JPS60251623A - Liquid material discharging device for semiconductor device - Google Patents

Liquid material discharging device for semiconductor device

Info

Publication number
JPS60251623A
JPS60251623A JP10775984A JP10775984A JPS60251623A JP S60251623 A JPS60251623 A JP S60251623A JP 10775984 A JP10775984 A JP 10775984A JP 10775984 A JP10775984 A JP 10775984A JP S60251623 A JPS60251623 A JP S60251623A
Authority
JP
Japan
Prior art keywords
semiconductor device
liquid material
syringe
liquid
needle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10775984A
Other languages
Japanese (ja)
Inventor
Toshio Noda
野田 利雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10775984A priority Critical patent/JPS60251623A/en
Publication of JPS60251623A publication Critical patent/JPS60251623A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Abstract

PURPOSE:To contrive enlargement of the coatable area of a semiconductor device by a method wherein a constitution, with which a liquid can be coated on a semiconductor device by moving a needle not only in vertical direction but also in back and forth and right and left directions, is provided. CONSTITUTION:When the semiconductor device 1 carrying a semiconductor element 2 is conveyed to the dripping position of a liquid, the head part 7 supporting a syringe 5 begins a downward movement by an interlocking operation in the degree set by a vertical stroke 8-1. Air pressure is applied in the tube 6 which is extended from a controlling part and connected to the syringe 5, and the liquid material located in the syringe 5 passes through a needle 4 and discharged. At the same time, the head part 7 is shifted in the range set by the strokes 8-2 and 8-3 in the direction in parallel with the surface of the semiconductor element 2 by the command sent from a controlling mechanism. Subsequently, after a fixed quantity of liquid material 3 has been discharged for a fixed period of time, the head part 7 moves up, the semiconductor device 1 is shifted to the next position, and a series of operation is finished.

Description

【発明の詳細な説明】 (1)発明の技術分野 本発明は、半導体装置に液体材料を滴下、塗布する工程
において、定量・定厚・均一な塗膜を形成させる液体材
料吐出装置(以後ディスペンサ゛−と称す)の構造に関
するものである。
Detailed Description of the Invention (1) Technical Field of the Invention The present invention relates to a liquid material discharging device (hereinafter referred to as a dispenser) that forms a fixed amount, constant thickness, and uniform coating film in the process of dropping and applying a liquid material to a semiconductor device. It concerns the structure of (referred to as -).

(2)従来技術 従来、ディスペンサーは空気圧を介して一定量の液体材
料を定時間で吐出させるニードルを有し、平lル壮害小
油り小:萎り憔部トj髄シ訃イ 肢ニードルを塗布され
るべき平面に垂直な上下方向に送りを与え、ニードルか
ら滴下した液体で半導体装置の塗布面に塗膜を形成する
ものであった。
(2) Prior Art Conventionally, a dispenser has a needle that dispenses a certain amount of liquid material at a certain time using air pressure, and dispenses a certain amount of liquid material at a certain time using air pressure. The needle is fed vertically in a direction perpendicular to the plane to be coated, and the liquid dripped from the needle forms a coating film on the coated surface of the semiconductor device.

しかし、上記の様にニードルを塗布面に対し上下動する
だけでは定量・定厚・均一な塗膜を得ることは非常に困
難であって、液体材料自体の粘度・チタン性・半導体素
子との濡れ具合(接触角)等の因子や、塗膜を形成する
半導体素子のサイズ・形状等の因子により、目的とする
塗膜のコントロールが完全とは言えず、量産性が上がら
ないという欠点があった。
However, it is very difficult to obtain a fixed amount, constant thickness, and uniform coating film simply by moving the needle up and down relative to the coating surface as described above, and it is difficult to obtain a uniform coating film with a fixed amount and thickness, and it is difficult to obtain a uniform coating film due to the viscosity of the liquid material itself, titanium properties, and semiconductor elements. Due to factors such as the degree of wetting (contact angle) and the size and shape of the semiconductor elements that form the coating film, it is not possible to completely control the desired coating film, which has the disadvantage of not increasing mass productivity. Ta.

(3)発明の目的 本発明の目的は、半導体装置に定量・定厚・均一な液体
材料の塗膜を形成しうるディスペンサーを提供すること
にある。
(3) Purpose of the Invention An object of the present invention is to provide a dispenser capable of forming a fixed amount, constant thickness, and uniform coating film of a liquid material on a semiconductor device.

(4)発明の構成 本発明はニードルから液体を吐出し、これを半導体装置
に塗布して塗膜を形成する液体材料吐出装置において、
前記ニードルを半導体装置の液体塗布面に対して垂直及
び平行な二方向に移動させる制御機構を備えたことを特
徴とする半導体装置用液体材料吐出装置である。
(4) Structure of the Invention The present invention provides a liquid material discharging device that discharges liquid from a needle and applies the liquid to a semiconductor device to form a coating film.
A liquid material discharging apparatus for a semiconductor device is characterized in that it includes a control mechanism that moves the needle in two directions perpendicular and parallel to the liquid application surface of the semiconductor device.

(5)発明の原理 従来技術によるディスペンサーの使用を通して、塗膜の
形成過程を観察・調査した結果、ディスペンサーにより
吐出された液体材料は、吐出速度・圧力・時間及び上下
方向のストロークの速度によって粘性流体として塗布さ
れるべき平面に拡がっていき、その結果、得られた塗膜
は限られた面積と厚み(形状)しかもたないことが分っ
た。
(5) Principle of the invention As a result of observing and investigating the coating film formation process through the use of dispensers according to the prior art, it was found that the liquid material discharged by the dispenser has a viscosity depending on the discharge speed, pressure, time, and vertical stroke speed. It was found that the coating spreads as a fluid over the plane to be applied, and as a result, the resulting coating film has only a limited area and thickness (shape).

そのため、必要とする塗膜を得るには吐出する位置を移
動させると共に、液体材料に横方向の力を加える様に、
ディスペンサーの吐出部分を半導体装置の塗布面と相対
的に動作させる必要がある。
Therefore, in order to obtain the desired coating film, in addition to moving the dispensing position, it is necessary to apply lateral force to the liquid material.
It is necessary to move the discharge portion of the dispenser relative to the application surface of the semiconductor device.

そこで、本発明は半導体装置への液体材料の腋下塗布工
程において、該液体材料を吐出させる機構の部分が塗布
されるべき平面に対して垂直な方向に動作するのみなら
ず、平行な方向にも動作するようにしたものである。
Therefore, in the process of applying a liquid material to a semiconductor device under the armpit, the present invention moves not only a part of the mechanism for discharging the liquid material in a direction perpendicular to the plane to be applied, but also in a direction parallel to it. is also made to work.

(6)実施例 以下、本発明の実施例を図によシ説明する。(6) Examples Hereinafter, embodiments of the present invention will be explained with reference to the drawings.

第2図(α)は従来技術によるディスペンサーの一部分
を示したものである。半導体素子2を載置した半導体装
置1が滴下位置に送られてくると、連動した動作でシリ
ンジ5を支持したヘッド部7が下がり始め、コントロー
ル部より伸びてシリンジ5につながったチューブ6内に
空気圧がかかり、シリンジ5内の液体材料3がニードル
4を通って吐出される。
FIG. 2(α) shows a portion of a conventional dispenser. When the semiconductor device 1 with the semiconductor chip 2 mounted thereon is sent to the dropping position, the head part 7 supporting the syringe 5 begins to lower in a linked motion, and the head part 7 that supports the syringe 5 begins to fall into the tube 6 extending from the control part and connected to the syringe 5. Air pressure is applied and the liquid material 3 in the syringe 5 is expelled through the needle 4.

次に一定量・一定時間・に液体材料3が吐出(滴下)さ
れた後に、ヘッド部7が上昇し、半導体装置1は次の位
置に移動され、一連の動作が終了する。
Next, after the liquid material 3 is discharged (dropped) in a predetermined amount and for a predetermined time, the head portion 7 is raised, the semiconductor device 1 is moved to the next position, and the series of operations is completed.

ヘッド部7全体の上下のストローク8は主に液体材料3
の切れを良くし、滴下速度を高くする目的で適度に調整
される。
The vertical stroke 8 of the entire head section 7 is mainly caused by the liquid material 3
It is adjusted appropriately to improve the cutting quality and increase the dripping speed.

第2図(b)は上記の結果、半導体素子2上に塗布され
た液体材料9を示した上面図である。この場合、必要と
する面の中央部付近しか塗布されていない。
FIG. 2(b) is a top view showing the liquid material 9 applied onto the semiconductor element 2 as a result of the above. In this case, only the central portion of the required surface is coated.

そこで、第1図(→において、本発明は前記ニードル4
を半導体装置の液体塗布面に対し垂直8−x及U乎行s
−2,8−3な二方向に移動させる制御機構Cをヘッド
部7に連動させて設けたものである。
Therefore, in FIG. 1 (→), the present invention
8-x and U lines perpendicular to the liquid application surface of the semiconductor device.
A control mechanism C is provided in conjunction with the head section 7 to move it in two directions -2 and 8-3.

本発明において、半導体素子2を載置した半導体装置1
が、液体の滴下位置に送られてくると、連動した動作で
シリンジ5を支持したヘッド部7が垂直なストローク8
〜1で設定された範囲で下がり始め、コントロール部よ
り伸びてシリンジ5につながったチューブ6内に空気圧
がかがり、シリンジ5内の液体材料3がニードル4を通
って吐出される。同時に制御機構Cがらの指令によりヘ
ッド部7は半導体素子2の表面に平行な方向のストロー
ク8−2.8−3で設定された範囲に移動する。
In the present invention, a semiconductor device 1 on which a semiconductor element 2 is mounted
When the syringe 5 is delivered to the liquid dropping position, the head part 7 supporting the syringe 5 moves in a vertical stroke 8 in an interlocking motion.
The pressure starts to decrease within the range set by 1 to 1, air pressure builds up in the tube 6 extending from the control section and connected to the syringe 5, and the liquid material 3 in the syringe 5 is discharged through the needle 4. At the same time, the head section 7 moves in a direction parallel to the surface of the semiconductor element 2 within a range set by a stroke 8-2, 8-3 according to a command from the control mechanism C.

その後一定量・一定時間に液体材料3が吐出(滴下)さ
れた後に、ヘッド部7が上昇し、半導体装置1は次の位
置に移動され、一連の動作が終了する。
Thereafter, after the liquid material 3 is discharged (dropped) in a certain amount and for a certain period of time, the head section 7 is raised, the semiconductor device 1 is moved to the next position, and the series of operations is completed.

ヘッド部7全体の半導体素子2に垂直な方向のストロー
ク8−1は、液体材料3の切れを良くシ。
The stroke 8-1 of the entire head portion 7 in the direction perpendicular to the semiconductor element 2 cuts the liquid material 3 well.

滴下速度を高め、又平行な方向のストローク8−2.8
−3は液体材料を広範囲に適度のスピードを液体材料3
にもたせながら行なわれる。
Increase the dropping speed and stroke in parallel direction 8-2.8
-3 is liquid material 3 which spreads liquid material over a wide range at moderate speed.
It is performed while leaning on the body.

第1図(b)は本発明によるディスペンサーを使用し、
半導体素子2上に塗布された液体材料9を示した上面図
である。この場合、塗布すべき面に適合した塗布がなさ
れておシ、平行な方向のストローク8−2.8−3によ
るニードル4の半導体素子2上へ投影した軌跡1oは図
の様に方形でよい。
FIG. 1(b) uses a dispenser according to the invention,
FIG. 2 is a top view showing liquid material 9 applied on a semiconductor element 2. FIG. In this case, the coating is applied in a way that suits the surface to be coated, and the locus 1o projected onto the semiconductor element 2 of the needle 4 by the stroke 8-2.8-3 in the parallel direction may be rectangular as shown in the figure. .

(7)発明の効果 本発明は以上説明したように、塗布されるべき平面上部
で上下方向のみならず、前後・左右方向にニードルを移
動させて液体を半導体装置に塗布するようにしたので、
半導体装置への塗布可能な面積を拡大でき、しかも該面
積の範囲は、従来技術の様に吐出される液体材料の粘度
・チクソ性・接触角等の固有な性質に左右されず、又、
塗布すべき半導体装置のサイズ・形状等にも制約を受け
ないという優れた特性を兼ね供えているという効果を有
するものである。
(7) Effects of the Invention As explained above, in the present invention, the liquid is applied to the semiconductor device by moving the needle not only in the vertical direction but also in the front and back and left and right directions on the upper part of the plane to be applied.
The area that can be coated onto a semiconductor device can be expanded, and the range of the area is not affected by the inherent properties of the liquid material such as viscosity, thixotropy, contact angle, etc., unlike conventional techniques, and
This coating has the advantage of not being restricted by the size, shape, etc. of the semiconductor device to be coated.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(α)は本発明によるディスペンサーの一部分の
側面図、第1図(b)は本発明によるディスペンサーで
塗布後の半導体装置を示す上面図、第2図(α)は従来
技術によるディスペンサーの一部分の側面図、第2図(
b)は従来技術によるディスペンサーで、塗布後の半導
体装置を示す上面図である。 1・・・半導体装置、2・・半導体素子、3・・液体材
料、4・・・ニードル、5・°・シリンジ、6・・・チ
ューブ、7シリンジを支持するヘッド部、8−1・・・
半導体素子に垂直な方向のストローク、8−2・・半導
体素子に平行な方向のス)o−り、8−3・・半導体素
子に平行な方向のストローク、9・・・塗布された液体
材料、IO・ニードルの軌跡 特許出願人 日本電気株式会社 第1図 (α) (b) 第2隊 (α) (b)
FIG. 1(α) is a side view of a portion of the dispenser according to the present invention, FIG. 1(b) is a top view showing a semiconductor device after coating in the dispenser according to the present invention, and FIG. 2(α) is a dispenser according to the prior art. Side view of part of the , Figure 2 (
b) is a top view of a conventional dispenser showing a semiconductor device after coating; DESCRIPTION OF SYMBOLS 1... Semiconductor device, 2... Semiconductor element, 3... Liquid material, 4... Needle, 5... Syringe, 6... Tube, 7 Head portion supporting syringe, 8-1...・
Stroke in the direction perpendicular to the semiconductor element, 8-2... Stroke in the direction parallel to the semiconductor element, 8-3... Stroke in the direction parallel to the semiconductor element, 9... Applied liquid material , IO Needle Trajectory Patent Applicant: NEC Corporation Figure 1 (α) (b) 2nd Group (α) (b)

Claims (1)

【特許請求の範囲】[Claims] (1)ニードルから液体を吐出し、これを半導体装置に
塗布して塗膜を形成する液体材料吐出装置において、前
記ニードルを半導体装置の液体塗布面に対して垂直及び
平行な二方向に移動させる制御機構を備えたことを特徴
とする半導体装置用液体材料吐出装置。
(1) In a liquid material discharging device that discharges liquid from a needle and applies it to a semiconductor device to form a coating film, the needle is moved in two directions perpendicular and parallel to the liquid application surface of the semiconductor device. A liquid material discharging device for a semiconductor device, comprising a control mechanism.
JP10775984A 1984-05-28 1984-05-28 Liquid material discharging device for semiconductor device Pending JPS60251623A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10775984A JPS60251623A (en) 1984-05-28 1984-05-28 Liquid material discharging device for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10775984A JPS60251623A (en) 1984-05-28 1984-05-28 Liquid material discharging device for semiconductor device

Publications (1)

Publication Number Publication Date
JPS60251623A true JPS60251623A (en) 1985-12-12

Family

ID=14467264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10775984A Pending JPS60251623A (en) 1984-05-28 1984-05-28 Liquid material discharging device for semiconductor device

Country Status (1)

Country Link
JP (1) JPS60251623A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004075264A3 (en) * 2003-02-20 2005-01-13 Asml Holding Nv Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004075264A3 (en) * 2003-02-20 2005-01-13 Asml Holding Nv Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems
JP2006518931A (en) * 2003-02-20 2006-08-17 アーエスエムエル ホールディング ナームローゼ フェンノートシャップ Method and apparatus for dispensing semiconductor processing solutions using a multi-syringe fluid dispensing system
CN100399499C (en) * 2003-02-20 2008-07-02 Asml控股股份有限公司 Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems
US7485346B2 (en) 2003-02-20 2009-02-03 Asml Netherlands B.V. Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems

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