JPS6066136A - Peeling-off testing method of semiconductive layer - Google Patents

Peeling-off testing method of semiconductive layer

Info

Publication number
JPS6066136A
JPS6066136A JP17486783A JP17486783A JPS6066136A JP S6066136 A JPS6066136 A JP S6066136A JP 17486783 A JP17486783 A JP 17486783A JP 17486783 A JP17486783 A JP 17486783A JP S6066136 A JPS6066136 A JP S6066136A
Authority
JP
Japan
Prior art keywords
peeling
layer
tension
shaft
point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17486783A
Other languages
Japanese (ja)
Inventor
Shigenori Tanaka
成憲 田中
Yoshiro Danjo
壇上 芳郎
Kihachi Onishi
喜八 大西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tatsuta Electric Wire and Cable Co Ltd
Original Assignee
Tatsuta Electric Wire and Cable Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tatsuta Electric Wire and Cable Co Ltd filed Critical Tatsuta Electric Wire and Cable Co Ltd
Priority to JP17486783A priority Critical patent/JPS6066136A/en
Publication of JPS6066136A publication Critical patent/JPS6066136A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N19/00Investigating materials by mechanical methods
    • G01N19/04Measuring adhesive force between materials, e.g. of sealing tape, of coating
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2203/00Investigating strength properties of solid materials by application of mechanical stress
    • G01N2203/0058Kind of property studied
    • G01N2203/0091Peeling or tearing

Abstract

PURPOSE:To put the titled layer to a peeling-off test which is capable of judging exactly adhesive strength conforming with the actual condition, and its uniformity by making a sample fitting base freely slidable to a rail, etc. of the tension shaft side of a tension tester so that a peeling-off point of a semiconductive layer always comes onto a tension axis. CONSTITUTION:A sample fitting base 6 is made freely slidable to the rail 4 of tension shaft 2 side of a tension tester, and the lead-out of a peeling-off point 9 of a semiconductive layer 8 on the insulator 7 of a cable is held by a measuring chuck. In this state, when peeling-off of the layer 8 is executed by operating the shaft 2, the base 6 moves to the left, the peeling-off point always comes onto an axis of the shaft, the peeling-off angle goes to 90 deg., and it is possible to execute a peeling-off test capable of deciding exactly an adhesive strength conforming with the actual condition, and its uniformity.

Description

【発明の詳細な説明】 〈発明の技術分野〉 本発明は電気ケーブルの半導電層の剥離試験、若しくは
半導電層の剥離点の角度がたえず90度の角度で剥離さ
れるようにする半導電層の剥離試験方法に関するもので
ある。
Detailed Description of the Invention <Technical Field of the Invention> The present invention relates to a peel test of a semiconducting layer of an electric cable, or a semiconducting test in which the peeling point of the semiconducting layer is constantly peeled at an angle of 90 degrees. This invention relates to a layer peel test method.

く技術的背景〉 電気ケーブルは導体と絶縁体との間および絶縁体上に電
界を緩和するために半導電層が設けられる。
TECHNICAL BACKGROUND Electrical cables are provided with semiconducting layers between a conductor and an insulator and on the insulator to reduce the electric field.

ところで絶縁体と半導電層とは電気特性の面から言うと
十分密着していることが好ましいが、接続や端末工事に
際しては半導電層が容易に剥離する−ことが望まれ、こ
のごたつの条件が充たされているか否かを判断する試験
の一ツとして半導電層の剥離試験がある。
By the way, from the standpoint of electrical properties, it is preferable that the insulator and the semiconducting layer be in close contact with each other, but it is desirable that the semiconducting layer be easily peeled off during connection and terminal construction, and this condition is important. One of the tests to determine whether the requirements are met is a peel test of a semiconducting layer.

これまで半導電層の剥離試験は、第3図に示づ如く接着
面に対して剥離した半導電層を180度折り返して絶縁
層部分を引張試験機の計測側チャックに掴持させていた
が、この方法は電気ケーブルの接続や端末処理時の半導
電層剥離作業の実態と合っておらず半導電層の剥離試験
結果によって前記半導電層の剥離作業の難易を判断する
試験データとして適切であるとは言えなかった。
Up until now, peeling tests for semiconducting layers have been carried out by folding back the semiconducting layer that has been peeled off from the adhesive surface 180 degrees and holding the insulating layer part in the measuring chuck of a tensile testing machine, as shown in Figure 3. However, this method does not match the actual situation of semiconducting layer peeling work during electrical cable connection and terminal processing, and is not appropriate as test data for determining the difficulty of semiconducting layer peeling work based on the peel test results of semiconducting layers. I couldn't say that there was.

このような事情から、半導電層剥離作業に合せて接着面
に対して90度の角度を持って半導電層をはぎとる試験
方法が提案され第2図のような方法で試験が行われたが
、この方法では剥離試験の開始時には剥離点での接着面
に対する半導電層の角度は90度より小さく終了時点で
は90度より大きくなって絶縁層と半導電層との接着強
度およびその均一性の判断を行い得るデータを得ること
ができなかった。
Under these circumstances, a test method was proposed in which the semiconducting layer was peeled off at a 90 degree angle to the adhesive surface, and the test was conducted using the method shown in Figure 2. In this method, the angle of the semiconducting layer to the adhesive surface at the peeling point is less than 90 degrees at the beginning of the peel test, and becomes larger than 90 degrees at the end of the peel test. It was not possible to obtain data on which a judgment could be made.

〈発明の目的〉 本発明は以上の問題を解決し、半導電層剥離作業に合わ
せ、且つ絶縁層と半導電層との接着強度およびその均一
性を判断し得るデータを得ることのできる半導電層の剥
離試験方法を提供することを目的とするものである。
<Object of the Invention> The present invention solves the above problems and provides a semiconducting material that is suitable for semiconducting layer peeling work and that can obtain data that can determine the adhesive strength and uniformity between an insulating layer and a semiconducting layer. The purpose of this invention is to provide a method for testing layer peeling.

〈発明の構成〉 引張試験機の引張軸がわにセットされた督)または基盤
にしゅう動自在に装着された試料取り付は台に、半導電
層を口出しした電気ケーブルの試料を取付け、前記口出
しした半導電層の端を引張試験機の計測側チャックに保
持させてたえず剥離点が引張軸線上にくるようにしたこ
とを特徴とするものである。
<Structure of the Invention> A sample of an electric cable with a semi-conductive layer exposed is attached to the stand, which is slidably attached to the tension shaft of the tensile tester or the base. This method is characterized in that the protruded end of the semiconductive layer is held by the measuring chuck of the tensile testing machine so that the peeling point is always on the tensile axis.

〈実施例〉 次に本発明の実施例を図面と共に説明する。1は、引張
試験機の引張軸2上端のチャック3にセットされた試料
取付は装置で、軌条4とリニアボールベアリング5と試
料取付は台6からなっている。
<Example> Next, an example of the present invention will be described with reference to the drawings. 1 is a sample mounting device set on a chuck 3 at the upper end of a tensile shaft 2 of a tensile testing machine, and consists of a rail 4, a linear ball bearing 5, and a sample mounting table 6.

試料取付は第6には長さ4ocmの電気ケーブルの絶 
7縁体7上の外部半導電層8に幅12.7mmで長さ方
向に絶縁層に達するスリットSを入れ片端から5cmだ
け外部半導電層を口出し剥離9しこれを試料取付は台6
に取付け、前記口出し剥離9部分を引張試験機の計測側
チャックに掴持させて引張軸を作動させて半導電層の剥
離試験を行う。
The sixth step is to attach the sample using an electrical cable with a length of 4ocm.
7 A slit S with a width of 12.7 mm reaching the insulating layer in the length direction is made in the outer semiconducting layer 8 on the edge body 7 , and the outer semiconducting layer is peeled off by 5 cm from one end.
A peeling test of the semiconductive layer is performed by attaching the peeled portion 9 to the measuring chuck of the tensile testing machine and operating the tensile shaft.

なお、本実施例ではベースとなるものとして軌条を用い
たがアリ溝を設けた基盤を用いボールベアリングを介し
て試料取付は台を装着したものでもよく、要するに剥離
試験の進行に従って試料取付は台が容易に移動して剥離
点が常に引張軸上にくるようにしておれば何れの手段を
用いてもよい。
In this example, a rail was used as the base, but it is also possible to use a base with dovetail grooves and attach a stand to the sample via ball bearings.In short, as the peel test progresses, the sample can be attached to the stand. Any means may be used as long as it moves easily and the peeling point is always on the tension axis.

以上のようにすることによって絶縁体から半導電層が剥
離し剥離点Pが移動するに従って試料取付は台が図面上
の左方向に移動し剥離点Pは常に引張軸線上にあって剥
離内皮を90度に保つことができるようになり、半導電
層剥離作業の実態に合っており、且つ半導電層の接着強
度とその均一性を正確に実態に即して測定できるように
なった。
By doing the above, as the semiconducting layer peels off from the insulator and the peeling point P moves, the sample mounting table moves to the left in the drawing, and the peeling point P is always on the tensile axis and the peeled endothelium moves. It is now possible to maintain the angle at 90 degrees, which suits the actual situation of semiconducting layer peeling work, and it has become possible to accurately measure the adhesive strength and uniformity of the semiconducting layer in accordance with the actual situation.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明の半導電層剥離試験方法に用いる試料
取付は装置の説明図、第2図は、90度剥離試験におけ
る従来の半導電層剥離試験装置の説明図、第3図は18
0度剥離における半導電層剥離試験の説明図で図中の符
号は次の通りである。 1:試料取付は装置 2:引張試験機の引張軸3:チャ
ック 4:軌条 5:リニアボールベアリング 6:試
料取付は台 7:絶縁体 8:外部半導電層 9:口出
し剥l!!lsニスリットP:剥離点 特許出願人 タック電線株式会社 代表者 大石健雄
Figure 1 is an explanatory diagram of the sample mounting apparatus used in the semiconducting layer peeling test method of the present invention, Figure 2 is an explanatory diagram of the conventional semiconducting layer peeling test apparatus used in the 90 degree peel test, and Figure 3 is 18
This is an explanatory diagram of a semiconductive layer peeling test in 0 degree peeling, and the symbols in the figure are as follows. 1: Sample mounting device 2: Tensile shaft of tensile testing machine 3: Chuck 4: Rail 5: Linear ball bearing 6: Sample mounting table 7: Insulator 8: External semiconductive layer 9: Peel off the opening! ! ls Nislit P: Peeling point patent applicant Tuck Electric Wire Co., Ltd. Representative Takeo Oishi

Claims (1)

【特許請求の範囲】[Claims] 引張試験機の引張がわにセットされた瞥)または基盤に
しゅう動自在に装着された試料取付は台に、半導電層を
口出しした電気ケーブルの試料を取付け、前記口出しし
た半導電層の端を引張試験機の計測側チャックに掴持さ
せて、たえず剥離点が引張軸線上にくるようにしたこと
を特徴とする半導電層の剥離試験方法
For mounting a specimen (set on the tensile side of a tensile testing machine) or slidably attached to a base, attach an electrical cable sample with a semiconducting layer exposed to the stand, and then attach the sample of an electric cable with a semiconductive layer exposed to the base, and A peeling test method for a semiconducting layer, characterized by gripping it on the measuring chuck of a tensile tester so that the peeling point is always on the tensile axis.
JP17486783A 1983-09-20 1983-09-20 Peeling-off testing method of semiconductive layer Pending JPS6066136A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17486783A JPS6066136A (en) 1983-09-20 1983-09-20 Peeling-off testing method of semiconductive layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17486783A JPS6066136A (en) 1983-09-20 1983-09-20 Peeling-off testing method of semiconductive layer

Publications (1)

Publication Number Publication Date
JPS6066136A true JPS6066136A (en) 1985-04-16

Family

ID=15986039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17486783A Pending JPS6066136A (en) 1983-09-20 1983-09-20 Peeling-off testing method of semiconductive layer

Country Status (1)

Country Link
JP (1) JPS6066136A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0908748A1 (en) * 1997-10-07 1999-04-14 N.V. Bekaert S.A. Communication cable with improved tensile member
WO2004025280A1 (en) * 2002-09-12 2004-03-25 3M Innovative Properties Company Apparatus for measuring adhesion of gelled polymers
CN105806779A (en) * 2016-03-21 2016-07-27 湖北三江航天江河化工科技有限公司 Interface peeling testing device and testing method thereof
CN108956453A (en) * 2018-07-10 2018-12-07 瀚德(中国)汽车密封系统有限公司 A kind of removing of sealing element and test device
CN110884745A (en) * 2018-09-11 2020-03-17 德莎欧洲股份公司 Method for applying die-cut pieces to a surface and testing method therefor
CN115165734A (en) * 2022-08-12 2022-10-11 山东七星电气科技发展有限公司 Simulation test method and device for adhesion degree of insulating strip interface

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316949U (en) * 1976-07-24 1978-02-13
JPS56108937A (en) * 1980-01-31 1981-08-28 Toyoda Gosei Co Ltd Peeling measuring device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316949U (en) * 1976-07-24 1978-02-13
JPS56108937A (en) * 1980-01-31 1981-08-28 Toyoda Gosei Co Ltd Peeling measuring device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0908748A1 (en) * 1997-10-07 1999-04-14 N.V. Bekaert S.A. Communication cable with improved tensile member
WO1999018464A1 (en) * 1997-10-07 1999-04-15 N.V. Bekaert S.A. Communication cable with improved tensile member
WO2004025280A1 (en) * 2002-09-12 2004-03-25 3M Innovative Properties Company Apparatus for measuring adhesion of gelled polymers
CN105806779A (en) * 2016-03-21 2016-07-27 湖北三江航天江河化工科技有限公司 Interface peeling testing device and testing method thereof
CN105806779B (en) * 2016-03-21 2018-05-22 湖北三江航天江河化工科技有限公司 A kind of interface peel test device and its test method
CN108956453A (en) * 2018-07-10 2018-12-07 瀚德(中国)汽车密封系统有限公司 A kind of removing of sealing element and test device
CN110884745A (en) * 2018-09-11 2020-03-17 德莎欧洲股份公司 Method for applying die-cut pieces to a surface and testing method therefor
CN110884745B (en) * 2018-09-11 2022-05-03 德莎欧洲股份公司 Method for applying die-cut pieces to a surface and testing method therefor
CN115165734A (en) * 2022-08-12 2022-10-11 山东七星电气科技发展有限公司 Simulation test method and device for adhesion degree of insulating strip interface

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