JPS607050A - Electron-beam machine - Google Patents

Abstract

PURPOSE:To perform working of high quality through simplified operation by feeding currents to two electron lenses installed in series from the same power source, installing an orifice near a position on which a beam is focused and which is located between the lenses and installing a work near a position on which the beam after passing through the lenses is focused. CONSTITUTION:A power source 14' is used for electron lenses 5 and 7 which are connected to the power source 14' in series. An electron beam 4 produced in an electron gun consisting of a cathode 1, a grid 2 and an anode 3 is focused by a lens 5 before passing through an orifice 6. The orifice 6 is installed near a position on which the beam 4 is focused and which is located in the middle between the lenses 5 and 7 so as to restrict the inflow of metallic paper and gas generated from a work 10. The beam 4 after passing through the orifice 6 is again focused by a lens 7 before being irradiated upon the work 10 placed in a working chamber 9 so as to perform a required working. The position in which the work 10 is attached is maintained constant relative to the lens 7. Column exhaust holes 12 and a chamber exhaust hole 13 are used to highly vacuum an electron-gun-side column 8 and lowly vacuum the working chamber 9 respectively. By the means mentioned above, working of high quality can be achieved through simplified operation.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electron beam processing apparatus for mass production that performs processing such as drilling, welding, melting, and heat treatment by irradiating a workpiece with a high-speed electron beam. This invention relates to a double-lens type electron beam generator in which two electron lenses are arranged in series to control the focal position and the like.

Conventionally, this type of electron beam processing apparatus has used one power source for each of the two electron lenses, which has the disadvantage of complicating operations and adjustments. In other words, in order to determine the characteristics of an electron lens, it is necessary to keep the lens current of either the ML lens or the second lens constant and examine the characteristics of the other lens. Although it is possible to do so, it is complicated. In addition, due to the increase in the number of parts due to the use of two electronic lens power supplies, the number of adjustment steps increases, resulting in a decrease in the reliability of the device, as well as an increase in the weight and volume of the entire device.
Furthermore, there are drawbacks such as an increase in the total cost due to these factors. However, in practice, in mass production machines, the temperature can be kept constant once the distance from the second lens to the workpiece is determined, so there is little need to adjust both lenses at the same time; In many cases, the desired beam convergence state and focal position are set by maintaining the beam and operating the other.

Therefore, except for laboratory use where adjustment of these two power supplies is required, in normal production activities, especially in the processing of mass-produced parts, the distance between the first lens and the second lens is By appropriately determining the distance between the second lens and the workpiece, adjustment can be performed with one power source, without the need to provide two lens power sources and adjust each one.

In view of the above-mentioned points, the present invention, unlike the conventional art, connects one lens power supply in series to two electron lenses, supplies current, and positions the first focal point of the electron beam between the two lenses. The present invention provides an electron beam processing device in which an orifice for restricting the inflow of metal paper or gas from the workpiece side is provided near the workpiece, and the workpiece is installed near the second focusing position of the electron beam after passing through the second lens. be.

Since this device uses only one lens power source, the operation and adjustment of the lens power source is simple, and it is possible to control the lens current with high reliability and reduce waste, that is, to control the focused state of the electron beam.・It becomes possible to control the focal position, etc.

Hereinafter, the present invention will be explained in detail using the figures.

Figure 1 shows a conventional electron beam processing device.
FIG. 2 is a schematic side cross-sectional view of an electron optical column (column) and a workpiece processing chamber (chamber). Dedicated power supplies 14 and 15 are used for the second lens 5 and the second lens 7, respectively.

FIG. 2 shows an embodiment of the electron beam processing apparatus of the present invention, and is a schematic side cross-sectional view similar to FIG. 1. Unlike the conventional example shown in FIG. and second lens 7
A common power supply 14' connected in series is used. Note that in FIGS. 1 and 2, the same parts are indicated by the same reference numerals (C and C).

In FIG. 2, thermionic electrons emitted from the cathode 1 by heating the cathode 1 by passing a current through the grid 2
．． It is extracted by an anode 3 to form an electron beam 4. These cathodes 1. The electron beam 4 generated in the electron gun section consisting of the grid 2 and the anode 3
The light is focused once and passes through OriSwiss 6. The orifice 6 is arranged near the electron beam focusing position between the first lens 5 and the second lens 7, and restricts the inflow of metal paper or gas generated from the workpiece side during processing.

In addition, in order to shorten the evacuation time of the workpiece machining chamber 9, which is often exposed to the atmosphere, and improve machining efficiency, the workpiece is The processing chamber 9 side is placed in a low vacuum (IXIO-3~
2 Torr), the orifice 6 has a small diameter sufficient to restrict the outflow of gas molecules from the low vacuum side to the high vacuum side.

The electron beam 4 that has passed through the orifice 6 passes through the second lens 7
The beam is then focused again and irradiated onto a workpiece 10 placed near a predetermined beam focus position in the workpiece processing chamber 9 to perform the required processing. Note that the mounting position of the workpiece 1o is always kept constant in relation to the second lens 7.

Column exhaust port 12. The chamber exhaust port 13 evacuates the electron gun side column 8 above the orifice 6 and the workpiece processing chamber 9 below to a high vacuum and a low vacuum as described above.

In addition, the lens current is controlled only by the lens power supply 14'.
and the oriswiss position to control at the same time.

Depending on the inner diameter and shape, the variable range of the beam focusing position after passing through the second lens is limited to some extent, and the beam focusing position after passing through the second lens must also be adjusted within a certain range. However, especially in mass-production electron beam processing equipment, the workpiece processing position can be set at an appropriate height in advance.

This is not a problem in electron beam processing.

In this way, in the electron beam processing apparatus according to the present invention,
Since only one lens power source is used, manufacturing adjustment and operation of the device can be simplified, and the occurrence of defects caused by these can be reduced, making it possible to realize high-quality processing at a low cost and making it practical. The effect is like a dog.

FIG. 1 is a sectional view of an embodiment of a conventional electron beam processing apparatus, and FIG. 2 is a sectional view of an embodiment of an electron beam processing apparatus according to the present invention.

l...Cathode, 2...Grid, 3
...Anode, 4...Electron beam, 5
...No. 6... Orifice, 7
...Second lens, 8...Electron optical column,
9... Work processing room, 10... Work, 11... Work table, 12...
Column exhaust port, 13...Chamber exhaust port, 1
4.14', 15°°゛... Lens power supply.

'-ノ/ Cow 1 diagram ! Second

Claims (1)

[Claims] It has two electron lenses in series to control the focusing state and focal position of the beam, and a workpiece (workpiece) is placed near the first focusing position of the beam between the first lens and the second lens.
An orifice is provided to restrict the introduction of metal benzene or gas from the side, and a workpiece is placed near the second focusing position of the beam after passing through the second lens. An electron beam processing device characterized by supplying in series from the same power source.