JPS61116142A - Quake-free and vibro-isolating structure - Google Patents
Quake-free and vibro-isolating structureInfo
- Publication number
- JPS61116142A JPS61116142A JP23607184A JP23607184A JPS61116142A JP S61116142 A JPS61116142 A JP S61116142A JP 23607184 A JP23607184 A JP 23607184A JP 23607184 A JP23607184 A JP 23607184A JP S61116142 A JPS61116142 A JP S61116142A
- Authority
- JP
- Japan
- Prior art keywords
- frame
- laminated rubber
- supported
- pedestal
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F1/00—Springs
- F16F1/36—Springs made of rubber or other material having high internal friction, e.g. thermoplastic elastomers
- F16F1/40—Springs made of rubber or other material having high internal friction, e.g. thermoplastic elastomers consisting of a stack of similar elements separated by non-elastic intermediate layers
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Architecture (AREA)
- Mechanical Engineering (AREA)
- Buildings Adapted To Withstand Abnormal External Influences (AREA)
- Floor Finish (AREA)
- Vibration Prevention Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は免震・防振構造に係り、特に半導体製造装置を
載置するために好適な免震・防振構造に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a seismic isolation/vibration isolation structure, and particularly to a seismic isolation/vibration isolation structure suitable for mounting semiconductor manufacturing equipment.
クリーンルーム等においては各種の半導体製造装置が設
置され、この半導体製造装置の中にはステッパー等のよ
うに極端に振動を嫌う装置がある。従ってこのような振
動を嫌う半導体製造装置においては免震・防振構造の床
上に設置する必要がある。第１図では従来の免震・防振
構造が示されている。第１図に示すように基盤１０には
上方が開放した架台枠１２が設置されており、この架台
枠１２には中間架台１４が支持されている。即ち中間架
台１４はコイルばね１６を介してその下面が架台枠１２
に支持され、その側方においてゴムダンパ１８を介して
架台枠１２に支持されている。尚、符号２０で示す部材
は中間架台１４の中央部に配置された錘りである。中間
架台１４の上部には防振ゴム２２．２２を介して架台２
４が設置され、この架台２４上には半導体製造装置等の
機器類が設置されることになる。Various types of semiconductor manufacturing equipment are installed in clean rooms and the like, and some of these semiconductor manufacturing equipment, such as steppers, are extremely sensitive to vibration. Therefore, semiconductor manufacturing equipment that dislikes such vibrations needs to be installed on a floor with a seismically isolated and vibration-proof structure. Figure 1 shows a conventional seismic isolation/vibration isolation structure. As shown in FIG. 1, a mount frame 12 with an open top is installed on the base 10, and an intermediate mount 14 is supported on this mount frame 12. That is, the lower surface of the intermediate frame 14 is connected to the frame frame 12 via the coil spring 16.
It is supported by the gantry frame 12 via a rubber damper 18 on its side. Note that the member indicated by the reference numeral 20 is a weight disposed at the center of the intermediate frame 14. The upper part of the intermediate frame 14 is connected to the frame 2 via anti-vibration rubber 22.22.
4 is installed, and equipment such as semiconductor manufacturing equipment is installed on this pedestal 24.
しかしながら前記第１図に示す免震・防振構造では、機
器類の重量が大きくなると防振ゴム２２が座屈を起こし
、機器類を支持出来ない恐れがある。また前記防振構造
では、防振構造の構造が複雑である上に、免震・防振効
果は一方向（上下方向）にしか有効ではなく、更に低周
波（周波数が１０Ｈｚ以下）に対して共振するおそれが
ある等３次元的に吸振効果を有することが困難である。However, in the seismic isolation/vibration isolation structure shown in FIG. 1, when the weight of the equipment becomes large, the vibration isolating rubber 22 may buckle and become unable to support the equipment. Furthermore, in the above-mentioned vibration isolation structure, the structure of the vibration isolation structure is complex, and the seismic isolation/vibration isolation effect is only effective in one direction (up and down direction), and furthermore, it is effective against low frequencies (frequency is 10Hz or less). It is difficult to have a three-dimensional vibration absorption effect because there is a risk of resonance.
第２図では別の従来の免震・防振構造が示されている。Fig. 2 shows another conventional seismic isolation/vibration isolation structure.
基盤１０と機器類等が設置される架台２４との間には積
層ゴム２６が配設されている。積層ゴム２６はゴム板２
８と金属板３ｏとが交互に積層状に配置され、これらは
相互に接着されて積層ゴム２６を構成している。A laminated rubber 26 is provided between the base 10 and a pedestal 24 on which equipment and the like are installed. Laminated rubber 26 is rubber plate 2
8 and metal plates 3o are alternately arranged in a laminated manner, and these are adhered to each other to constitute a laminated rubber 26.
しかしながら前記積層ゴム２６を用いる従来の免震・防
振構造は、金属板３０を配している為大きな鉛直方向荷
重を支持できる利点があるが、架台２４上に設置される
機器類が軽量の場合には水平方向に対しては剛性が弱い
為、座屈を生じる恐れがある。However, the conventional seismic isolation/vibration isolation structure using the laminated rubber 26 has the advantage of being able to support a large vertical load because the metal plate 30 is arranged, but the equipment installed on the pedestal 24 is lightweight. In some cases, buckling may occur because the rigidity is weak in the horizontal direction.
本発明はこのような事情に鑑みてなされたもので、機器
類の重量に関係なく免震・防振効果を有し、更に３次元
的に免震・防振効果を有する免震・防振構造を提案する
ことを目的としている。The present invention has been made in view of the above circumstances, and is a seismic isolation/vibration proofing system that has a seismic isolation/vibration proofing effect regardless of the weight of the equipment, and further has a seismic isolation/vibration proofing effect in three dimensions. The purpose is to propose a structure.
本発明は前記目的を達成するために、基盤と、基盤上に
積層ゴムを介して支持される架台枠と、機器類を支持し
、その上部または下部は弾性体を介して架台枠に支持さ
れると共にその側部が積層ゴムを介して架台枠に支持さ
れた架台とからなることを特徴としている。In order to achieve the above object, the present invention supports a base, a mount frame supported on the base via laminated rubber, and equipment, the upper or lower part of which is supported by the mount frame via an elastic body. It is characterized in that it consists of a pedestal whose side portions are supported by a pedestal frame via laminated rubber.
また本発明は、基盤と、基盤上に複数の積層ゴムを介し
て支持され複数の空間部を画成する格子状縦壁を有する
架台枠と、前記架台枠の空間部内に配置されると共に機
器類を支持し、その上部または下部が弾性体で架台枠に
支持されると共にその側部が架台枠の縦壁に積層ゴムを
介して支持された架台とから成ることを特徴としている
。The present invention also provides a base, a mount frame having a lattice-like vertical wall supported on the base via a plurality of laminated rubbers and defining a plurality of spaces, and a device arranged in the space of the mount frame. The device is characterized by a pedestal whose upper or lower part is supported by an elastic body on a pedestal frame, and whose side parts are supported by the vertical walls of the pedestal frame via laminated rubber.
以下添付図面に従って本発明に係る免震・防振構造の好
ましい実施例を詳説する。Preferred embodiments of the seismic isolation/vibration isolation structure according to the present invention will be described in detail below with reference to the accompanying drawings.
第３図並びに第４図では本発明に係る第１実施例の構造
が示されている。第３図に示すように基盤１０上には架
台枠３２が積層ゴム２６．２６を介して支持されている
。積層ゴム２６は前記したようにゴム板２８と金属板３
ｏとが交互に積層状に配設されて構成されている。架台
枠３２には上方に向けて縦壁３４が立設され、この縦壁
３４は第４図に示すように方形状に枠組形成されている
。この縦壁３４で形成される空間部には半導体製造装置
等の機器類等を支持する架台２４が設置される。架台２
４の底面は弾性体３６を介して架台枠３２上に支持され
ている。また架台２４の４側面２４Ａ、２４Ａ、２４Ａ
、２４Ａ、は積層ゴム２６を介して架台枠３２の縦壁３
４に支持されている。積層ゴム２６は架台２４の側面２
４Ａと架台枠３２の縦壁３４との隙間に予め予圧をかけ
て圧縮した状態で配置される。3 and 4 show the structure of a first embodiment of the present invention. As shown in FIG. 3, a pedestal frame 32 is supported on the base 10 via laminated rubber 26, 26. As described above, the laminated rubber 26 includes the rubber plate 28 and the metal plate 3.
o are arranged alternately in a laminated manner. A vertical wall 34 is erected upward from the mount frame 32, and the vertical wall 34 is formed into a rectangular frame as shown in FIG. In the space formed by this vertical wall 34, a pedestal 24 for supporting equipment such as semiconductor manufacturing equipment is installed. Frame 2
The bottom surface of 4 is supported on the frame frame 32 via an elastic body 36. Also, the four sides 24A, 24A, 24A of the pedestal 24
, 24A are the vertical walls 3 of the frame frame 32 via the laminated rubber 26.
It is supported by 4. The laminated rubber 26 is attached to the side surface 2 of the frame 24.
4A and the vertical wall 34 of the frame frame 32 are preloaded in advance and placed in a compressed state.
前記の如く構成された本発明に係る実施例によれば、鉛
直方向の荷重に対しては基盤１０と架台枠３２との間に
設置される積層ゴム２６で支持し、水平方向の荷重に対
しては架台２４と縦壁３４との間に設置される積層ゴム
２６において支持するので、３次元の方向の振動に対し
て免震・防振効果を存することになる。According to the embodiment of the present invention configured as described above, the load in the vertical direction is supported by the laminated rubber 26 installed between the base 10 and the frame frame 32, and the load in the horizontal direction is supported. Since it is supported by the laminated rubber 26 installed between the frame 24 and the vertical wall 34, it has a seismic isolation and vibration damping effect against vibrations in three-dimensional directions.
第５図並びに第６図では本発明に係る第２実施例の構造
が示されている。第２実施例においては基盤１０と架台
枠３２との間には多段形式の積層ゴム４０が配役されて
いる。多段形式の積層ゴム４０は通常の積層ゴム２６．
２６を複数の連結板４２で途中連結し、水平方向の変位
に対して積層ゴム２６が座屈するのを防止するものであ
る。連結板４２は、剛体で形成され、積層ゴム２６の金
属板３０を連結するようにしてもよい。これにより上方
に設置される機器類等が軽量であっても水平方向の変位
に対して多段形式の積層ゴム４０により積層ゴム２６．
２６が座屈するようなことは無い。第２実施例において
は架台枠３２上に立設される縦壁３４は第６図に示すよ
うに格子状に形成され、複数の空間部４４が形成されて
いる。この複数の空間部４４内には各々機器類等を支持
する架台４６が配設されている。この架台４６は内部が
空洞の角柱状に形成され、この下端部には縦壁３４の下
部に形成された支持突起４８との間に弾性材５０を介し
て支持されている。また架台４６の側面と縦壁３４との
間には予め予圧を加えた状態で積層ゴム２６が配設され
ている。この積層ゴム２６は水平方向の荷重を吸収する
ために設けられたものである。他の空間部４４における
架台４６を支持する積層ゴム２６並びに弾性体５０は架
台４６が支持する機器類等の重量或いは要求される防振
構造に合わせてその弾性係数等を決定することができる
。尚、架台４６は弾性体５０でその底面を架台枠３２に
支持したのであるが、弾性体で吊下げるようにしてもよ
い。5 and 6 show the structure of a second embodiment of the present invention. In the second embodiment, a multi-stage laminated rubber 40 is disposed between the base 10 and the pedestal frame 32. The multi-stage type laminated rubber 40 is a normal laminated rubber 26.
26 are connected midway through a plurality of connecting plates 42 to prevent the laminated rubber 26 from buckling due to displacement in the horizontal direction. The connecting plate 42 may be formed of a rigid body and connect the metal plates 30 of the laminated rubber 26. As a result, even if the equipment installed above is lightweight, the laminated rubber 26.
26 will not buckle. In the second embodiment, the vertical walls 34 erected on the frame frame 32 are formed in a lattice shape as shown in FIG. 6, and a plurality of spaces 44 are formed. Each of the plurality of spaces 44 is provided with a pedestal 46 for supporting equipment and the like. The pedestal 46 is formed into a prismatic shape with a hollow interior, and is supported at its lower end with an elastic member 50 interposed between it and a support protrusion 48 formed at the lower part of the vertical wall 34. Further, the laminated rubber 26 is disposed between the side surface of the frame 46 and the vertical wall 34 in a preloaded state. This laminated rubber 26 is provided to absorb horizontal loads. The elastic modulus of the laminated rubber 26 and elastic body 50 that support the pedestal 46 in the other space 44 can be determined according to the weight of the equipment supported by the pedestal 46 or the required vibration isolation structure. Although the bottom surface of the pedestal 46 is supported on the pedestal frame 32 by an elastic body 50, it may be suspended by an elastic body.
前記実施例によれば、架台枠３２を支持する積層ゴム４
０は多段形式に構成されているので、水平方向の剛性は
強く軽量の機器類が設置されても横揺れに対して座屈す
るようなことはない。また横方向の揺れに対しては縦壁
３４と架台４６との間には積層ゴム２６が配設されてい
るので、横方向の荷重を支持することができる。According to the embodiment, the laminated rubber 4 supporting the frame frame 32
0 has a multi-stage structure, so it has strong horizontal rigidity and will not buckle due to horizontal shaking even when lightweight equipment is installed. Moreover, since the laminated rubber 26 is disposed between the vertical wall 34 and the pedestal 46, the load in the lateral direction can be supported.
第７図並びに第８図では本発明に係る第３実施例の構造
が示されている。第３実施例では架台２４にはその四隅
に支持面５２．５２．５２．５２が形成され、この各支
持面５２に対応してそれぞれ支柱５４．５４．５４．５
４が立設されている、更に各支持面５２と支柱５４との
間には多段積層ゴム４０とベアリング５６が配設されて
いる。7 and 8 show the structure of a third embodiment of the present invention. In the third embodiment, support surfaces 52, 52, 52, 52 are formed at the four corners of the pedestal 24, and columns 54, 54, 54, 5 correspond to each support surface 52, respectively.
Further, between each supporting surface 52 and the support column 54, a multi-stage laminated rubber 40 and a bearing 56 are arranged.
前記第３実施例によれば横方向の変位に対しては積層ゴ
ム４０を介して支柱５４で受けることができ、また積層
ゴム４０と支柱５４との間にはベアリング５６が介在さ
れているため、架台２４の上下方向の変位もスムーズに
行うことができる。According to the third embodiment, the lateral displacement can be received by the strut 54 via the laminated rubber 40, and the bearing 56 is interposed between the laminated rubber 40 and the strut 54. Also, vertical displacement of the pedestal 24 can be performed smoothly.
以上説明したように本発明に係る免震・防振床構造によ
れば、機器類等支持する架台の側面と架台を支持する架
台枠の縦壁との間に積層ゴムを配設したので、横方向の
荷重を支持することができる。また架台枠の縦枠は格子
状に区切られ複数の空間部が形成され、この空間部には
各機器類を支持する架台が配置され、各架台は架台枠の
間に配設される積層ゴムの種類並びにばね等の弾性係数
を適宜変えることにより各半導体製造装置の要求に合っ
た免震・防振効果を与えることができる。As explained above, according to the seismic isolation/vibration isolation floor structure according to the present invention, since the laminated rubber is disposed between the side surface of the pedestal that supports equipment etc. and the vertical wall of the pedestal frame that supports the pedestal, Can support lateral loads. In addition, the vertical frame of the mount frame is divided into a grid pattern to form a plurality of spaces, and a mount supporting each piece of equipment is placed in this space. By appropriately changing the type of the spring and the elastic modulus of the spring, etc., it is possible to provide seismic isolation and vibration isolation effects that meet the requirements of each semiconductor manufacturing device.
さらに架台枠は基盤との間に積層ゴムを多段形式で配設
しているので、機械類が軽量のような場合であっても横
方向の荷重に対して積層ゴムが座屈するようなことはな
い。Furthermore, since the mount frame has laminated rubber placed in multiple stages between it and the base, the laminated rubber will not buckle due to lateral loads, even if the machinery is lightweight. do not have.
第１図は従来の免震・防振構造の構造を示す断面図、第
２図は別の従来の積層ゴムを用いた免震・防振構造を示
す正面図、第３図は本発明に係る第１実施例の構造を示
す断面図、第４図はその平面図、第５図並びに第６図は
本発明に係る第２実施例の構造を示す図面で、第５図は
その部分断面図、第６図はその平面図、第７図、第８図
は本発明に係る第３実施例の構造を示す図面で第７図は
第３実施例の平断面図、第８図は第７図上でＡ矢視断面
図である。
１０・・・基盤、 ２６・・・積層ゴム、 ３２・・・
架台枠、 ３４・・・縦壁、 ４０・・・多段積層ゴム
。Figure 1 is a sectional view showing the structure of a conventional seismic isolation/vibration isolation structure, Figure 2 is a front view showing another conventional seismic isolation/vibration isolation structure using laminated rubber, and Figure 3 is a cross-sectional view showing the structure of a conventional seismic isolation/vibration isolation structure. FIG. 4 is a cross-sectional view showing the structure of the first embodiment, FIG. 4 is a plan view thereof, and FIGS. 5 and 6 are drawings showing the structure of the second embodiment according to the present invention, and FIG. 5 is a partial cross-section thereof. 6 is a plan view thereof, FIGS. 7 and 8 are drawings showing the structure of a third embodiment according to the present invention, FIG. 7 is a plan sectional view of the third embodiment, and FIG. 7 is a sectional view taken along arrow A in FIG. 10... Base, 26... Laminated rubber, 32...
Frame frame, 34...Vertical wall, 40...Multi-stage laminated rubber.
Claims (3)
台枠と、機器類を支持し、その上部または下部は弾性体
を介して架台枠に支持されると共にその側部が積層ゴム
を介して架台枠に支持された架台とからなることを特徴
とする免震・防振構造。(1) A base, a pedestal frame supported on the base via laminated rubber, and supporting equipment, the upper or lower part of which is supported by the pedestal frame via an elastic body, and the sides of which are supported by laminated rubber. A seismic isolation/vibration isolation structure characterized by comprising a pedestal supported by a pedestal frame via a pedestal frame.
れ複数の空間部を画成する格子状縦壁を有する架台枠と
、前記架台枠の空間部内に配置されると共に機器類を支
持し、その上部または下部が弾性体で架台枠に支持され
ると共にその側部が架台枠の縦壁に積層ゴムを介して支
持された架台とから成ることを特徴とする免震・防振構
造。(2) a base, a mount frame having a lattice-like vertical wall supported on the base via a plurality of laminated rubbers and defining a plurality of spaces; and a mount frame that is disposed within the space of the mount frame and that accommodates equipment. Seismic isolation and vibration isolation characterized by comprising a pedestal whose upper or lower part is supported by an elastic body on the pedestal frame, and whose side parts are supported by the vertical walls of the pedestal frame via laminated rubber. structure.
連結されていることを特徴とする特許請求の範囲第２項
の免震・防振構造。(3) The seismic isolation/vibration isolation structure according to claim 2, wherein the laminated rubber between the base and the pedestal frame are connected to each other by a connecting plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23607184A JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23607184A JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116142A true JPS61116142A (en) | 1986-06-03 |
| JPH0549846B2 JPH0549846B2 (en) | 1993-07-27 |
Family
ID=16995282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23607184A Granted JPS61116142A (en) | 1984-11-09 | 1984-11-09 | Quake-free and vibro-isolating structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61116142A (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62159824A (en) * | 1985-12-28 | 1987-07-15 | Bridgestone Corp | Earthquake motion releasing/vibration removing support device |
| JPS6357933A (en) * | 1986-08-29 | 1988-03-12 | Nippon Denki Kankyo Eng Kk | Vibrrationproof base |
| JPS63186180A (en) * | 1987-01-28 | 1988-08-01 | 工業技術院長 | Vibration damper |
| JPS63258776A (en) * | 1987-04-17 | 1988-10-26 | 株式会社ブリヂストン | Vibration-damping container for transport |
| JPH028530A (en) * | 1988-06-27 | 1990-01-12 | Ohbayashi Corp | Multi-stage vibration removing device |
| JPH0289143U (en) * | 1988-12-28 | 1990-07-16 | ||
| JPH02136900U (en) * | 1989-04-21 | 1990-11-15 | ||
| FR2711765A1 (en) * | 1993-10-25 | 1995-05-05 | Metravib Sa | Suspension device for a system designed to be placed in a zero-gravity situation |
| JP2002310232A (en) * | 2001-04-11 | 2002-10-23 | Tokkyokiki Corp | Vibration isolation pedestal for clean room |
| JP2012042016A (en) * | 2010-08-20 | 2012-03-01 | Shimizu Corp | Three-dimensional base isolation device |
| JP2014162526A (en) * | 2013-02-26 | 2014-09-08 | Mitsubishi Heavy Ind Ltd | Container, method for stacking the same |
| WO2017056265A1 (en) * | 2015-09-30 | 2017-04-06 | 三菱電機株式会社 | Base isolation unit and base isolation method |
| CN112324828A (en) * | 2020-11-24 | 2021-02-05 | 北京航空航天大学 | Three-way rigidity damping decoupling high-bearing metal rubber combined vibration isolator |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59228571A (en) * | 1983-06-08 | 1984-12-21 | 多田 英之 | Earthquake-proof enclosure |
-
1984
- 1984-11-09 JP JP23607184A patent/JPS61116142A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59228571A (en) * | 1983-06-08 | 1984-12-21 | 多田 英之 | Earthquake-proof enclosure |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62159824A (en) * | 1985-12-28 | 1987-07-15 | Bridgestone Corp | Earthquake motion releasing/vibration removing support device |
| JPS6357933A (en) * | 1986-08-29 | 1988-03-12 | Nippon Denki Kankyo Eng Kk | Vibrrationproof base |
| JPS63186180A (en) * | 1987-01-28 | 1988-08-01 | 工業技術院長 | Vibration damper |
| JPS63258776A (en) * | 1987-04-17 | 1988-10-26 | 株式会社ブリヂストン | Vibration-damping container for transport |
| JPH028530A (en) * | 1988-06-27 | 1990-01-12 | Ohbayashi Corp | Multi-stage vibration removing device |
| JPH0289143U (en) * | 1988-12-28 | 1990-07-16 | ||
| JPH02136900U (en) * | 1989-04-21 | 1990-11-15 | ||
| FR2711765A1 (en) * | 1993-10-25 | 1995-05-05 | Metravib Sa | Suspension device for a system designed to be placed in a zero-gravity situation |
| JP2002310232A (en) * | 2001-04-11 | 2002-10-23 | Tokkyokiki Corp | Vibration isolation pedestal for clean room |
| JP2012042016A (en) * | 2010-08-20 | 2012-03-01 | Shimizu Corp | Three-dimensional base isolation device |
| JP2014162526A (en) * | 2013-02-26 | 2014-09-08 | Mitsubishi Heavy Ind Ltd | Container, method for stacking the same |
| WO2017056265A1 (en) * | 2015-09-30 | 2017-04-06 | 三菱電機株式会社 | Base isolation unit and base isolation method |
| JPWO2017056265A1 (en) * | 2015-09-30 | 2017-10-05 | 三菱電機株式会社 | Seismic isolation unit and seismic isolation device |
| US10443677B2 (en) | 2015-09-30 | 2019-10-15 | Mitsubishi Electric Corporation | Base isolation unit and base isolation apparatus |
| CN112324828A (en) * | 2020-11-24 | 2021-02-05 | 北京航空航天大学 | Three-way rigidity damping decoupling high-bearing metal rubber combined vibration isolator |
| CN112324828B (en) * | 2020-11-24 | 2021-08-17 | 北京航空航天大学 | Three-way rigidity damping decoupling high-bearing metal rubber combined vibration isolator |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0549846B2 (en) | 1993-07-27 |
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