JPS6049629U - Photomask plate holder - Google Patents
Photomask plate holderInfo
- Publication number
- JPS6049629U JPS6049629U JP14128183U JP14128183U JPS6049629U JP S6049629 U JPS6049629 U JP S6049629U JP 14128183 U JP14128183 U JP 14128183U JP 14128183 U JP14128183 U JP 14128183U JP S6049629 U JPS6049629 U JP S6049629U
- Authority
- JP
- Japan
- Prior art keywords
- photomask plate
- plate
- photomask
- plate holder
- movers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Control Of Position Or Direction (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は、本考案の実施例を示す斜視図、第2図は第1
図の一部切欠拡大部分斜視図、第3図は第2図のB−B
断面図である。
1・・・・・・フォトマスクプレート、2・・・・・・
プレート台、3・・・・・・固定子、4・・・・・・移
動子、5・・・・・・駆動レバー、6・・・・・・ガイ
ド溝、7・・・・・・てこ、8・・・・・・ばね、9・
・・・・・分割バー。Fig. 1 is a perspective view showing an embodiment of the present invention, and Fig. 2 is a perspective view showing an embodiment of the present invention.
A partially cutaway enlarged partial perspective view of the figure, Figure 3 is B-B of Figure 2.
FIG. 1...Photomask plate, 2...
Plate stand, 3... Stator, 4... Mover, 5... Drive lever, 6... Guide groove, 7... Lever, 8... Spring, 9.
...Divided bar.
Claims (1)
ート台と、前記フォトマスクプレートの外縁部4辺のう
ち互いに直交する2辺の中点を点接触しながら均等な圧
力で押圧し、他方の直交する2辺を前記プレート台に固
定された固定子へ押し付けて前記フォトマスクプレート
を保持する2個の移動子と、前記移動子を同時に駆動さ
せる駆動機構と、前記駆動機構の解放およびロックとを
行う駆動レバーとを含むフォトマスクプレート・ホルダ
。A plate stand on which a rectangular photomask plate for IC manufacturing is placed is pressed with even pressure while making point contact with the midpoints of two of the four outer edges of the photomask plate that are perpendicular to each other, and two movers that hold the photomask plate by pressing their sides against a stator fixed to the plate stand; a drive mechanism that simultaneously drives the movers; and a drive that releases and locks the drive mechanisms. A photomask plate holder including a lever.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14128183U JPS6049629U (en) | 1983-09-12 | 1983-09-12 | Photomask plate holder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14128183U JPS6049629U (en) | 1983-09-12 | 1983-09-12 | Photomask plate holder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6049629U true JPS6049629U (en) | 1985-04-08 |
JPS6325734Y2 JPS6325734Y2 (en) | 1988-07-13 |
Family
ID=30316033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14128183U Granted JPS6049629U (en) | 1983-09-12 | 1983-09-12 | Photomask plate holder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6049629U (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6433927A (en) * | 1987-07-30 | 1989-02-03 | Canon Kk | Mask holder and mask conveying method using the same |
JPH1097985A (en) * | 1996-09-24 | 1998-04-14 | Canon Inc | Scan type exposure device and manufacture of device |
JP2004328014A (en) * | 2004-08-10 | 2004-11-18 | Nikon Corp | Projection lithography system and pattern forming method using same |
KR100965769B1 (en) | 2006-07-31 | 2010-06-24 | 가부시키가이샤 다이후쿠 | Load positioning apparatus |
CN106356320A (en) * | 2015-07-15 | 2017-01-25 | 苏斯微技术光刻有限公司 | Spacer displacement device for a wafer illumination unit and wafer illumination unit |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4521821Y1 (en) * | 1966-05-10 | 1970-08-29 | ||
JPS5548942A (en) * | 1978-10-04 | 1980-04-08 | Hitachi Ltd | Positioning device for very small components |
-
1983
- 1983-09-12 JP JP14128183U patent/JPS6049629U/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4521821Y1 (en) * | 1966-05-10 | 1970-08-29 | ||
JPS5548942A (en) * | 1978-10-04 | 1980-04-08 | Hitachi Ltd | Positioning device for very small components |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6433927A (en) * | 1987-07-30 | 1989-02-03 | Canon Kk | Mask holder and mask conveying method using the same |
JPH1097985A (en) * | 1996-09-24 | 1998-04-14 | Canon Inc | Scan type exposure device and manufacture of device |
JP2004328014A (en) * | 2004-08-10 | 2004-11-18 | Nikon Corp | Projection lithography system and pattern forming method using same |
KR100965769B1 (en) | 2006-07-31 | 2010-06-24 | 가부시키가이샤 다이후쿠 | Load positioning apparatus |
CN106356320A (en) * | 2015-07-15 | 2017-01-25 | 苏斯微技术光刻有限公司 | Spacer displacement device for a wafer illumination unit and wafer illumination unit |
JP2017027028A (en) * | 2015-07-15 | 2017-02-02 | ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングSuss MicroTec Lithography GmbH | Spacer displacement device for wafer illumination unit and wafer illumination unit |
CN106356320B (en) * | 2015-07-15 | 2021-08-10 | 苏斯微技术光刻有限公司 | Spacer shifting device for wafer irradiation unit and wafer irradiation unit |
Also Published As
Publication number | Publication date |
---|---|
JPS6325734Y2 (en) | 1988-07-13 |
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