JPS6046117B2 - Method for producing cephalosporin derivatives - Google Patents

Method for producing cephalosporin derivatives

Info

Publication number
JPS6046117B2
JPS6046117B2 JP13113274A JP13113274A JPS6046117B2 JP S6046117 B2 JPS6046117 B2 JP S6046117B2 JP 13113274 A JP13113274 A JP 13113274A JP 13113274 A JP13113274 A JP 13113274A JP S6046117 B2 JPS6046117 B2 JP S6046117B2
Authority
JP
Japan
Prior art keywords
compound
formula
group
dibenzylamine
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP13113274A
Other languages
Japanese (ja)
Other versions
JPS5159889A (en
Inventor
信吾 杉本
暁 中林
清昭 片野
俊三 深津
誠夫 関
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meiji Seika Kaisha Ltd
Original Assignee
Meiji Seika Kaisha Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meiji Seika Kaisha Ltd filed Critical Meiji Seika Kaisha Ltd
Priority to JP13113274A priority Critical patent/JPS6046117B2/en
Publication of JPS5159889A publication Critical patent/JPS5159889A/en
Publication of JPS6046117B2 publication Critical patent/JPS6046117B2/en
Expired legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は抗生物質として有用な上記の式(■)のセフア
レキシン化合物を製造する方法、及び有用な中間体を精
製する方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a cephalexin compound of formula (■) above that is useful as an antibiotic, and a method for purifying a useful intermediate.

セフアレキシンの製造においてはN−保護D−フェニル
グリシン又はこれのカルボン酸活性誘導体と7ーADC
A(すなわち7ーアミノー3−メチルー3−セフエムー
4−カルボン酸)を反応させることにより上記の式(I
)で示される化合物すなわちN−保護セフアレキシンが
得られる。
In the production of cephalexin, N-protected D-phenylglycine or its carboxylic acid active derivative and 7-ADC are used.
The above formula (I
), namely N-protected cephalexin, is obtained.

このN−保護セフアレキシンは、必らずN−保護D−フ
ェニルグリシンを含有しており、粗製物の形である。こ
の様にして得られた粗製のN−保護セフアレキシンを精
製することなしに脱保護工程に付すと、その脱保護生成
物である式(■)のセフアレキシンに混在するD−フェ
ニルグリシンを取り除くことが極めて困難になり、本質
的に得られたセフアレキシンの純度は極めて低くなる。
この様なことから、本発明者は粗製のN−保護セフアレ
キシン(N−保護D−フェニルグリシンを不純物として
含有)にジベンジルアミンを溶液中で作用させてジベン
ジルアミン塩とすることにより、溶液からジベンジルア
ミン塩が不純物と分離して沈澱することを認め、さらに
これを分離、精製して高純度のN−保護セフアレキシン
が極めて選択的に高収率で得られること及びこのN一保
護セフアレキシンを脱保護工程に付して生成した最終生
成物がD−フェニルグリシンを含有せず、高純度で得ら
れることを知見し、このことから、本発明を完成した。
本発明は次式 (式中Rはアミノ基の保護基である)で表わされる化合
物の粗製物にジベンジルアミン(DBAと略記する)を
作用させて式(1)の化合物のジベンジルアミン塩を形
成せしめ、これを分離精製し、このジベンジルアミン塩
から式(1)の化合物を遊離させその後、該化合物から
保護基Rを脱離することを特徴とする式で表わされる化
合物、すなわちセフアレキシンを高純度で生成せしめる
セフアレキシンの製造方法を提供する。
This N-protected cephalexin necessarily contains N-protected D-phenylglycine and is in crude form. When the crude N-protected cephalexin thus obtained is subjected to the deprotection step without purification, it is possible to remove D-phenylglycine present in the deprotected product, cephalexin of formula (■). It becomes very difficult and essentially the purity of the obtained cephalexin is very low.
For these reasons, the present inventor has developed a solution by treating crude N-protected cephalexin (containing N-protected D-phenylglycine as an impurity) with dibenzylamine in a solution to form a dibenzylamine salt. It was recognized that dibenzylamine salt separates from impurities and precipitates from the above, and that it can be further separated and purified to obtain highly pure N-protected cephalexin in a highly selective manner in high yield, and that this N-protected cephalexin can be obtained in a highly selective manner in a high yield. It was found that the final product produced by subjecting to the deprotection step does not contain D-phenylglycine and is obtained with high purity, and based on this, the present invention was completed.
The present invention provides a dibenzylamine salt of a compound of formula (1) by reacting dibenzylamine (abbreviated as DBA) to a crude product of a compound represented by the following formula (in which R is a protecting group for an amino group). is formed, separated and purified, the compound of formula (1) is liberated from the dibenzylamine salt, and then the protecting group R is removed from the compound, that is, cephalexin. Provided is a method for producing cephalexin with high purity.

なお、化合物(1)のジベンジルアミン(DBA)塩そ
れ自体は新規物質である。本法の原料である化合物(1
)におけるRはβーラクタム、及び7位アミド結合に影
響を与えることなく除去されるアミノ基の公知の保護基
を示し、代表的な例としては、ベンジルオキシカルボニ
ル基、p−メトキシベンジルオキシカルボニル基、t−
ブトキシカルボニル基、ジフェニルメトキシカルボニル
基、t−ペンチルオキシカルボニル基、β,β,β一ト
リクロロエトキシカルボニル基、β,β,β一トリブロ
モエトキシカルボニル基、2,4ージニトロフェノキシ
カルボニル基、p−ニトロベンジルオキシカルボニル基
、p−クロロベンジルオキシカルボニル基、α,α−ジ
メチルー3,5−ジメトキシベンジルオキシカルボニル
基、トリチル基、ビス(p−メトキシフェニル)メチル
基、o−ニトロフエニルスルフエニル基、p−ニトロフ
エニルスルフエニル基、ホルミル基などが挙げられる。
これらの保護基はペプチド化学の分野で一般的に常用さ
れる方法により、β−ラクタム及び7位アミド結合に影
響なく(1)式の化合物から脱離することが出来る。本
法においてDBA塩の形成反応は不活性溶媒・中で0〜
50℃好ましくは10〜20℃で化合物(1)の粗製物
にDBAを作用させて実施される。
Note that the dibenzylamine (DBA) salt of compound (1) itself is a new substance. The compound (1
), R represents β-lactam and a known protecting group for an amino group that can be removed without affecting the amide bond at the 7-position; typical examples include benzyloxycarbonyl group, p-methoxybenzyloxycarbonyl group , t-
Butoxycarbonyl group, diphenylmethoxycarbonyl group, t-pentyloxycarbonyl group, β,β,β-trichloroethoxycarbonyl group, β,β,β-tribromoethoxycarbonyl group, 2,4-dinitrophenoxycarbonyl group, p- Nitrobenzyloxycarbonyl group, p-chlorobenzyloxycarbonyl group, α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl group, trityl group, bis(p-methoxyphenyl)methyl group, o-nitrophenylsulfenyl group , p-nitrophenylsulfenyl group, formyl group, and the like.
These protecting groups can be removed from the compound of formula (1) without affecting the β-lactam and the 7-position amide bond by methods commonly used in the field of peptide chemistry. In this method, the DBA salt formation reaction is carried out in an inert solvent from 0 to
The reaction is carried out by treating the crude compound (1) with DBA at 50°C, preferably 10 to 20°C.

こ)に用いる不活性溶媒としてはエチルエーテル、イソ
プロピルエーテル等のエーテル類、アセトン、メチルエ
チルケトン、メチルイソブチルケトン等のケトン類又は
酢酸エチル、酢酸ブチル等のエステル類を単一溶媒とし
て、又はいくつかの混合溶媒として用いることが出来る
。ジベンジルアミン(DBA)塩の形成において化合物
(1)に対して、作用されるDBAの量は1〜2モルを
加えれ・ば良く、実際に使用されるDBA量は化合物(
1)に対して1.1〜1.5モルを加えることが好まし
い。生成したジベンジルアミン塩は反応溶液から沈澱す
るが不純物は溶解したま)留るので分離、精製できる。
The inert solvent used in this step may be ethers such as ethyl ether or isopropyl ether, ketones such as acetone, methyl ethyl ketone or methyl isobutyl ketone, or esters such as ethyl acetate or butyl acetate, or several solvents. It can be used as a mixed solvent. In the formation of dibenzylamine (DBA) salt, the amount of DBA that acts on compound (1) may be 1 to 2 moles, and the amount of DBA actually used is
It is preferable to add 1.1 to 1.5 mol to 1). The generated dibenzylamine salt precipitates from the reaction solution, but the impurities remain dissolved and can be separated and purified.

例えばろ過によりジベンジルアミン塩を採取する。こう
して形成、採取された化合物(1)のジベンジルアミン
塩は、これを塩酸、硫酸、リン酸、クエン酸等で処理す
ると分解して遊離酸の形で化合物(1)が生成する。こ
の生成物を酢酸エチル、酢酸ブチル、メチルイソブチル
ケトン等の有機溶媒で抽出してジベンジルアミンそれ自
体を除去することにより、遊離酸の形の化合物(1)に
定量的に転化、再生することが出来る。尚この再生工程
はO〜5℃の温度範囲で行なうことが望ましく、さらに
完全にジベンジルアミンを取り除くために注意深く抽出
を行なうべきである。こうして再生された化合物(1)
の高純度物から保護基Rを脱離して化合物(■)を生成
する工程は、単なる脱保護基の工程であり、その脱保護
の手段としては、一般的にペプチド化学の領域で知られ
ている様に、保護基の種類により種々の方法があるが、
β−ラクタム及び7位アミド結合に影響を与えない方法
でなければならない。
For example, the dibenzylamine salt is collected by filtration. When the dibenzylamine salt of compound (1) thus formed and collected is treated with hydrochloric acid, sulfuric acid, phosphoric acid, citric acid, etc., it is decomposed to produce compound (1) in the form of a free acid. By extracting this product with an organic solvent such as ethyl acetate, butyl acetate, or methyl isobutyl ketone to remove dibenzylamine itself, it is quantitatively converted and regenerated into the free acid form of compound (1). I can do it. This regeneration step is preferably carried out at a temperature of 0 to 5 DEG C., and the extraction should be carried out carefully to completely remove dibenzylamine. Compound (1) thus regenerated
The step of removing the protecting group R from a highly purified product to generate compound (■) is simply a step of deprotecting the group, and the means of deprotection is generally known in the field of peptide chemistry. As you can see, there are various methods depending on the type of protecting group, but
The method must not affect the β-lactam and the 7-position amide bond.

たとえばt−ブトキシカルボニル基が保護基Rとして化
合物(1)上に存在する場合は、トリフルオロ酢酸、ギ
酸、塩酸等の酸で処理することにより脱保護することが
出来る。本発明方法により得られたセフアレキシンは、
DBA塩を経由しないて製造したすなわち、化合物(1
)の粗製物の段階で精製することなしに直ちに脱保護工
程に付すことにより製造したセフアレキシンと比較して
、極めて高純度であり、未反応原料から由来するD−フ
ェニルグリシンを含有』してない。
For example, when a t-butoxycarbonyl group is present on compound (1) as a protecting group R, it can be deprotected by treatment with an acid such as trifluoroacetic acid, formic acid, or hydrochloric acid. Cephalexin obtained by the method of the present invention is
That is, compound (1) produced without going through DBA salt.
) has extremely high purity and does not contain D-phenylglycine derived from unreacted raw materials compared to cephalexin produced by immediately subjecting it to the deprotection step without purification at the crude product stage. .

以下に、本発明の方法を実施例により説明するが本発明
はこれに限定されるものではない。実施例 (a)7β−(4)−α−t−ブトキシカルボニルア」
ミノーα−フェニルアセトアミド)−3−メチルー3−
セフエムー4−カルボン酸、ジベンジルアミン塩の生成
The method of the present invention will be explained below using Examples, but the present invention is not limited thereto. Example (a) 7β-(4)-α-t-butoxycarbonyla”
Minnow α-phenylacetamide)-3-methyl-3-
Generation of cefhemu 4-carboxylic acid, dibenzylamine salt.

D−α−t−ブトキシカルボニルアミノフエニル酢酸リ
チウム塩3.86JをDMF4Omlに溶解し、2減圧
下20m1に濃縮することにより乾燥する。
3.86 J of lithium salt of D-α-t-butoxycarbonylaminophenyl acetate is dissolved in 40 ml of DMF and dried by concentrating to 20 ml under 2 reduced pressure.

この溶液を氷冷し、無水硫酸、ジメチルホルムアミド混
合物(SO3・DMF)の(ト)α溶液(特願昭49一
60235号参照)(イ).1y1m1)12mtを加
える。その後2扮攪拌する。この溶液を7−アミノー3
−メチ;ルー3−セフエムー4−カルボン酸2.14ダ
を水50m1に懸濁し炭酸水素ナトリウム飽和水溶液で
PH7.5とし可溶化し5〜10゜Cの温度に保持した
溶液に対して、攪拌しながら約1紛で滴下する。PHは
7.5〜8.0に保持する。滴下後、同−PHl同一温
度.で3Cy)j−攪拌を続けた後、水50mtを加え
食塩で飽和し、酢酸エチル100m1を加えて、10%
塩酸でPH2.Oとし、不溶物を淵過により取り除く。
酢酸エチル層を分離し、水層を酢酸エチル50TnLて
抽出し、有機層を含ませる。有機層を飽和食塩水100
mLで2回洗浄し無水硫酸マグネシウムで乾燥し、溶媒
を減圧下留去すると、5.6qの残渣が得られた。この
残渣に酢酸エチル−エーテル1:1の混合液20mLを
加えて溶解し、ジベンジルアミン8T1.1を攪拌しな
がら加えた。生成したDBA塩は沈澱として析出するか
ら、これを淵取し少量の酢酸エチルで洗浄し酢酸エチル
ニメタノール15:1の混合溶媒から再結晶した。5.
85gの白色針状結晶として表題の化合物を得た。
This solution was cooled on ice, and a (g) α solution of anhydrous sulfuric acid and a dimethylformamide mixture (SO3/DMF) (see Japanese Patent Application No. 1971-60235) (a). 1y1m1) Add 12mt. Then stir twice. Add this solution to 7-amino-3
- Methyl; 2.14 Da of 3-cephemu-4-carboxylic acid was suspended in 50 ml of water, solubilized to pH 7.5 with a saturated aqueous solution of sodium hydrogen carbonate, and the solution maintained at a temperature of 5 to 10°C was stirred. While doing so, add about 1 drop. PH is maintained at 7.5-8.0. After dropping, use the same PHL at the same temperature. After continued stirring, 50 ml of water was added to saturate with salt, and 100 ml of ethyl acetate was added to give a 10%
pH2 with hydrochloric acid. O, and insoluble matter was removed by filtration.
Separate the ethyl acetate layer and extract the aqueous layer with 50 TnL of ethyl acetate to incorporate the organic layer. Dilute the organic layer with saturated saline solution 100%
mL twice, dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain 5.6q of residue. 20 mL of a 1:1 mixture of ethyl acetate and ether was added to dissolve the residue, and 1.1 dibenzylamine 8T was added with stirring. The generated DBA salt precipitated out, and was filtered out, washed with a small amount of ethyl acetate, and recrystallized from a mixed solvent of ethyl acetate nimethanol 15:1. 5.
The title compound was obtained as 85 g of white needles.

Mp.l53℃(分解)〔α〕D=+49.4(メタノ
ール,C=0.036)UV:λMeOH,max26
3mμ,H1%,1cm107.6IR(ヌジヨール)
3350cm−1(NH)17600−1(β−1ac
Iam)1660cm−1(ウレタ ン)NMR
: (DMSO−(16,TMS,60MHz)1.4
0(S,9H,t−Bu)1.93(S,3ll,CH
3)3.26(Q,2H,2位CH2)3.95(S,
4H,CH2)4.90(D,lH,6位 H)5
.35(D,lH,NH)5.53(Q,lH,7位H
)7。
Mp. l53℃ (decomposition) [α] D=+49.4 (methanol, C=0.036) UV: λMeOH, max26
3mμ, H1%, 1cm107.6IR (Nujiyoru)
3350cm-1 (NH) 17600-1 (β-1ac
Iam) 1660cm-1 (urethane) NMR
: (DMSO-(16,TMS,60MHz)1.4
0(S,9H,t-Bu)1.93(S,3ll,CH
3) 3.26 (Q, 2H, 2nd position CH2) 3.95 (S,
4H, CH2) 4.90 (D, lH, 6th position H) 5
.. 35 (D, lH, NH) 5.53 (Q, lH, 7th position H
)7.

26〜7.33(15H,フエ ニル)(b)7
β−(D−α−アミノーα−フェニルアセトアミド)−
3−メチルー3−セフエムー4−カルボン酸の生成。
26-7.33 (15H, phenyl) (b) 7
β-(D-α-amino-α-phenylacetamide)-
Formation of 3-methyl-3-cefemu-4-carboxylic acid.

前項(a)の生成物、すなわち7−β(−D−α−t−
ブトキシカルボニルアミノーα−フェニルアセトアミド
)−3−メチルー3−セフエムー4一カルボン酸ジベン
ジルアミン塩2gを酢酸エチル20m1に懸濁し、水2
0m1を加え冷却した50%クエン酸でPH3.Oとし
た。
The product of the previous section (a), that is, 7-β(-D-α-t-
Suspend 2 g of dibenzylamine salt of butoxycarbonylamino-α-phenylacetamide)-3-methyl-3-cephemu-4 monocarboxylic acid in 20 ml of ethyl acetate, and suspend 2 g of dibenzylamine salt of ethyl acetate.
0ml and cooled 50% citric acid to pH 3. It was set as O.

酢酸エチル層を分離し、水層にさらに酢酸エチル20m
tを加えて抽出し、酢酸エチルを合せ飽和食塩水20m
tで2回洗浄し、無水硫酸マグネシウムで乾燥し溶媒を
留去することによりジベンジルアミン塩から遊離酸を得
た。残渣に塩化メチレン10m1を加え溶解し濃塩酸5
m1を加え室温で1時間攪拌した後、氷水20m1を加
え、水層を分離した水層に冷却下、トリエチルアミンを
加えPH4.5とし沈澱を析出させた。約1時間攪拌し
た後、ろ過により固体を集め、少量の水で洗浄した。1
.16gの白色結晶として表題の化合物を得た。
Separate the ethyl acetate layer and add 20ml of ethyl acetate to the aqueous layer.
Add t and extract, add ethyl acetate and add 20ml of saturated saline.
The free acid was obtained from the dibenzylamine salt by washing with T twice, drying with anhydrous magnesium sulfate, and distilling off the solvent. Add 10ml of methylene chloride to the residue, dissolve it, and add 5ml of concentrated hydrochloric acid.
After stirring at room temperature for 1 hour, 20 ml of ice water was added and the aqueous layer was separated, and triethylamine was added to the aqueous layer under cooling to adjust the pH to 4.5 and precipitate. After stirring for about 1 hour, the solids were collected by filtration and washed with a small amount of water. 1
.. The title compound was obtained as 16 g of white crystals.

Claims (1)

【特許請求の範囲】 1 次式 ▲数式、化学式、表等があります▼( I )(式中Rは
アミノ基の保護基である)で表わされる化合物の粗製物
にジベンジルアミンを作用させて、式( I )の化合物
のジベンジルアミン塩を形成させ、これを分離精製し、
このジベンジルアミン塩から遊離酸の形の式( I )の
化合物を遊離させ、その後に該化合物から保護基Rを脱
離することを特徴とする次式▲数式、化学式、表等があ
ります▼(II)で表わされるセファレキシンの製法。
[Claims] Primary formula ▲ Numerical formulas, chemical formulas, tables, etc. ▼ (I) (in the formula, R is a protecting group for an amino group), which is obtained by reacting dibenzylamine with a crude product of the compound represented by , forming a dibenzylamine salt of the compound of formula (I), separating and purifying this,
The following formula ▲Mathematical formula, chemical formula, table, etc.▼ is characterized by liberating the compound of formula (I) in the form of a free acid from this dibenzylamine salt, and then removing the protecting group R from the compound. A method for producing cephalexin represented by (II).
JP13113274A 1974-11-15 1974-11-15 Method for producing cephalosporin derivatives Expired JPS6046117B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13113274A JPS6046117B2 (en) 1974-11-15 1974-11-15 Method for producing cephalosporin derivatives

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13113274A JPS6046117B2 (en) 1974-11-15 1974-11-15 Method for producing cephalosporin derivatives

Publications (2)

Publication Number Publication Date
JPS5159889A JPS5159889A (en) 1976-05-25
JPS6046117B2 true JPS6046117B2 (en) 1985-10-14

Family

ID=15050720

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13113274A Expired JPS6046117B2 (en) 1974-11-15 1974-11-15 Method for producing cephalosporin derivatives

Country Status (1)

Country Link
JP (1) JPS6046117B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0142733B2 (en) * 1984-04-06 1989-09-14 Degremont

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023219152A1 (en) * 2022-05-13 2023-11-16 中外製薬株式会社 Method for producing salt of amino acid or salt of peptide compound or solvate of either one of said salts comprising lithium salt precipitation step

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0142733B2 (en) * 1984-04-06 1989-09-14 Degremont

Also Published As

Publication number Publication date
JPS5159889A (en) 1976-05-25

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