JPS6084101A - Flow-down film type evaporation apparatus - Google Patents

Flow-down film type evaporation apparatus

Info

Publication number
JPS6084101A
JPS6084101A JP9670183A JP9670183A JPS6084101A JP S6084101 A JPS6084101 A JP S6084101A JP 9670183 A JP9670183 A JP 9670183A JP 9670183 A JP9670183 A JP 9670183A JP S6084101 A JPS6084101 A JP S6084101A
Authority
JP
Japan
Prior art keywords
flow
heating element
film type
heating elements
steam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9670183A
Other languages
Japanese (ja)
Inventor
Shizuo Honda
静夫 本多
Kiyohisa Ueda
上田 精久
Masahito Yano
矢野 正仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Zosen Corp
Original Assignee
Hitachi Zosen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Zosen Corp filed Critical Hitachi Zosen Corp
Priority to JP9670183A priority Critical patent/JPS6084101A/en
Publication of JPS6084101A publication Critical patent/JPS6084101A/en
Pending legal-status Critical Current

Links

Landscapes

  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)

Abstract

PURPOSE:To effectively suppress the generation of mist without lowering evaporation capacity, by gradually enlarging the vertical opening end parts of the gaps between the heating elements of a flow-down film type evaporation apparatus from above to below. CONSTITUTION:A flow-down film type evaporation apparatus has a heater passage and is equipped with a large number of hollow flat plate shaped heating elements 2 provided vertically in parallel at predetermined intervals and a liquid to be treated is evaporated while flowed down along the outer surface of each heating element 2. A plural number of flow amount adjusting plates 4 are respectively provided to the end parts of the heating elements 2 in the width direction thereof. Each flow adjusting plate 4 has the same length as each heating element and comprises a vertically long plate shaped body of which the width is gradually narrowed from above to below. In addition, said plate 4 is contacted with the end part of each heating element 2 at the central part in the width direction thereof and almost contacted with adjacent plates 4 at the upper end part thereof to each other.

Description

【発明の詳細な説明】 この発明は、化学、食品、機械などの工業において、各
種溶液を濃縮するために用いられる仲鵞1 −y i 
n、r w> −u: pse J士嬰+y NI+−
−W一般に流下フィルム式蒸発装置は、第1図および第
2図に示すように、加熱流体通路(11を有し、かつ所
定間隔で垂直並列状に設けられた複数の中空平板状加熱
素子(2)を備えている。被処理液は、供液装置(3)
によって各加熱素子(2)の上端に供給されてその外表
面にそって流下し、この価程で熱を受けて蒸発濃縮され
る。
[Detailed Description of the Invention] This invention is a method for concentrating various solutions in the chemical, food, machinery, and other industries.
n, r w> −u: pse Jshiyan+y NI+−
-W In general, a falling film type evaporator, as shown in FIGS. 1 and 2, has a heating fluid passage (11) and a plurality of hollow flat heating elements (11) arranged vertically in parallel at predetermined intervals. 2).The liquid to be treated is supplied to the liquid supply device (3).
is supplied to the upper end of each heating element (2) and flows down along its outer surface, where it receives heat and is evaporated and concentrated.

発生した蒸気は各加熱素子(2)の間隙を横方向に流れ
て排出される間に被処理液の霧状飛沫数滴(以下ミスト
という)が混入1−るために、これを分離するために分
離装置(図示+11i’+ )へ綽かれるが、分離装置
で気液分離を効果的に行うためには、蒸気に多量のミス
トか混在することは好ましくない。
While the generated steam flows horizontally through the gaps between the heating elements (2) and is discharged, it is mixed with a few droplets of the liquid to be treated (hereinafter referred to as mist), so this is separated. However, in order to effectively perform gas-liquid separation in the separator, it is not preferable that a large amount of mist be mixed with the steam.

ミストは、っぎのようにして発生し、蒸気に混入−A−
7+t、のJ−−1!’ −/ ; + Z 4nか1
1月器ヱhl Ji i6i IF’そって被処理液は
、層流域、遷移流域およQ乱流域を形成して流れる。ま
た被処理液の流れ始めからある距離に至るまでは助走区
間と呼ばれる。この区間において流れは完全層流であり
、伝熱抵抗は大きい。流れが層流域から遷移流域、乱流
域に進むにしたかつて伝熱抵抗は小さくなり、効率良く
伝熱が行なわれる。伝熱が効率良く行なわれて蒸発が進
むと液膜が簿(なり、伝熱抵抗はますます小さくなって
熱伝達率が良くなり、蒸発が促進される。このために、
加熱素子外表面では被処理液の蒸発■が上下方向で異な
り、下部に近い部分はど蒸発ユが多くなる。
Mist is generated as shown in the figure and mixed with steam -A-
7+t, J--1! '-/; + Z 4n or 1
Then, the liquid to be treated flows forming a laminar region, a transition region, and a Q turbulent region. Further, the period from the beginning of the flow of the liquid to be treated to a certain distance is called a run-up section. In this section, the flow is completely laminar and the heat transfer resistance is large. As the flow progresses from the laminar region to the transition region to the turbulent region, the heat transfer resistance becomes smaller and heat is transferred more efficiently. As heat transfer is carried out efficiently and evaporation progresses, the liquid film becomes thinner, the heat transfer resistance becomes smaller and the heat transfer coefficient improves, and evaporation is promoted.
On the outer surface of the heating element, the rate of evaporation of the liquid to be treated differs in the vertical direction, with more evaporation occurring near the bottom.

第1図には、この様子を模式的に示すように蒸発を示す
矢印の密度か上から下にかけて漸次大きくなっている。
In FIG. 1, this situation is schematically shown, and the density of the arrow indicating evaporation gradually increases from the top to the bottom.

このように加熱素子の上下方向で蒸発蒸気量が異なるた
めに、加熱素子間隙内を蒸気は蒸発量の少ない上部に向
かって上昇しながら横方向に流れ、しかも流速が上下間
で異なるために流れか撹乱される。このように、流下す
る被処理液に対して蒸気が向流して流れるとともに、流
れか一様でないために、蒸気かミストを随伴してしまう
ことになる。
Because the amount of evaporated steam differs in the upper and lower directions of the heating element, the steam flows laterally within the gap between the heating elements while rising toward the upper part where the amount of evaporation is less. or be disturbed. In this way, the steam flows countercurrently to the flowing liquid to be treated, and since the flow is not uniform, steam or mist is entrained.

ところで蒸気とミストの混在を防d−するための従来の
蒸発装置としては、特開昭53−83977号公報に開
示されているように、加熱素子間隙の1側方端、或は下
方端のみを全開、或は一部門させて、加熱素子間で発生
ずる蒸発蒸気の餠出方向を規制するようにしたものであ
って、蒸発蒸気は筐体内壁に衝突し、ために強制方向転
換がなされて、その間にミスI・を分離ずをようにした
ものが知られている。ところが、蒸気の排出方向を規制
することは、加熱素子間の蒸気流沫の増大を招くために
、却って加熱素子表面からミストか発生し易くなり、ま
た同時に蒸気流路の田力損失が増大するために、蒸発性
能が低下する。
By the way, as a conventional evaporator for preventing the mixture of steam and mist, as disclosed in Japanese Patent Laid-Open No. 53-83977, only one side end or lower end of the heating element gap is used. The heating element is fully opened or partially opened to control the direction of the evaporative vapor generated between the heating elements, and the evaporative vapor collides with the inner wall of the housing, causing a forced direction change. There is a known method that does not separate Miss I. However, regulating the direction of steam discharge leads to an increase in steam droplets between the heating elements, which makes mist more likely to be generated from the surface of the heating elements, and at the same time increases power loss in the steam flow path. Therefore, the evaporation performance decreases.

この発明の目的は、上記欠点を解消し、蒸発性能を低下
させることな(、ミスト発生を効果的に抑制することの
できる流下フィルム式蒸発装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a falling film type evaporator that can eliminate the above-mentioned drawbacks and effectively suppress mist generation without deteriorating evaporation performance.

この発明による流下フィルム式蒸発装置は、加熱流体通
路を有し、かつ所定間隔で垂直並列状に設けられた複数
の中空平板状加熱素子を備え、各加熱素子の外表面にそ
って被処理液が流下して蒸発するようになされている流
下フィルム式蒸発装置において、各加熱素子間隙の垂直
開口端部が上から下にかりて漸次大きく開口さ引ていス
ミ+小−7′l七l この発明によれば、各加熱素子間隙の垂直開口端部が上
から下にかけて漸次大きく開口されているので、同開口
部を通過する蒸気の流量か同開口面積に応じて絞られる
ように調整されるために、同間隙内を横方向に流れる蒸
気の流速は上下方向で一様になり、蒸気が被処理液に向
流する方向に流れようとすることか阻dlされるととも
に、上下を流れる蒸気の流れが和瓦に撹乱されることか
ないので、蒸気にミストを随伴することがなり、ミスト
発生を効果的に抑制することができる。
The falling film type evaporator according to the present invention includes a plurality of hollow flat heating elements each having a heating fluid passage and arranged vertically in parallel at a predetermined interval. In a falling film type evaporator, the vertical opening end of each heating element gap is gradually opened larger from top to bottom. According to the invention, the vertical opening end of each heating element gap is gradually opened larger from top to bottom, so that the flow rate of steam passing through the opening is adjusted to be throttled according to the opening area. Therefore, the flow velocity of the steam flowing laterally within the same gap becomes uniform in the vertical direction, preventing the steam from flowing in the countercurrent direction to the liquid to be treated, and preventing the steam flowing above and below. Since the flow of steam is not disturbed by the Japanese roof tiles, mist is entrained in the steam, and mist generation can be effectively suppressed.

以下、この発明の実施例について第3図から第6図を参
照して説明する。第3図から第6図は Nl 1図およ
び第2図に示した流下フィルム式蒸発装置に対応して示
すものである。各図において、便宜上同一の構成要素に
ついては同一の符号が附されている。
Embodiments of the present invention will be described below with reference to FIGS. 3 to 6. 3 to 6 correspond to the falling film type evaporator shown in FIGS. 1 and 2. In each figure, the same reference numerals are given to the same components for convenience.

以下に示す各実施例は、いずれも各加熱素子(2)の幅
方向両端部に流量調整板+41 +51 (61+71
を設けることにより、各加熱素子(2)間隙の垂直開口
端部が上から下にかけて漸次大きく開口されるようにし
たものである。
In each of the embodiments shown below, flow rate adjustment plates +41 +51 (61+71
By providing this, the vertical opening ends of the gaps between the heating elements (2) gradually become larger from the top to the bottom.

第3図に、第1実施例を示す。加熱素子(2)の幅方向
端部に複数の流量調整板(4)がそれぞれ設けられてい
る。流量調整板(4)は加熱素子(2)と同じ長さを有
し、上から下にいくにしたがって幅が漸次狭められた上
下に長い板状体で、その幅方向の中央部で加熱素子(3
)の端部に当接し、かつ上端部が相互にほぼ接するよう
に設りられている。
FIG. 3 shows a first embodiment. A plurality of flow rate adjustment plates (4) are provided at the ends in the width direction of the heating element (2), respectively. The flow rate adjustment plate (4) is a vertically long plate-like body having the same length as the heating element (2) and whose width gradually narrows from top to bottom. (3
), and their upper ends are substantially in contact with each other.

第4図に、第2実施例を示す。この実施例では、第1実
施例の流量調整板(4)とほぼ同様な流量調整板(5)
が各加熱素子間に位置するように設けられている。
FIG. 4 shows a second embodiment. In this embodiment, a flow rate adjustment plate (5) which is almost the same as the flow rate adjustment plate (4) of the first embodiment is used.
are located between each heating element.

第5図に、第3実施例を示す。この実施例では、第2実
施例と同様に各加熱素子(2)間に流量顎杉板(6)が
設けられている。たたし流m N!I整板(6)は、各
加熱素子(2)間隙よりも狭い一定の中1□1を有し、
かつ上端部が各加熱素子(2)の開口端部に位置し、下
端部が同端部から離れるように細糸[している。
FIG. 5 shows a third embodiment. In this embodiment, similar to the second embodiment, flow jaw cedar plates (6) are provided between each heating element (2). Tashi style m N! The I-straight plate (6) has a constant diameter 1□1 narrower than the gap between each heating element (2);
The upper end is located at the open end of each heating element (2), and the lower end is separated from the same end by a thin thread.

第6図に、第4実施例を示す。この実施例ては、各加熱
素子(2)の各端部に当接するように1枚の流量調整板
(7)が設けられている。流ij1調整板(7)には多
数の蒸気流出口(8)があけられている。
FIG. 6 shows a fourth embodiment. In this embodiment, one flow regulating plate (7) is provided so as to abut each end of each heating element (2). A large number of steam outlet ports (8) are opened in the flow ij1 adjustment plate (7).

各流出口(8)は加熱素子(2)の間隙に相当する位置
を上下−列に並べられ、かつ各開口面積が上から下に順
に大きくなっている。なお流出口(8)は、大小の開口
面積を有するものの代わりに、一定の開口面積を有する
多数のものを密度を上から下にかけて漸次高くなるよう
に配列したものでもよい。
The outflow ports (8) are arranged in vertical rows at positions corresponding to the gaps between the heating elements (2), and the area of each opening increases from top to bottom. Note that the outlet (8) may be one in which a large number of outlets each having a constant opening area are arranged so that the density gradually increases from top to bottom, instead of having a large and small opening area.

各流量調整板+41 +51 +6) (7+の各高さ
における開口部面積は、加熱素子(2)の上下方同各位
置で蒸発した蒸気が各加熱素子(2)間隙をほぼ水平方
向に流れて同開口部からJ′Jt出されるときに、その
流速か各位置でほぼ一定となるように、加熱素子(2)
の上下方同各位置で蒸発する蒸気二に対応して決められ
ている。また、各加熱素子(2)の間隙は最下部で蒸発
した蒸気がほぼ水平方向に流れたときに、その流れによ
ってミストが持ち去られることのない許容流速以下とな
るように決められている。
Each flow rate adjusting plate +41 +51 +6) (The opening area at each height of 7+ is such that the steam evaporated at the same position above and below the heating element (2) flows almost horizontally through the gap between each heating element (2). The heating element (2) is arranged so that when J'Jt is discharged from the same opening, the flow velocity is approximately constant at each position.
It is determined according to the amount of steam that evaporates at the same upper and lower positions. Further, the gap between each heating element (2) is determined so that when the vapor evaporated at the bottom flows in a substantially horizontal direction, the flow velocity is below an allowable flow rate at which the mist is not carried away by the flow.

流速で流れる。これにより、蒸気が上昇して被処理液に
向流することがな(、かつ上下の流れが相互に撹乱され
ることがないので、ミストか蒸気に随伴して持ち去られ
ることがない。
Flows at a current speed. As a result, the steam does not rise and flow countercurrently to the liquid to be treated (and since the upper and lower flows are not mutually disturbed, the mist is not carried away along with the steam).

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は、従来例を示すもので、第1図は
要部を示す垂直断面図、第2図は第1図のn−n線にそ
う断面図である。第3図から第6図は、この発明の各実
施例を示す斜視図である。 (1)・・・加熱流体通路、(2)・拳書加熱素子、1
41 f51f61 +71・・・流量調整板。 以 上 IL/Ily !−1 浪 ■ )
1 and 2 show a conventional example. FIG. 1 is a vertical sectional view showing the main part, and FIG. 2 is a sectional view taken along the line nn in FIG. 1. 3 to 6 are perspective views showing each embodiment of the present invention. (1)... Heating fluid passage, (2) - Fist heating element, 1
41 f51f61 +71...Flow rate adjustment plate. That's it IL/Ily! -1 wave)

Claims (1)

【特許請求の範囲】 加熱流体通路を有し、かつ所定間隔で垂直並列状に設け
られた複数の中空平板状加熱素子を備え、各加熱素子の
外表面にそって被処理液が流下して蒸発するようなされ
ている流下フィルム式蒸発装置において、 各加熱素子間隙のffi直開口開口端部から下にかけて
漸次太きく Dd口されている流下フィルム式蒸発装誼
[Claims] A plurality of hollow flat heating elements each having a heating fluid passage and arranged vertically in parallel at a predetermined interval are provided, and the liquid to be treated flows down along the outer surface of each heating element. In a falling film type evaporator, the width of each heating element gap gradually increases from the open end of the opening to the bottom.
JP9670183A 1983-05-30 1983-05-30 Flow-down film type evaporation apparatus Pending JPS6084101A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9670183A JPS6084101A (en) 1983-05-30 1983-05-30 Flow-down film type evaporation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9670183A JPS6084101A (en) 1983-05-30 1983-05-30 Flow-down film type evaporation apparatus

Publications (1)

Publication Number Publication Date
JPS6084101A true JPS6084101A (en) 1985-05-13

Family

ID=14172061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9670183A Pending JPS6084101A (en) 1983-05-30 1983-05-30 Flow-down film type evaporation apparatus

Country Status (1)

Country Link
JP (1) JPS6084101A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0533801U (en) * 1991-10-02 1993-05-07 住友重機械工業株式会社 Dispersion device for processing liquid to heating element in plate type evaporator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54149377A (en) * 1978-05-16 1979-11-22 Ishikawajima Harima Heavy Ind Co Ltd Liquid evaporator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54149377A (en) * 1978-05-16 1979-11-22 Ishikawajima Harima Heavy Ind Co Ltd Liquid evaporator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0533801U (en) * 1991-10-02 1993-05-07 住友重機械工業株式会社 Dispersion device for processing liquid to heating element in plate type evaporator

Similar Documents

Publication Publication Date Title
US4586565A (en) Plate evaporator
US3917764A (en) Sloped film fill assembly cooling tower
US4769186A (en) Gas liquid tower structure
JP2000167301A (en) Liquid distributor for packed column and packed column equipped with the liquid distributor
KR910000323B1 (en) Evaporating heat transfer wall
US3707277A (en) Combination cross flow and counter flow cooling tower
US5569415A (en) Cross-flow cooling tower with reduced upper inboard fill section
BR112012032752B1 (en) method of operating a contact column section
JPS6084101A (en) Flow-down film type evaporation apparatus
WO1998043027A1 (en) Absorber of absorption system refrigerator
US2693350A (en) Construction for handling vapors and liquids as in bubble columns or the like
SE423279B (en) SUPPLY DEVICE AT AN EVAPOROTIVE CONTACT BODY
US4592877A (en) Cooling tower with partially filled air inlet plenum
US20080073801A1 (en) Splash bar apparatus and method
JPS60257802A (en) Gas-liquid contact tower
JPH06137780A (en) Fluid distributor, method of supplying fluid and crossflow cooling tower
JPS6178425A (en) Cooling and carbonic acid adding container
US6631860B2 (en) Guide member for a liquid jet to be deflected
US4256674A (en) Counter-current gas-liquid contact apparatus
US4774033A (en) Gas liquid tower structure
US3711070A (en) Foam-type apparatus for carrying out heat and mass transfer processes
GB2027352A (en) Plate type evaporator
JPS58173393A (en) Distributing header for two (vapor-liquid) phase fluid
US2081615A (en) Apparatus for obtaining exposed liquid surfaces
RU1813997C (en) Spray chamber