JPS6080450U - photomask substrate - Google Patents

photomask substrate

Info

Publication number
JPS6080450U
JPS6080450U JP1983172023U JP17202383U JPS6080450U JP S6080450 U JPS6080450 U JP S6080450U JP 1983172023 U JP1983172023 U JP 1983172023U JP 17202383 U JP17202383 U JP 17202383U JP S6080450 U JPS6080450 U JP S6080450U
Authority
JP
Japan
Prior art keywords
photomask substrate
recorded
photomask
polished
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1983172023U
Other languages
Japanese (ja)
Inventor
和夫 伊藤
Original Assignee
日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電気株式会社 filed Critical 日本電気株式会社
Priority to JP1983172023U priority Critical patent/JPS6080450U/en
Publication of JPS6080450U publication Critical patent/JPS6080450U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図はフォトマスク基板を示す斜視図、第２図は、認
識記号を示す断面図である。 図中の記号、Ａ、　Ａ’、　Ｂ、　Ｂ’、　Ｃ，Ｃ’は
各面を示しり、Ｅは代表的な辺を表わしている。図中の
数字、１・・・・・・フォトマスク基板、２・・・・・
・認識記号、２１・・・・・・認識記号の深さを示して
いる。FIG. 1 is a perspective view showing a photomask substrate, and FIG. 2 is a sectional view showing a recognition symbol. The symbols A, A', B, B', C, and C' in the figure indicate each surface, and E indicates a typical side. Numbers in the diagram: 1...Photomask substrate, 2...
- Recognition symbol, 21... Indicates the depth of the recognition symbol.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 表面を研磨したり、溶解したりしても、残存する認識記
号を有するフォトマスク基板。A photomask substrate that has a recognition mark that remains even if the surface is polished or dissolved.
JP1983172023U 1983-11-07 1983-11-07 photomask substrate Pending JPS6080450U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1983172023U JPS6080450U (en) 1983-11-07 1983-11-07 photomask substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1983172023U JPS6080450U (en) 1983-11-07 1983-11-07 photomask substrate

Publications (1)

Publication Number Publication Date
JPS6080450U true JPS6080450U (en) 1985-06-04

Family

ID=30375092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1983172023U Pending JPS6080450U (en) 1983-11-07 1983-11-07 photomask substrate

Country Status (1)

Country Link
JP (1) JPS6080450U (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002116533A (en) * 2000-10-11 2002-04-19 Dainippon Printing Co Ltd Blanks for photomask with area code, photomask with area code and method for producing photomask
JP2006309143A (en) * 2005-03-30 2006-11-09 Hoya Corp Manufacturing method of mask blank glass substrate, manufacturing method of mask blank, mask blank glass substrate, and mask blank
JP2007033857A (en) * 2005-07-27 2007-02-08 Hoya Corp Method for manufacturing glass substrate for mask blanks, glass substrate for mask blanks, method for manufacturing mask blanks, and mask blanks
JP2011070214A (en) * 2005-03-30 2011-04-07 Hoya Corp Method for manufacturing mask blank glass substrate, method for manufacturing mask blank, mask blank glass substrate, and mask blank
JP2018106147A (en) * 2016-12-22 2018-07-05 Hoya株式会社 Mask blank substrate for display device production, mask blank and mask, and production method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144829A (en) * 1982-02-22 1983-08-29 Hoya Corp Method for marking base used for photomask blank
JPS5915938A (en) * 1982-07-19 1984-01-27 Hoya Corp Substrate for photomask blank applied with marking

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58144829A (en) * 1982-02-22 1983-08-29 Hoya Corp Method for marking base used for photomask blank
JPS5915938A (en) * 1982-07-19 1984-01-27 Hoya Corp Substrate for photomask blank applied with marking

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002116533A (en) * 2000-10-11 2002-04-19 Dainippon Printing Co Ltd Blanks for photomask with area code, photomask with area code and method for producing photomask
JP2006309143A (en) * 2005-03-30 2006-11-09 Hoya Corp Manufacturing method of mask blank glass substrate, manufacturing method of mask blank, mask blank glass substrate, and mask blank
US7851108B2 (en) 2005-03-30 2010-12-14 Hoya Corporation Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
JP2011070214A (en) * 2005-03-30 2011-04-07 Hoya Corp Method for manufacturing mask blank glass substrate, method for manufacturing mask blank, mask blank glass substrate, and mask blank
US7955763B2 (en) 2005-03-30 2011-06-07 Hoya Corporation Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask
JP2012190044A (en) * 2005-03-30 2012-10-04 Hoya Corp Mask blanks and method for manufacturing mask blanks
JP2007033857A (en) * 2005-07-27 2007-02-08 Hoya Corp Method for manufacturing glass substrate for mask blanks, glass substrate for mask blanks, method for manufacturing mask blanks, and mask blanks
JP2018106147A (en) * 2016-12-22 2018-07-05 Hoya株式会社 Mask blank substrate for display device production, mask blank and mask, and production method thereof

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