JPS6039192A - Nozzle device for spray plating - Google Patents
Nozzle device for spray platingInfo
- Publication number
- JPS6039192A JPS6039192A JP14500083A JP14500083A JPS6039192A JP S6039192 A JPS6039192 A JP S6039192A JP 14500083 A JP14500083 A JP 14500083A JP 14500083 A JP14500083 A JP 14500083A JP S6039192 A JPS6039192 A JP S6039192A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- nozzle
- plated
- opening
- insertion part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 title claims abstract description 78
- 239000007921 spray Substances 0.000 title claims description 11
- 238000002347 injection Methods 0.000 claims abstract description 11
- 239000007924 injection Substances 0.000 claims abstract description 11
- 230000001105 regulatory effect Effects 0.000 claims abstract description 5
- 238000003780 insertion Methods 0.000 claims description 38
- 230000037431 insertion Effects 0.000 claims description 38
- 239000000243 solution Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 abstract 3
- 230000001276 controlling effect Effects 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000010970 precious metal Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 210000004894 snout Anatomy 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)発明の技術分野
本発明は各種電子機器等に使用するコネクターソケット
の如き開孔を有するメッキ物の開孔内面にメッキを施す
噴射メッキ用のノズル装置に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a nozzle device for spray plating that applies plating to the inner surface of a hole in a plated object having an opening, such as a connector socket used in various electronic devices.
(ロ)従来技術と問題点
一般に電子機器等に用いられるコネクター類等は銅又は
銅@r金で造られていて、高い信頼度を必要とするもの
になると優れた導電性のほかに耐蝕性、耐摩耗性、ハン
ダ作業の容易性などの性能が要求されるので、メッキが
必要となシ、そのメッキは主として金メッキが施される
ものであるが、用途に応じては全以外の、ロジウム又は
銀メッキのほか種々の会合メッキが施されるものである
。(b) Conventional technology and problems Generally, connectors used in electronic devices, etc. are made of copper or copper@r gold, and when it comes to products that require high reliability, they have excellent conductivity and corrosion resistance. Since performance such as wear resistance and ease of soldering is required, plating is required.Plating is mainly gold plating, but depending on the application, rhodium other than gold plating may be used. Alternatively, various types of associative plating may be applied in addition to silver plating.
そしてコネクターソケットのビン挿入部の如き開孔の開
孔内面にメッキする噴射メッキ用のノズル装置としては
、例えば第1図に示すような特開昭58−37193号
公報に開示された「コネクターソケットの内面メッキ方
法」の中で使用されているような装置がある。この開示
された技術によれば「メッキ物」としてのコネクターソ
ケット1はr 1it!孔」としてのピン挿入部2を有
し、カソードを兼ねた金属性の支持台3によりピン挿入
部2の開口4を下に向けてコネクターソケット1f:鉛
直に保持されるようにしてあり、コネクターソケット1
の下方にはメッキ液5の入ったメッキ槽6が備えられ、
またメッキ槽6中にはノズル7がビン挿入部2に対して
進退自在に取付けられている。そしてメッキ槽6中のメ
ッキ液5はポンプ8によりパイプ9内金通って、コネク
ターソケット1のビン挿入部2に挿入されたノズル7の
噴射口10より、開孔内面11に噴射され、噴射された
メッキ液5は開孔内面11を流れ落ちる間にメッキ全行
ない、下方に備えられたメッキ槽6内に回収され、再び
ポンプ8、ノ々イブ9を通ってノズル7に循環供給され
るようにしである。As a nozzle device for spray plating for plating the inner surface of an opening such as a bottle insertion part of a connector socket, for example, the "Connector Socket" disclosed in Japanese Patent Application Laid-Open No. 58-37193 as shown in FIG. There is a device like the one used in "Inner surface plating method". According to this disclosed technology, the connector socket 1 as a "plated object" is r 1it! The connector socket 1f has a pin insertion part 2 as a hole, and is held vertically by a metal support 3 which also serves as a cathode, with the opening 4 of the pin insertion part 2 facing downward. socket 1
A plating tank 6 containing a plating solution 5 is provided below the
Further, a nozzle 7 is installed in the plating tank 6 so as to be able to move forward and backward with respect to the bottle insertion portion 2. Then, the plating solution 5 in the plating tank 6 is passed through the inner metal of the pipe 9 by the pump 8, and is injected onto the inner surface 11 of the opening from the injection port 10 of the nozzle 7 inserted into the bottle insertion part 2 of the connector socket 1. The plating solution 5 performs the entire plating process while flowing down the inner surface 11 of the opening, is collected into a plating tank 6 provided below, and is circulated and supplied to the nozzle 7 through the pump 8 and the nozzle 9 again. It is.
しかしながら近年、金、観等の貴金属の価格が高騰して
いることや貴金属の省資源を図ることから、これら貴金
属のメッキの場会は必要最小限の部位にのみメッキを施
す要望が高まりつつある。コネクターソケット1の開孔
内面11にメッキtSす際も、コネクターソケット1と
ピン(図示せず)とのコンタクトに必要な部位骨〔例え
ば開口4の近辺部位〕にのみメッキを施せば良く、従来
の装置だとビン挿入部2の開孔内面11全部にメッキが
施とさnてしまい、開孔内面11の不要な部位にもメッ
キされることから製造コストがその分高くなるなどの不
経済な点があった。However, in recent years, as the prices of precious metals such as gold and gold have soared, and as efforts are being made to conserve precious metal resources, there has been an increasing demand for plating only the minimum necessary parts when plating these precious metals. . When plating the inner surface 11 of the opening of the connector socket 1, it is sufficient to plate only the parts necessary for contact between the connector socket 1 and the pin (not shown) (for example, the part near the opening 4). With this device, the entire inner surface 11 of the aperture of the bottle insertion part 2 is plated, and unnecessary parts of the inner surface 11 of the aperture are also plated, which increases the manufacturing cost, which is uneconomical. There was a point.
(ハ)発明の目的
本発明は上記の如き問題点に着目してなされたもので、
開孔を有するメッキ物の開孔内面を部分的にメッキ〔第
1発明〕、また開孔内面を部分的(/(メッキするとと
もにノズルの開孔内への挿入及び開孔内での中心位置決
め操作をより円滑に且つ確実に行なうことができる〔第
2発明〕噴射メッキ用のノズル装置を提供することを目
的としている。(c) Purpose of the invention The present invention has been made by focusing on the above-mentioned problems.
Partially plating the inner surface of the aperture of a plated object having an aperture [first invention], and partially plating the inner surface of the aperture (/(while plating the nozzle and inserting the nozzle into the aperture and positioning the center within the aperture) [Second Invention] It is an object of the present invention to provide a nozzle device for spray plating that can be operated more smoothly and reliably.
に)発明の構成
本発明は上記の目的を達成するために、メッキ物の開孔
内へ挿入させるノズル挿入部の一部に、開孔内面のメッ
キ対象部位を規制するための絶縁部を備え〔第1発明〕
且つこの絶縁部とともに、開孔サイズに相応する外径お
よびメッキ液の流れを妨害せぬ形状を有するガイド兼用
の中心位置決め体を設けた〔第2発明〕溝成としている
。B) Structure of the Invention In order to achieve the above object, the present invention includes a part of the nozzle insertion part inserted into the aperture of the plated object, including an insulating part for regulating the part to be plated on the inner surface of the aperture. [First invention]
In addition, together with this insulating portion, a center positioning body which also serves as a guide and has an outer diameter corresponding to the size of the opening and a shape that does not obstruct the flow of the plating solution is provided.
(ホ)実施例 以下本発明の詳細を図面を参照して説明する。(e) Examples The details of the present invention will be explained below with reference to the drawings.
、112図〜第4図は本発明〔第1発明〕の一実7+I
IJ例を示すものである。尚、以下の説明に於いて従来
と共通の部分にはついては共通の符号を付して重複する
説明は省略する。, 112 to 4 are part of the present invention [first invention] 7+I
An IJ example is shown. In the following description, parts common to those in the prior art are given the same reference numerals, and redundant description will be omitted.
1は「メッキ物」としてのコネクターソケットで、12
は回転ホルダーを示す。この回転ホルダー12の外周面
にはカッ−12板13が設けてあり、更にこの外周面V
こはコネクターソケット1のステム14の略半外周面に
相応する複数の固定溝15が一定のピッチで設けられて
いる。1 is a connector socket as a "plated item", 12
indicates a rotating holder. A cup 12 plate 13 is provided on the outer peripheral surface of this rotary holder 12, and this outer peripheral surface V
A plurality of fixing grooves 15 corresponding to approximately half the outer peripheral surface of the stem 14 of the connector socket 1 are provided at a constant pitch.
コネクターソケット1のステム14は、固定溝15に嵌
合されて、また回転ホルダー12の外周面を覆う押えベ
ルト16のテンションにより回転ホルダー12からの位
置ずれを防止されつつ固定される。回転ホルダー12の
下方にはメッキ液受槽17が備えられておりこのメッキ
液受槽17内にはアノードを兼ねた複数のノズル7がそ
の噴射口10をそれぞれ上に向けてスA−ジャ18上に
交換自在に立設されている。ノズル7が立設されている
間隔は回転ホルダー12に保持されたコネクターソケッ
ト1と同じピッチで、即ち各々のノズル7は各々のコネ
クターソケット1の真下に対応位置決めきれている。The stem 14 of the connector socket 1 is fitted into the fixing groove 15 and is fixed while being prevented from shifting from the rotating holder 12 by the tension of a presser belt 16 covering the outer peripheral surface of the rotating holder 12. A plating liquid receiving tank 17 is provided below the rotating holder 12, and in this plating liquid receiving tank 17, a plurality of nozzles 7 which also serve as anodes are directed onto the bath A-jar 18 with their respective injection ports 10 facing upward. It is installed upright so that it can be replaced freely. The intervals between the nozzles 7 are the same as those of the connector sockets 1 held in the rotary holder 12, that is, each nozzle 7 is positioned directly below each connector socket 1.
スハーシャ18は図示せぬ圧力シリンダーのア−ム19
に固定されており上下動自在とされている。ノズル7は
スノξ−ジャ18の内部と通じていて、スパーンャ18
内に一定の圧力によって供給されるメッキ液5を噴射口
10より噴射させるものである。ノズル7のビン挿入部
2内へ挿入されている部分であるノズル挿入部20の噴
射口10側には絶縁体製の絶縁部21が形成されており
、ノズル7の絶縁部21以外の部分は導電性の良い金属
でできている導電部22としである。この絶縁部21の
ノズル挿入部20中に占める開会(長さ)は開孔内面1
1中における非メツキ対象部位XIにより設足されるも
のであり、結果的にはメッキ対象部位Yi決めることに
なる。Suhassha 18 is an arm 19 of a pressure cylinder (not shown).
It is fixed and can move up and down. The nozzle 7 communicates with the inside of the snout ξ-jar 18 and
The plating liquid 5 supplied into the tank under a constant pressure is injected from an injection port 10. An insulating part 21 made of an insulator is formed on the injection port 10 side of the nozzle insertion part 20, which is the part inserted into the bottle insertion part 2 of the nozzle 7, and the part of the nozzle 7 other than the insulating part 21 is The conductive portion 22 is made of a metal with good conductivity. The opening (length) occupied in the nozzle insertion part 20 of this insulating part 21 is the opening (length) of the opening inner surface 1
This is established by the non-plating target part XI in 1, and as a result, the plating target part Yi is determined.
次に作用を説明する。Next, the action will be explained.
回転ホルダー12に保持さ扛たコネクターソケット1は
メッキ槽6中のノズル7に対応する数だけ、即ち図示の
例で6個づつのグループで矢示N1方向へ移動する。第
2図中8が前処理、0がメッキ処理、そして′Dが後処
理の各ゾーンを示している。またコネクターソケット1
は回転ホルダー12のカソード板13に接触しているこ
とで常にカソード化されている。あるグループがメッキ
槽6の真上に位置した時にスパーンャ18が図示せぬ圧
力シリンダーにより上昇するとノズル7はまずコネクタ
ーソケット1のビン挿入部2内に挿入され次にビン挿入
部2内に位置決めされる。The connector sockets 1 held by the rotary holder 12 are moved in the direction of the arrow N1 by a number corresponding to the number of nozzles 7 in the plating tank 6, that is, in groups of six in the illustrated example. In FIG. 2, 8 indicates the pre-treatment zone, 0 the plating treatment zone, and 'D the post-treatment zone. Also connector socket 1
is in contact with the cathode plate 13 of the rotating holder 12, so that it is always turned into a cathode. When a certain group is positioned directly above the plating tank 6, when the spanner 18 is raised by a pressure cylinder (not shown), the nozzle 7 is first inserted into the bottle insertion part 2 of the connector socket 1, and then positioned within the bottle insertion part 2. Ru.
メッキ液5はノズル7がビン挿入部2内に位置決めされ
ると、先ずスパーンャ18内に一定の圧力で供給され、
次にノズル7の内部を通って噴射口10よりビン挿入部
2内へ噴射される。When the nozzle 7 is positioned within the bottle insertion portion 2, the plating solution 5 is first supplied into the sparner 18 at a constant pressure.
Next, it passes through the inside of the nozzle 7 and is injected into the bottle insertion part 2 from the injection port 10.
噴射されたメッキ液5はビン挿入部2内の開孔内面11
を流れ落ちる間にメッキを施すものであるが、ビン挿入
部2内のノズル挿入部20に於ける絶縁部21に対向す
る非メツキ対象部位・K)にはメッキを施すのに十分な
電位が加わらないのでメッキは施されないことになる。The sprayed plating solution 5 is applied to the inner surface 11 of the opening in the bottle insertion part 2.
However, sufficient potential is not applied to the non-plating target area K) facing the insulating part 21 in the nozzle insertion part 20 in the bottle insertion part 2. Since there is no plating, no plating will be applied.
−万でノズル挿入部20の導電部22に対向するメッキ
対象部位IY)には十分な電位が加わるのでメッキ対象
部位Y上に析出物23を得ることができる。従って、ノ
ズル挿入部20に於ける絶縁部21の占める開会(長さ
)を調整したり、ノズル7の上下動ストローク址を調整
することによりメッキが施される面積の調整を図り開孔
内面11を部分的にメッキすることができる。- In this case, a sufficient potential is applied to the plating target part IY) facing the conductive part 22 of the nozzle insertion part 20, so that a precipitate 23 can be obtained on the plating target part Y. Therefore, by adjusting the opening (length) occupied by the insulating part 21 in the nozzle insertion part 20 and by adjusting the vertical movement stroke of the nozzle 7, the area to be plated can be adjusted. can be partially plated.
第5図〜第7図は本発明〔第2発明〕の実施例を示す(
ン1である。第2発明に係るノズル装置はノズル7のノ
ズル挿入部20には絶縁部21を備えるとともに、開孔
サイズに相応する外径24を有するガイド兼用の中心位
置決め体25が設けられている。5 to 7 show examples of the present invention [second invention] (
It is 1. In the nozzle device according to the second invention, the nozzle insertion portion 20 of the nozzle 7 is provided with an insulating portion 21 and a center positioning body 25 which also serves as a guide and has an outer diameter 24 corresponding to the aperture size.
次に作用を説明する。Next, the action will be explained.
まずノズル7がビン挿入部2内へ挿入する際に、ノズル
7は中心位置決め体25のガイドによりビン挿入部2内
へ円滑Qて挿入される。同時にビン挿入部2内に挿入さ
れたノズル7は第6図に示す如く中心位置決め体25に
より必ずビン挿入部2の中心Vζ位置決めされる。この
ガイド兼用の中心位iM決め体25はメッキ液5の流れ
を妨害せぬ「恢状」〔第5図、第6図の場合〕の形をし
て(へるので、メッキ液5は噴射口10より円滑に噴射
され、またノズル7はビン挿入部2の中心1く位置せし
められているので噴射されたメッキ液5は開孔内面11
をどの部分も均等に流れ落ち回収されるものである。更
にノズル7と開孔内面11との距離はどの部分も等しい
ので開孔内面11ン(はとの部分Vても均等な電位が加
えられるものである。First, when the nozzle 7 is inserted into the bottle insertion part 2, the nozzle 7 is smoothly inserted into the bottle insertion part 2 by the guide of the center positioning body 25. At the same time, the nozzle 7 inserted into the bottle insertion part 2 is always positioned at the center Vζ of the bottle insertion part 2 by the center positioning body 25 as shown in FIG. The central position iM determining body 25, which also serves as a guide, is shaped like a ``shape'' (in the case of FIGS. 5 and 6) that does not obstruct the flow of the plating solution 5, so that the plating solution 5 is sprayed. The plating solution 5 is sprayed smoothly from the opening 10, and since the nozzle 7 is positioned at the center 1 of the bottle insertion part 2, the sprayed plating solution 5 is sprayed onto the inner surface 11 of the opening.
All parts of the water fall down equally and are collected. Furthermore, since the distance between the nozzle 7 and the inner surface 11 of the aperture is the same at all parts, an equal potential is applied to the inner surface 11 of the aperture (the bottom part V).
またガイド°兼用の中心位置決め体25の形状は第5図
に示すような形状に限定されず、ビン挿入部2内へ挿入
し易い形状のもので且っ開孔サイズに相応する外径24
を有するものであればよく1例えば第7図(a) (b
) (c)に示すようなものも十分採用可能である。第
7図(a)は、絶縁部21の外周面Vこ4本の棒状の形
をした中心位置決め体25が備えら:rしている。この
中心位置決め体25の外径24は開孔サイズに相応する
ものであり、またメッキ液5は先端の噴射口1oより噴
射されるものである。第7図(b)は先端がテーツク状
の絶縁部21で形成されており、ここのテーパ状の絶縁
部21が中心位置決め体?5も兼ねている。噴射口10
は中心位[R決め体25の下方の一段くびれた部分1尾
4つ設けられている。Further, the shape of the center positioning body 25 which also serves as a guide is not limited to the shape shown in FIG.
For example, Fig. 7(a) (b)
) The one shown in (c) is also fully applicable. In FIG. 7(a), four rod-shaped center positioning bodies 25 are provided on the outer peripheral surface of the insulating section 21. The outer diameter 24 of this center positioning body 25 corresponds to the size of the opening, and the plating liquid 5 is sprayed from the injection port 1o at the tip. In FIG. 7(b), the tip is formed of a tapered insulating part 21, and this tapered insulating part 21 is a center positioning member. It also serves as 5. Jet nozzle 10
is provided at the center [one constricted part below the R-determining body 25].
更に第7図(c)の場合は他の場合と異なりノ、ツルア
の先端部に導電部22を設け、その下に絶縁部21が備
えられており、その外周面にガイド兼用の中心位置決め
体25が設けられている。Furthermore, in the case of FIG. 7(c), unlike the other cases, a conductive part 22 is provided at the tip of the truer, an insulating part 21 is provided below the conductive part 22, and a center positioning body that also serves as a guide is provided on the outer peripheral surface of the conductive part 22. 25 are provided.
噴射口10はメッキ液5がビン挿入部2の円形の底面に
当たるように絶縁部21の外周面に傾斜角度で設けられ
ている。従ってこの(c)のノズル7を用いてメッキを
真した場合は、ビン挿入部2内の導電部22と対向して
いる底面付近にのみメッキが施されることになる。尚、
第2発明に係るその他の構成、作用については第1発明
と同様につき説明を省略する。The injection port 10 is provided at an inclined angle on the outer peripheral surface of the insulating section 21 so that the plating solution 5 hits the circular bottom surface of the bottle insertion section 2. Therefore, when plating is performed using the nozzle 7 of (c), the plating is applied only to the vicinity of the bottom surface of the bottle insertion portion 2 facing the conductive portion 22. still,
The other configurations and functions of the second invention are the same as those of the first invention, and therefore their explanations will be omitted.
また以上のWW、明に於いてコネクターソケット1側を
固定とし、ノズル7側を可動としたが、勿論、この逆に
メッキ物1側を可動としノズル7側を固定にすることも
可能であり、更に双方とも可動にすることも可能であっ
て、要はノズル7がメッキ物1の開孔2内に挿入できる
ものであればメッキ物1とノズル7とがどのような配置
状態であっても全て本発明で対象とされるものである。In addition, in the above WW and Akira, the connector socket 1 side was fixed and the nozzle 7 side was made movable, but of course it is also possible to conversely make the plated object 1 side movable and the nozzle 7 side fixed. Furthermore, it is also possible to make both of them movable, and the point is that as long as the nozzle 7 can be inserted into the opening 2 of the plated object 1, the plated object 1 and the nozzle 7 can be arranged in any state. All of these are also covered by the present invention.
またメッキ物1の開孔内面11はコネクターソケット1
のぎン挿入部2のような円筒状内面に限定されるもので
はないことは言うまでもない。Also, the inner surface of the hole 11 of the plated object 1 is connected to the connector socket 1.
Needless to say, it is not limited to a cylindrical inner surface like the cylindrical insertion part 2.
(へ)発明の詳細
な説明した如く、本発明によれば、その構成を、メッキ
物の開孔内へ挿入させるノズル挿入部の一部に、開孔内
面のメッキ対象部位を規制するための絶縁部を備え〔第
1発明〕且つこの絶縁部とともに、開孔サイズに相応す
る外径およびメッキ液の流れを妨害せぬ形状を有するガ
イド兼用の中心位置決め体を設けた〔第2発明〕構成と
したので、メッキはノズル挿入部の絶縁部に対向してい
る開孔内面即ち非メツキ対象部位には施されない。従っ
てノズル挿入部の絶縁部の占める割分(長さ)を調整し
たり、ノズル上[・動ストロークリFを調整したりする
ことなどによりメッキが施される面積の調整が可能と々
リメッキ物の開孔内面を部分的にメッキできて金その他
の貴金属などをメッキする場合にはその’ft金属の節
約ができるという効果〔第1発明〕がある。(f) As described in detail, according to the present invention, the structure is such that a part of the nozzle insertion part inserted into the aperture of the plated object is provided with a part for regulating the part to be plated on the inner surface of the aperture. The structure includes an insulating part [first invention] and, together with the insulating part, a center positioning body that also serves as a guide and has an outer diameter corresponding to the aperture size and a shape that does not obstruct the flow of the plating solution [second invention]. Therefore, plating is not applied to the inner surface of the opening facing the insulating part of the nozzle insertion part, that is, the non-plating target area. Therefore, the area to be plated can be adjusted by adjusting the proportion (length) occupied by the insulating part of the nozzle insertion part, or by adjusting the dynamic stroke F on the nozzle. When the inner surface of the opening can be partially plated with gold or other noble metal, the 'ft metal can be saved [first invention].
シスに、上記効果に加えてノズルをノズル挿入部に設け
たガイド兼用の中心位置決め体により確実にし〃1も円
滑に開孔内へ挿入させることができ、また開孔内へ挿入
されたノズルは同様に中心位置決め体により必ずメッキ
物の開孔内の中心に位置決めされる。従ってアノードを
兼ねたノズルの導電部とカソード化されているメッキ物
の開孔内面とが接触して短絡(ショート)を起こす危険
性もより少なくなシ、シかもノズルと開孔内面との距離
はどの部分も等しくなるので開孔内面のメッキ対象部位
に均一な電位を加えることができると同時に噴射された
メッキ液は開孔内面上のどの部分も均等な檜が流れ落ち
るようになるのでメッキ対象部位のみに均一な厚さのメ
ッキ’cTfaすことができるという効果〔第2発明〕
がある。In addition to the above-mentioned effects, the nozzle can be inserted into the aperture smoothly by the center positioning body that also serves as a guide provided in the nozzle insertion part, and the nozzle inserted into the aperture is Similarly, the centering body ensures that the plating is centered within the aperture. Therefore, there is less risk of a short circuit caused by contact between the conductive part of the nozzle, which also serves as an anode, and the inner surface of the aperture, which is a cathode. is the same on all parts, so a uniform potential can be applied to the plating target area on the inner surface of the hole.At the same time, the injected plating solution flows down evenly on all parts of the inner surface of the hole, so it is possible to apply a uniform potential to the plating target area on the inner surface of the hole. Effect of being able to plate only a portion with a uniform thickness [Second invention]
There is.
第1図は噴射メッキ用のノズル装置の従来例を示す説明
図。
第2図は本発明(gJfJ1発明〕の一実施例を示す噴
射メッキ用のノズル装置の斜視図。
第3図は第2図中の矢示II−III線に沿う概略断面
図。
第4図は第3図中のノズルを挿入した状態を示す矢示■
部の拡大断面図。
第5図は本発明〔第2発明〕の一実施例を示す第4図に
相当する断面図。
第6図は第5図中の矢示vr−vrsに沿う断面図、そ
して
第7図(a) (b) (c)は第2発明に係るガイド
兼用の中心位置決め体の変形例を各々示す斜視図である
。
1・・・メッキ物(コネクターソケット)2・・・開孔
(ビン挿入部)
5・・・メッキ液
7・・・ノズル
10・・・噴射口
11・・・開孔内面
20・・・ノズル挿入部
21・・・絶縁部
24・・・外径
25・・・中心位置決め体
Y・・・メッキ対象
第1図
第2図
587
第3図
第5図
牛
第6図
第7ぼ
(O)(b)
(C’)
4FIG. 1 is an explanatory diagram showing a conventional example of a nozzle device for spray plating. Fig. 2 is a perspective view of a nozzle device for spray plating showing one embodiment of the present invention (gJfJ1 invention). Fig. 3 is a schematic sectional view taken along the arrow II-III line in Fig. 2. is the arrow in Figure 3 that indicates the nozzle inserted state■
An enlarged sectional view of the section. FIG. 5 is a sectional view corresponding to FIG. 4 showing an embodiment of the present invention [second invention]. 6 is a sectional view taken along the arrow vr-vrs in FIG. 5, and FIGS. 7(a), 7(b), and 7(c) respectively show modified examples of the center positioning body that also serves as a guide according to the second invention. FIG. 1... Plated object (connector socket) 2... Opening hole (bottle insertion part) 5... Plating liquid 7... Nozzle 10... Spray port 11... Opening inner surface 20... Nozzle Insertion part 21...Insulating part 24...Outer diameter 25...Center positioning body Y...Plating target Fig. 1 Fig. 2 587 Fig. 3 Fig. 5 Cow Fig. 6 Fig. 7 (O) (b) (C') 4
Claims (2)
ノズル挿入部の噴射口よシ、メッキ液を噴射してカソー
ド化されたメッキ物の開孔内面にメッキを施す噴射メッ
キ用のノズル装置において。 上記ノズル挿入部はその一部に、上記開孔内面のメッキ
対象部位を規制するための絶縁部を備えていることを特
徴とする噴射メッキ用のノズル装置。(1) For injection plating, the nozzle inserted into the opening of the plating object is inserted into the opening of the plated object, and the plating liquid is sprayed through the injection port of the nozzle insertion part, which is inserted into the opening of the plated object, and the inner surface of the opening of the plating object that has been turned into a cathode is plated. In nozzle equipment. A nozzle device for spray plating, characterized in that the nozzle insertion portion includes an insulating portion in a part thereof for regulating a portion to be plated on the inner surface of the opening.
ノズル挿入部の噴射口より、メッキ液を噴射してカソー
ド化されたメッキ物の開孔内面にメッキを施す噴射メッ
キ用のノズル装置において。 上記ノズル挿入部はその一部に、上記開孔内面のメッキ
対象部位を規制するための絶縁部を備え且つ上記開孔サ
イズに相応する外径抄よびメッキ液の流れを妨害せぬ形
状を有するガイド兼用の中心位置決め体を、設けたこと
を特徴とする噴射メッキ用のノズル装置。(2) A nozzle device for spray plating that sprays plating solution from the injection port of the nozzle insertion part that also serves as an anode and is inserted into the aperture of the plating object to plate the inner surface of the aperture of the plating object that has become a cathode. In. The nozzle insertion part includes an insulating part in a part thereof for regulating the plating target area on the inner surface of the opening, and has an outer diameter corresponding to the opening size and a shape that does not interfere with the flow of the plating solution. A nozzle device for spray plating characterized by being provided with a center positioning body that also serves as a guide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14500083A JPS6039192A (en) | 1983-08-10 | 1983-08-10 | Nozzle device for spray plating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14500083A JPS6039192A (en) | 1983-08-10 | 1983-08-10 | Nozzle device for spray plating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6039192A true JPS6039192A (en) | 1985-02-28 |
JPH0440437B2 JPH0440437B2 (en) | 1992-07-02 |
Family
ID=15375131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14500083A Granted JPS6039192A (en) | 1983-08-10 | 1983-08-10 | Nozzle device for spray plating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6039192A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910827A (en) * | 1972-05-31 | 1974-01-30 |
-
1983
- 1983-08-10 JP JP14500083A patent/JPS6039192A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4910827A (en) * | 1972-05-31 | 1974-01-30 |
Also Published As
Publication number | Publication date |
---|---|
JPH0440437B2 (en) | 1992-07-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4367123A (en) | Precision spot plating process and apparatus | |
US5443707A (en) | Apparatus for electroplating the main surface of a substrate | |
US20050161336A1 (en) | Electroplating apparatus with segmented anode array | |
US4280882A (en) | Method for electroplating selected areas of article and articles plated thereby | |
US9708724B2 (en) | Anode unit and plating apparatus having such anode unit | |
JP7073332B2 (en) | Electrodeposition of a metal layer of uniform thickness on a semiconductor wafer | |
JP2006249450A (en) | Plating method and plating device | |
IE44205B1 (en) | Process for the selective electrodepostion of metal | |
US20040245111A1 (en) | Plating machine and process for producing film carrier tapes for mounting electronic parts | |
US3506546A (en) | Copper coating | |
JPS6039192A (en) | Nozzle device for spray plating | |
US7713398B2 (en) | Selective plating apparatus and selective plating method | |
US3669865A (en) | Apparatus for uniformly plating a continuous cylindrical substrate | |
CN113564650B (en) | Electrodeposition method and electrodeposition device | |
CA2156644C (en) | Method and apparatus for continuous galvanic or chemical application of metallic layers on a body | |
JPS6021395A (en) | Method for plating article having cylindrical inside of small diameter | |
US3994786A (en) | Electroplating device and method | |
EP0114216B1 (en) | Method for selective electroplating | |
JP2014129591A (en) | Electrolytic plating device | |
KR101665103B1 (en) | a partial electroplating apparatus for a connector | |
US6517698B1 (en) | System and method for providing rotation to plating flow | |
JPH1112791A (en) | Device for plating inner face of metallic pipe | |
CN110098129A (en) | A kind of making apparatus and production method of silicon diode silver bump electrode | |
JP2009013466A (en) | Electrode structure and continuous partial plating device | |
KR20190138489A (en) | suction plating device |