5v程度まで下げても
、発熱抵抗体の近傍に引きつけられたままであった。従
って、このことlこより、気泡の位置を保つことが出来
た。この場合59/1m@れた隣接する発熱抵抗体に1
゜5vの電圧を印加すると同時に、気泡を引きつけてい
る発熱抵抗体の電圧を切ると、気泡は隣接する発熱抵抗
体の位置へ移動した。又、120μm離れた2つ目の発
熱抵抗体へ直接移動させる場合には、発熱抵抗体に2v
の電圧を印加することにより、気泡は移動した。
Figure 1 When providing bubbles in the liquid as particles using the element shown in Figure 1, it is easy to form bubbles in the liquid by applying heat to the heating resistor and forming vapor bubbles in the liquid. You can. For example, in the device with the configuration shown in Figure 1, when the liquid is ethyl alcohol, when a DC voltage of about 4.2 V is applied across the heating resistor, bubbles with a diameter of about 150 μm are formed; The vapor bubbles did not disappear even when the applied voltage was lowered. And the particles made of air bubbles are
Even when the voltage applied to the heating resistor was lowered to about 1.5V, it remained attracted to the vicinity of the heating resistor. Therefore, this made it possible to maintain the position of the bubbles. In this case, 1
When a voltage of 5 V was applied and at the same time the voltage to the heating resistor attracting the bubbles was cut off, the bubbles moved to the position of the adjacent heating resistor. Also, when moving directly to the second heating resistor 120 μm apart, apply 2V to the heating resistor.
The bubbles were moved by applying a voltage of .

この様に第1図に示す素子では液体内での粒体を保持す
る為に、粒体を引きつけている発熱抵抗体に、液体に気
泡を生じない程度の電圧をバイアス電圧(保持電圧)と
して印加しておくことが、粒体の位置を保つ上で望まし
い。父、別の駆動方法としては、総ての発熱抵抗体に上
記バイアス電圧を印加させておき、粒体を移動させる目
的の位置に存する発熱抵抗体にバイアス電圧以上の比較
的高い電圧を印加し、粒体を引き寄せ、その後、バイア
ス電圧まで下げる。この様にして、粒体を所定の位置に
保持することができる。
In this way, in the device shown in Figure 1, in order to hold the particles in the liquid, a bias voltage (holding voltage) is applied to the heating resistor that attracts the particles to a level that does not create bubbles in the liquid. It is desirable to keep the voltage applied in order to maintain the position of the particles. Another driving method is to apply the above bias voltage to all heating resistors, and then apply a relatively high voltage higher than the bias voltage to the heating resistors located at the desired position to move the particles. , attracts the particles and then lowers the bias voltage. In this way, the granules can be held in place.

第3図は本発明に用いる光学素子の一実施例であって、
写真レンズ等の軟焦点フィルターとして用いた例を示す
図である。18はガラス基板であって該基板上にはリン
グ状の電極11及び13が同心に配置されている。該電
極上には発熱抵抗体12a、12b、12c・−・及び
14al14b114C・・・がそれぞれほぼ等間隔で
配列し、少くとも電極13及び発熱抵抗体14a、14
b。
FIG. 3 shows an example of an optical element used in the present invention,
It is a figure which shows the example used as a soft focus filter, such as a photographic lens. 18 is a glass substrate on which ring-shaped electrodes 11 and 13 are arranged concentrically. Heat generating resistors 12a, 12b, 12c, . . . and 14al14b114C, .
b.

14c・・・は透明な物質で形成さaているものとする
。15は後述するように写真レンズの光線有効部であっ
て、リング状邂極11は該有効部の外に位置し、リング
状邂極13は有効部の内側に位置している。また成極1
1及び13の一方の端はスイッチ17によっていずれか
一方が一定の電位に保たれ、他端は接地される構造にな
っている。また、気泡等の粒体は電極11が一定の電位
に保たれた第1の状態においては発熱抵抗体12a。
It is assumed that 14c... is made of a transparent material. As will be described later, reference numeral 15 indicates a light beam effective portion of the photographic lens, and the ring-shaped barb 11 is located outside the effective portion, and the ring-shaped barb 13 is located inside the effective portion. Also, Seikoku 1
One end of the terminals 1 and 13 is kept at a constant potential by a switch 17, and the other end is grounded. In addition, particles such as bubbles become the heating resistor 12a in the first state where the electrode 11 is kept at a constant potential.

12b、12c・・・上にあり、スイッチ17を切換え
た第2の状態では、発熱抵抗体12a上の粒体が発熱抵
抗体14a上に、発熱抵抗体12b上の粒体が同14b
上に、発熱抵抗体12c上の粒体が同14c上に、それ
ぞれ中心へ向って転送され、その結果粒体はすべて内側
の電極13上に移動する。
12b, 12c..., and in the second state when the switch 17 is switched, the grains on the heating resistor 12a are on the heating resistor 14a, and the grains on the heating resistor 12b are on the heating resistor 14b.
At the top, the particles on the heating resistor 12c are transferred onto the heating resistor 14c toward the center, and as a result, all the particles move onto the inner electrode 13.

第4図は第3図で説明した軟焦点フィルターを写真レン
ズ内に組込んだ状態を示す図で、20は写真レンズ、2
1は該レンズの絞り、22は第3図で説明した軟焦点フ
ィルターである。鈑フィルターは絞り21の近傍に設置
され、前述したようにスイッチの切換によって粒体を光
線有効部内に移動させて絞りの周辺付近にほぼ等間隔に
配列させる機能を有する。粒体が光線有効部外にあると
きは、電極、ヒーター等は透明であるから写真レンズ2
0の解像力は通常どおりであるか、粒体を移動させると
該粒体によって入射光線のうち瞳への入射高さの高い光
線だけが吸収、散乱等lこよる位相変化を受けるので、
主に球面収差の入射高さの高い部分のみが影響を受けて
フレアー状の収差全発生する。従って、写真レンズの軟
焦点フィルターとして描写性のコントロール等の効果を
生みだすことができる。
FIG. 4 is a diagram showing a state where the soft focus filter explained in FIG. 3 is incorporated into a photographic lens, and 20 is a photographic lens;
1 is the aperture of the lens, and 22 is the soft focus filter explained in FIG. The plate filter is installed near the diaphragm 21, and has the function of moving the particles into the effective light beam area and arranging them at approximately equal intervals near the periphery of the diaphragm by switching the switch as described above. When the particles are outside the effective light beam area, the electrodes, heaters, etc. are transparent, so the photographic lens 2
Is the resolving power of 0 the same as usual?When the grains are moved, only the rays with a high height of incidence on the pupil among the incident light rays undergo a phase change due to absorption, scattering, etc.
Mainly, only the portion where the incident height of the spherical aberration is high is affected, and all flare-like aberrations occur. Therefore, it is possible to produce effects such as controlling depiction quality as a soft focus filter for a photographic lens.

なお、本実施例においては、光線有効部内のリング状透
明ヒーターは一重であるとしたが、複数のヒーターを同
心状に並べ粒体の部内における位置や数を制御すれば絞
り径に対応した制御ができるほか、さらに複雑な効果を
持つフィルターとして利用でき、レンズのMTF値の制
御フィルターとしての機能を持たせることができる。ま
た、必ずしもリング状の配列である必要はす<、目的に
応じて配列と粒体の種類を選択することにより、振幅フ
ィルターや位相フィルターとしてアポディゼーシ冒ン等
の浄改良フィルターとしての応用も可能である。
In this example, the ring-shaped transparent heater in the beam effective area is single layered, but if multiple heaters are arranged concentrically and the position and number within the particle area is controlled, control corresponding to the aperture diameter can be achieved. In addition, it can be used as a filter with more complex effects, and it can also function as a filter that controls the MTF value of the lens. In addition, although it does not necessarily have to be a ring-shaped arrangement, by selecting the arrangement and type of particles according to the purpose, it can also be applied as an amplitude filter or a phase filter, and as a filter for improving purification such as apodyses. be.

以上図面を用いて本発明の詳細な説明した。本発明に於
いては、液体中の粒体を#動させる事により透過光束の
波面を変換させる光学素子を結縁光学系中に用いて、上
記結像光学系の結像特性を可変ならしめる効果がある。
The present invention has been described in detail above using the drawings. In the present invention, an optical element that converts the wavefront of a transmitted light beam by moving particles in a liquid is used in the coupling optical system, and the imaging characteristics of the imaging optical system can be made variable. There is.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は本発明に用いる光学素子の原理を説
明する為の図、第3図及び第4図は本発明に係る実施例
を示す図、 。 1・・・透明保護板、2・・・液体薄層、3・・・反射
層、4・・・発熱抵抗体層、5・・・支持体、6a 、
6b 、6c 、6d 、6e−−−発熱抵抗体、7・
・・粒体、11.13・・・電極、12.14・・・発
熱抵抗体、15・・・光線有効部、16・・・電源、1
7・・・スイッチ、18・・・ガラス基板、20・・・
写真レンズ、21・・・絞り、22・・軟焦点フィルタ
ー。
FIGS. 1 and 2 are diagrams for explaining the principle of the optical element used in the present invention, and FIGS. 3 and 4 are diagrams showing embodiments of the present invention. DESCRIPTION OF SYMBOLS 1...Transparent protective plate, 2...Liquid thin layer, 3...Reflection layer, 4...Heating resistor layer, 5...Support, 6a,
6b, 6c, 6d, 6e---heating resistor, 7.
... Granular body, 11.13 ... Electrode, 12.14 ... Heat generating resistor, 15 ... Light beam effective part, 16 ... Power supply, 1
7... Switch, 18... Glass substrate, 20...
Photographic lens, 21...Aperture, 22...Soft focus filter.

Claims (1)

【特許請求の範囲】[Claims] (1)液体層、該液体層に設けられた前記液体とは異な
る粒体、液体層の粒体の存する位置の液体の温度とは異
なる温度の部所を前記液体層内に生ぜしめる為の手段を
備え、前記粒体の移動により入射光束の波面の状態を変
化せしめる光学素子を結像光学系中に配置することによ
り結像特性を可変とすることを特徴とする結像光学系。
(1) A liquid layer, granules provided in the liquid layer that are different from the liquid, and a method for creating a part in the liquid layer whose temperature is different from the temperature of the liquid at the position where the granules of the liquid layer exist. An imaging optical system characterized in that the imaging characteristic is made variable by arranging in the imaging optical system an optical element that changes the state of a wavefront of an incident light beam by movement of the particles.
JP25856984A 1984-12-07 1984-12-07 Image formation optical system with variable image formation characteristic Pending JPS61137124A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25856984A JPS61137124A (en) 1984-12-07 1984-12-07 Image formation optical system with variable image formation characteristic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25856984A JPS61137124A (en) 1984-12-07 1984-12-07 Image formation optical system with variable image formation characteristic

Publications (1)

Publication Number Publication Date
JPS61137124A true JPS61137124A (en) 1986-06-24

Family

ID=17322060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25856984A Pending JPS61137124A (en) 1984-12-07 1984-12-07 Image formation optical system with variable image formation characteristic

Country Status (1)

Country Link
JP (1) JPS61137124A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011129459A1 (en) * 2010-04-16 2011-10-20 Canon Kabushiki Kaisha Image pickup apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011129459A1 (en) * 2010-04-16 2011-10-20 Canon Kabushiki Kaisha Image pickup apparatus
JP2011228837A (en) * 2010-04-16 2011-11-10 Canon Inc Imaging apparatus
US9118853B2 (en) 2010-04-16 2015-08-25 Canon Kabushiki Kaisha Image pickup apparatus

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