JPS6082460U - Substrate holder for vacuum evaporation equipment - Google Patents

Substrate holder for vacuum evaporation equipment

Info

Publication number
JPS6082460U
JPS6082460U JP17577083U JP17577083U JPS6082460U JP S6082460 U JPS6082460 U JP S6082460U JP 17577083 U JP17577083 U JP 17577083U JP 17577083 U JP17577083 U JP 17577083U JP S6082460 U JPS6082460 U JP S6082460U
Authority
JP
Japan
Prior art keywords
substrate holder
vacuum evaporation
evaporation equipment
substantially cylindrical
equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17577083U
Other languages
Japanese (ja)
Inventor
秋葉 繁夫
Original Assignee
真空器械工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 真空器械工業株式会社 filed Critical 真空器械工業株式会社
Priority to JP17577083U priority Critical patent/JPS6082460U/en
Publication of JPS6082460U publication Critical patent/JPS6082460U/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの考案の基板ホルダーを備えた蒸着槽の概略
断面図、第2図はこの考案の基板ホルダーの実施例を示
す平面図、第3図はこの正面図、第4図は右側面図、第
5図は第2図の線A−Aに沿った断面図である。 図中、10は基板ホルダー、10aは基板ホルダ一本体
、10bは基板ホルダー扉部、16は蒸着室、24は回
転リング、26は蒸発源、4oは周面、42は開口、4
8は蝶番、50はボールキャッチである。
Fig. 1 is a schematic cross-sectional view of a deposition tank equipped with a substrate holder of this invention, Fig. 2 is a plan view showing an embodiment of the substrate holder of this invention, Fig. 3 is a front view thereof, and Fig. 4 is a right side view. FIG. 5 is a sectional view taken along line A--A in FIG. 2. In the figure, 10 is a substrate holder, 10a is a substrate holder body, 10b is a substrate holder door, 16 is a deposition chamber, 24 is a rotating ring, 26 is an evaporation source, 4o is a peripheral surface, 42 is an opening, 4
8 is the hinge and 50 is the ball catch.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 蒸発源を内部に配して立設される略円筒状の基板ホルダ
ーであって、この略円筒状基板ホルダーの周面の一部が
開閉自在に構成されていることを特−とする真空蒸着装
置用基板ホルダー。
A vacuum evaporation method comprising: a substantially cylindrical substrate holder that is erected with an evaporation source disposed therein; and a part of the circumferential surface of the substantially cylindrical substrate holder is configured to be openable and closable. Board holder for equipment.
JP17577083U 1983-11-11 1983-11-11 Substrate holder for vacuum evaporation equipment Pending JPS6082460U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17577083U JPS6082460U (en) 1983-11-11 1983-11-11 Substrate holder for vacuum evaporation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17577083U JPS6082460U (en) 1983-11-11 1983-11-11 Substrate holder for vacuum evaporation equipment

Publications (1)

Publication Number Publication Date
JPS6082460U true JPS6082460U (en) 1985-06-07

Family

ID=30382312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17577083U Pending JPS6082460U (en) 1983-11-11 1983-11-11 Substrate holder for vacuum evaporation equipment

Country Status (1)

Country Link
JP (1) JPS6082460U (en)

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