JPS61125170U - - Google Patents

Info

Publication number
JPS61125170U
JPS61125170U JP15563185U JP15563185U JPS61125170U JP S61125170 U JPS61125170 U JP S61125170U JP 15563185 U JP15563185 U JP 15563185U JP 15563185 U JP15563185 U JP 15563185U JP S61125170 U JPS61125170 U JP S61125170U
Authority
JP
Japan
Prior art keywords
substrate
substrate carrier
chassis
substantially vertically
vertically oriented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15563185U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS61125170U publication Critical patent/JPS61125170U/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
JP15563185U 1984-10-12 1985-10-11 Pending JPS61125170U (US07579456-20090825-P00002.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65998884A 1984-10-12 1984-10-12

Publications (1)

Publication Number Publication Date
JPS61125170U true JPS61125170U (US07579456-20090825-P00002.png) 1986-08-06

Family

ID=24647654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15563185U Pending JPS61125170U (US07579456-20090825-P00002.png) 1984-10-12 1985-10-11

Country Status (4)

Country Link
EP (1) EP0178186B1 (US07579456-20090825-P00002.png)
JP (1) JPS61125170U (US07579456-20090825-P00002.png)
DE (1) DE3579659D1 (US07579456-20090825-P00002.png)
HK (1) HK27191A (US07579456-20090825-P00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6453755U (US07579456-20090825-P00002.png) * 1987-09-30 1989-04-03

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679435A (en) * 1979-11-30 1981-06-30 Fujitsu Ltd Rotary evaporation device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2053802A1 (en) * 1970-11-02 1972-05-10 Licentia Gmbh Uniform evaporated coatings prodn - esp metal layers for integrated semiconductor circuits etc
DE2813180C2 (de) * 1978-03-25 1985-12-19 Leybold-Heraeus GmbH, 5000 Köln Vakuumbeschichtungsanlage zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Materialstrom
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
JPS5767163A (en) * 1980-10-09 1982-04-23 Tonan Kinzoku Kogyo Kk Formation of film for wrist watch band
GB2119236A (en) * 1982-03-26 1983-11-16 Philips Electronic Associated Magazine and disc holders for supporting discs in the magazine

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679435A (en) * 1979-11-30 1981-06-30 Fujitsu Ltd Rotary evaporation device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6453755U (US07579456-20090825-P00002.png) * 1987-09-30 1989-04-03

Also Published As

Publication number Publication date
DE3579659D1 (de) 1990-10-18
HK27191A (en) 1991-04-19
EP0178186A3 (en) 1987-08-26
EP0178186A2 (en) 1986-04-16
EP0178186B1 (en) 1990-09-12

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