JPS61121737U - - Google Patents

Info

Publication number
JPS61121737U
JPS61121737U JP564385U JP564385U JPS61121737U JP S61121737 U JPS61121737 U JP S61121737U JP 564385 U JP564385 U JP 564385U JP 564385 U JP564385 U JP 564385U JP S61121737 U JPS61121737 U JP S61121737U
Authority
JP
Japan
Prior art keywords
extension tube
diffusion
nozzle
tube
furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP564385U
Other languages
Japanese (ja)
Other versions
JPH0737309Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985005643U priority Critical patent/JPH0737309Y2/en
Publication of JPS61121737U publication Critical patent/JPS61121737U/ja
Application granted granted Critical
Publication of JPH0737309Y2 publication Critical patent/JPH0737309Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は、本考案の実施例に係る拡散炉の縦断
側面図、第２図は、その要部の縦断正面図、第３
図は、従来の拡散炉の縦断側面図である。 図中、符号１は反応管、３は炉口、５は拡散ボ
ート、８は延長管、１１は冷却ガス供給用ノズル
。 FIG. 1 is a vertical side view of a diffusion furnace according to an embodiment of the present invention, FIG. 2 is a vertical front view of the main parts thereof, and FIG.
The figure is a vertical side view of a conventional diffusion furnace. In the figure, 1 is a reaction tube, 3 is a furnace opening, 5 is a diffusion boat, 8 is an extension tube, and 11 is a cooling gas supply nozzle.

Claims (1)

【実用新案登録請求の範囲】 (1) 反応管１の炉口３に、拡散ボート５の全体
を収容可能な長さの延長管８を接続するとともに
、この延長管８内に、冷却ガス供給用ノズル１１
を設けてある拡散炉。 (2) 前記供給用ノズル１１は、延長管８の長手
方向に沿つて配設されている前記実用新案登録請
求の範囲第１項に記載の拡散炉。[Claims for Utility Model Registration] (1) An extension tube 8 having a length that can accommodate the entire diffusion boat 5 is connected to the furnace opening 3 of the reaction tube 1, and cooling gas is supplied into the extension tube 8. nozzle 11
A diffusion furnace equipped with (2) The diffusion furnace according to claim 1, wherein the supply nozzle 11 is arranged along the longitudinal direction of the extension tube 8.
JP1985005643U 1985-01-18 1985-01-18 Diffusion furnace Expired - Lifetime JPH0737309Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985005643U JPH0737309Y2 (en) 1985-01-18 1985-01-18 Diffusion furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985005643U JPH0737309Y2 (en) 1985-01-18 1985-01-18 Diffusion furnace

Publications (2)

Publication Number Publication Date
JPS61121737U true JPS61121737U (en) 1986-07-31
JPH0737309Y2 JPH0737309Y2 (en) 1995-08-23

Family

ID=30482335

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985005643U Expired - Lifetime JPH0737309Y2 (en) 1985-01-18 1985-01-18 Diffusion furnace

Country Status (1)

Country Link
JP (1) JPH0737309Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269932A (en) * 1988-09-05 1990-03-08 Hitachi Ltd Device for heat treatment of semiconductor wafer and heat treating method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106119A (en) * 1980-12-24 1982-07-01 Hitachi Ltd Heating furnace

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57106119A (en) * 1980-12-24 1982-07-01 Hitachi Ltd Heating furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269932A (en) * 1988-09-05 1990-03-08 Hitachi Ltd Device for heat treatment of semiconductor wafer and heat treating method

Also Published As

Publication number Publication date
JPH0737309Y2 (en) 1995-08-23

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