JPS61123846A - Processing method of photosensitive planographic plate - Google Patents

Abstract

PURPOSE:To control optimum conditions by kinds efficiently and accurately by detecting the kind of a PS plate to be processed by a sensor provide;d in the middle of or behind a developing zone, and controlling processing conditions on the basis of previously inputted control information. CONSTITUTION:The light reflection sensor 23 is positioned so that its photo detection surface is 10mm above the conveyed photosensitive planographic plate (PS) and away from a conveyor roller at an entrance by 1/5 of the entire developing zone; a developer is removed temporarily by a roller 19 and the amount of the remaining photosensitive layer at the no-image part of the PS plate is measured by the sensor 23. The signal of this sensor 23 is converted by a controller 21 into an output voltage and the kind of the PS plate is identi fied from the level of the voltage. Further, the no-image area of the PS p[late is measured by an optical method and a supplementing device 22 is operated in consideration of the measurement result to supply a specific amount of supple mentary liquid.

Description

Detailed Description of the Invention (1) Object of the Invention (Field of Industrial Application) The present invention relates to a method for processing a photosensitive lithographic printing plate (hereinafter referred to as PS plate) with an automatic processor, and more specifically, This relates to control of processing conditions.

(Prior art) The optimal processing conditions for processing the 28th edition are
Since it varies depending on the nature, performance, or material of the SIN, there is a conventional method of identifying the type of photosensitive material and controlling the processing conditions based on this information, as described in Japanese Patent Laid-Open No. 56-92540.
Various proposals have been made, such as in Japanese Patent No. 55-59465 and Japanese Patent No. 57-195245.

In these methods, the type of photosensitive material is identified at the photosensitive material loading section of an automatic processor, and processing conditions are controlled based on this information. In this case, the type of photosensitive material is identified by a person, and based on the identified result, a person presses a selection button corresponding to the type of photosensitive material to be processed. )
, or a method in which a specific cut is made for each type of photosensitive material and it is automatically read, or the characteristics of the photosensitive material such as transmittance and reflectance are identified using an optical sensor (Japanese Patent Laid-Open No. 195245/1983). etc. This method of pressing the selection button is very cumbersome and inefficient because it is done manually, and it is also prone to serious mistakes such as fabrication, so it is not the preferred method. However, it is cumbersome and ineffective as it adds one additional step to making the cuts. Since the method of identifying the type of photosensitive material to be processed using an optical sensor is performed automatically without manual intervention, problems such as inconvenience are solved. However, since the type of photosensitive material is identified at the photosensitive material loading section of the automatic processor, a problem arises in that identification is extremely difficult. Particularly in the case of PS plates, even if they are of different types, the surface color tone and density are often similar, and some are almost identical. Therefore, it is almost impossible to identify the product type by the color tone or density of the image area or non-image area using such a method before development, except for the identification of product types with extremely different color tones or densities. . Therefore, it is difficult to efficiently and accurately identify the product type using this type of product identification method.

(Object of the invention) The object of the present invention is to improve the above-mentioned drawbacks and to
To provide a PS version processing power method that can always efficiently and accurately identify the product type even when processing Sffi, and can always control the processing conditions to the optimum conditions based on the information. .

(2) Structure of the Invention As a result of intensive research, the present inventors have discovered that in a method for processing PS plates using an automatic developing machine that automatically carries in PS Jl and processes it, it is possible to Detected by a sensor installed after passing through the development zone,
It has been found that the object of the present invention can be achieved by controlling the processing conditions based on control information that has been manually prepared in advance for the variety.

The present invention will be explained in detail below.

The 28 sheets to be developed in the method of the present invention have a photosensitive layer coated on a support, the solubility of which changes in response to light irradiation. Supports include paper laminated with paper niblast; metal plates such as aluminum, zinc, and copper; plastic films such as polyethylene terephthalate, polypropylene, and cellulose triacetate; and metals such as chromium and nickel deposited or laminated. Includes metal plates, paper, plastic films, etc. Among these supports, aluminum plates are preferably used.

In addition to pure aluminum, the aluminum material includes alloys containing aluminum as a main component, such as aluminum alloys containing silicon, magnesium, iron, copper, zinc, manganese, bismuth, nickel, and the like.

As the aluminum material, plate-shaped (including M-shaped) aluminum materials produced by rolling or hot-dip aluminum plating can be used. Aluminum materials manufactured by hot-dip aluminum plating are plated on metal plates such as copper plates in a hot-dip aluminum bath, and I! This is a board having an aluminum layer where 1 is 7In or more.

Further, it is desirable that the surface of the aluminum plate has a grained shape. Examples of methods for forming the grain shape include mechanical methods and electrolytic etching methods. Furthermore, it is desirable that the aluminum plate with the grained shape be anodized. Further, it is desirable to perform a sealing treatment and a surface treatment such as immersion in an aqueous solution of potassium fluorinated zirconate.

The photosensitive composition of the PS plate used in the present invention contains a photosensitive substance as an essential component, and the physical and chemical properties of the photosensitive substance do not change upon exposure or subsequent development treatment. For example, there are differences in solubility in developing solutions due to exposure, differences in intermolecular adhesive strength before and after exposure, differences in affinity for water and oil due to exposure or subsequent development, and A material that can form an image area by electrophotography can be used.

Typical examples include photosensitive noazo compounds, photosensitive azide compounds, compounds with ethylenically unsaturated double bonds, epoxy compounds that polymerize with acid catalysts, and C-0-C- groups that decompose with acids. Examples include compounds having the following. Examples of photosensitive noazo compounds include O-su7toquinone di7dide compound as a bottom-type compound that changes to be alkali-soluble upon exposure, and aromatic noazonium #A as a negative-type compound whose solubility decreases upon exposure.

Additives such as a dye, +1 (plastic agent, and a component imparting printout performance) can be added to the photosensitive layer formed by the above method of the PSJ doctor to which the h method of the present invention is applied. The photosensitive layer is prepared using a solution of a suitable solvent.
It is applied onto a support.

The coating amount of the photosensitive layer provided on the support is 0.1 to 7.
g/n+”, more preferably 0.5 to 3 g/11
It is 12.

18 clothes are carbon 7-light, mercury lamp, mercury lamp,
The film is exposed to light using a light source rich in actinic rays, such as a metal halide lamp or a tungsten lamp, and then developed in a development process using Type 78 processing.

The developer used in the present invention may vary depending on the type of photosensitive composition used in the 28th plate, but preferably contains at least one of an alkaline agent and an organic solvent.

Examples of alkaline agents include silium, potassium silicate, lithium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic potassium phosphate. , potassium diphosphate, ammonium triphosphate, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc., mono-, sea-, or triethanol. Organic compounds such as amines, mono-, cy-, or trimethylamine, mono-, cy-, or triethylamine, mono-1- or diisopropylamine, n-butylamine, 7-, no-, or triisopropafuramine, ethyleneimine, ethylenediimine, etc. Examples include amine compounds.

In particular, when the photosensitive composition provided on the hydrophilic surface of the support or body contains a negative-type noazo compound (hereinafter referred to as negative-type diazo PS plate), the developing solution does not contain an organic solvent. Preferably, it is an alkaline aqueous solution containing
As an organic solvent, the solubility in water at 20°C is 1.
It is preferable that the amount is 0% by weight or less from the viewpoint of improving the developability, ink receptivity, and water retention of the 28th plate. Some examples of R78 media with solubility in water at 20°C of 0% by weight or less include, for example, ethyl acetate, propyl acetate,
Carboxylic acid esters such as butyl acetate, amyl acetate, benyl acetate, ethyl acetoacetate, ethylene glycol mobutyl acetate, ethyl malonate, butyl lactate, butyl levulinate, ketones such as ethyl butyl ketone, menalim butyl ketone, cyclohexanone , ethylene glycol mono/butyl ether, ethylene glycol monobutylphenyl ether, ethylene glycol monobenzyl ether, ethylene glycol mono-n-hexyl ether, ethylene glycol moophenyl ether, propylene gelicol monophenyl ether, benzyl alcohol, ethoxy Ethoxyethanol, methylphenyl carbinol, n-amyl alcohol, methyl amyl alcohol, 4-7enyl-1-but/-ol,
Alcohols such as β-7enethyl alcohol, 3-phenyl-1-butyl, furkyl-substituted aromatic hydrocarbons such as xylene, methylene fuchloride, methylene fuchloride, monochlorobenzene, etc. One or more of these organic solvents may be used, such as lodenated hydrocarbons. Among these organic solvents, ethylene glycol moaphenyl ether and benzyl alcohol are particularly effective. Further, the content of these organic solvents in the developer is preferably 1 to 20% by weight, particularly 2 to 20% by weight.
More favorable results are obtained when the amount is 10% by weight.

Further, the preferable content of the alkaline agent contained in the developer for the negative mold azo PS plate is o, oos to 4% by weight, preferably 0.5 to 2% by weight.

Furthermore, it is preferable to include an anionic surfactant, a water-soluble sulfite, a solubilizer, etc. in the developing solution of the negative type 77128 plate in order to improve the developability. Higher alcohol sulfate esters, aliphatic alcohol phosphate ester salts, alkylaryl sulfonates, alkyl 7 midosulfonates, sulfonate salts of dibasic fatty acid esters, flukylnaphthalene sulfonate salts, which are described in Publication No. 5045 a. , a formaldehyde condensate of flukylnaphthalene sulfonate, and the like. Among these, sodium butylnaphthalene sulfonate and a formaldehyde condensate of sodium butylnaphthalene sulfonate are particularly preferred because of their strong separation and solubility from the hydrophilic surface of the photosensitive composition layer during development. The content of these 7-ion surfactants in the developer component is preferably 0.5 to 10% by weight, more preferably 1 to 5% by weight.

The water-soluble sulfite has the effect of preventing the photosensitive composition from sticking to or remaining on the hydrophilic surface due to side reactions and improving developability. As a specific example, alkali or alkaline earth metal sulfites are preferable. Examples include sodium sulfite, potassium sulfite, lithium sulfite, and magnesium sulfite.

The preferred content of sulfite in the developer composition is 0.
．． 05-4% by weight, more preferably 0.1-1% by weight
It is.

The solubilizer has a solubility of 10% in water at 20°C.
Since it assists the dissolution of the following organic solvents, it is preferable to use an organic solvent that is more easily soluble in water, and it is preferable to use low-molecular alcohols, ketones, and lactams.

Specifically, for example, methanol, ethanol, propatool, butyl, acetone, methyl ethyl ketone monomethyl ether, ethylene glycol monoethyl ether sibutanol, 4-methoxy-4-methylbutanol,
N-methylpyrrolidone and the like are preferred. The amount of solubilizer used is preferably 30% by weight or less in the developer.

In addition, when a photosensitive composition containing a positive type noazo compound is provided on the hydrophilic surface of the support (hereinafter referred to as "bot type"), 7zoP
It is written as S-meal. ), the developer is preferably an alkaline aqueous solution, and the alkaline agents are preferably potassium silicate, lithium silicate, sodium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, Examples include sodium diphosphate, potassium triphosphate, potassium diphosphate, sodium carbonate, potassium carbonate, and the like. Among these, potassium silicate,
A developer containing an alkali silicate such as lithium silicate or sodium silicate is most preferable because it has good development gradation, and the composition of the alkali silicate is (S io 2
) / CM ) = 0.5 to 1.5 (here (S
iO2) and CM) represent the molar concentration of Sin2 and the molar concentration of total alkali metals, respectively. ), and SiO□
Among the alkali silicate compositions, it is preferable to use a developer containing 0.8 to 8% by weight of (
Sio2)/CM] = 0.5 to 0.7
5 and with a Sin: of 0.8 to 4% by weight are preferably used because they are low in concentration and easy to neutralize the developing waste solution; A developer having a molar ratio of 1 to 8% by weight of SiO2 is preferably used because it has a high buffering power and a high processing ability.

In addition, JP-A-1986-100 was added to the developer of the Bot type Noazo PS plate.
51324, by containing at least one of a 7-ionic surfactant and a double-sided surfactant, or JP-A-55-95946,
As described in Japanese Patent Publication No. 56-142528, the inclusion of a polymer electrolyte can improve the wettability of the photosensitive composition and further improve the gradation, and is therefore preferably used. There is no particular restriction on the amount of the darkening surfactant added, but it is preferably 0.003 to 3% by weight, particularly 0.003 to 3% by weight.
A concentration of 0.006 to 1% by weight is preferred. Further, it is preferable that the alkali silicate contains at least 20 mol% of potassium as the alkali metal in all the alkali metals, since the generation of insoluble matter in the developer is small, and more preferably 90 mol% or more of potassium. , most preferably when the potassium content is 100 mol %.

Irrespective of whether the photosensitive composition is a negative type or a flat type, the developer used in the present invention can contain an antifoaming agent. Suitable antifoaming agents include organosilane compounds.゛In the present invention, it is difficult to identify the 28 clothes by non-artificial means with respect to the development process 11; We found that it is easy to process during or after development, and that if we control the processing conditions based on the identification results by sensors in this processing range, we can obtain a finish quality that is satisfactory for Toyo. It is based on

The processing conditions in the present invention include the composition of the processing solution (developing solution, rinsing solution, gamma solution, washing water, etc.), processing temperature, P
It refers to the transport speed of the S plate, the drying temperature, the drying air volume, the processing liquid supplementary light amount, the processing liquid supply amount, etc., and in the present invention, at least one of these is controlled.

In a preferred embodiment of the type identification method of the present invention, the reflection density or reflectance of the support of the PS plate is determined by an optical sensor installed in the middle of the development zone or at a position after passing through the development zone, and is measured in advance and stored. The impedance, zero capacitance, and (series) equivalent resistance of the PS plate support can be determined by comparing the reflection density or reflectance of each type to identify the type, or by using an electric sensor installed at the same position as above. Measure at least one of the following and compare it with the corresponding measurement value for each product type stored in advance,
Examples include methods for identifying varieties.

An optical sensor or an electrical sensor similar to the one described above is installed in the middle of the development zone or after passing through the development zone, and the measurement is performed while the photosensitive layer remains on the support, and each product type is memorized in advance. Another method is to identify the variety by comparing it with the corresponding measurement value. These measurement points may be one or several points.

In the present invention, the sensor for identifying the product type is located midway through the development zone or after passing through the development zone, but when measuring with the photosensitive layer remaining on the support, it is preferable to use the sensor after the development zone for reasons of simplifying the device. In the middle of the zone.

Furthermore, in the method of measuring with the photosensitive layer remaining on the support, if a sensor is provided at a position midway in the development zone, 1.The position is 1720 degrees from the insertion part of the development zone in the direction in which development progresses. 1 from the position
The range up to the advanced position of /2 is preferable because the difference between the varieties becomes noticeable.

Further, this sensor is installed at a position where its measurement position can measure the portion that should be the non-image portion of the 18th plate. A method for identifying types by installing a sensor at a position after passing through the development zone and measuring while the photosensitive layer remains on the support is to prevent the development of the part to be measured from substantially proceeding in the development zone for a certain period of time. Alternatively, a part of the non-image area of the PS plate is provided with a different elution rate than other non-image areas, and that part is measured after passing through the development zone. One example is a method in which the measurement is carried out later. Further, when measuring the support, it is sufficient to measure the normal non-image area after passing through the development zone.

When an electric sensor is used as a sensor for identifying the product type, the distance between one electrode and the other electrode of the sensor is preferably 0.1 mm to 30 cm, more preferably 0.1 mgm to 15 cm. Further, the positional relationship between the two electrodes may be parallel to or perpendicular to the 28-plate conveying force direction, or in any vertical direction across the PS plate. Further, the distance between the 18th plate and the electrode is preferably 10+*m or less, more preferably 5III+ or less. Also,
The area of the electrode in the part where the PS plate and the electrode are lined up in parallel is IC
Tl12-20Ci2 is desirable, more preferably 2
cm2~■0c1TI2. At this time, at least one electrode needs to be located on the side of the PS plate that has the photosensitive layer. When considering the remaining amount of the photosensitive layer as impedance in alternating current, the PSli and the electrode should be in contact, or electricity should be in a state where electricity can flow through the opening of the photosensitive planographic printing plate electrode through a liquid that is an electrolyte. There is a need.

Also, the -force electrode is in contact with the PS plate and the other electrode is in contact with the PS plate.
It may be separated from the S plate via a liquid that is an electrolyte. In any case, it is necessary to maintain a state in which electricity can flow between the PS plate and the electrode.

In addition, the product type information obtained in this way includes, for example, the composition and replenishment amount of the replenisher for development by type, the replenisher for the rinse solution, and the information that has been input in advance based on experimental data etc. for the product type. Composition and replenishment amount of gum solution, composition and replenishment amount of gum solution, conveyance speed, drying temperature, drying air: flower, amount of washing water, amount of developer supplied, amount of rinse solution supplied, amount of gum solution supplied, etc. It is used to control the processing conditions based on the control information of fftlJ.

When using product type information to replenish the developer, there is a method of finding a more accurate replenishment amount from the image area or non-image area measured by the general method and the product type information and replenishing the amount.

The treatment conditions for the pond are determined in advance and controlled according to the characteristics of each variety. If the plate size is determined by the type of PS plate to be used, take these 1F into consideration.

Example Hereinafter, the present invention will be explained in more detail with reference to Examples.

Example 1 A large number of 101003 x 800 size PS version FPS-A and F''P'P (Fuji Photo Film Co., Ltd.) were prepared, and 801
From a distance of 2 to 7 using a special metal noride lamp
Exposure was made for 0 seconds. On the other hand, a developer prepared by diluting 5DR-1 (Konishi Roku Photo Industry Co., Ltd.) 6 times with water and
GW-1 (Konishi Roku Photo Industry Co., Ltd.) was prepared.

Next, the exposed PS plate was processed using the automatic developing machine shown in FIG. fjS1 In the figure, 1 is a developing tank, 2 is a circulation washing tank, 3 is a peeling tank, t is a transport roller, 5 is a skewer roller, 6 is a squeezing roller, 7 is a receiving roller,
8 is a brush roller, and 9 is a dryer. The developer sent from the pump 10 is supplied onto the PS plate from the shower vibe 13, the circulating washing water sent from the pump 11 is supplied onto the PS plate from the shower vibe 14, and the gum liquid sent from the pump 12 is supplied from the shower vibe 13 onto the PS plate. It will be distributed on the PS version from 15 onwards.

Reference numerals 16 and 16' denote electrode plates made of stainless steel, and the size thereof is 1 cm x 2 cm* with a thickness of 11. Its installation position is above 3III11 of the PS plate being transported, and
It was located at a position 51 from the edge of the plate in the width direction, and the non-image area was always passed through this position. Further, the speed of the conveyance roller was set so that the total development time was 40 seconds. Further, the developer temperature was set at 25°C. 16.16' was set so that [I between the centers thereof was 10 cm. 17 is an AC impedance meter and a control switch connected to it;
A constant current of 10 KHz is applied to the object to be measured, the impedance of the object to be measured is measured, the type of PS plate is identified based on the measured impedance value, and at the same time the squeegee pressure adjustment device 1
8 to change the amount of gum applied. At the same time, the drying temperature and drying air volume of the drying device 9 can be adjusted.

Regarding the relationship between impedance value and type identification, when the impedance value is 15Ω or less, it is determined to be PPP, and when the impedance value is greater than 15Ω, it is determined to be FPS-A.

The identified variety, the amount of coating and drying conditions can be set on the FP.
In the case of S-A, the squeegee pressure was set to be low using the squeegee pressure adjustment device 18, and the amount of gum applied was set to be a little large. In addition, the drying conditions were set so that the drying temperature and air volume were slightly stronger in the case of FP S-A.

Next, to the developer tank 1'! The exposed PS plate was processed by charging all the developer solution, charging ZOQ of water to the circulating water washing tank 2', and charging Mu@209 to the gum liquid tank 3'. First exposed P
S k l” l) When P is processed, PS is sent to the sensor.
By the time the plate reached the plate, almost all of the photosensitive layer in the measurement area had been eluted, and the impedance value of the AC impedance meter showed 5Ω. At this time, the control device 17 was activated, and the squeegee pressure was set to a high level, and the drying conditions were set to a low level.

Next, when the exposed PS plate F' P S -A was processed, by the time the PS plate reached the sensor, most of the photosensitive layer in the measurement area had eluted, and the impedance value of the AC impedance meter showed 17Ω. Ta. At this time, the control device 17
The squeegee pressure was set to a low level and the drying conditions were set to a high level. In this way, the exposed PS plates FPS-A and FPP were processed in random order and a running test was carried out. It was possible to obtain a good amount of energy for use, and also to save power.

[chi] Example 2 A large number of 1003 x 800 mm size 8 size PS plates 5LP-N and SMP-N (Konishiroku Photo Industry Co., Ltd.) were prepared and exposed in the same manner as in Example 1.

In addition, a developer replenisher was prepared by diluting the same developer replenisher VSDR-IR (Konishiroku Photo Industry Co., Ltd.) four times with water as in Example 1.

Next, the I'S plate was processed using the automatic developing machine shown in FIG. In Figure 2, 23
There is a light reflection sensor to measure the amount of photosensitive layer remaining in the non-image area of the 28th plate, and its installation position is determined so that the light receiving surface is at +011111 position on the PS plate being transported, and it is located at the entrance. 17 of all development zones from the transport roller
I decided to put it in position 5. 19 is a developer smudge removing roller that temporarily removes the developer in the middle of the development zone, and a light reflection sensor 23 measures the amount of the photosensitive layer remaining in the non-image area of the plate 28.
It was made possible to measure with. The signal from the light reflection sensor is converted into an output voltage and processed by the control device 21, and the type of PS garment is identified based on the value, and the non-image area of the PS garment is measured using a generally known optical method. The replenishment device 22 was operated based on the result, and a predetermined amount of replenisher was replenished.

The relationship between the processed value of the light reflection sensor signal and product type identification is that when the processed value is 0.28 or less, it is determined to be SMP-N, and 0.28 or less is determined as SMP-N.
When the value is larger than 28, it is determined as 5LP-N. Furthermore, the relationship between the identified product type and the amount of developer replenisher is +0 for the non-image area 5n+2 when the product type is SMP-N.
0@l) replenishment, and in the case of 5LP-N, it is set to replenish 100- for the non-image area 4 x 2.

In fact, the non-image area of SMP-N and 5LP-N is integrated separately, and when the non-image area of SMP-N reaches 5 2, the developer replenisher of 100- is replenished, and the same applies. In 5LP-H, the non-image area is 4m2.
When reaching 100 liters, the developer was refilled and the liquid was supplemented.

Also, while the automatic developing machine is operating, 1
35@g of developer replenisher is replenished every hour, and 300Il1g every 15 hours when the automatic developing machine is not operating.
The developer replenisher is now supplemented.

The developer tank 1' was filled with 409 volumes of the developer, and the exposed 28 plates were processed. First exposed P
When processing S version SMP-N, F' on the light reflection sensor
At the time when the S plate reached, the photosensitive layer in the measurement area was almost eluted, and the processed value of the signal of the light reflection sensor showed 0.25.
At the same time, the area of the non-image area was 0.7II2.

Next, when the exposed PSS plate LP-N was processed,
The processing value shows 0.30, and at the same time the non-image area is 0.6
I11: It showed. When we conducted a running test by processing the exposed PS version SMP-N, SL, and PN in random order in this way, we were able to accurately identify the product type even for these difficult-to-identify PS I&. Furthermore, in combination with the non-image area, accurate replenishment was possible. As a result, a good IL plate printing age with stable halftone dots 11) printability was obtained.

(3) Effects of the Invention According to the present invention, when processing different types of PS rice using the same automatic processor, it is possible to efficiently and accurately control the optimum processing conditions for each type.

[Brief explanation of the drawing]

FIGS. 1 and 52 are schematic cross-sectional views of an automatic developing machine used in an embodiment of the present invention.

Claims (1)

[Claims] In a method for processing photosensitive planographic printing plates using an automatic processor that automatically transports and develops the photosensitive planographic printing plates, the type of photosensitive planographic printing plate to be processed is determined by a sensor installed during or after passing through the development zone. 1. A method for processing a photosensitive lithographic printing plate, characterized by detecting the type and controlling processing conditions based on control information inputted in advance for the type.