JPS61105839U - - Google Patents
Info
- Publication number
- JPS61105839U JPS61105839U JP19077384U JP19077384U JPS61105839U JP S61105839 U JPS61105839 U JP S61105839U JP 19077384 U JP19077384 U JP 19077384U JP 19077384 U JP19077384 U JP 19077384U JP S61105839 U JPS61105839 U JP S61105839U
- Authority
- JP
- Japan
- Prior art keywords
- detection element
- temperature probe
- full
- temperature detection
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000523 sample Substances 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims 2
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Landscapes
- Measuring Temperature Or Quantity Of Heat (AREA)
Description
第１図は本考案の全温度プローブの断面図、第
２図は本考案の変形例の全温度プローブの断面図
、第３図は従来の全温度プローブの断面図である
。 １……配管、２……外側しやへい管、３……内
側しやへい管、４……熱電体、５……しやへい管
、６……キヤツプ、７……保護カバー。
２図は本考案の変形例の全温度プローブの断面図
、第３図は従来の全温度プローブの断面図である
。 １……配管、２……外側しやへい管、３……内
側しやへい管、４……熱電体、５……しやへい管
、６……キヤツプ、７……保護カバー。
Claims (1)
- 【実用新案登録請求の範囲】 (1) 温度検出素子と、この温度検出素子を囲み
相互にずれた位置に穴を有する複数の管とを備え
たことを特徴とする全温度プローブ。 (2) 管はその先端が閉じられたものであること
を特徴とする実用新案登録請求の範囲第１項記載
の全温度プローブ。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19077384U JPS61105839U (ja) | 1984-12-18 | 1984-12-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19077384U JPS61105839U (ja) | 1984-12-18 | 1984-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61105839U true JPS61105839U (ja) | 1986-07-05 |
Family
ID=30748224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19077384U Pending JPS61105839U (ja) | 1984-12-18 | 1984-12-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61105839U (ja) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
| US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface |
| US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
| JP2016511389A (ja) * | 2012-12-20 | 2016-04-14 | ヌオーヴォ ピニォーネ ソチエタ レスポンサビリタ リミタータＮｕｏｖｏ Ｐｉｇｎｏｎｅ Ｓ．Ｒ．Ｌ． | 湿りガス状態での全圧および全温測定 |
| US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
| US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
| US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
| US9400857B2 (en) | 2011-09-19 | 2016-07-26 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography |
| US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
-
1984
- 1984-12-18 JP JP19077384U patent/JPS61105839U/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9268214B2 (en) | 2008-09-01 | 2016-02-23 | D2S, Inc. | Method for forming circular patterns on a surface |
| US9274412B2 (en) | 2008-09-01 | 2016-03-01 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
| US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
| US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
| US9372391B2 (en) | 2008-09-01 | 2016-06-21 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
| US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
| US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| US9400857B2 (en) | 2011-09-19 | 2016-07-26 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography |
| JP2016511389A (ja) * | 2012-12-20 | 2016-04-14 | ヌオーヴォ ピニォーネ ソチエタ レスポンサビリタ リミタータＮｕｏｖｏ Ｐｉｇｎｏｎｅ Ｓ．Ｒ．Ｌ． | 湿りガス状態での全圧および全温測定 |