JPS6033359A - Composition for forming copper film - Google Patents

Composition for forming copper film

Info

Publication number
JPS6033359A
JPS6033359A JP14299883A JP14299883A JPS6033359A JP S6033359 A JPS6033359 A JP S6033359A JP 14299883 A JP14299883 A JP 14299883A JP 14299883 A JP14299883 A JP 14299883A JP S6033359 A JPS6033359 A JP S6033359A
Authority
JP
Japan
Prior art keywords
copper
composition
org
compound
copper film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14299883A
Other languages
Japanese (ja)
Inventor
Masatoshi Wada
正敏 和田
Yukikazu Moritsu
森津 幸和
Toshiro Kimura
敏郎 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OKUNO SEIYAKU KOGYO KK
Okuno Chemical Industries Co Ltd
Original Assignee
OKUNO SEIYAKU KOGYO KK
Okuno Chemical Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OKUNO SEIYAKU KOGYO KK, Okuno Chemical Industries Co Ltd filed Critical OKUNO SEIYAKU KOGYO KK
Priority to JP14299883A priority Critical patent/JPS6033359A/en
Publication of JPS6033359A publication Critical patent/JPS6033359A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material

Abstract

PURPOSE:To provide the titled composition with good efficiency which is prevented from flowing due to heating, forms a copper film only to a desired part and enabled in the easy removal of residue after heating by washing, obtained by containing a Ca- or Mg-compound, copper halide and an org. vehicle as effective components. CONSTITUTION:A copper film forming composition contains Ca- or Mg-halide, an inorg. acid or an org. acid, at least one of a calcium compound and a magnesium compound, a copper halide such as cupprous chloride, cuppric chloride or ammonium cuppric chloride and an org. vehicle such as vaseline and laminated to the surface of aluminum or an aluminum alloy and heated to about 350- 500 deg.C to form a copper film. In the above mentioned composition, it is pref. to bring the amount of at least one of the calcium compound and the magnesium compound to 0.5-20wt%, and to adjust the ratio of copper halide to 99.5-80% while it is proper to use the org. vehicle in an amount of about 0.2-2pts.wt. to one pt.wt. of the composition.

Description

【発明の詳細な説明】 本発明はアルミニウムまたはその合金表面に銅被膜を形
成するために使用する組成物に関す。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a composition used to form a copper coating on the surface of aluminum or its alloys.

アルミニウムまたはアルミニウム合金表面に銅被膜を形
成させる方法は各種の方法があるが、その一つの方法と
して、アルミニウム表面に粘着性ハイドロカーボンたと
えばワセリンや流動パラフィン等を塗布し、その上にへ
ロゲン化銅粉末を塗布して加熱し、アルミニウム表面に
銅被膜を形成させる方法が知られている。
There are various methods for forming a copper film on the surface of aluminum or aluminum alloys. One method is to apply adhesive hydrocarbon such as vaseline or liquid paraffin to the aluminum surface, and then coat the aluminum surface with copper halide. A method is known in which a powder is applied and heated to form a copper coating on the aluminum surface.

しかしこの方法では、加熱により粘着性ハイドロカーボ
ンの粘度が低下して流動し、この際ハロゲン化銅も一緒
に流動する。このためハロゲン化銅が所望の場所以外に
流動し、所望しない場所にも銅被膜が形成される。また
この方法では、ハロゲン化銅の融点以上に加熱しC銅の
完全均一被膜を形成し、加熱処理後は、残7jfヲ水洗
除去するものであるが、水洗だけでは残渣を容易に除去
できず、ブラッシングや超音波洗浄を行なう必要がある
。このためアルミニウムまたはアルミニウム合金を高温
加熱状態から水中へ投入して急冷して残渣除去を行なつ
Cいるのが現状であるが、急冷によってアルミニウム素
材に歪が残シ、ひどい時は成形品が変形する場合がある
However, in this method, heating reduces the viscosity of the sticky hydrocarbon and causes it to flow, and at this time, the copper halide also flows together. For this reason, the copper halide flows to areas other than the desired locations, and a copper film is also formed in undesired locations. In addition, in this method, a completely uniform coating of C copper is formed by heating the copper halide above its melting point, and after the heat treatment, the remaining 7jf is removed by washing with water, but the residue cannot be easily removed by washing with water alone. , it is necessary to perform brushing and ultrasonic cleaning. For this reason, currently aluminum or aluminum alloys are heated to a high temperature and then poured into water to be rapidly cooled to remove the residue.However, rapid cooling leaves distortions in the aluminum material, and in severe cases, the molded product becomes deformed. There are cases where

本発明の目的はこれ等従来法の難点を解消するためにな
されたものであって、本発明のこの目的はアルミニウム
またはアルミニウム合金表面に、力μシウム化合物とマ
グネシウム化合物のうち、少なくとも一種類、ハロゲン
化銅及び有機ビヒク)Vを有効成分として成る組成物を
塗布し加熱して銅被膜を形成することによって達成され
る。
The purpose of the present invention is to solve the problems of the conventional methods, and the purpose of the present invention is to apply at least one kind of μsium compound and magnesium compound to the surface of aluminum or aluminum alloy. This is achieved by applying a composition comprising copper halide and organic vehicle (V) as active ingredients and heating to form a copper coating.

本発明の大きな特徴は、カルシウム化合物とマグネシウ
ム化合物のうち少なくとも一種をハロゲン化銅と併用す
る点にある。この併用によジハロゲン化銅の流動を効果
的に防ぐことが出来、惹いては所望の個所にのみ銅被膜
を形成させることが出来る。またハロゲン化銅の融点以
下の温度でも均一な銅被膜の形成が可能となシ、加熱後
の残渣を除去する際には、水洗だけで容易に残渣を除去
することが出来る。
A major feature of the present invention is that at least one of a calcium compound and a magnesium compound is used in combination with copper halide. By using this combination, it is possible to effectively prevent the flow of copper dihalide, and as a result, it is possible to form a copper coating only at desired locations. Further, it is possible to form a uniform copper coating even at a temperature below the melting point of copper halide, and when removing the residue after heating, the residue can be easily removed by simply washing with water.

本発明において使用するハロゲン化銅としては、従来こ
の分野で使用され”C来たものが広く使用出来、たとえ
ば塩化第一銅、塩化第二銅、塩化第二銅アンモニウム等
を代表例として例示出来る。
As the copper halide used in the present invention, those that have been conventionally used in this field and have a "C" name can be widely used, and representative examples thereof include cuprous chloride, cupric chloride, cupric ammonium chloride, etc. .

また本発明に於いて使用されるマグネシウム化合物及び
カルシウム化合物としては無機化合物及び有板化合物が
包含され、前者としてはマグネシウム及びカルシウムの
夫々のハロゲン化物たとえば弗化物や塩化物、酸化物、
硫酸塩、硝酸塩、リン酸塩、珪酸塩、炭酸塩等を例示出
来、また後者とL’−(はI!I): e塩、プロピオ
ン酸塩、ステアリン酸塩などの有機カルボン酸塩が例示
出来る。これ等化合物のうち、ハロゲン化物、硫酸塩、
リン酸塩、珪酸塩が特に好ましい。
In addition, the magnesium compounds and calcium compounds used in the present invention include inorganic compounds and plate compounds, and the former include halides of magnesium and calcium, such as fluorides, chlorides, oxides,
Examples include sulfates, nitrates, phosphates, silicates, carbonates, and the latter and organic carboxylates such as L'-(I!I): e salts, propionates, and stearates. I can do it. Among these compounds, halides, sulfates,
Phosphates and silicates are particularly preferred.

有機ビヒクルとし〔は従来この種分野で使用され−C来
たものが広い範囲で使用出来、室温で液状のものはかシ
でなくワックス類の如く固体状のものでも艮い。たとえ
はワセリン、)々ラフイン等のハイドロカーボン、メタ
ノール、エタノール、グロパノール、ブタノール、ヌテ
アリルアルコーμ等のアルコ−/L/ 類、エチレング
リコール、クリセリン等の多価アルコール、メチルイソ
グチルケトン、アセチルアセトン等のケトン類、エチレ
ングリコールモツプチルエーテル、ジエチレングリコー
ルモノブチルエーテル等のエーテル類、酢酸エチル、酢
酸ブチμ、酢酸エチレングリコールモツプチルエーテル プチルエーテル等のエステル類、ベンゼン、トルエン、
キンレン等の芳香族炭化水素、パインオイル、ターピネ
オール等テルペン系オイル及びこれらの混合物あるいは
これらの溶剤にエチルセルロース、ヒドロキシグロヒ諏
しセルロース、アセチルセルロース等セルロースalJ
]L メチルメタクリレート、ブチルメタクリレート等
のアクリル樹脂、ビニルアセテート、ビニルブチフール
等のビニル樹脂及びこれらの共重合体を溶解させたもの
が例示できる。
As the organic vehicle, those which have been conventionally used in this field can be used in a wide range of applications, and not only those which are liquid at room temperature but also those which are solid such as waxes are also applicable. For example, hydrocarbons such as vaseline, rough-in, etc., alcohols such as methanol, ethanol, glopanol, butanol, nutaryl alcohol μ, polyhydric alcohols such as ethylene glycol and chrycerin, methyl isobutyl ketone, acetylacetone, etc. Ketones, ethers such as ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, esters such as ethyl acetate, butyl acetate, butyl acetate, benzene, toluene,
Aromatic hydrocarbons such as fenugreek, terpene oils such as pine oil and terpineol, and mixtures thereof, or solvents thereof, and celluloses such as ethyl cellulose, hydroxyl cellulose, acetyl cellulose, etc.
]L Examples include those in which acrylic resins such as methyl methacrylate and butyl methacrylate, vinyl resins such as vinyl acetate and vinyl butifur, and copolymers thereof are dissolved.

使用割合は前者0.5〜20重量%、後者99.5〜8
0重量%であシ、前者が0.5重景チに達しないときは
、本発明の効果が充,分に発揮され難く、逆に20重量
%よりも多くなると銅被膜の形成が不均一となる傾向が
あシ望ましくない。
The usage ratio is 0.5 to 20% by weight for the former and 99.5 to 8% for the latter.
If the former is less than 0.5% by weight, the effect of the present invention will not be fully exhibited, and if it exceeds 20% by weight, the formation of the copper coating will be uneven. This tends to be undesirable.

また有機ビヒクルの使用割合は、該混合物1重九[部に
対し、0.2〜2市.敏部程度である。
The proportion of the organic vehicle to be used is 0.2 to 2 parts per 1 part of the mixture. It's about the same level as Tobe.

本発明組成物を用いてアルミニウムまたはその合金に銅
被膜を形成するに際しては、本発明組成物をアルミニウ
ムまたはその合金の表面に積層し、加熱通常350〜5
008C程度で加熱し、水洗すれば良い。
When forming a copper film on aluminum or its alloy using the composition of the present invention, the composition of the present invention is laminated on the surface of aluminum or its alloy, and heated to usually 350 to 50
All you have to do is heat it to about 0.008C and wash it with water.

以下に実施例を挙げ゛C本発明の詳細な説明する。The present invention will be described in detail below with reference to Examples.

実施例 第1表に示す所定量の塩化第一銅と所定量並びに所定の
力pシウム化合物またはマグネシウム化合物との混合物
を、有機ビヒク/I/(タービネオー/l/96重量%
、エチルセルローズ5重量%及びブチルメタクリレート
1重量%)と該混合物:有機ビヒクt&= 2.: l
 (Mfik比)の割合で混合してペースト状の組成物
を製造し、これをアルミニウム板(JIS A 108
0;50X50X0.4111m)上に0.3 i/ 
l O0m2の割合で塗布した。これを10000で乾
燥後電気炉で400°Cにて15分間加熱処理し、水洗
し゛C銅被膜を得た。
EXAMPLE A mixture of a predetermined amount of cuprous chloride shown in Table 1 and a psium compound or a magnesium compound at a predetermined strength was added to an organic vehicle/I/(Turbineo/l/96% by weight).
, 5% by weight of ethyl cellulose and 1% by weight of butyl methacrylate) and the mixture: organic vehicle t&=2. : l
(Mfik ratio) to produce a paste-like composition, and this is applied to an aluminum plate (JIS A 108
0; 50X50X0.4111m) on 0.3 i/
It was applied at a rate of 100m2. This was dried at a temperature of 10,000° C., then heat-treated at 400° C. for 15 minutes in an electric furnace, and washed with water to obtain a C copper coating.

第1表 (以 上)Table 1 (that's all)

Claims (1)

【特許請求の範囲】 ■ カルシウム化合物及びマグネシウム化合物の少くと
も1種、ハロゲン化銅及び有機ビヒクルを有効成分とし
て成る銅被膜形成用組成物。 ■ カルシウム化合物及びマグネシウム化合物の少くと
も1種と、ハロゲン化銅との割合が前者0.5〜20重
量%、後者99.5〜80重是チである特許請求の範囲
第1項記載の組成物。
[Scope of Claims] (1) A composition for forming a copper coating comprising at least one of a calcium compound and a magnesium compound, a copper halide, and an organic vehicle as active ingredients. (2) The composition according to claim 1, wherein the proportions of at least one of a calcium compound and a magnesium compound and copper halide are 0.5 to 20% by weight for the former and 99.5 to 80% by weight for the latter. thing.
JP14299883A 1983-08-03 1983-08-03 Composition for forming copper film Pending JPS6033359A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14299883A JPS6033359A (en) 1983-08-03 1983-08-03 Composition for forming copper film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14299883A JPS6033359A (en) 1983-08-03 1983-08-03 Composition for forming copper film

Publications (1)

Publication Number Publication Date
JPS6033359A true JPS6033359A (en) 1985-02-20

Family

ID=15328559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14299883A Pending JPS6033359A (en) 1983-08-03 1983-08-03 Composition for forming copper film

Country Status (1)

Country Link
JP (1) JPS6033359A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06276097A (en) * 1992-08-31 1994-09-30 Crystal Semiconductor Corp Method and equipment for calibrating monolithic voltage reference

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06276097A (en) * 1992-08-31 1994-09-30 Crystal Semiconductor Corp Method and equipment for calibrating monolithic voltage reference

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