JPS61135763A - Thermal head - Google Patents
Thermal headInfo
- Publication number
- JPS61135763A JPS61135763A JP59258055A JP25805584A JPS61135763A JP S61135763 A JPS61135763 A JP S61135763A JP 59258055 A JP59258055 A JP 59258055A JP 25805584 A JP25805584 A JP 25805584A JP S61135763 A JPS61135763 A JP S61135763A
- Authority
- JP
- Japan
- Prior art keywords
- film
- plate
- targets
- protective film
- blended
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 33
- 238000005299 abrasion Methods 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000002184 metal Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 4
- 238000010030 laminating Methods 0.000 claims abstract description 4
- -1 silicon carbide compound Chemical class 0.000 claims description 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims 1
- 230000005611 electricity Effects 0.000 abstract description 9
- 230000003068 static effect Effects 0.000 abstract description 9
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052786 argon Inorganic materials 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 229910001873 dinitrogen Inorganic materials 0.000 abstract description 3
- 239000007789 gas Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005477 sputtering target Methods 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 10
- 239000011195 cermet Substances 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000003487 electrochemical reaction Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 235000020083 shōchū Nutrition 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
Landscapes
- Non-Adjustable Resistors (AREA)
- Electronic Switches (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は感熱記録用サーマルヘッドの耐摩耗保護膜の改
良に関する。感熱記録方式は保守の容易なハードコピー
を得る方式として、各種の端末記録装置やファクシミリ
等に利用されている。特に近年は、熱転写記録方式によ
る多色記録やフルカラー記録の開発も活発で、事務機器
分野や家庭用プリンタとして期待されている。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an improvement in a wear-resistant protective film for a thermal head for heat-sensitive recording. The thermal recording method is used in various terminal recording devices, facsimile machines, etc. as a method for obtaining hard copies that are easy to maintain. Particularly in recent years, there has been active development of multi-color recording and full-color recording using thermal transfer recording methods, which are expected to be used in the field of office equipment and home printers.
従来の技術
一般に、サーマルヘッドは第５図に示す発熱体部構造を
有している。同図において、１はアルミナ基板、２はグ
レーズ層、３は発熱抵抗体膜、４および６は２層構成電
極で、４は下層電極で主として密着層、５は上層電極で
主導体層として働く。BACKGROUND OF THE INVENTION Generally, a thermal head has a heating element structure shown in FIG. In the figure, 1 is an alumina substrate, 2 is a glaze layer, 3 is a heating resistor film, 4 and 6 are two-layer electrodes, 4 is a lower layer electrode and mainly serves as an adhesion layer, and 5 is an upper layer electrode that functions as a main conductor layer. .
なお、下層電極４は用いない場合もある。６は発熱抵抗
体膜を酸化から防止するための酸化防止膜、了は耐摩耗
保護膜であ□る。ここで、酸化防止膜６は用いない場合
もある。このサーマルヘッドはファクシミリに多用され
て大きく伸びてきたが、今後はさらに各種のプリンタ等
に増々多く用いられるようになると予測されている。こ
のためには、より高速化・高信頼性および低コスト化が
要求されており、駆動回路のＩＣ化とともに発熱体材料
の開発が積極的に行われている。高速化と高信頼性のサ
ーマルヘッドを実現する上では、耐熱衝撃性と耐摩耗性
に優れた耐摩耗保護膜を開発することも重要である。こ
の要請に対して１本発明者等により特開昭５９−１１１
８７１号公報に示す新焼酎摩耗保護膜材料に関する発明
が出願されている０この発明は、耐摩耗保護膜として炭
化珪素化合物と窒化珪素化合物の混合被膜を用いること
で靭性を高めて耐熱衝撃性を改良するとともに、感熱紙
を用いた印字時に生じていた電気化学的反応による摩耗
を防止して耐摩耗性を大きく改善したものである０
発明が解決しようとする問題点
しかしながら、炭化珪素化合物と窒化珪素化合物（以降
、各々をＳｉＣ、５ｉ５Ｎ４とする。）の混合被膜より
なる耐摩耗保護膜は、ポリエステル等の樹脂を保護コー
トした感熱紙、あるいは熱転写記録用の転写シート（こ
の２種類の紙を含めて以降特殊紙とする。）で印字した
場合、全色形感熱紙での記録寿命に比べて短くなる場合
があった。このような特殊紙での印字は今後のプリンタ
に多く使用されるようになることが予測されることから
、どのような特殊紙においても全色形感熱紙と同程度の
記録寿命を有するような材料および作成方式の開発が要
請されていだ０
前記５ｉＣ−３ｉ３Ｎ４混合耐摩耗保護膜の場合に特殊
紙での記録寿命の低下は、耐摩耗保護膜の比抵抗が１０
１０〜１０１３Ω・１であり、このために特殊紙での印
字記録時に静電気が発生し放電することにより破壊が生
じるものである。Note that the lower layer electrode 4 may not be used. 6 is an oxidation prevention film for preventing the heating resistor film from oxidation, and □ is an abrasion-resistant protective film. Here, the anti-oxidation film 6 may not be used. This thermal head has been widely used in facsimile machines and has grown significantly, and it is predicted that it will be used more and more in various types of printers in the future. To this end, faster speeds, higher reliability, and lower costs are required, and the use of ICs for drive circuits and the development of heating element materials are being actively pursued. In order to realize high-speed and highly reliable thermal heads, it is also important to develop a wear-resistant protective film with excellent thermal shock resistance and abrasion resistance. In response to this request, the present inventors et al.
An invention related to a new shochu wear protection film material disclosed in Publication No. 871 has been filed. This invention uses a mixed film of a silicon carbide compound and a silicon nitride compound as a wear protection film to improve toughness and thermal shock resistance. In addition, the abrasion resistance was significantly improved by preventing the abrasion caused by the electrochemical reaction that occurred during printing using thermal paper. A wear-resistant protective film made of a mixed film of silicon compounds (hereinafter referred to as SiC and 5i5N4) can be used on thermal paper with a protective coating of resin such as polyester, or on a transfer sheet for thermal transfer recording (these two types of paper are used). (hereinafter referred to as special paper), the recording life may be shorter than that of full-color thermal paper. Since it is predicted that printing on such special paper will be widely used in printers in the future, it is expected that any special paper will have a recording life comparable to that of full-color thermal paper. In the case of the above-mentioned 5iC-3i3N4 mixed abrasion-resistant protective film, the decrease in recording life on special paper is due to the specific resistance of the abrasion-resistant protective film being 10.
10 to 10<13 >[Omega].1, and for this reason, static electricity is generated and discharged during printing and recording on special paper, causing destruction.
この静電気による破壊を防止する方法としては、５ｉＣ
−３ｉ３Ｎ４混合耐摩耗保護膜の特殊紙と接触する面の
比抵抗を小さくし静電気か帯電しないようにすることで
防止できる。As a method to prevent damage caused by static electricity, 5iC
This can be prevented by reducing the specific resistance of the surface of the -3i3N4 mixed abrasion-resistant protective film that comes into contact with the special paper so that static electricity does not build up.
問題点を解決するための手段
本発明はｓ ｉ ｃ−ｓλｓｅ＜混合耐摩耗保護膜を用
いて、特殊紙と接触する面に金属を添加した５ｉＣ−８
工ｓ”ａ 混合耐摩耗保護膜を積層することにより静電
気の発生を防止することを可能としたものである。Means for Solving the Problems The present invention uses a s i c-s
By laminating a mixed wear-resistant protective film, it is possible to prevent the generation of static electricity.
作用
このようにＳ工Ｃ−３ｉ、Ｎ４混合耐摩耗保護膜の表面
に金−を添加した膜を積層することにより、特殊紙との
摺動時にも静電気の帯電か防止できるようになり、静電
気による破壊を防止できる。また、通常の全色形感熱紙
においても、下層の５ｉＣ−３ｉ３Ｎ４混合耐摩耗保護
膜が充分な電気絶縁性を有していることから、電気化学
的反応による摩耗も生じない。さらに、金属を添加する
ことで保護膜の靭性が向上し、耐熱衝撃性が向上する。Function By laminating a gold-added film on the surface of the S-C-3i, N4 mixed wear-resistant protective film, it is possible to prevent static electricity from being charged even when sliding on special paper. can prevent damage caused by Further, even in ordinary full-color thermal paper, since the lower layer 5iC-3i3N4 mixed abrasion-resistant protective film has sufficient electrical insulation properties, abrasion due to electrochemical reactions does not occur. Furthermore, adding metal improves the toughness of the protective film and improves its thermal shock resistance.
実施例 以下に本発明を実施例に従って説明する。Example The present invention will be explained below according to examples.
〈実施例１〉
発熱抵抗体膜としてＴｉＣ−８ｉ０２サーメツト膜、電
極として（ｉｒ−ＯｕＱ層膜よシなるヘッド基板上に、
以下のように耐摩耗ｓｈ膜をスパッタリングで形成した
。すなわち、スパッタリング用のターゲットとして、Ｓ
ｉＣおよびＳｉ 、Ｎ ４からなる板をそれぞれ用いて
、水素ガスを１０％、窒素ガスを６％含ムアルゴンガス
中で両ターゲットを同時にスパッタリングして、約３μ
ｍの混合保護膜を形成した。この場合、ＳｉＣとＳｉ
３Ｎ ４ の混合比は各々のターゲットに印加する電力
を変えることで任急にかえられる。この後、第２図（ム
ｌ 、 （Ｂ）に示すようにＳｉ 、Ｎ ４板の周辺部
にＴｉを設けたターゲットの放電を開始して、３つのタ
ーゲットにより成膜を行い、全体の膜厚が約５μｍとな
るようにした。<Example 1> On a head substrate, a TiC-8i02 cermet film was used as a heating resistor film, and an ir-OuQ layer film was used as an electrode.
A wear-resistant sh film was formed by sputtering as follows. That is, as a target for sputtering, S
Using plates made of iC, Si, and N4, both targets were simultaneously sputtered in an argon gas containing 10% hydrogen gas and 6% nitrogen gas to form a sputtering layer of about 3μ.
A mixed protective film of m was formed. In this case, SiC and Si
The mixing ratio of 3N 4 can be changed at will by changing the power applied to each target. After this, as shown in FIG. 2 (B), discharge of the target provided with Ti around the Si and N4 plates was started, and film formation was performed using the three targets to form the entire film. The thickness was set to about 5 μm.
なお、第２図において、２ｏはターゲットをとりつケル
銅板、２１はＳｉ 、Ｎａ板ｆ、２２はＴｉ板テする。In FIG. 2, 2o is a copper plate on which the target is attached, 21 is a Si and Na plate f, and 22 is a Ti plate.
２３はＴ１板をおさえる１′１製のネジ、Ｔｉ−［２２
は３つのターゲットを同時にスパッタした混合膜におい
て約６マｏ１０％以下となるような面積比とした。23 is a 1'1 screw that holds the T1 plate, Ti-[22
The area ratio was set so that the mixed film obtained by simultaneously sputtering three targets was approximately 6 mm o 10% or less.
このようにして形成した本実施例のサーマルヘッドの発
熱体部の断面形状を第１図に示す。同図において、１は
アルミナ基板、２はグレーズ層で、第５図と同一のもの
である。１１はＴ工Ｃ−Ｓ ｉ ０２サ一メツト抵抗体
膜、１２はｃｒ電極、１３はＣｕ電極、１４および１６
は本発明の実施例による耐摩耗保護膜で、１４は５ｉＯ
−５工、Ｎ４混合耐摩耗保護膜、１６はＴｉを添加した
３ｉＣ−３ｉ、Ｎ４ 混合耐摩耗保護膜である。FIG. 1 shows the cross-sectional shape of the heating element portion of the thermal head of this example formed in this manner. In the figure, 1 is an alumina substrate and 2 is a glaze layer, which are the same as in FIG. 11 is a T-C-S i 02 single-metal resistor film, 12 is a CR electrode, 13 is a Cu electrode, 14 and 16
is a wear-resistant protective film according to an embodiment of the present invention, and 14 is 5iO
-5 is a N4 mixed wear-resistant protective film; 16 is a Ti-added 3iC-3i and N4 mixed wear-resistant protective film.
本実権例のサーマルヘッドの耐摩耗保護膜の表面抵抗は
１０’Ω・αであった。これは、Ｔｉの添加による効果
である。転写紙を用いて表面をこすり帯電量を測定した
か、静電気の帯電は検出されなかった。The surface resistance of the wear-resistant protective film of the thermal head in this practical example was 10'Ω·α. This is an effect due to the addition of Ti. The amount of charge was measured by rubbing the surface using transfer paper, and no static electricity was detected.
この耐摩耗保護膜を形成したサーマルヘッドを、転写紙
および発色形感熱紙の両方で印字走行試験を行った。こ
の結果は、両方の場合ともに良好な結果か得られ、静電
気による破壊も、また電気化学的反応による摩耗も生じ
ないことが確認された。The thermal head on which this abrasion-resistant protective film was formed was subjected to printing running tests on both transfer paper and color-forming thermal paper. Good results were obtained in both cases, and it was confirmed that neither damage caused by static electricity nor wear caused by electrochemical reactions occurred.
この時の摩耗量はＴｉを添加しない場合と特に差違はな
く、３０ｋＪ１以上の走行寿命を保証できた。The amount of wear at this time was not particularly different from that in the case where Ti was not added, and a running life of 30 kJ1 or more was guaranteed.
また、本実施例で作成したサーマルヘッドの耐熱パルス
特性を第３図に示す。同図において、本実施例の結果を
ムに示すが、従来の作成方式による結果Ｂ（％開昭６９
−１１１８７１号公報にもとづくヘッド）に比べてやや
良好な結果が得られ、本発明は耐熱パルス特性について
も改善された。Further, FIG. 3 shows the heat-resistant pulse characteristics of the thermal head produced in this example. In the same figure, the results of this example are shown in M, and the results B (%
Slightly better results were obtained compared to the head based on Japanese Patent No. 111871, and the heat pulse resistance characteristics of the present invention were also improved.
〈実施例２〉
発熱抵抗体膜として５ｉ−Ｔａサーメツト膜、電極とし
てｃｒ−ｃｕＲ層膜よシなるヘッド基板上に、以下の方
法で耐摩耗保護膜をスパッタリングにより形成した。す
なわち、ターゲットとして５ｊ−０とＳｉ ３Ｎ ４
を所定比率で混合して焼結したものを用い、水素ガス
を１５チ、窒素ガスを５％含むアルゴンガス中で放電を
行い、約２．６μｍの保護膜を形成した。その後、Ｏｒ
のターゲットを同時に放電させて、Ｏｒを添加した５ｉ
Ｃ−５ｉ、Ｎ４混合耐摩耗保護膜を約３μｍ形成した。Example 2 A wear-resistant protective film was formed by sputtering in the following manner on a head substrate consisting of a 5i-Ta cermet film as a heating resistor film and a cr-cuR layer film as an electrode. That is, 5j-0 and Si 3N 4 as targets
A protective film having a thickness of about 2.6 μm was formed by performing electric discharge in an argon gas containing 15% hydrogen gas and 5% nitrogen gas. After that, Or
5i with Or added by simultaneously discharging the targets of
A C-5i, N4 mixed wear-resistant protective film was formed to a thickness of about 3 μm.
ｃｒの添加量はＯｒのターゲットに印加する電力で任意
に制御できるが、本実施例では混合膜において約１７０
１１％となるようにした。The amount of Cr added can be arbitrarily controlled by the power applied to the Or target, but in this example, the amount of Cr added was approximately 170 Cr in the mixed film.
It was set to 11%.
本実施例のサーマルヘッドの発熱部の断面形状を第４図
に示す。同図において、１はアルミナ基板、２はグレー
ズ層で、第５図と同一のものである。４１は５ｉ−Ｔａ
サーメット抵抗体膜、１２はＯｒ電極、１３はＣｕｔ極
、１４と４６は本発明の実施例による耐摩耗保護膜で、
１４は５ｉＣ−８工５Ｎ４混合耐摩耗保護膜、６６はＯ
ｒを添加したＳｉ、Ｇ−３ｉ、Ｎ４混合耐摩耗保護膜で
ある。FIG. 4 shows the cross-sectional shape of the heat generating portion of the thermal head of this embodiment. In the figure, 1 is an alumina substrate and 2 is a glaze layer, which are the same as in FIG. 41 is 5i-Ta
A cermet resistor film, 12 is an Or electrode, 13 is a cut electrode, 14 and 46 are wear-resistant protective films according to embodiments of the present invention,
14 is 5iC-8-5N4 mixed wear-resistant protective film, 66 is O
This is a Si, G-3i, and N4 mixed wear-resistant protective film added with r.
本実施例のサーマルヘッドも転写紙及び発色形感熱紙で
の印字走行試験を行ったが、静電気による破壊も、また
電気化学的反応による摩耗も生じなかった。さらに、慴
動による機械的な摩耗も従来の耐摩耗保護膜（特開昭５
９−１１１８７１号公報）と同程度であった。The thermal head of this example was also subjected to printing running tests on transfer paper and color-forming thermal paper, but neither damage caused by static electricity nor wear caused by electrochemical reactions occurred. Furthermore, mechanical abrasion due to sliding motion can be avoided using conventional wear-resistant protective films (Japanese Patent Laid-Open No. 5
9-111871).
本実施例はＣｒターゲｙトを別に用いて添加するために
添加量の制御が容易で、成膜が簡単である。In this example, since the Cr target is added separately, the amount added can be easily controlled and the film formation is simple.
なお、前記実施例ではＴｉまたはＯｒを添加したか、添
加する金属はこれらに限定されるものでないことは説明
するまでもない。また、前記実施例の抵抗体膜材料や電
極材料に限定されるものでないことも説明するまでもな
い。It goes without saying that Ti or Or was added in the above embodiments, but the metals to be added are not limited to these. Furthermore, it goes without saying that the present invention is not limited to the resistor film materials and electrode materials of the above embodiments.
発明の効果
本発明は、５ｉＣ−８ｉ、Ｎ４混合耐摩耗保護膜を５ｉ
Ｃ−８ｉ、Ｎ４の混合膜と５ｉＣ−５±５町［金属混合
膜の２層構成とすることによシ、発色形感熱紙および転
写紙のどちらに対しても良好な記録寿命を１するサーマ
ルヘッドを得られる。このために。Effects of the Invention The present invention provides a 5iC-8i, N4 mixed wear-resistant protective film.
The two-layer structure of C-8i, N4 mixed film and 5iC-5±5 town [metal mixed film provides good recording life for both color-forming thermal paper and transfer paper. You can get a thermal head. For this.
ファクシミリや各種カラープリンタ等への応用が期待で
きる。It can be expected to be applied to facsimile machines, various color printers, etc.
第１図は本発明の第１の実施例による耐摩耗保護膜を設
け、たサーマルヘッドの発熱体部の断面形状を示す図、
第２図は本発明の第１の実施例でＴｉを添加する場合の
ターゲット構成を示すもので、ｆＡｌは平面図、（Ｂ）
は同図（Ａｌのムーム′断面部形状を示す図、第３図は
本発明の第１の実施例にもとづくサーマルヘッドの耐熱
パルス特性を比較した図、第４図は本発明の第２の実施
例による耐摩耗保護膜を設けたサーマルヘッドの発熱体
部の断面形状を示す図、第６図は従来のサーマルヘッド
の発熱体部の断面形状を示す図である。
１・・・・・絶縁性基板（アルミナ基板）、１１．４１
・・・・・・抵抗体膜（ＴｉＣ−８ｉ０２サ一メツト抵
抗体膜、５ｉ−Ｔａサーメット抵抗体膜、１２・１３・
・・・・・給電用導体膜（電極）、１４，１５，４ｅＳ
・・・・・・耐摩耗保護膜（Ｓｉｃ−ｓｉ３ｍ４混合耐
摩耗膜、Ｔｉ添加５ｉＣ−３ｉ、Ｎ４混合耐摩耗膜−Ｏ
ｒ添加５ｉＣ−８ｉ、Ｎ４混合耐摩耗膜）。
代理人の氏名 弁理士 中 尾 敏 男 ほか１名１１
・・・Ｔｉｃ−３１σ？サーメ・ソト」１廻遁禽ン白
に超重（１？、ＩＪ、＝電極
第１図
第２図
第３図
→ｓｐ卯４！：η （１７１７，轡清り第４図
第５図FIG. 1 is a diagram showing a cross-sectional shape of a heating element portion of a thermal head provided with a wear-resistant protective film according to a first embodiment of the present invention;
Figure 2 shows the target configuration when adding Ti in the first embodiment of the present invention, fAl is a plan view, (B)
3 is a diagram comparing the heat resistance pulse characteristics of the thermal head based on the first embodiment of the present invention, and FIG. 4 is a diagram showing the cross-sectional shape of the Moum' of Al. FIG. 6 is a diagram showing the cross-sectional shape of the heating element of the thermal head provided with the abrasion-resistant protective film according to the embodiment, and FIG. 6 is a diagram showing the cross-sectional shape of the heating element of the conventional thermal head. 1. Insulating substrate (alumina substrate), 11.41
...Resistor film (TiC-8i02 cermet resistor film, 5i-Ta cermet resistor film, 12.13.
...Conductor film (electrode) for power supply, 14, 15, 4eS
...wear-resistant protective film (Sic-si3m4 mixed wear-resistant film, Ti-added 5iC-3i, N4 mixed wear-resistant film-O
r-added 5iC-8i, N4 mixed wear-resistant film). Name of agent: Patent attorney Toshio Nakao and 1 other person11
...Tic-31σ? ``Same Soto'' 1 turn, super heavy (1?, IJ, = Electrode Figure 1 Figure 2 Figure 3 → SP 4!: η (1717, Kiyoshiri Figure 4 Figure 5
Claims (1)
耐摩耗保護膜よりなる感熱記録用サーマルヘッドの前記
耐摩耗保護膜を、炭化珪素化合物と窒化珪素化合物より
なる膜と、炭化珪素化合物と窒化珪素化合物および金属
を混合してなる膜を積層して構成したことを特徴とする
サーマルヘッド。The abrasion-resistant protective film of a thermal head for heat-sensitive recording, which is composed of a resistor film, a power supply conductor film, and an abrasion-resistant protective film formed on an insulating substrate, is a film made of a silicon carbide compound and a silicon nitride compound, and a silicon carbide compound. 1. A thermal head characterized in that it is constructed by laminating a film made of a mixture of a silicon nitride compound, and a metal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59258055A JPS61135763A (en) | 1984-12-06 | 1984-12-06 | Thermal head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59258055A JPS61135763A (en) | 1984-12-06 | 1984-12-06 | Thermal head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61135763A true JPS61135763A (en) | 1986-06-23 |
Family
ID=17314908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59258055A Pending JPS61135763A (en) | 1984-12-06 | 1984-12-06 | Thermal head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61135763A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1226950A1 (en) * | 2001-01-29 | 2002-07-31 | ZIH Corporation | Thermal printer with print head protection member |
| US6970042B2 (en) | 2002-10-29 | 2005-11-29 | Huettinger Elektronik Gmbh & Co. Kg | Power control for high frequency amplifiers |
-
1984
- 1984-12-06 JP JP59258055A patent/JPS61135763A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1226950A1 (en) * | 2001-01-29 | 2002-07-31 | ZIH Corporation | Thermal printer with print head protection member |
| US6970042B2 (en) | 2002-10-29 | 2005-11-29 | Huettinger Elektronik Gmbh & Co. Kg | Power control for high frequency amplifiers |
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