JPS6079134U - High concentration/low concentration gas detection device - Google Patents

High concentration/low concentration gas detection device

Info

Publication number
JPS6079134U
JPS6079134U JP17157883U JP17157883U JPS6079134U JP S6079134 U JPS6079134 U JP S6079134U JP 17157883 U JP17157883 U JP 17157883U JP 17157883 U JP17157883 U JP 17157883U JP S6079134 U JPS6079134 U JP S6079134U
Authority
JP
Japan
Prior art keywords
gas
path
concentration
inflow path
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17157883U
Other languages
Japanese (ja)
Other versions
JPH0131951Y2 (en
Inventor
博行 岡崎
木下 裕雄
平田 茂雄
Original Assignee
大阪瓦斯株式会社
新コスモス電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大阪瓦斯株式会社, 新コスモス電機株式会社 filed Critical 大阪瓦斯株式会社
Priority to JP17157883U priority Critical patent/JPS6079134U/en
Publication of JPS6079134U publication Critical patent/JPS6079134U/en
Application granted granted Critical
Publication of JPH0131951Y2 publication Critical patent/JPH0131951Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はサンプリング開始時の各ポーリング穴    
−間の相対ガス濃度を示す図、第2図はサンプリング時
間とポーリング穴内のガス濃度との関係を示す図、第3
図には先行技術に係るガス検知装置を説明するための全
体概略構成図である。そして、第4図および第5図は、
本考案に係る高濃度・低濃度両用ガス検知装置の一実施
例を示し、第4図は全体概略構成図、第5図は正面パネ
ルの正面図である。 1・・・・・・ガス流入路、2・・・・・・ガス流出路
、3・・・・・・    ゛希釈空気流入路、4・・・
・・・三方弁、5・・・・・・ガスバイパス流路、6・
・・・・・余剰ガス排出流路、9・・・・・・逆止弁、
D・・・・・・希釈装置、Pl・・・・・・吸引用メイ
ンポンプ、−P2・・・・・・圧送用補助ポンプ、S・
・・・・・ガスセンサ  。 −〇
Figure 1 shows each polling hole at the start of sampling.
Figure 2 shows the relationship between sampling time and gas concentration in the poling hole. Figure 3 shows the relative gas concentration between
The figure is an overall schematic configuration diagram for explaining a gas detection device according to the prior art. And, FIG. 4 and FIG. 5 are as follows.
An embodiment of the high-concentration/low-concentration gas detection device according to the present invention is shown, and FIG. 4 is a schematic diagram of the overall configuration, and FIG. 5 is a front view of the front panel. 1... Gas inflow path, 2... Gas outflow path, 3... ゛Dilution air inflow path, 4...
...Three-way valve, 5...Gas bypass flow path, 6.
... Surplus gas discharge channel, 9 ... Check valve,
D...Dilution device, Pl...Main pump for suction, -P2...Auxiliary pump for pressure feeding, S...
...Gas sensor. −〇

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ガス流入路1とガス流出路2と希釈空気流入路3との間
に、前記ガス流入路1とガス流出路2とを直接連通させ
る状態と、前記希釈空気流入路3とガス流出路2とを連
通させる状態とに択一的に切換えるための三方弁4を設
けると共に、その三方弁4を迂回させて、前記ガス流入
路1からガス流出路2に亘るガスバイパス流路5を設け
てガス希釈装置りを構成し、かつ、前記ガス流出路2に
゛  ガスセンサーSとサンプリングガス吸引用ポンプ
P1とを設けであるガス濃度計において、前記ガス流入
路1内へ十分な量のサンプリングガスを圧送導入可能な
補助ポンプP2を設けると共に、前記ガス流入路1の途
中から逆止弁9付きの余剰ガス排出流路6を分岐導出し
であることを特徴とする高濃度・低濃度両用ガス検知装
置。
A state in which the gas inflow path 1 and the gas outflow path 2 are directly communicated between the gas inflow path 1, the gas outflow path 2, and the diluted air inflow path 3, and a state in which the diluted air inflow path 3 and the gas outflow path 2 are A three-way valve 4 is provided for selectively switching between the gas inflow path 1 and the gas outflow path 2 by bypassing the three-way valve 4. In a gas concentration meter that constitutes a dilution device and is provided with a gas sensor S and a sampling gas suction pump P1 in the gas outflow path 2, a sufficient amount of sampling gas is introduced into the gas inflow path 1. A high-concentration/low-concentration gas detection device characterized in that an auxiliary pump P2 that can be introduced under pressure is provided, and an excess gas discharge channel 6 equipped with a check valve 9 is branched out from the middle of the gas inflow channel 1. Device.
JP17157883U 1983-11-04 1983-11-04 High concentration/low concentration gas detection device Granted JPS6079134U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17157883U JPS6079134U (en) 1983-11-04 1983-11-04 High concentration/low concentration gas detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17157883U JPS6079134U (en) 1983-11-04 1983-11-04 High concentration/low concentration gas detection device

Publications (2)

Publication Number Publication Date
JPS6079134U true JPS6079134U (en) 1985-06-01
JPH0131951Y2 JPH0131951Y2 (en) 1989-10-02

Family

ID=30374250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17157883U Granted JPS6079134U (en) 1983-11-04 1983-11-04 High concentration/low concentration gas detection device

Country Status (1)

Country Link
JP (1) JPS6079134U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06300727A (en) * 1993-04-19 1994-10-28 Osaka Gas Co Ltd Gas detector
JP2012529639A (en) * 2009-06-12 2012-11-22 アデイクセン・バキユーム・プロダクト Apparatus and method for analyzing gas and associated measuring station

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06300727A (en) * 1993-04-19 1994-10-28 Osaka Gas Co Ltd Gas detector
JP2012529639A (en) * 2009-06-12 2012-11-22 アデイクセン・バキユーム・プロダクト Apparatus and method for analyzing gas and associated measuring station

Also Published As

Publication number Publication date
JPH0131951Y2 (en) 1989-10-02

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