JPS6032719B2 - Nickel alloy plating liquid - Google Patents
Nickel alloy plating liquidInfo
- Publication number
- JPS6032719B2 JPS6032719B2 JP10465378A JP10465378A JPS6032719B2 JP S6032719 B2 JPS6032719 B2 JP S6032719B2 JP 10465378 A JP10465378 A JP 10465378A JP 10465378 A JP10465378 A JP 10465378A JP S6032719 B2 JPS6032719 B2 JP S6032719B2
- Authority
- JP
- Japan
- Prior art keywords
- plating solution
- nickel
- plating
- alloy plating
- plating liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Description
【発明の詳細な説明】
本発明は耐酸性、耐食性、耐摩耗性、離型性、耐変色性
等を必要とする表面処理に適用して好適なニッケルリン
合金メッキ液の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the improvement of a nickel-phosphorus alloy plating solution suitable for application to surface treatments that require acid resistance, corrosion resistance, abrasion resistance, mold releasability, discoloration resistance, etc. .
ニッケルリン合金メッキ液は種々報告されているがその
代表的具体例を次に示す。Various nickel-phosphorus alloy plating solutions have been reported, and typical examples are shown below.
例1 NiS。Example 1 NiS.
4・母日2〇 175夕/そN
iCI2・8日2〇 50タ
′そ日3P。4. Mother's Day 20 175 evening/SoN
iCI2/8th 20 50ta' 3P that day.
4 509′そ比P
o3 1.5ジ′〆p
H0.5〜1.0 液温 75〜90oo例2硫酸ニッ
ケル 250タ′そ乳酸ナトリウ
ム 80夕/々次亜リン酸ナトリ
ウム 6夕/そ餌2.5〜3.5 液
温 40〜8び0例3
塩化ニッケル 40夕/そ炭酸
ニッケル 40夕/夕硫酸ニッケ
ル 160夕/そりン酸
50夕/そ亜リン酸
44夕/そPHO.5〜1.0こ
れら従来のニッケルリン合金メッキ液には複数のニッケ
ル塩あるいは有機酸塩が含有されており、また複数のリ
ン含有薬品が添加されているため、使用に際し、メッキ
液の建格やくみ出しにより損出が大きく不経剤であるば
かりかメッキ液の維持管理が複雑となる。4 509' Sobi P
o3 1.5ji'〆p
H0.5-1.0 Liquid temperature 75-90ooExample 2 Nickel sulfate 250 t Sodium lactate 80 t/t Sodium hypophosphite 6 t/t 2.5-3.5 Liquid temperature 40-8 0 Example 3 Nickel chloride 40 t/so Nickel carbonate 40 t/t Nickel sulfate 160 t/sorinic acid
50 evenings/phosphorous acid
44th evening/SoPHO. 5-1.0 These conventional nickel-phosphorus alloy plating solutions contain multiple nickel salts or organic acid salts, and multiple phosphorus-containing chemicals are added, so when using them, it is important to Not only does plating cause a large loss and is a sterile agent, but also complicates the maintenance and management of the plating solution.
このため、析出物中のリン含有量が変動し易く不安定で
あり、メッキ液の寿命が短かく、一定期間メッキ液を使
用後、メッキ液の一部又は全部を新しいメッキ液と交換
せねばならぬ等の欠点があった。本発明は従来使用され
ているニッケルリン合金メッキ液に関する前記欠点を改
善することを目的とし、メッキ液中に含有する組成を単
純化し、メッキ液の蓮格並びに使用に際する、くみ出み
に伴う薬品補充を簡易化し、メッキ液の維持管理を単純
化すると共に、析出皮膜中のリン含有率を安定化し、メ
ッキ液の寿命を長くし、長期連続使用に耐えるメッキ液
を提供せんとするものである。For this reason, the phosphorus content in the precipitate is easily fluctuated and unstable, the life of the plating solution is short, and after using the plating solution for a certain period of time, part or all of the plating solution must be replaced with a new plating solution. There were drawbacks such as: The present invention aims to improve the above-mentioned drawbacks of the conventionally used nickel phosphorus alloy plating solution, and it simplifies the composition contained in the plating solution and improves the quality of the plating solution and the pumping during use. The objective is to simplify the chemical replenishment involved, simplify the maintenance and management of the plating solution, stabilize the phosphorus content in the deposited film, extend the life of the plating solution, and provide a plating solution that can withstand long-term continuous use. It is.
本発明者はニッケルリン合金メッキ液について検討を重
ねた結果、ニッケル塩は複数にする必要がなく、硫酸ニ
ッケルのみで充分であり、リン酸はメッキ液のpH調整
機能やメッキ析出物中へのIJン析出効果が少く、亜リ
ン酸のみで充分であり、有機酸塩はメッキ液使用中に分
解しその結果メッキ液を汚しメッキ液の寿命を短くする
ことを見出し硫酸ニッケルと亜リン酸とからなるメッキ
液が合目的であることを見出した。次に本発明の実施例
を示す。As a result of repeated studies on nickel-phosphorus alloy plating solutions, the inventor found that it is not necessary to use multiple nickel salts, and that nickel sulfate alone is sufficient, and that phosphoric acid has the ability to adjust the pH of the plating solution and to dissolve into plating deposits. It was discovered that nickel sulfate and phosphorous acid have little precipitation effect, and that phosphorous acid alone is sufficient, while organic acid salts decompose during use of the plating solution, contaminating the plating solution and shortening the life of the plating solution. It has been found that a plating solution consisting of Next, examples of the present invention will be shown.
実施例 1
硫酸ニッケル六水塩230夕/そ、亜リン酸40夕/そ
の組成の水溶液を水酸化ナトリウムでPHI.0に調整
した液をメッキ液とし、ニッケル板を陽極とし、研摩し
た鋼板を陰極として、メッキ液温度80℃、陰極電流密
度2A/d〆で表面光択のあるニッケルリン合金析出皮
膜を得た。Example 1 An aqueous solution having the composition of nickel sulfate hexahydrate 230 t/s and phosphorous acid 40 t/s was subjected to PHI. with sodium hydroxide. A nickel phosphorus alloy deposited film with surface photo-selectivity was obtained by using a plating solution adjusted to 0 as a plating solution, a nickel plate as an anode, and a polished steel plate as a cathode at a plating solution temperature of 80° C. and a cathode current density of 2 A/d.
実施例 2
硫酸ニッケル六水塩100多′〆、亜リン酸10夕/そ
の組成の水溶液を作成しニッケル板陽極及びステンレス
板等の不溶性陽極を用い、陰極として鋼板を用いメッキ
液温度80午0陰極電流密度4A/dめで電解を行い、
pHを0.5とした。Example 2 An aqueous solution with the composition of 100% nickel sulfate hexahydrate and 10% phosphorous acid was prepared, and a nickel plate anode and an insoluble anode such as a stainless steel plate were used, a steel plate was used as the cathode, and the plating solution temperature was 80%. Electrolysis was performed at a cathode current density of 4 A/d,
The pH was set to 0.5.
この液をメッキ液として実施例1と同条件でメッキを行
いビット、ザラ、クラックの少し、光択のある析出表面
を得た。実施例 3
硫酸ニッケル六水塩100多′ク亜リン酸40夕/夕の
組成の水溶液を水酸化ニッケルでpHを1.5に調整し
た液をメッキ液としニッケル板を陽極、塩化ビニル樹脂
成形用金型を陰極としメッキ液温度75℃陰極電流密度
4A/dめでメッキをし塩化ピニルの分解ガスに強い金
型を得た。Using this solution as a plating solution, plating was carried out under the same conditions as in Example 1 to obtain a deposited surface with few bits, roughness, and cracks, and an optically selective surface. Example 3 An aqueous solution with a composition of 100% nickel sulfate hexahydrate and 40% polyphosphorous acid was adjusted to pH 1.5 with nickel hydroxide as a plating solution, a nickel plate was used as an anode, and molded with vinyl chloride resin. Using the mold as a cathode, plating was carried out at a plating solution temperature of 75° C. and a cathode current density of 4 A/d to obtain a mold resistant to decomposition gas of pinyl chloride.
上記実施例の如く本発明のメッキ液は組成が硫酸ニッケ
ル六水塩と亜リン酸とから成る単純な構成となるため、
メッキ液のニッケルがニッケルリン合金として新出して
メッキ液の比重が低下すると比重を計りながら硫酸ニッ
ケル六水塩を加え、比重を一定に成すように管理し、一
方リンがニッケルリン合金として折出してメッキ液のリ
ン含有量が低下するとメッキ液のリンは亜リン酸のみか
ら成るためメッキ液のリンを分析して不足量だけ頭リン
酸を補充してリンの濃度を維持するように管理する。As shown in the above embodiments, the plating solution of the present invention has a simple composition of nickel sulfate hexahydrate and phosphorous acid;
When the nickel in the plating solution is released as a nickel-phosphorus alloy and the specific gravity of the plating solution decreases, nickel sulfate hexahydrate is added while measuring the specific gravity to keep the specific gravity constant, while phosphorus is precipitated as a nickel-phosphorus alloy. When the phosphorus content of the plating solution decreases, the phosphorus in the plating solution consists only of phosphorous acid, so the phosphorus in the plating solution is analyzed and the insufficient amount of phosphoric acid is replenished to maintain the phosphorus concentration. .
餌の管理は硫酸を加えて調整すれば簡単である。上記の
ように本発明によるとニッケルリン合金メッキとして折
出し減った分だけ硫酸ニッケル六水塩と函リン酸を補充
することを繰返すことの簡単な管理で常にリン含有率の
変動の少し、均一なメッキ皮膜が得られ、メッキ液の寿
命は長く、メッキ液の一部又は全部を新しいメッキ液と
交換する必要もなくその効果は大きい。Bait management is easy by adding sulfuric acid. As described above, according to the present invention, nickel sulfate hexahydrate and box phosphoric acid are repeatedly replenished as much as they are deposited as nickel phosphorus alloy plating, and the phosphorus content is kept constant with little fluctuation and uniformity. The plating film can be obtained, the life of the plating solution is long, and there is no need to replace part or all of the plating solution with a new plating solution, which is highly effective.
Claims (1)
酸10〜40g/lから成る水溶液のpHを0.5〜2
.0に保つことを特徴とするニツケルリン合金メツキ液
。1. Adjust the pH of an aqueous solution consisting of 100 to 400 g/l of nickel sulfate hexahydrate and 10 to 40 g/l of phosphorous acid to 0.5 to 2.
.. A nickel phosphorus alloy plating liquid that maintains the temperature at 0.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10465378A JPS6032719B2 (en) | 1978-08-28 | 1978-08-28 | Nickel alloy plating liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10465378A JPS6032719B2 (en) | 1978-08-28 | 1978-08-28 | Nickel alloy plating liquid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5531181A JPS5531181A (en) | 1980-03-05 |
JPS6032719B2 true JPS6032719B2 (en) | 1985-07-30 |
Family
ID=14386411
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10465378A Expired JPS6032719B2 (en) | 1978-08-28 | 1978-08-28 | Nickel alloy plating liquid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6032719B2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4673468A (en) * | 1985-05-09 | 1987-06-16 | Burlington Industries, Inc. | Commercial nickel phosphorus electroplating |
US4767509A (en) * | 1983-02-04 | 1988-08-30 | Burlington Industries, Inc. | Nickel-phosphorus electroplating and bath therefor |
JPS6115997A (en) * | 1984-06-29 | 1986-01-24 | Riken Corp | Wear resistant sliding member and its manufacture |
CN106048674B (en) * | 2016-08-04 | 2019-01-15 | 江西铜业集团公司 | Copper foil surface handles nickel-phosphor electroplate liquid phosphorous acid root, phosphate radical minimizing technology |
CN106086957A (en) * | 2016-08-08 | 2016-11-09 | 常熟市常力紧固件有限公司 | A kind of process of surface treatment of flange face bolt |
-
1978
- 1978-08-28 JP JP10465378A patent/JPS6032719B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5531181A (en) | 1980-03-05 |
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