JPS6049625U - infrared heating device - Google Patents

infrared heating device

Info

Publication number
JPS6049625U
JPS6049625U JP14302283U JP14302283U JPS6049625U JP S6049625 U JPS6049625 U JP S6049625U JP 14302283 U JP14302283 U JP 14302283U JP 14302283 U JP14302283 U JP 14302283U JP S6049625 U JPS6049625 U JP S6049625U
Authority
JP
Japan
Prior art keywords
heating device
heated surface
infrared heating
infrared
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14302283U
Other languages
Japanese (ja)
Inventor
博 西村
牧野　繁蔵
Original Assignee
ニチデン機械株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ニチデン機械株式会社 filed Critical ニチデン機械株式会社
Priority to JP14302283U priority Critical patent/JPS6049625U/en
Publication of JPS6049625U publication Critical patent/JPS6049625U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は本考案の前提となる赤外線加熱装置の概略断面
図、第２図は第１図のＴｌ−Ｔｌ線に断面図、第３図は
第２図のＴ２−Ｔ２線から寛た概略平面図、第４図は第
３図における被加熱面の部分平面図とその放熱分布特性
曲線図及び熱分布特性曲線図、第５図及び第６図は本考
案の他の実施例を示す赤外線ランプの概略平面図である
。 ｍ・・・被加熱面、ｍｌ・・・中央部、ｍ２・・・周辺
部、７・・・赤外線ランプ、８・・・フィラメント。Figure 1 is a schematic sectional view of the infrared heating device that is the premise of the present invention, Figure 2 is a sectional view taken along the Tl-Tl line in Figure 1, and Figure 3 is a schematic view taken from the T2-T2 line in Figure 2. 4 is a partial plan view of the heated surface in FIG. 3, its heat radiation distribution characteristic curve diagram, and heat distribution characteristic curve diagram; FIGS. 5 and 6 are infrared rays showing other embodiments of the present invention. FIG. 3 is a schematic plan view of the lamp. m... surface to be heated, ml... central portion, m2... peripheral portion, 7... infrared lamp, 8... filament.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] フィラメントを有する長尺な直線状赤外線ラン−プを複
数灯並列に配置して平坦な被加熱面に対向させ該被加熱
面を同時加熱する加熱装置において、各赤外線ランプの
各フィラメントの被加熱面の中央部と対向する部分を粗
に、被加熱面の周面部と対向する部分を密に形成したこ
とを特徴とする赤外線加熱装置。In a heating device in which a plurality of long linear infrared lamps each having a filament are arranged in parallel to face a flat heated surface and simultaneously heat the heated surface, the heated surface of each filament of each infrared lamp is An infrared heating device characterized in that a portion facing the central portion of the heated surface is formed roughly, and a portion facing the peripheral surface of the heated surface is formed densely.
JP14302283U 1983-09-13 1983-09-13 infrared heating device Pending JPS6049625U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14302283U JPS6049625U (en) 1983-09-13 1983-09-13 infrared heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14302283U JPS6049625U (en) 1983-09-13 1983-09-13 infrared heating device

Publications (1)

Publication Number Publication Date
JPS6049625U true JPS6049625U (en) 1985-04-08

Family

ID=30319377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14302283U Pending JPS6049625U (en) 1983-09-13 1983-09-13 infrared heating device

Country Status (1)

Country Link
JP (1) JPS6049625U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030025146A (en) * 2001-09-19 2003-03-28 권영해 Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764937A (en) * 1980-10-09 1982-04-20 Ushio Inc Annealing device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764937A (en) * 1980-10-09 1982-04-20 Ushio Inc Annealing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030025146A (en) * 2001-09-19 2003-03-28 권영해 Heating apparatus of rapid thermal annealer and rapid thermal chemical vapor deposition for semiconductor device manufacturing

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